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Journal Articles

Improving SiO2 to SiNx etch selectivity during atomic layer etching with multiple selective organic pre-functionalization steps

Editor’s Pick
Xue Wang, Ryan J. Gasvoda, Eric A. Hudson, Prabhat Kumar, Sumit Agarwal
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032602 (2024)
https://doi.org/10.1116/6.0003447
Published: April 2024
View article titled, Improving SiO<sub>2</sub> to SiN<em><sub>x</sub></em> etch selectivity during atomic layer etching with multiple selective organic pre-functionalization steps
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Journal Articles

Significance of plasma-surface interactions in the etch behavior of low-k materials

Adam Pranda, Steven Grzeskowiak, Yu- Hao Tsai, Yusuke Yoshida, Eric Liu, Yun Han, Peter Biolsi, Ken Kobayashi, Nobuyuki Ikezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063009 (2023)
https://doi.org/10.1116/6.0003014
Published: November 2023
View article titled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Journal Articles

Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist

Editor’s Pick
Adam Pranda, Kang-Yi Lin, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph, Dominik Metzler, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052601 (2020)
https://doi.org/10.1116/6.0000289
Published: July 2020
View article titled, Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
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Journal Articles

Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources

Editor’s Pick
Wanxing Xu, Paul C. Lemaire, Kashish Sharma, Dennis M. Hausmann, Sumit Agarwal
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 012401 (2020)
https://doi.org/10.1116/1.5122994
Published: December 2019
View article titled, Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources
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Journal Articles

Surface characterization of poly-2-vinylpyridine—A polymer for area selective deposition techniques

Matthew Snelgrove, Clara Zehe, Ross Lundy, Pravind Yadav, Jean-Pascal Rueff, Robert O’Connor, Justin Bogan, Greg Hughes, Enda McGlynn, Michael Morris, Pierre Giovanni Mani-Gonzalez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 050601 (2019)
https://doi.org/10.1116/1.5115769
Published: August 2019
View article titled, Surface characterization of poly-2-vinylpyridine—A polymer for area selective deposition techniques
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Journal Articles

Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics

Rafaiel A. Ovanesyan, Dennis M. Hausmann, Sumit Agarwal
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021506 (2017)
https://doi.org/10.1116/1.4973923
Published: January 2017
View article titled, Challenges in atomic layer deposition of carbon-containing silicon-based dielectrics
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Journal Articles

Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rate

Kosa Hirota, Naoshi Itabashi, Junichi Tanaka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 061304 (2014)
https://doi.org/10.1116/1.4900967
Published: November 2014
View article titled, Evolution of titanium residue on the walls of a plasma-etching reactor and its effect on the polysilicon etching rate
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Journal Articles

Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition

Taeyong Park, Jaesang Lee, Jingyu Park, Heeyoung Jeon, Hyeongtag Jeon, Ki-Hoon Lee, Byung-Chul Cho, Moo-Sung Kim, Heui-Bok Ahn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 01A139 (2012)
https://doi.org/10.1116/1.3666033
Published: December 2011
View article titled, Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
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Journal Articles

Molecular layer deposition of polyethylene terephthalate thin films

Tatyana V. Ivanova, Philipp S. Maydannik, David C. Cameron
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 01A121 (2012)
https://doi.org/10.1116/1.3662846
Published: November 2011
View article titled, Molecular layer deposition of polyethylene terephthalate thin films
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Journal Articles

Plasma treatment of HfO2-based metal–insulator–metal resistive memories

C. Vallée, P. Gonon, C. Mannequin, T. Chevolleau, M. Bonvalot, H. Grampeix, C. Licitra, N. Rochat, V. Jousseaume
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 041512 (2011)
https://doi.org/10.1116/1.3599825
Published: June 2011
View article titled, Plasma treatment of HfO<sub>2</sub>-based metal–insulator–metal resistive memories
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Journal Articles

Interactions between organic photoconductor and plasma discharge within an electrophotographic environment

K. Nauka, Seongsik Chang, Hou T. Ng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 566–571 (2009)
https://doi.org/10.1116/1.3122632
Published: April 2009
View article titled, Interactions between organic photoconductor and plasma discharge within an electrophotographic environment
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Journal Articles

