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Journal Articles

Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering

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Babak Bakhit, Ivan Petrov, J. E. Greene, Lars Hultman, Johanna Rosén, Grzegorz Greczynski
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 030604 (2018)
https://doi.org/10.1116/1.5026445
Published: April 2018
View articletitled, Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering
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Journal Articles

Time‐resolved mass spectrometry in rough vacuum environment

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J. Laimer, O. Schnabl, C. G. Schwärzler, H. Störi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 14, 2315–2324 (1996)
https://doi.org/10.1116/1.580065
Published: July 1996
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Journal Articles

Loss of selectivity during W chemical vapor deposition on Si using the WF6/SiH4 process

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P. A. C. Groenen, Ö. F. Tekcan, J. G. A. Hölscher, H. H. Brongersma
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 12, 737–745 (1994)
https://doi.org/10.1116/1.578816
Published: May 1994
View articletitled, Loss of selectivity during W chemical vapor deposition on Si using the WF6/SiH4 process
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