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Journal Articles

Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings

Sanath Kumar Honnali, Charlotte Poterie, Arnaud le Febvrier, Daniel Lundin, Grzegorz Greczynski, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043402 (2023)
https://doi.org/10.1116/6.0002752
Published: May 2023
View article titled, Effect of tilted closed-field magnetron design on the microstructure and mechanical properties of TiZrNbTaN coatings
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Includes: Supplementary data
Journal Articles

Determination of stress in thin films using micro-machined buckled membranes

C. Malhaire, M. Granata, D. Hofman, A. Amato, V. Martinez, G. Cagnoli, A. Lemaitre, N. Shcheblanov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043401 (2023)
https://doi.org/10.1116/6.0002590
Published: May 2023
View article titled, Determination of stress in thin films using micro-machined buckled membranes
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Journal Articles

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Xin Zhang, Xiu-bo Tian, Chun-zhi Gong, Xiang-li Liu, Jin Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033405 (2023)
https://doi.org/10.1116/6.0002353
Published: April 2023
View article titled, Effect of plasma nitriding substrate current density on the adhesion strength of <em>in situ</em> PVD TiN coatings
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Journal Articles

Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system

Jia-Hong Huang, I.-Sheng Ting, Peng-Wen Lin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023104 (2023)
https://doi.org/10.1116/6.0002358
Published: February 2023
View article titled, Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system
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Journal Articles

Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films

Eiji Kusano
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053405 (2022)
https://doi.org/10.1116/6.0001989
Published: September 2022
View article titled, Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films
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Journal Articles

CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior

K. Bobzin, T. Brögelmann, N. C. Kruppe, H. J. Maier, T. Heidenblut, H.-B. Besserer, C. Kahra, J. Janowitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013414 (2022)
https://doi.org/10.1116/6.0001462
Published: December 2021
View article titled, CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior
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Journal Articles

Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching

Jonas C. Gertsch, Emanuele Sortino, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062602 (2021)
https://doi.org/10.1116/6.0001340
Published: November 2021
View article titled, Deposit and etchback approach for ultrathin Al<sub>2</sub>O<sub>3</sub> films with low pinhole density using atomic layer deposition and atomic layer etching
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Journal Articles

Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth

Andreas Werbrouck, Kevin Van de Kerckhove, Diederik Depla, Dirk Poelman, Philippe F. Smet, Jolien Dendooven, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062402 (2021)
https://doi.org/10.1116/6.0001094
Published: September 2021
View article titled, Plasma-enhanced atomic layer deposition: Correlating O 2 plasma parameters and species to blister formation and conformal film growth
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Includes: Supplementary data
Journal Articles

Silver film etching using halogen gas plasma

Toshiyuki Sasaki, Kenichi Yoshikawa, Kazuhito Furumoto, Itsuko Sakai, Hisataka Hayashi, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 053006 (2020)
https://doi.org/10.1116/6.0000286
Published: August 2020
View article titled, Silver film etching using halogen gas plasma
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Journal Articles

High power impulse magnetron sputtering of diamond-like carbon coatings

Tomas Kubart, Asim Aijaz, Joakim Andersson, Fabio Ferreira, João Carlos Oliveira, Arcadie Sobetkii, Anca Constantina Parau, Catalin Vitelaru
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043408 (2020)
https://doi.org/10.1116/6.0000070
Published: June 2020
View article titled, High power impulse magnetron sputtering of diamond-like carbon coatings
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Journal Articles

Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film

Grzegorz Greczynski, Ivan Petrov, J. E. Greene, Lars Hultman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 060801 (2019)
https://doi.org/10.1116/1.5121226
Published: October 2019
View article titled, Paradigm shift in thin-film growth by magnetron sputtering: From gas-ion to metal-ion irradiation of the growing film
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Journal Articles

Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer deposition

Nese Gungor, Mustafa Alevli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 050901 (2019)
https://doi.org/10.1116/1.5097467
Published: July 2019
View article titled, Visible/infrared refractive index and phonon properties of GaN films grown on sapphire by hollow-cathode plasma-assisted atomic layer deposition
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Journal Articles

Effect of synchronized bias in the deposition of TiB2 thin films using high power impulse magnetron sputtering

Nils Nedfors, Oleksiy Vozniy, Johanna Rosen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031510 (2018)
https://doi.org/10.1116/1.5003194
Published: April 2018
View article titled, Effect of synchronized bias in the deposition of TiB<sub>2</sub> thin films using high power impulse magnetron sputtering
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Journal Articles

Review Article: Stress in thin films and coatings: Current status, challenges, and prospects

Grégory Abadias, Eric Chason, Jozef Keckes, Marco Sebastiani, Gregory B. Thompson, Etienne Barthel, Gary L. Doll, Conal E. Murray, Chris H. Stoessel, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 020801 (2018)
https://doi.org/10.1116/1.5011790
Published: March 2018
View article titled, Review Article: Stress in thin films and coatings: Current status, challenges, and prospects
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Journal Articles

Influence of discharge power and bias potential on microstructure and hardness of sputtered amorphous carbon coatings

Christian Saringer, Christoph Oberroither, Katrin Zorn, Robert Franz, Christian Mitterer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021501 (2018)
https://doi.org/10.1116/1.5001141
Published: November 2017
View article titled, Influence of discharge power and bias potential on microstructure and hardness of sputtered amorphous carbon coatings
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Journal Articles

Fracture behavior of diamondlike carbon films deposited on polymer substrates

Go Yamamoto, Tomonaga Okabe, Noriaki Ikenaga
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 02C101 (2018)
https://doi.org/10.1116/1.5003683
Published: November 2017
View article titled, Fracture behavior of diamondlike carbon films deposited on polymer substrates
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Includes: Supplementary data
Journal Articles

Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target

Muhammad Arif, Markus Sauer, Annette Foelske-Schmitz, Christoph Eisenmenger-Sittner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061507 (2017)
https://doi.org/10.1116/1.4993082
Published: September 2017
View article titled, Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target
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Includes: Supplementary data
Journal Articles

XeF2 etching of epitaxial Nb2N for lift-off or micromachining of III-N materials and devices

Brian P. Downey, D. Scott Katzer, Neeraj Nepal, Matthew T. Hardy, David J. Meyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C312 (2017)
https://doi.org/10.1116/1.4994400
Published: July 2017
View article titled, XeF<sub>2</sub> etching of epitaxial Nb<sub>2</sub>N for lift-off or micromachining of III-N materials and devices
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Journal Articles

Stress modulation of titanium nitride thin films deposited using atomic layer deposition

Manuj Nahar, Noel Rocklein, Michael Andreas, Greg Funston, Duane Goodner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B144 (2017)
https://doi.org/10.1116/1.4972859
Published: December 2016
View article titled, Stress modulation of titanium nitride thin films deposited using atomic layer deposition
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Journal Articles

Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions

Jindřich Musil, Martin Jaroš, Radomír Čerstvý, Stanislav Haviar
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 020601 (2017)
https://doi.org/10.1116/1.4967935
Published: November 2016
View article titled, Evolution of microstructure and macrostress in sputtered hard Ti(Al,V)N films with increasing energy delivered during their growth by bombarding ions
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