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Journal Articles

Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride

Editor’s Pick
Gilbert B. Rayner, Jr., Noel O’Toole, Bangzhi Liu, Jeffrey Shallenberger, Jiadi Zhu, Tomás Palacios, Piush Behera, Suraj Cheema, Blaine Johs, Nicholas A. Strnad
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 020401 (2025)
https://doi.org/10.1116/6.0004180
Published: January 2025
View article titled, Ultrahigh purity plasma-enhanced atomic layer deposition and electrical properties of epitaxial scandium nitride
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Journal Articles

Si-doped HZO and ZrO2 for hysteresis free high-k dielectric

Editor’s Pick
Harshil Kashyap, Ping-Che Lee, Kisung Chae, Matthias Passlack, Ajay K. Yadav, Keith Wong, Srini Nemani, Ellie Yieh, Jeffrey Spiegelman, Kyeongjae Cho, Asif Islam Khan, Andrew C. Kummel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022401 (2025)
https://doi.org/10.1116/6.0003895
Published: January 2025
View article titled, Si-doped HZO and ZrO<sub>2</sub> for hysteresis free high-<em>k</em> dielectric
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Journal Articles

Effect of post-deposition annealing on crystal structure of RF magnetron sputtered germanium dioxide thin films

Ahmad Matar Abed, Rebecca L. Peterson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063403 (2024)
https://doi.org/10.1116/6.0003960
Published: October 2024
View article titled, Effect of post-deposition annealing on crystal structure of RF magnetron sputtered germanium dioxide thin films
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Journal Articles

Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi2-based thin films

Editor’s Pick
Sophie Richter, Ahmed Bahr, Philip Kutrowatz, Tomasz Wojcik, Szilárd Kolozsvári, Peter Polcik, Carmen Jerg, Jürgen Ramm, Helmut Riedl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053407 (2024)
https://doi.org/10.1116/6.0003833
Published: August 2024
View article titled, Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi<sub>2</sub>-based thin films
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Journal Articles

Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source

Editor’s Pick
Naga Prathibha Jasti, Shay Tirosh, Ansuman Halder, Eti Teblum, David Cahen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043406 (2024)
https://doi.org/10.1116/6.0003607
Published: May 2024
View article titled, <em>Continuous wave</em> laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source
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Includes: Supplementary data
Journal Articles

Atomic structure of a NbTiN/AlN/NbTiN Josephson junction grown by molecular-beam epitaxy

Edwin Supple, Christopher J. K. Richardson, Brian P. Gorman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042701 (2024)
https://doi.org/10.1116/6.0003518
Published: May 2024
View article titled, Atomic structure of a NbTiN/AlN/NbTiN Josephson junction grown by molecular-beam epitaxy
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Includes: Supplementary data
Journal Articles

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor

So Young Kim, Chunghee Jo, Hyerin Shin, Dongmin Yoon, Donghyuk Shin, Min-ho Cheon, Kyu-beom Lee, Dong-won Seo, Jae-wook Choi, Heungsoo Park, Dae-Hong Ko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032405 (2024)
https://doi.org/10.1116/6.0003361
Published: March 2024
View article titled, Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO<sub>2</sub>Cl<sub>2</sub> as precursor
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Journal Articles

Effect of template on the photoresponsivity of BaSi2 films grown on Ge(111) substrates by molecular beam epitaxy

Sho Aonuki, Kaori Takayanagi, Ai Iwai, Kaoru Toko, Takashi Suemasu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032702 (2024)
https://doi.org/10.1116/6.0003503
Published: March 2024
View article titled, Effect of template on the photoresponsivity of BaSi<sub>2</sub> films grown on Ge(111) substrates by molecular beam epitaxy
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Journal Articles

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Editor’s Pick
Partha Mukhopadhyay, Ivan Fletcher, Zuriel Caribe Couvertier, Brent Schwab, John Gumpher, Winston V. Schoenfeld, Jon Kretzschmar, Anton deVilliers, Jim Fulford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032401 (2024)
https://doi.org/10.1116/6.0003405
Published: March 2024
View article titled, Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform
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Journal Articles

Infrared photoelectric detection of polycrystalline Bi2Te3 thin films prepared by pulsed laser deposition

