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Journal Articles

Cr₂O₃–NiO mixed oxides thin films for p-type transparent conductive electrodes

Aleksei Almaev, Bogdan Kushnarev, Petr Korusenko, Pavel Butenko, Viktor Kopyev, Aleksandra Koroleva, Andrei Chikiryaka, Evgeniy Zhizhin

J. Vac. Sci. Technol. A 42, 063406 (2024)

https://doi.org/10.1116/6.0003956

Published: October 2024

View article titled, Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes

Journal Articles

Low-loss and low-temperature Al₂O₃ thin films for integrated photonics and optical coatings

Pooya Torab Ahmadi, Michael Chesaux, Jacek Wojcik, Dino Deligiannis, Peter Mascher, Jonathan D. B. Bradley

J. Vac. Sci. Technol. A 42, 063402 (2024)

https://doi.org/10.1116/6.0003976

Published: October 2024

View article titled, Low-loss and low-temperature Al2O3 thin films for integrated photonics and optical coatings

Journal Articles

High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle

Hironori Torii, Shinsuke Matsui

J. Vac. Sci. Technol. A 42, 062701 (2024)

https://doi.org/10.1116/6.0003837

Published: September 2024

View article titled, High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle

Journal Articles

Effect of sputtering power and thickness ratios on the materials properties of Cu–W and Cu–Cr bilayer thin films using high power impulse magnetron and DC magnetron sputtering

Tra Anh Khoa Nguyen, Yu Huang, Nhat Minh Dang, Chi-Han Lin, Wei-Chieh Chen, Zhao-Ying Wang, Ming-Tzer Lin

J. Vac. Sci. Technol. A 42, 053410 (2024)

https://doi.org/10.1116/6.0003795

Published: August 2024

View article titled, Effect of sputtering power and thickness ratios on the materials properties of Cu–W and Cu–Cr bilayer thin films using high power impulse magnetron and DC magnetron sputtering

Journal Articles

Optimized thermoelectric performance of flexible Bi_0.5Sb_1.5Te₃ thin film through PbTe incorporation

Rensheng Zhang, Xujiang Tian, Shaojun Liang, Hanming Zhu, Song Yue

J. Vac. Sci. Technol. A 42, 053409 (2024)

https://doi.org/10.1116/6.0003812

Published: August 2024

View article titled, Optimized thermoelectric performance of flexible Bi0.5Sb1.5Te3 thin film through PbTe incorporation

Includes: Supplementary data

Journal Articles

Sputter-deposited zirconium doped nickel-aluminide coatings for high-temperature oxidation-resistant applications

Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Piyush Chandra Verma, Paritosh Dubey, Vipin Chawla, Neha Sardana, Sanjeev Kumar, Devesh Kumar Avasthi, Amit Kumar Chawla

J. Vac. Sci. Technol. A 42, 053408 (2024)

https://doi.org/10.1116/6.0003848

Published: August 2024

View article titled, Sputter-deposited zirconium doped nickel-aluminide coatings for high-temperature oxidation-resistant applications

Journal Articles

Nanostructured bi-metallic Pd–Ag alloy films for surface-enhanced Raman spectroscopy-based sensing application

Niladri Mohan Das, Avantika Chauhan, M. S. S. Bharati, Kousik Bera, Satani Sampath Kumar, Venugopal Rao Soma, Amit Kumar Chawla, Shyama Rath, Devesh Kumar Avasthi

J. Vac. Sci. Technol. A 42, 053403 (2024)

https://doi.org/10.1116/6.0003748

Published: August 2024

View article titled, Nanostructured bi-metallic Pd–Ag alloy films for surface-enhanced Raman spectroscopy-based sensing application

Journal Articles

Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device

Itsuki Misono, Taisei Motomura, Tatsuo Tabaru, Masato Uehara, Tetsuya Okuyama

J. Vac. Sci. Technol. A 42, 053005 (2024)

https://doi.org/10.1116/6.0003743

Published: July 2024

View article titled, Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device

Journal Articles

Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning

Alexander G. Shard, Mark A. Baker

J. Vac. Sci. Technol. A 42, 050801 (2024)

https://doi.org/10.1116/6.0003681

Published: July 2024

View article titled, Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning

Journal Articles

MoS₂-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy

J. Patouillard, M. Bernard, S. Cadot, R. Gassilloud, N. Bernier, A. Grenier, A. Mantoux, E. Blanquet, F. Martin, C. Raynaud, F. Gianesello

J. Vac. Sci. Technol. A 42, 050401 (2024)

https://doi.org/10.1116/6.0003652

Published: July 2024

View article titled, MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy

Journal Articles

Piezoelectric and elastic properties of Al_0.60Sc_0.40N thin films deposited on patterned metal electrodes

Marco Liffredo, Nan Xu, Silvan Stettler, Federico Peretti, Luis Guillermo Villanueva

J. Vac. Sci. Technol. A 42, 043404 (2024)

https://doi.org/10.1116/6.0003497

Published: May 2024

View article titled, Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes

Journal Articles

Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Martin Fenker, Martin Balzer, Holger Kaßner

J. Vac. Sci. Technol. A 42, 043402 (2024)

https://doi.org/10.1116/6.0003333

Published: May 2024

View article titled, Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Journal Articles

