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Journal Articles

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K. Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astie, Jean-Manuel Decams, Mikhael Bechelany, Lionel Santinacci
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032401 (2023)
https://doi.org/10.1116/6.0002288
Published: March 2023
View article titled, Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
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Includes: Supplementary data
Journal Articles

Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications

A. Ferreira, M. A. Correa, S. Lanceros-Mendez, F. Vaz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063101 (2022)
https://doi.org/10.1116/6.0002060
Published: October 2022
View article titled, Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications
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Includes: Supplementary data
Journal Articles

Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content

Daniela Fontecha, R. Blake Nuwayhid, Alexander C. Kozen, David M. Stewart, Gary W. Rubloff, Keith E. Gregorczyk
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 032403 (2022)
https://doi.org/10.1116/6.0001752
Published: April 2022
View article titled, Low temperature plasma-enhanced atomic layer deposition of sodium phosphorus oxynitride with tunable nitrogen content
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Includes: Supplementary data
Journal Articles

Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition

Nese Gungor, Mustafa Alevli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022404 (2022)
https://doi.org/10.1116/6.0001498
Published: January 2022
View article titled, Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface

Wanxing Xu, Ryan J. Gasvoda, Paul C. Lemaire, Kashish Sharma, Dennis M. Hausmann, Sumit Agarwal
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012403 (2022)
https://doi.org/10.1116/6.0001449
Published: December 2021
View article titled, Area-selective atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> on SiN<em><sub>x</sub></em> with SiO<sub>2</sub> as the nongrowth surface
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Includes: Supplementary data
Journal Articles

Transparent conductive properties of TiON thin films

Housei Akazawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013407 (2022)
https://doi.org/10.1116/6.0001434
Published: December 2021
View article titled, Transparent conductive properties of TiON thin films
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Journal Articles

Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films

S. G. Walton, D. R. Boris, S. G. Rosenberg, H. Miyazoe, E. A. Joseph, S. U. Engelmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033002 (2021)
https://doi.org/10.1116/6.0000868
Published: March 2021
View article titled, Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films
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Journal Articles

Energy-dense Li metal anodes enabled by thin film electrolytes

Marina Maria Ioanniti, Fei Hu, Wyatt E. Tenhaeff
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 060801 (2020)
https://doi.org/10.1116/6.0000430
Published: September 2020
View article titled, Energy-dense Li metal anodes enabled by thin film electrolytes
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Journal Articles

Bixbyite-Ta2N2O film prepared by HiPIMS and postdeposition annealing: Structure and properties

J. Čapek, Š. Batková, M. Matas, Š. Kos, T. Kozák, S. Haviar, J. Houška, J. Schusser, J. Minár, F. Dvořák, P. Zeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033409 (2020)
https://doi.org/10.1116/6.0000066
Published: April 2020
View article titled, Bixbyite-Ta<sub>2</sub>N<sub>2</sub>O film prepared by HiPIMS and postdeposition annealing: Structure and properties
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Journal Articles

Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Małgorzata Kot, Justyna Łobaza, Franziska Naumann, Hassan Gargouri, Karsten Henkel, Dieter Schmeißer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A114 (2018)
https://doi.org/10.1116/1.5003356
Published: December 2017
View article titled, Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
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Journal Articles

Stress modulation of titanium nitride thin films deposited using atomic layer deposition

Manuj Nahar, Noel Rocklein, Michael Andreas, Greg Funston, Duane Goodner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B144 (2017)
https://doi.org/10.1116/1.4972859
Published: December 2016
View article titled, Stress modulation of titanium nitride thin films deposited using atomic layer deposition
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Journal Articles

In-gap states in titanium dioxide and oxynitride atomic layer deposited films

Karsten Henkel, Chittaranjan Das, Małgorzata Kot, Dieter Schmeißer, Franziska Naumann, Irina Kärkkänen, Hassan Gargouri
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B135 (2017)
https://doi.org/10.1116/1.4972247
Published: December 2016
View article titled, In-gap states in titanium dioxide and oxynitride atomic layer deposited films
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Journal Articles

Investigation of TiN thin film oxidation depending on the substrate temperature at vacuum break

Fabien Piallat, Remy Gassilloud, Pierre Caubet, Christophe Vallée
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051508 (2016)
https://doi.org/10.1116/1.4960648
Published: August 2016
View article titled, Investigation of TiN thin film oxidation depending on the substrate temperature at vacuum break
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Journal Articles

Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study

Małgorzata Sowińska, Karsten Henkel, Dieter Schmeißer, Irina Kärkkänen, Jessica Schneidewind, Franziska Naumann, Bernd Gruska, Hassan Gargouri
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A127 (2016)
https://doi.org/10.1116/1.4936227
Published: November 2015
View article titled, Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
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Journal Articles

Surface cleaning for enhanced adhesion to packaging surfaces: Effect of oxygen and ammonia plasma

Sneha Gaddam, Haseeb Kazi, Bin Dong, Marcus Driver, Jeffry Kelber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021301 (2015)
https://doi.org/10.1116/1.4902334
Published: November 2014
View article titled, Surface cleaning for enhanced adhesion to packaging surfaces: Effect of oxygen and ammonia plasma
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Journal Articles

Lithium phosphorus oxynitride solid-state thin-film electrolyte deposited and modified by bias sputtering and low temperature annealing

K.-F. Chiu, C. C. Chen, K. M. Lin, C. C. Lo, H. C. Lin, W.-H. Ho, C. S. Jiang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 568–572 (2010)
https://doi.org/10.1116/1.3435330
Published: June 2010
View article titled, Lithium phosphorus oxynitride solid-state thin-film electrolyte deposited and modified by bias sputtering and low temperature annealing
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Journal Articles

Crystallographic texture control of sputtered HfN thin films using low oxygen partial pressures

D. Deniz, J. M. E. Harper
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 63–66 (2009)
https://doi.org/10.1116/1.3039680
Published: December 2008
View article titled, Crystallographic texture control of sputtered HfN thin films using low oxygen partial pressures
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Journal Articles

Low energy secondary ion mass spectrometry with sub-keV O 2 + beams at glancing incidence

Z. X. Jiang, K. Kim, T. Guenther, B. Robichaud, J. Benavides, L. Contreras, D. D. Sieloff
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1120–1127 (2008)
https://doi.org/10.1116/1.2952449
Published: July 2008
View article titled, Low energy secondary ion mass spectrometry with sub-keV O 2 + beams at glancing incidence
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Journal Articles

Experiments and modeling of dual reactive magnetron sputtering using two reactive gases

T. Kubart, D. H. Trinh, L. Liljeholm, L. Hultman, H. Högberg, T. Nyberg, S. Berg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 565–570 (2008)
https://doi.org/10.1116/1.2913582
Published: June 2008
View article titled, Experiments and modeling of dual reactive magnetron sputtering using two reactive gases
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Journal Articles

Effect of additive gases and injection methods on chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F 2 remote plasmas

Y. B. Yun, S. M. Park, D. J. Kim, N.-E. Lee, K. S. Kim, G. H. Bae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 980–985 (2007)
https://doi.org/10.1116/1.2723766
Published: July 2007
View article titled, Effect of additive gases and injection methods on chemical dry etching of silicon nitride, silicon oxynitride, and silicon oxide layers in F 2 remote plasmas
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