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Journal Articles

Etching and fluorination of yttrium oxide (Y₂O₃) irradiated with fluorine ions or radicals

Hojun Kang, Tomoko Ito, Junghwan Um, Hikaru Kokura, Sungil Cho, Hyunjung Park, Kazuhiro Karahashi, Satoshi Hamaguchi

J. Vac. Sci. Technol. A 43, 013003 (2025)

https://doi.org/10.1116/6.0004137

Published: January 2025

View article titled, Etching and fluorination of yttrium oxide (Y2O3) irradiated with fluorine ions or radicals

Journal Articles

Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study

Jomar U. Tercero, Michiro Isobe, Kazuhiro Karahashi, Magdaleno R. Vasquez, Jr., Satoshi Hamaguchi

J. Vac. Sci. Technol. A 42, 052603 (2024)

https://doi.org/10.1116/6.0003750

Published: August 2024

View article titled, Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study

Journal Articles

In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching

Takayoshi Tsutsumi, Atsuki Asano, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

J. Vac. Sci. Technol. A 42, 032603 (2024)

https://doi.org/10.1116/6.0003432

Published: April 2024

View article titled, In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching

Journal Articles

Significant decrease in surface charging of electrically isolated ionic liquid by cluster ion bombardment

Yukio Fujiwara

J. Vac. Sci. Technol. A 42, 033207 (2024)

https://doi.org/10.1116/6.0003500

Published: April 2024

View article titled, Significant decrease in surface charging of electrically isolated ionic liquid by cluster ion bombardment

Includes: Supplementary data

Journal Articles

Molecular dynamics study of SiO₂ nanohole etching by fluorocarbon ions

Charisse Marie D. Cagomoc, Michiro Isobe, Satoshi Hamaguchi

J. Vac. Sci. Technol. A 41, 023001 (2023)

https://doi.org/10.1116/6.0002380

Published: February 2023

View article titled, Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions

Includes: Supplementary data

Journal Articles

Thermal versus radiation-assisted defect annealing in β-Ga₂O₃

Alexander Azarov, Vishnukanthan Venkatachalapathy, In-Hwan Lee, Andrej Kuznetsov

J. Vac. Sci. Technol. A 41, 023101 (2023)

https://doi.org/10.1116/6.0002388

Published: January 2023

View article titled, Thermal versus radiation-assisted defect annealing in β-Ga2O3

Journal Articles

Morphological changes of nanostructures on silicon induced by C₆₀-ion irradiation

Naoto Oishi, Yoshiki Murao, Noriko Nitta, Hidetsugu Tsuchida, Shigeo Tomita, Kimikazu Sasa, Kouichi Hirata, Hiromi Shibata, Yoshimi Hirano, Keisuke Yamada, Atsuya Chiba, Yuichi Saitoh, Kazumasa Narumi, Yasushi Hoshino

J. Vac. Sci. Technol. A 40, 063103 (2022)

https://doi.org/10.1116/6.0002073

Published: November 2022

View article titled, Morphological changes of nanostructures on silicon induced by C60-ion irradiation

Journal Articles

Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials

Yukio Fujiwara, Naoaki Saito

J. Vac. Sci. Technol. A 40, 053203 (2022)

https://doi.org/10.1116/6.0001999

Published: August 2022

View article titled, Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials

Journal Articles

Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

Yukio Fujiwara, Naoaki Saito

J. Vac. Sci. Technol. A 39, 063218 (2021)

https://doi.org/10.1116/6.0001431

Published: October 2021

View article titled, Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

Includes: Supplementary data

Journal Articles

Ion implantation in β-Ga₂O₃: Physics and technology

Alena Nikolskaya, Evgenia Okulich, Dmitry Korolev, Anton Stepanov, Dmitry Nikolichev, Alexey Mikhaylov, David Tetelbaum, Aleksei Almaev, Charles Airton Bolzan, Antônio Buaczik, Jr., Raquel Giulian, Pedro Luis Grande, Ashok Kumar, Mahesh Kumar, Daniela Gogova

J. Vac. Sci. Technol. A 39, 030802 (2021)

https://doi.org/10.1116/6.0000928

Published: March 2021

View article titled, Ion implantation in β-Ga2O3: Physics and technology

Journal Articles

Topotactic crystal structure transformation from spinel ferrite to wüstite in epitaxial Fe₃O₄ films via Kr ion irradiation

Yang Liu, Yuki Hisamatsu, Sonia Sharmin, Daiki Oshima, Satoshi Iwata, Takeshi Kato, Daiichiro Sekiba, Eiji Kita, Hideto Yanagihara

J. Vac. Sci. Technol. A 39, 033403 (2021)

https://doi.org/10.1116/6.0000885

Published: March 2021

View article titled, Topotactic crystal structure transformation from spinel ferrite to wüstite in epitaxial Fe3O4 films via Kr ion irradiation

