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Journal Articles

Enhancing erosion resistance of ceramic/metal multilayer coating by crack inhibition design

Zhaolu Zhang, Yuxin Ren, Guangyu He, Zhufang Yang

J. Vac. Sci. Technol. A 42, 053107 (2024)

https://doi.org/10.1116/6.0003857

Published: August 2024

View article titled, Enhancing erosion resistance of ceramic/metal multilayer coating by crack inhibition design

Journal Articles

Nanomultilayer gradation strategy to improve mechanical properties of TiSiN/AlCrN hard coatings

Qizhong Li, Fazhen Liu, Mai Yang, Tenghua Gao, Baifeng Ji, Song Zhang, Rong Tu, Lianmeng Zhang

J. Vac. Sci. Technol. A 42, 053202 (2024)

https://doi.org/10.1116/6.0003763

Published: July 2024

View article titled, Nanomultilayer gradation strategy to improve mechanical properties of TiSiN/AlCrN hard coatings

Journal Articles

Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings

Sanath Kumar Honnali, Charlotte Poterie, Arnaud le Febvrier, Daniel Lundin, Grzegorz Greczynski, Per Eklund

J. Vac. Sci. Technol. A 41, 043402 (2023)

https://doi.org/10.1116/6.0002752

Published: May 2023

View article titled, Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings

Includes: Supplementary data

Journal Articles

Determination of stress in thin films using micro-machined buckled membranes

C. Malhaire, M. Granata, D. Hofman, A. Amato, V. Martinez, G. Cagnoli, A. Lemaitre, N. Shcheblanov

J. Vac. Sci. Technol. A 41, 043401 (2023)

https://doi.org/10.1116/6.0002590

Published: May 2023

View article titled, Determination of stress in thin films using micro-machined buckled membranes

Journal Articles

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Xin Zhang, Xiu-bo Tian, Chun-zhi Gong, Xiang-li Liu, Jin Li

J. Vac. Sci. Technol. A 41, 033405 (2023)

https://doi.org/10.1116/6.0002353

Published: April 2023

View article titled, Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Journal Articles

Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system

Jia-Hong Huang, I.-Sheng Ting, Peng-Wen Lin

J. Vac. Sci. Technol. A 41, 023104 (2023)

https://doi.org/10.1116/6.0002358

Published: February 2023

View article titled, Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system

Journal Articles

Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films

Eiji Kusano

J. Vac. Sci. Technol. A 40, 053405 (2022)

https://doi.org/10.1116/6.0001989

Published: September 2022

View article titled, Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films

Journal Articles

CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior

K. Bobzin, T. Brögelmann, N. C. Kruppe, H. J. Maier, T. Heidenblut, H.-B. Besserer, C. Kahra, J. Janowitz

J. Vac. Sci. Technol. A 40, 013414 (2022)

https://doi.org/10.1116/6.0001462

Published: December 2021

View article titled, CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior

Journal Articles

Deposit and etchback approach for ultrathin Al₂O₃ films with low pinhole density using atomic layer deposition and atomic layer etching

Jonas C. Gertsch, Emanuele Sortino, Victor M. Bright, Steven M. George

J. Vac. Sci. Technol. A 39, 062602 (2021)

https://doi.org/10.1116/6.0001340

Published: November 2021

View article titled, Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching

Journal Articles

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe F. Smet, Jolien Dendooven, Christophe Detavernier

J. Vac. Sci. Technol. A 39, 062402 (2021)

https://doi.org/10.1116/6.0001094

Published: September 2021

View article titled, Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Includes: Supplementary data

Journal Articles

Silver film etching using halogen gas plasma

Toshiyuki Sasaki, Kenichi Yoshikawa, Kazuhito Furumoto, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine, Masaru Hori

J. Vac. Sci. Technol. A 38, 053006 (2020)

https://doi.org/10.1116/6.0000286

Published: August 2020

View article titled, Silver film etching using halogen gas plasma

Journal Articles

High power impulse magnetron sputtering of diamond-like carbon coatings

Tomas Kubart, Asim Aijaz, Joakim Andersson, Fabio Ferreira, João Carlos Oliveira, Arcadie Sobetkii, Anca Constantina Parau, Catalin Vitelaru