Qijun Kao, Yi Xiao, Yongfeng Jia, Jin Wang, Chuanbin Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023421 (2024)
https://doi.org/10.1116/6.0003343
Published: February 2024
View article titled, Infrared photoelectric detection of polycrystalline Bi<sub>2</sub>Te<sub>3</sub> thin films prepared by pulsed laser deposition
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Journal Articles

Electrochromic properties of NiO films prepared by atomic layer deposition

Xi Su, Zexin Tu, Liwei Ji, Hao Wu, Hongxing Xu, Chang Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062407 (2023)
https://doi.org/10.1116/6.0003040
Published: October 2023
View article titled, Electrochromic properties of NiO films prepared by atomic layer deposition
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Journal Articles

Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties

Hwan-Seok Seo, Taeyoon Lee, Hyungjun Kim, Ivan Petrov, J. E. Greene
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063406 (2023)
https://doi.org/10.1116/6.0003072
Published: October 2023
View article titled, Phase composition of polycrystalline HfN<sub>x</sub> (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties
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Journal Articles

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Editor’s Pick
Sanjie Liu, Yangfeng Li, Qing Liu, Jiayou Tao, Xinhe Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052405 (2023)
https://doi.org/10.1116/6.0002639
Published: August 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces
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Journal Articles

Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering

Editor’s Pick
Smita G. Rao, Pascal Manuel Illgner, Robert Boyd, Gyula Nagy, Philippe Djemia, Daniel Primetzhofer, Ivan Petrov, Arnaud le Febvrier, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053415 (2023)
https://doi.org/10.1116/6.0002947
Published: August 2023
View article titled, Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering
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Includes: Supplementary data
Journal Articles

Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study

Jeong Won Kim, Ansoon Kim, Hui Ung Hwang, Jun Hyung Kim, Seungwook Choi, Norbert Koch, Dongguen Shin, Zhijuan Zhao, Fen Liu, Minki Choi, Kyu Myung Lee, Yongsup Park
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053211 (2023)
https://doi.org/10.1116/6.0002852
Published: August 2023
View article titled, Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study
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Journal Articles

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Editor’s Pick
Heli Seppänen, Igor Prozheev, Christoffer Kauppinen, Sami Suihkonen, Kenichiro Mizohata, Harri Lipsanen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052401 (2023)
https://doi.org/10.1116/6.0002705
Published: July 2023
View article titled, Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
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Journal Articles

Reactive plasma sputtering deposition of polycrystalline GaN thin films on silicon substrates at room temperature

Lakshman Srinivasan, Cyril Jadaud, François Silva, Jean-Charles Vanel, Jean-Luc Maurice, Erik Johnson, Pere Roca i Cabarrocas, Karim Ouaras
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053407 (2023)
https://doi.org/10.1116/6.0002718
Published: July 2023
View article titled, Reactive plasma sputtering deposition of polycrystalline GaN thin films on silicon substrates at room temperature
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Journal Articles

Room temperature magnetron sputtering and laser annealing of ultrathin amorphous sulfur-rich MoSx films

Spencer Gellerup, Corey L. Arnold, Christopher Muratore, Nicholas R. Glavin, Nigel D. Shepherd, Andrey A. Voevodin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053405 (2023)
https://doi.org/10.1116/6.0002544
Published: July 2023
View article titled, Room temperature magnetron sputtering and laser annealing of ultrathin amorphous sulfur-rich MoS<sub>x</sub> films
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Includes: Supplementary data
Journal Articles

Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga2O3 devices

Editor’s Pick
William A. Callahan, Edwin Supple, David Ginley, Michael Sanders, Brian P. Gorman, Ryan O’Hayre, Andriy Zakutayev
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043211 (2023)
https://doi.org/10.1116/6.0002645
Published: June 2023
View article titled, Ultrathin stable Ohmic contacts for high-temperature operation of <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> devices
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Includes: Supplementary data
Journal Articles

Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering

Damanpreet Kaur, Rohit Dahiya, Mukesh Kumar
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043410 (2023)
https://doi.org/10.1116/6.0002646
Published: June 2023
View article titled, Dependence of persistent photoconductivity on the thickness of β-Ga<sub>2</sub>O<sub>3</sub> thin film photodetectors on <em>c</em>-plane sapphire via magnetron sputtering
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