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Journal Articles

Some considerations in nanoindentation measurement and analysis by atomic force microscopy

Irit Rosenhek-Goldian, Sidney R. Cohen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062801 (2023)
https://doi.org/10.1116/6.0003136
Published: November 2023
View article titled, Some considerations in nanoindentation measurement and analysis by atomic force microscopy
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Journal Articles

Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron

Laurent Souqui, Hans Högberg, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063412 (2023)
https://doi.org/10.1116/6.0003001
Published: November 2023
View article titled, Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron
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Includes: Supplementary data
Journal Articles

Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology

Esteban Broitman, Yuri Kadin, Predrag Andric
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063210 (2023)
https://doi.org/10.1116/6.0003048
Published: November 2023
View article titled, Study of Al2124-SiC nanocomposites by an improved statistical nanoindentation methodology
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Journal Articles

Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatings

Sunil Kumar Tiwari, Akula Umamaheswara Rao, Archana Singh Kharb, Vipin Chawla, Neha Sardana, Devesh Kumar Avasthi, Amit Kumar Chawla
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063407 (2023)
https://doi.org/10.1116/6.0003022
Published: October 2023
View article titled, Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni<sub>3</sub>Al coatings
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Journal Articles

Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Brahim Ahammou, Paramita Bhattacharyya, Christophe Levallois, Fahmida Azmi, Jean-Pierre Landesman, Peter Mascher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053113 (2023)
https://doi.org/10.1116/6.0002896
Published: August 2023
View article titled, Mechanical and optical properties of amorphous silicon nitride-based films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition
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Journal Articles

Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate

Lena Patterer, Sabrina Kollmann, Teresa de los Arcos, Leonie Jende, Soheil Karimi Aghda, Damian M. Holzapfel, Sameer A. Salman, Stanislav Mráz, Guido Grundmeier, Jochen M. Schneider
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053112 (2023)
https://doi.org/10.1116/6.0002921
Published: August 2023
View article titled, Large-area deposition of protective (Ti,Al)N coatings onto polycarbonate
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Includes: Supplementary data
Journal Articles

Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings

Gilad Zorn, Joshua Salisbury, Jae-Hyuk Her, Rachel Rose, Patrick Shower
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053106 (2023)
https://doi.org/10.1116/6.0002805
Published: July 2023
View article titled, Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings
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Journal Articles

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Xin Zhang, Xiu-bo Tian, Chun-zhi Gong, Xiang-li Liu, Jin Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033405 (2023)
https://doi.org/10.1116/6.0002353
Published: April 2023
View article titled, Effect of plasma nitriding substrate current density on the adhesion strength of <em>in situ</em> PVD TiN coatings
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Journal Articles

Composition, structure, and mechanical properties of cathodic arc deposited Cr-rich Cr-N coatings

Johan Nyman, Grzegorz Greczynski, Muhammad Junaid, Niklas Sarius, Sören Kahl, Jens Birch, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023105 (2023)
https://doi.org/10.1116/6.0002366
Published: February 2023
View article titled, Composition, structure, and mechanical properties of cathodic arc deposited Cr-rich Cr-N coatings
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Journal Articles

Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating

Xiao Li, Ivan Petrov, Lars Hultman, Grzegorz Greczynski
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013407 (2023)
https://doi.org/10.1116/6.0002320
Published: December 2022
View article titled, Determining role of W<sup>+</sup> ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating
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Journal Articles

Synthesis and characteristics of Sn-doped SiO2 via plasma-enhanced atomic layer deposition for self-aligned patterning

Suhyeon Park, Junyung An, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062401 (2022)
https://doi.org/10.1116/6.0001895
Published: September 2022
View article titled, Synthesis and characteristics of Sn-doped SiO<sub>2</sub> via plasma-enhanced atomic layer deposition for self-aligned patterning
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Journal Articles

On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition

Katalin Böőr, Erik Lindahl, Linus von Fieandt, Mats Boman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053101 (2022)
https://doi.org/10.1116/6.0001941
Published: August 2022
View article titled, On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition
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Includes: Supplementary data
Journal Articles

CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior

K. Bobzin, T. Brögelmann, N. C. Kruppe, H. J. Maier, T. Heidenblut, H.-B. Besserer, C. Kahra, J. Janowitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013414 (2022)
https://doi.org/10.1116/6.0001462
Published: December 2021
View article titled, CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior
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Journal Articles

Enhancement in the tribological performance of WSx/a-C multilayer films with Al sublayers in vacuum

Fang-er Yang, Wan-kun Zhang, Gong-qi Wang, Tao Wang, Xiao-hua Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033404 (2021)
https://doi.org/10.1116/6.0000785
Published: March 2021
View article titled, Enhancement in the tribological performance of WS<em><sub>x</sub></em>/a-C multilayer films with Al sublayers in vacuum
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Journal Articles

Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heating

Zhengtao Wu, Olof Tengstrand, Babak Bakhit, Jun Lu, J. E. Greene, Lars Hultman, Ivan Petrov, Grzegorz Greczynski
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023006 (2020)
https://doi.org/10.1116/1.5140357
Published: January 2020
View article titled, Growth of dense, hard yet low-stress Ti<sub>0.40</sub>Al<sub>0.27</sub>W<sub>0.33</sub>N nanocomposite films with rotating substrate and no external substrate heating
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Journal Articles

Influence of Si doping and O2 flow on arc-deposited (Al,Cr)2O3 coatings

Ludvig Landälv, Emmanuelle Göthelid, Jens Jensen, Grzegorz Greczynski, Jun Lu, Mats Ahlgren, Lars Hultman, Björn Alling, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061516 (2019)
https://doi.org/10.1116/1.5118312
Published: November 2019
View article titled, Influence of Si doping and O<sub>2</sub> flow on arc-deposited (Al,Cr)<sub>2</sub>O<sub>3</sub> coatings
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Includes: Supplementary data
Journal Articles

Effect of the plasma confinement on properties of a-C:H:SiOx films grown by plasma enhanced chemical vapor deposition

Alexander S. Grenadyorov, Аndrey А. Solovyev, Konstantin V. Oskomov, Vladimir O. Oskirko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061512 (2019)
https://doi.org/10.1116/1.5118852
Published: November 2019
View article titled, Effect of the plasma confinement on properties of a-C:H:SiO<sub>x</sub> films grown by plasma enhanced chemical vapor deposition
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Journal Articles

Investigation on the influence of oxygen on the deformation and cracking behavior of (Cr,Al)ON hard coatings using combinatorial static and dynamic loadings

Tobias Brögelmann, Kirsten Bobzin, Nathan Christopher Kruppe, Mostafa Arghavani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061509 (2019)
https://doi.org/10.1116/1.5124615
Published: October 2019
View article titled, Investigation on the influence of oxygen on the deformation and cracking behavior of (Cr,Al)ON hard coatings using combinatorial static and dynamic loadings
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Journal Articles

Effects of nitrogen-argon flow ratio on the microstructural and mechanical properties of TiAlSiN/CrN multilayer coatings prepared using high power impulse magnetron sputtering

Hui Liu, Jian-Fu Tang, Xiaojian Wang, Wei Li, Chi-Lung Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051501 (2019)
https://doi.org/10.1116/1.5100340
Published: July 2019
View article titled, Effects of nitrogen-argon flow ratio on the microstructural and mechanical properties of TiAlSiN/CrN multilayer coatings prepared using high power impulse magnetron sputtering
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Journal Articles

Nanomechanical and microtribological properties of yttrium thin films for photocathode engineering

Esteban Broitman, Antonella Lorusso, Alessio Perrone, Vagelis Karoutsos, Nikolaos A. Vainos, Francisco Gontad
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031507 (2019)
https://doi.org/10.1116/1.5088106
Published: April 2019
View article titled, Nanomechanical and microtribological properties of yttrium thin films for photocathode engineering
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