Addition of yttrium into Hf O 2 films: Microstructure and electrical properties

C. Dubourdieu, E. Rauwel, H. Roussel, F. Ducroquet, B. Holländer, M. Rossell, G. Van Tendeloo, S. Lhostis, S. Rushworth
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 503–514 (2009)
https://doi.org/10.1116/1.3106627
Published: April 2009
View article titled, Addition of yttrium into Hf O 2 films: Microstructure and electrical properties
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Journal Articles

Investigation of a vapor deposited thin silica film as a novel substrate for in situ Fourier transform infrared spectroscopy

A. Anderson, W. Robert Ashurst
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1357–1361 (2008)
https://doi.org/10.1116/1.2956630
Published: August 2008
View article titled, Investigation of a vapor deposited thin silica film as a novel substrate for <em>in situ</em> Fourier transform infrared spectroscopy
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Journal Articles

Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition

Jiurong Liu, Ryan M. Martin, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1251–1257 (2008)
https://doi.org/10.1116/1.2966430
Published: August 2008
View article titled, Characteristics of Hf-silicate thin films synthesized by plasma enhanced atomic layer deposition
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Journal Articles

High sensitivity attenuated total reflection Fourier transform infrared spectroscopy study of ultrathin Zr O 2 films: A study of phase change

S. Sayan, D. Chandler-Horowitz, N. V. Nguyen, J. R. Ehrstein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 270–273 (2008)
https://doi.org/10.1116/1.2830642
Published: February 2008
View article titled, High sensitivity attenuated total reflection Fourier transform infrared spectroscopy study of ultrathin Zr O 2 films: A study of phase change
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Journal Articles

In situ attenuated total reflectance Fourier transform infrared spectroscopy of hafnium (IV) tert butoxide adsorption onto hydrogen terminated Si (100) and Si (111)

K. Li, S. Dubey, H. B. Bhandari, Z. Hu, C. H. Turner, T. M. Klein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 1389–1394 (2007)
https://doi.org/10.1116/1.2757179
Published: August 2007
View article titled, <em>In situ</em> attenuated total reflectance Fourier transform infrared spectroscopy of hafnium (IV) tert butoxide adsorption onto hydrogen terminated Si (100) and Si (111)
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Journal Articles

Organic monolayers detected by single reflection attenuated total reflection infrared spectroscopy

N. L. Rowell, L. Tay, D. J. Lockwood, J.-M. Baribeau, J. A. Bardwell, R. Boukherroub
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 668–672 (2006)
https://doi.org/10.1116/1.2180270
Published: May 2006
View article titled, Organic monolayers detected by single reflection attenuated total reflection infrared spectroscopy
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Journal Articles

Attenuated total reflection infrared spectroscopy for studying adsorbates on planar model catalysts: CO adsorption on silica supported Rh nanoparticles

C. M. Leewis, W. M. M. Kessels, M. C. M. van de Sanden, J. W. Niemantsverdriet
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 296–304 (2006)
https://doi.org/10.1116/1.2171707
Published: February 2006
View article titled, Attenuated total reflection infrared spectroscopy for studying adsorbates on planar model catalysts: CO adsorption on silica supported Rh nanoparticles
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Journal Articles

Ammonium chloride complex formation during downstream microwave ammonia plasma treatment of parylene-C

K. G. Pruden, S. P. Beaudoin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 1605–1609 (2005)
https://doi.org/10.1116/1.2049305
Published: October 2005
View article titled, Ammonium chloride complex formation during downstream microwave ammonia plasma treatment of parylene-C
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Journal Articles

In situ real-time monitoring of profile evolution during plasma etching of mesoporous low-dielectric-constant SiO 2

Henry Gerung, C. Jeffrey Brinker, Steven R. J. Brueck, Sang M. Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 347–354 (2005)
https://doi.org/10.1116/1.1865154
Published: March 2005
View article titled, <em>In situ</em> real-time monitoring of profile evolution during plasma etching of mesoporous low-dielectric-constant SiO 2
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