Journal Articles

Phosphites as precursors in atomic layer deposition thin film synthesis

Kristian B. Kvamme, Amund Ruud, Kristian Weibye, Timo Sajavaara, Ola Nilsen

J. Vac. Sci. Technol. A 39, 032404 (2021)

https://doi.org/10.1116/6.0000844

Published: March 2021

View article titled, Phosphites as precursors in atomic layer deposition thin film synthesis

Journal Articles

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar⁺ ions and Cl radicals

Masaki Hasegawa, Takayoshi Tsutsumi, Atsushi Tanide, Shohei Nakamura, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Masaru Hori

J. Vac. Sci. Technol. A 38, 042602 (2020)

https://doi.org/10.1116/6.0000124

Published: June 2020

View article titled, In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals

Journal Articles

Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

Stella Mathioudaki, Cédric R. Vandenabeele, Romain Tonneau, Andreas Pflug, Jonathan Tennyson, Stéphane Lucas

J. Vac. Sci. Technol. A 38, 033003 (2020)

https://doi.org/10.1116/1.5142913

Published: April 2020

View article titled, Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

Journal Articles

Growth of dense, hard yet low-stress Ti_0.40Al_0.27W_0.33N nanocomposite films with rotating substrate and no external substrate heating

Zhengtao Wu, Olof Tengstrand, Babak Bakhit, Jun Lu, J. E. Greene, Lars Hultman, Ivan Petrov, Grzegorz Greczynski

J. Vac. Sci. Technol. A 38, 023006 (2020)

https://doi.org/10.1116/1.5140357

Published: January 2020

View article titled, Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heating

Journal Articles

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Saravana Balaji Basuvalingam, Bart Macco, Harm C. M. Knoops, Jimmy Melskens, Wilhelmus M. M. (Erwin) Kessels, Ageeth A. Bol

J. Vac. Sci. Technol. A 36, 041503 (2018)

https://doi.org/10.1116/1.5034097

Published: June 2018

View article titled, Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Journal Articles

Recrystallization of VO₂ films into (011)-oriented micrometer-sized grains on Al₂O₃ (001) in biased reactive sputtering

Nurul Hanis Azhan, Kunio Okimura, Kohei Matsuoka, Mustapha Zaghrioui, Joe Sakai

J. Vac. Sci. Technol. A 35, 061508 (2017)

https://doi.org/10.1116/1.4989669

Published: October 2017

View article titled, Recrystallization of VO2 films into (011)-oriented micrometer-sized grains on Al2O3 (001) in biased reactive sputtering

Includes: Supplementary data

Journal Articles

Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori

J. Vac. Sci. Technol. A 35, 060606 (2017)

https://doi.org/10.1116/1.4994218

Published: September 2017

View article titled, Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

Journal Articles

Correlation between density and hydrogen content in vertically aligned carbon nanotube forests by ion beam analysis

Olga Girshevitz, Vova Richter, Efrat Shawat Avraham, Gilbert D. Nessim, Irina Gouzman

J. Vac. Sci. Technol. A 35, 061403 (2017)

https://doi.org/10.1116/1.4999774

Published: August 2017

View article titled, Correlation between density and hydrogen content in vertically aligned carbon nanotube forests by ion beam analysis

Journal Articles

Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

Thomas Dobbelaere, Felix Mattelaer, Philippe M. Vereecken, Christophe Detavernier

J. Vac. Sci. Technol. A 35, 041513 (2017)

https://doi.org/10.1116/1.4987131

Published: June 2017

View article titled, Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

NARROW

Topics

Etching and fluorination of yttrium oxide (Y₂O₃) irradiated with fluorine ions or radicals

Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study

In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching

Significant decrease in surface charging of electrically isolated ionic liquid by cluster ion bombardment

Molecular dynamics study of SiO₂ nanohole etching by fluorocarbon ions

Thermal versus radiation-assisted defect annealing in β-Ga₂O₃

Morphological changes of nanostructures on silicon induced by C₆₀-ion irradiation

Negative ion beam bombardment of a protic ionic liquid: Alleviating surface charging and damage and analyzing the surface of organic insulating materials

Negative-cluster ion beam production from the tip of a sharp needle: Suppression of surface charging and surface analysis of an insulated sample

Ion implantation in β-Ga₂O₃: Physics and technology

Topotactic crystal structure transformation from spinel ferrite to wüstite in epitaxial Fe₃O₄ films via Kr ion irradiation

Phosphites as precursors in atomic layer deposition thin film synthesis

In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar⁺ ions and Cl radicals

Plasma polymerization of cyclopropylamine in a low-pressure cylindrical magnetron reactor: A PIC-MC study of the roles of ions and radicals

Growth of dense, hard yet low-stress Ti_0.40Al_0.27W_0.33N nanocomposite films with rotating substrate and no external substrate heating

Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films

Recrystallization of VO₂ films into (011)-oriented micrometer-sized grains on Al₂O₃ (001) in biased reactive sputtering

Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

Correlation between density and hydrogen content in vertically aligned carbon nanotube forests by ion beam analysis

Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material

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