Bayesian optimization for stable properties amid processing fluctuations in sputter deposition

Ankit Shrivastava, Matias Kalaswad, Joyce O. Custer, David P. Adams, Habib N. Najm

J. Vac. Sci. Technol. A 42, 033408 (2024)

https://doi.org/10.1116/6.0003418

Published: April 2024

View article titled, Bayesian optimization for stable properties amid processing fluctuations in sputter deposition

Journal Articles

Over 6 MV/cm operation in β-Ga₂O₃ Schottky barrier diodes with IrO₂ and RuO₂ anodes deposited by molecular beam epitaxy

B. Cromer, D. Saraswat, N. Pieczulewski, W. Li, K. Nomoto, F. V. E. Hensling, K. Azizie, H. P. Nair, D. G. Schlom, D. A. Muller, D. Jena, H. G. Xing

J. Vac. Sci. Technol. A 42, 033206 (2024)

https://doi.org/10.1116/6.0003468

Published: April 2024

View article titled, Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy

Includes: Supplementary data

Journal Articles

Flexible VO₂ films grown on ZnO-nanorod buffered polyimide sheets with large insulator metal transition: Evaluation of flexible performance

Yukito Ozawa, Rai Hiranabe, Shinpei Shimono, Qiuzhi Liu, Kunio Okimura

J. Vac. Sci. Technol. A 42, 033103 (2024)

https://doi.org/10.1116/6.0003378

Published: April 2024

View article titled, Flexible VO2 films grown on ZnO-nanorod buffered polyimide sheets with large insulator metal transition: Evaluation of flexible performance

Journal Articles

High-performance a-Ga₂O₃ solar-blind photodetectors by pulsed magnetron sputtering deposition

Difei Xue, Peiwen Lv, Kai Peng, Qiang Hu, Chenlong Chen

J. Vac. Sci. Technol. A 42, 033403 (2024)

https://doi.org/10.1116/6.0003442

Published: March 2024

View article titled, High-performance a-Ga2O3 solar-blind photodetectors by pulsed magnetron sputtering deposition

Journal Articles

Deposition rate and optical emissions in niobium oxide processes by reactive sputtering

João Saccoman, Nilton Francelosi A. Neto, José H. D. da Silva

J. Vac. Sci. Technol. A 42, 033402 (2024)

https://doi.org/10.1116/6.0003255

Published: March 2024

View article titled, Deposition rate and optical emissions in niobium oxide processes by reactive sputtering

Journal Articles

Molybdenum erosion in iodine plasma at hollow cathode conditions

James D. Rogers, Richard D. Branam

J. Vac. Sci. Technol. A 42, 023005 (2024)

https://doi.org/10.1116/6.0003367

Published: February 2024

View article titled, Molybdenum erosion in iodine plasma at hollow cathode conditions

Journal Articles

Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF₄, Mg–O₂, and Ti–O₂ discharges by probe measurements

Eiji Kusano

J. Vac. Sci. Technol. A 42, 023104 (2024)

https://doi.org/10.1116/6.0003244

Published: February 2024

View article titled, Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements

Journal Articles

Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films

D. Cristea, A. I. Scărlătescu, G. Bulai, D. Martínez-Martínez, C. I. da Silva Oliveira, G. Yan, L. Cunha

J. Vac. Sci. Technol. A 42, 023411 (2024)

https://doi.org/10.1116/6.0003267

Published: January 2024

View article titled, Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films

NARROW

Topics

Cr₂O₃–NiO mixed oxides thin films for p-type transparent conductive electrodes

Low-loss and low-temperature Al₂O₃ thin films for integrated photonics and optical coatings

High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle

Effect of sputtering power and thickness ratios on the materials properties of Cu–W and Cu–Cr bilayer thin films using high power impulse magnetron and DC magnetron sputtering

Optimized thermoelectric performance of flexible Bi_0.5Sb_1.5Te₃ thin film through PbTe incorporation

Sputter-deposited zirconium doped nickel-aluminide coatings for high-temperature oxidation-resistant applications

Nanostructured bi-metallic Pd–Ag alloy films for surface-enhanced Raman spectroscopy-based sensing application

Effect of plasma discharge pulse length for GaN film crystallinity on sapphire substrate by high density convergent plasma sputtering device

Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning

MoS₂-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy

Piezoelectric and elastic properties of Al_0.60Sc_0.40N thin films deposited on patterned metal electrodes

Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Bayesian optimization for stable properties amid processing fluctuations in sputter deposition

Over 6 MV/cm operation in β-Ga₂O₃ Schottky barrier diodes with IrO₂ and RuO₂ anodes deposited by molecular beam epitaxy

Flexible VO₂ films grown on ZnO-nanorod buffered polyimide sheets with large insulator metal transition: Evaluation of flexible performance

High-performance a-Ga₂O₃ solar-blind photodetectors by pulsed magnetron sputtering deposition

Deposition rate and optical emissions in niobium oxide processes by reactive sputtering

Molybdenum erosion in iodine plasma at hollow cathode conditions

Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF₄, Mg–O₂, and Ti–O₂ discharges by probe measurements

Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films

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