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Journal Articles

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Daisuke Ogawa, Keiji Nakamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063001 (2023)
https://doi.org/10.1116/6.0002835
Published: September 2023
View article titled, Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes
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Journal Articles

Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography

Bo Cao, Rui Li, Zhiyuan Cao, Haomin Li, Liqiong Sun, Yingsan Geng, Jianhua Wang, Zhenxing Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053006 (2023)
https://doi.org/10.1116/6.0002876
Published: August 2023
View article titled, Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography
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Journal Articles

Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042401 (2023)
https://doi.org/10.1116/6.0002484
Published: May 2023
View article titled, Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma
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Includes: Supplementary data
Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
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Journal Articles

Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

Qinzhen Hao, Pilbum Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032605 (2023)
https://doi.org/10.1116/6.0002482
Published: April 2023
View article titled, Real-time monitoring of atomic layer etching in Cl<sub>2</sub>/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy
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Journal Articles

In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures

Artem Osipov, Alina Gagaeva, Anastasia Speshilova, Armenak Osipov, Yakov Enns, Alexey Kazakin, Ekaterina Endiiarova, Roman Kornilov, Sergey Alexandrov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033007 (2023)
https://doi.org/10.1116/6.0002427
Published: April 2023
View article titled, <em>In situ</em> diagnostics of the Si etching structures profile in ICP SF<sub>6</sub>/C<sub>4</sub>F<sub>8</sub> plasma: Macrostructures
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Journal Articles

Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si

François Boulard, Valentin Bacquié, Aurélien Tavernier, Nicolas Possémé
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033002 (2023)
https://doi.org/10.1116/6.0002434
Published: March 2023
View article titled, Role of SiCl<sub>4</sub> addition in CH<sub>3</sub>F/O<sub>2</sub> based chemistry for Si<sub>3</sub>N<sub>4</sub> etching selectively to SiO<sub>2</sub>, SiCO, and Si
Open the PDF for Role of SiCl<sub>4</sub> addition in CH<sub>3</sub>F/O<sub>2</sub> based chemistry for Si<sub>3</sub>N<sub>4</sub> etching selectively to SiO<sub>2</sub>, SiCO, and Si in another window
Journal Articles

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K. Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astie, Jean-Manuel Decams, Mikhael Bechelany, Lionel Santinacci
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032401 (2023)
https://doi.org/10.1116/6.0002288
Published: March 2023
View article titled, Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
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Includes: Supplementary data
Journal Articles

Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation

Artem Shelemin, Oleg Zabeida, Jincheng Qian, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023409 (2023)
https://doi.org/10.1116/6.0002371
Published: February 2023
View article titled, Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation
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Includes: Supplementary data
Journal Articles

Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy

M. A. Mione, V. Vandalon, W. M. M. Kessels, F. Roozeboom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062407 (2022)
https://doi.org/10.1116/6.0002158
Published: November 2022
View article titled, Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al<sub>2</sub>O<sub>3</sub> using infrared and optical emission spectroscopy
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Includes: Supplementary data
Journal Articles

Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor

Radha Krishna Murthy Bulusu, Shurik Yatom, Christopher W. Patterson, Robert J. Wandell, Bruce R. Locke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063001 (2022)
https://doi.org/10.1116/6.0001992
Published: September 2022
View article titled, Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor
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Includes: Supplementary data
Journal Articles

Influence of the carrier wafer during GaN etching in Cl2 plasma

Thibaut Meyer, Camille Petit-Etienne, Erwine Pargon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 023202 (2022)
https://doi.org/10.1116/6.0001478
Published: January 2022
View article titled, Influence of the carrier wafer during GaN etching in Cl<sub>2</sub> plasma
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Journal Articles

Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source

Katherine E. Mackie, Michael J. Gordon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013002 (2022)
https://doi.org/10.1116/6.0001386
Published: December 2021
View article titled, Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source
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Journal Articles

Comparison of CO and CO2 rf plasma treatment of SnO2 nanoparticles for gas sensing materials

Kimberly A. M. Hiyoto, Erin P. Stuckert, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063005 (2021)
https://doi.org/10.1116/6.0001326
Published: November 2021
View article titled, Comparison of CO and CO<sub>2</sub> rf plasma treatment of SnO<sub>2</sub> nanoparticles for gas sensing materials
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Includes: Supplementary data
Journal Articles

Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms

Artem Shelemin, Oleg Zabeida, Jolanta-Ewa Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063003 (2021)
https://doi.org/10.1116/6.0001291
Published: October 2021
View article titled, Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms
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Includes: Supplementary data
Journal Articles

Innovative remote plasma source for atomic layer deposition for GaN devices

Harm C. M. Knoops, Karsten Arts, Jan W. Buiter, Luca Matteo Martini, Richard Engeln, Dilini Tania Hemakumara, Michael Powell, Wilhelmus M. M. (Erwin) Kessels, Chris J. Hodson, Aileen O’Mahony
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062403 (2021)
https://doi.org/10.1116/6.0001318
Published: September 2021
View article titled, Innovative remote plasma source for atomic layer deposition for GaN devices
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe F. Smet, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062402 (2021)
https://doi.org/10.1116/6.0001094
Published: September 2021
View article titled, Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth
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Includes: Supplementary data
Journal Articles

Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si

Nobuya Miyoshi, Kazunori Shinoda, Hiroyuki Kobayashi, Masaru Kurihara, Yutaka Kouzuma, Masaru Izawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 052601 (2021)
https://doi.org/10.1116/6.0001179
Published: August 2021
View article titled, Atomic layer etching of Si<sub>3</sub>N<sub>4</sub> with high selectivity to SiO<sub>2</sub> and poly-Si
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Journal Articles

Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching

Clint D. Frye, Scott B. Donald, Catherine Reinhardt, Lars F. Voss, Sara E. Harrison
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053002 (2021)
https://doi.org/10.1116/6.0001123
Published: August 2021
View article titled, Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching
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Journal Articles

Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas

Tara L. Van Surksum, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053001 (2021)
https://doi.org/10.1116/6.0001080
Published: July 2021
View article titled, Elucidating energetics and kinetics in environmentally relevant mixed gas plasmas
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Includes: Supplementary data