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Journal Articles

Oxygen plasma treatment of TeO2—B2O3 (boro-tellurite) thin films

Uğur Demirkol, Çağrı Durmuş, Tamer Akan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063006 (2023)
https://doi.org/10.1116/6.0002879
Published: October 2023
View article titled, Oxygen plasma treatment of TeO<sub>2</sub>—B<sub>2</sub>O<sub>3</sub> (boro-tellurite) thin films
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Journal Articles

Effect of the growth orientation on the physical properties of Sr2CoNbO6 thin films

Ajay Kumar, Ramcharan Meena, M. Miryala, K. Ueno, Rajendra S. Dhaka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053409 (2023)
https://doi.org/10.1116/6.0002728
Published: July 2023
View article titled, Effect of the growth orientation on the physical properties of Sr<sub>2</sub>CoNbO<sub>6</sub> thin films
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Journal Articles

Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas

Adnan Mohammad, Krishna D. Joshi, Dhan Rana, Saidjafarzoda Ilhom, Barrett Wells, Brian Willis, Boris Sinkovic, A. K. Okyay, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032405 (2023)
https://doi.org/10.1116/6.0002383
Published: March 2023
View article titled, Low-temperature synthesis of crystalline vanadium oxide films using oxygen plasmas
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Includes: Supplementary data
Journal Articles

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K. Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astie, Jean-Manuel Decams, Mikhael Bechelany, Lionel Santinacci
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032401 (2023)
https://doi.org/10.1116/6.0002288
Published: March 2023
View article titled, Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
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Includes: Supplementary data
Journal Articles

Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications

A. Ferreira, M. A. Correa, S. Lanceros-Mendez, F. Vaz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063101 (2022)
https://doi.org/10.1116/6.0002060
Published: October 2022
View article titled, Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications
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Includes: Supplementary data
Journal Articles

High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Jeyanthinath Mayandi, Matthias Schrade, Ponniah Vajeeston, Marit Stange, Anna M. Lind, Martin F. Sunding, Jonas Deuermeier, Elvira Fortunato, Ole M. Løvvik, Alexander G. Ulyashin, Spyros Diplas, Patricia A. Carvalho, Terje G. Finstad
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 023402 (2022)
https://doi.org/10.1116/6.0001394
Published: January 2022
View article titled, High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation
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Includes: Supplementary data
Journal Articles

Hole selective nickel oxide as transparent conductive oxide

David Tröger, Johanna Reif, Thomas Mikolajick, Matthias Grube
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013409 (2022)
https://doi.org/10.1116/6.0001391
Published: December 2021
View article titled, Hole selective nickel oxide as transparent conductive oxide
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Includes: Supplementary data
Journal Articles

Modulating the optoelectronic properties of hybrid Mo-thiolate thin films

Jingwei Shi, Li Zeng, Shayla Nikzad, David M. Koshy, Arun S. Asundi, Callisto MacIsaac, Stacey F. Bent
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012402 (2022)
https://doi.org/10.1116/6.0001378
Published: December 2021
View article titled, Modulating the optoelectronic properties of hybrid Mo-thiolate thin films
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

Md. Istiaque Chowdhury, Mark Sowa, Kylie E. Van Meter, Tomas F. Babuska, Tomas Grejtak, Alexander C. Kozen, Brandon A. Krick, Nicholas C. Strandwitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053408 (2021)
https://doi.org/10.1116/6.0001175
Published: August 2021
View article titled, Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
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Includes: Supplementary data
Journal Articles

Influence of oxygen partial pressure on properties of monoclinic Ga2O3 deposited on sapphire substrates

Jaime A. Freitas, Jr., James C. Culbertson, Neeraj Nepal, Alyssa L. Mock, Marko J. Tadjer, Zixuan Feng, Hongping Zhao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033414 (2021)
https://doi.org/10.1116/6.0000851
Published: May 2021
View article titled, Influence of oxygen partial pressure on properties of monoclinic Ga<sub>2</sub>O<sub>3</sub> deposited on sapphire substrates
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Journal Articles

Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant

Amanda A. Volk, Jung-Sik Kim, Jovenal Jamir, Elizabeth C. Dickey, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 032413 (2021)
https://doi.org/10.1116/6.0000791
Published: April 2021
View article titled, Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant
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Journal Articles

Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSixN films through composition tuning

Corbin Feit, Srishti Chugh, Ajit R. Dhamdhere, Hae Young Kim, Shaurya Dabas, Somilkumar J. Rathi, Niloy Mukherjee, Parag Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 062404 (2020)
https://doi.org/10.1116/6.0000453
Published: October 2020
View article titled, Achieving near-zero temperature coefficient of resistivity in atomic layer deposition TiSi<sub>x</sub>N films through composition tuning
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Includes: Supplementary data
Journal Articles

In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films

Johanna Reif, Martin Knaut, Sebastian Killge, Felix Winkler, Matthias Albert, Johann W. Bartha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 012405 (2020)
https://doi.org/10.1116/1.5132891
Published: December 2019
View article titled, <em>In vacuo</em> studies on plasma-enhanced atomic layer deposition of cobalt thin films
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Journal Articles

Resistivity and surface scattering of (0001) single crystal ruthenium thin films

Sameer S. Ezzat, Prabhu Doss Mani, Asim Khaniya, William Kaden, Daniel Gall, Katayun Barmak, Kevin R. Coffey
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031516 (2019)
https://doi.org/10.1116/1.5093494
Published: May 2019
View article titled, Resistivity and surface scattering of (0001) single crystal ruthenium thin films
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Journal Articles

CMOS compatible metal stacks for suppression of secondary grains in Sc0.125Al0.875N

Giovanni Esteves, Morgann Berg, Kyle D. Wrasman, Michael David Henry, Benjamin A. Griffin, Erica A. Douglas
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021511 (2019)
https://doi.org/10.1116/1.5065517
Published: February 2019
View article titled, CMOS compatible metal stacks for suppression of secondary grains in Sc<sub>0.125</sub>Al<sub>0.875</sub>N
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Includes: Supplementary data
Journal Articles

Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target

Martin Magnuson, Lina Tengdelius, Grzegorz Greczynski, Fredrik Eriksson, Jens Jensen, Jun Lu, Mattias Samuelsson, Per Eklund, Lars Hultman, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021506 (2019)
https://doi.org/10.1116/1.5065468
Published: January 2019
View article titled, Compositional dependence of epitaxial Ti<sub>n+1</sub>SiC<sub>n</sub> MAX-phase thin films grown from a Ti<sub>3</sub>SiC<sub>2</sub> compound target
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Journal Articles

Characterization of atomic layer deposited semiconducting Co3O4

Konner E. K. Holden, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 020903 (2019)
https://doi.org/10.1116/1.5064469
Published: January 2019
View article titled, Characterization of atomic layer deposited semiconducting Co<sub>3</sub>O<sub>4</sub>
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Journal Articles

Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films

Elham Mohimi, Kinsey Canova, Zhejun Zhang, Sumeng Liu, Justin L. Mallek, Gregory S. Girolami, John R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021503 (2019)
https://doi.org/10.1116/1.5079805
Published: January 2019
View article titled, Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of titanium vanadium nitride

Mark J. Sowa, Ling Ju, Alexander C. Kozen, Nicholas C. Strandwitz, Guosong Zeng, Tomas F. Babuska, Zakaria Hsain, Brandon A. Krick
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 06A103 (2018)
https://doi.org/10.1116/1.5037463
Published: October 2018
View article titled, Plasma-enhanced atomic layer deposition of titanium vanadium nitride
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Includes: Supplementary data
Journal Articles

Growth and properties of epitaxial Ti1−xMgxN(001) layers

Baiwei Wang, Sit Kerdsongpanya, Mary E. McGahay, Erik Milosevic, Panos Patsalas, Daniel Gall
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061501 (2018)
https://doi.org/10.1116/1.5049957
Published: September 2018
View article titled, Growth and properties of epitaxial Ti<sub>1−<em>x</em></sub>Mg<em><sub>x</sub></em>N(001) layers
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