J. Vac. Sci. Technol. A 38, 043408 (2020)

https://doi.org/10.1116/6.0000070

Published: June 2020

View article titled, High power impulse magnetron sputtering of diamond-like carbon coatings

Journal Articles

Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer deposition

Nese Gungor, Mustafa Alevli

J. Vac. Sci. Technol. A 37, 050901 (2019)

https://doi.org/10.1116/1.5097467

Published: July 2019

View article titled, Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer deposition

Journal Articles

Effect of synchronized bias in the deposition of TiB₂ thin films using high power impulse magnetron sputtering

Nils Nedfors, Oleksiy Vozniy, Johanna Rosen

J. Vac. Sci. Technol. A 36, 031510 (2018)

https://doi.org/10.1116/1.5003194

Published: April 2018

View article titled, Effect of synchronized bias in the deposition of TiB2 thin films using high power impulse magnetron sputtering

Journal Articles

Influence of discharge power and bias potential on microstructure and hardness of sputtered amorphous carbon coatings

Christian Saringer, Christoph Oberroither, Katrin Zorn, Robert Franz, Christian Mitterer

J. Vac. Sci. Technol. A 36, 021501 (2018)

https://doi.org/10.1116/1.5001141

Published: November 2017

View article titled, Influence of discharge power and bias potential on microstructure and hardness of sputtered amorphous carbon coatings

Journal Articles

Fracture behavior of diamondlike carbon films deposited on polymer substrates

Go Yamamoto, Tomonaga Okabe, Noriaki Ikenaga

J. Vac. Sci. Technol. A 36, 02C101 (2018)

https://doi.org/10.1116/1.5003683

Published: November 2017

View article titled, Fracture behavior of diamondlike carbon films deposited on polymer substrates

Includes: Supplementary data

Journal Articles

Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target

Muhammad Arif, Markus Sauer, Annette Foelske-Schmitz, Christoph Eisenmenger-Sittner

J. Vac. Sci. Technol. A 35, 061507 (2017)

https://doi.org/10.1116/1.4993082

Published: September 2017

View article titled, Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target

Includes: Supplementary data

Journal Articles

XeF₂ etching of epitaxial Nb₂N for lift-off or micromachining of III-N materials and devices

Brian P. Downey, D. Scott Katzer, Neeraj Nepal, Matthew T. Hardy, David J. Meyer

J. Vac. Sci. Technol. A 35, 05C312 (2017)

https://doi.org/10.1116/1.4994400

Published: July 2017

View article titled, XeF2 etching of epitaxial Nb2N for lift-off or micromachining of III-N materials and devices

Journal Articles

Stress modulation of titanium nitride thin films deposited using atomic layer deposition

Manuj Nahar, Noel Rocklein, Michael Andreas, Greg Funston, Duane Goodner

J. Vac. Sci. Technol. A 35, 01B144 (2017)

https://doi.org/10.1116/1.4972859

Published: December 2016

View article titled, Stress modulation of titanium nitride thin films deposited using atomic layer deposition

Journal Articles

Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

Jindřich Musil, Martin Jaroš, Radomír Čerstvý, Stanislav Haviar

J. Vac. Sci. Technol. A 35, 020601 (2017)

https://doi.org/10.1116/1.4967935

Published: November 2016

View article titled, Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

NARROW

Topics

Enhancing erosion resistance of ceramic/metal multilayer coating by crack inhibition design

Nanomultilayer gradation strategy to improve mechanical properties of TiSiN/AlCrN hard coatings

Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings

Determination of stress in thin films using micro-machined buckled membranes

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system

Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films

CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior

Deposit and etchback approach for ultrathin Al₂O₃ films with low pinhole density using atomic layer deposition and atomic layer etching

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Silver film etching using halogen gas plasma

High power impulse magnetron sputtering of diamond-like carbon coatings

Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer deposition

Effect of synchronized bias in the deposition of TiB₂ thin films using high power impulse magnetron sputtering

Influence of discharge power and bias potential on microstructure and hardness of sputtered amorphous carbon coatings

Fracture behavior of diamondlike carbon films deposited on polymer substrates

Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target

XeF₂ etching of epitaxial Nb₂N for lift-off or micromachining of III-N materials and devices

Stress modulation of titanium nitride thin films deposited using atomic layer deposition

Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

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