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Journal Articles

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

T. Stach, A. Seif, A. Ambrosetti, P. L. Silvestrelli, U. Burghaus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062201 (2023)
https://doi.org/10.1116/6.0002948
Published: September 2023
View article titled, Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory
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Includes: Supplementary data
Journal Articles

Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas

Katsumi Watanabe, Daisuke Watanabe, Kazutoshi Mamiya, Seiji Koizumi, Noriaki Sanada, Mineharu Suzuki
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043209 (2023)
https://doi.org/10.1116/6.0002487
Published: June 2023
View article titled, Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas
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Journal Articles

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Holger Saare, Wenyi Xie, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042602 (2023)
https://doi.org/10.1116/6.0002708
Published: June 2023
View article titled, Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride
Open the PDF for Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride in another window
Includes: Supplementary data
Journal Articles

Fundamentals of thin film depth profiling by glow discharge optical emission spectroscopy

Alenka Vesel, Rok Zaplotnik, Gregor Primc, Miran Mozetic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 040801 (2023)
https://doi.org/10.1116/6.0002695
Published: June 2023
View article titled, Fundamentals of thin film depth profiling by glow discharge optical emission spectroscopy
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Journal Articles

Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature

George H. Major, B. Maxwell Clark, Kevin Cayabyab, Nathan Engel, Christopher D. Easton, Jan Čechal, Donald R. Baer, Jeff Terry, Matthew R. Linford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043201 (2023)
https://doi.org/10.1116/6.0002714
Published: May 2023
View article titled, Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature
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Journal Articles

Controlling electron beam induced deposition of iron from Fe(CO)5: Inhibition of autocatalytic growth by NH3 and reactivation by electron irradiation

Petra Martinović, Lars Barnewitz, Markus Rohdenburg, Petra Swiderek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033207 (2023)
https://doi.org/10.1116/6.0002306
Published: April 2023
View article titled, Controlling electron beam induced deposition of iron from Fe(CO)<sub>5</sub>: Inhibition of autocatalytic growth by NH<sub>3</sub> and reactivation by electron irradiation
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Includes: Supplementary data
Journal Articles

Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile

Songyou Lian, Antonie J. Fourie, Jiangyong Wang, Hendrik C. Swart, Jacobus Johannes Terblans
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033401 (2023)
https://doi.org/10.1116/6.0002400
Published: March 2023
View article titled, Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile
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Journal Articles

XPS characterization of a PuGa-7 at. % alloy

P. Roussel, S. C. Hernandez, J. J. Joyce, K. S. Graham, T. Venhaus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023204 (2023)
https://doi.org/10.1116/6.0002365
Published: February 2023
View article titled, XPS characterization of a PuGa-7 at. % alloy
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Includes: Supplementary data
Journal Articles

Nanometer-scale depth-resolved hard x-ray absorption spectroscopy based on the detection of energy-loss Auger electrons with low energies

Noritake Isomura, Keiichiro Oh-ishi, Naoko Takahashi, Satoru Kosaka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063204 (2022)
https://doi.org/10.1116/6.0002131
Published: October 2022
View article titled, Nanometer-scale depth-resolved hard x-ray absorption spectroscopy based on the detection of energy-loss Auger electrons with low energies
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Includes: Supplementary data
Journal Articles

Chirality in double photoemission from a Cu(100) surface

F. O. Schumann, G. Di Fillippo, Z. Wei, G. Stefani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043204 (2022)
https://doi.org/10.1116/6.0001875
Published: June 2022
View article titled, Chirality in double photoemission from a Cu(100) surface
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Journal Articles

Resonant Auger decay induced by the symmetry-forbidden 1a1g → 6a1g transition of the SF6 molecule

A. C. F. Santos, O. Travnikova, N. Boudjemia, T. Marchenko, R. Guillemin, I. Ismail, D. Koulentianos, D. Céolin, F. Gel’mukhanov, M. Simon, M. N. Piancastelli, R. Püttner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 042801 (2022)
https://doi.org/10.1116/6.0001890
Published: May 2022
View article titled, Resonant Auger decay induced by the symmetry-forbidden 1<em>a</em><sub>1<em>g</em></sub> → 6<em>a</em><sub>1<em>g</em></sub> transition of the SF<sub>6</sub> molecule
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Journal Articles

Partial densities of states from x-ray absorption and Auger electron spectroscopy: Use of core-hole memory

Eric L. Shirley, C. Weiland, J. C. Woicik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 023410 (2022)
https://doi.org/10.1116/6.0001432
Published: February 2022
View article titled, Partial densities of states from x-ray absorption and Auger electron spectroscopy: Use of core-hole memory
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Journal Articles

Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)

Rachael G. Farber, Sarah A. Willson, S. J. Sibener
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063212 (2021)
https://doi.org/10.1116/6.0001374
Published: October 2021
View article titled, Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)
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Journal Articles

Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching

Clint D. Frye, Scott B. Donald, Catherine Reinhardt, Lars F. Voss, Sara E. Harrison
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053002 (2021)
https://doi.org/10.1116/6.0001123
Published: August 2021
View article titled, Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching
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Journal Articles

Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition

Chanwon Jung, Seokhwi Song, Hyunwoo Park, Youngjoon Kim, Eun Jong Lee, Sung Gwon Lee, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042404 (2021)
https://doi.org/10.1116/6.0000887
Published: June 2021
View article titled, Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition
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Journal Articles

Investigations on Ba diffusion and SiO evaporation during BaSi2 film formation on Si substrates by thermal evaporation

Daisuke Yazawa, Kosuke O. Hara, Junji Yamanaka, Keisuke Arimoto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043410 (2021)
https://doi.org/10.1116/6.0001081
Published: May 2021
View article titled, Investigations on Ba diffusion and SiO evaporation during BaSi<sub>2</sub> film formation on Si substrates by thermal evaporation
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Includes: Supplementary data
Journal Articles

Adsorption and reaction kinetics of SO2 on graphene: An ultrahigh vacuum surface science study

Thomas Stach, Melody C. Johnson, Samuel Stevens, Uwe Burghaus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042201 (2021)
https://doi.org/10.1116/6.0001055
Published: May 2021
View article titled, Adsorption and reaction kinetics of SO<sub>2</sub> on graphene: An ultrahigh vacuum surface science study
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Includes: Supplementary data
Journal Articles

Monolayer attenuation length of low-energy electrons in Gd and Tb

Karen Göhler, Anke B. Schmidt, Markus Donath
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 023205 (2021)
https://doi.org/10.1116/6.0000754
Published: February 2021
View article titled, Monolayer attenuation length of low-energy electrons in Gd and Tb
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Journal Articles

Al Kα XPS reference spectra of polyethylene for all instrument geometries

Alexander G. Shard, Benjamen P. Reed
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063209 (2020)
https://doi.org/10.1116/6.0000578
Published: November 2020
View article titled, Al Kα XPS reference spectra of polyethylene for all instrument geometries
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Journal Articles

Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas

Priyanka Arora, Junghyun Cho, Rafael Cervantes, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063004 (2020)
https://doi.org/10.1116/6.0000373
Published: October 2020
View article titled, Glow discharge-optical emission spectroscopy for <em>in situ</em> analysis of surfaces in plasmas
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