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Journal Articles

Effect of NH₃ flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition

Ju Eun Kang, Sang Jeen Hong

J. Vac. Sci. Technol. A 42, 062402 (2024)

https://doi.org/10.1116/6.0003862

Published: September 2024

View article titled, Effect of NH3 flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition

Journal Articles

Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings

Lanxin Guo, Yixian Wang, Zifan Pang, Xin Han, Yafeng Wang, Lipei Peng, Xin Gao, Chunlei Pei, Tuo Wang, Jinlong Gong

J. Vac. Sci. Technol. A 42, 062401 (2024)

https://doi.org/10.1116/6.0003777

Published: September 2024

View article titled, Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings

Journal Articles

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Yousra Traouli, Ufuk Kilic, Sema G. Kilic, Matthew Hilfiker, Daniel Schmidt, Stefan Schoeche, Eva Schubert, Mathias Schubert

J. Vac. Sci. Technol. A 42, 052403 (2024)

https://doi.org/10.1116/6.0003830

Published: September 2024

View article titled, In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

Journal Articles

MOS structure with as-deposited ALD Al₂O₃/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region

Yu-Xuan Zeng, Xi-Rui Wang, Ruo-Yun Yang, Wei Huang, Lei Yang, Hong-Ping Ma, Qing-Chun Zhang

J. Vac. Sci. Technol. A 42, 053207 (2024)

https://doi.org/10.1116/5.0202640

Published: August 2024

View article titled, MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region

Journal Articles

Ultrathin ZrO₂ thickness control on TiO₂/ZrO₂ core/shell nanoparticles using ZrO₂ atomic layer deposition and etching

Janine D. Sempel, Marja-Leena Kaariainen, Troy A. Colleran, Alejo M. Lifschitz, Steven M. George

J. Vac. Sci. Technol. A 42, 052604 (2024)

https://doi.org/10.1116/6.0003781

Published: August 2024

View article titled, Ultrathin ZrO2 thickness control on TiO2/ZrO2 core/shell nanoparticles using ZrO2 atomic layer deposition and etching

Journal Articles

Inherent area selective deposition of silicon dioxide in multilayer 3D SiO_x–SiN_x stacks

Kartik Sondhi, Stephen Ross, Joyeeta Nag, X. C. Guo, Dexin Zhao, Adarsh Rajashekhar, Senaka Kanakamedala

J. Vac. Sci. Technol. A 42, 050403 (2024)

https://doi.org/10.1116/6.0003790

Published: August 2024

View article titled, Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks

Journal Articles

First principles reaction processes of Co(CO)₃NO as an atomic layer deposition precursor on SiO₂ and Co surfaces

Nickolas M. Ashburn, Xiuyao Lang, Youhwan Jo, Yeonghun Lee, Xiaolong Yao, Kyeongjae Cho

J. Vac. Sci. Technol. A 42, 052401 (2024)

https://doi.org/10.1116/6.0003769

Published: July 2024

View article titled, First principles reaction processes of Co(CO)3NO as an atomic layer deposition precursor on SiO2 and Co surfaces

Journal Articles

Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool

Vitaly Kuzmenko, Alexander Melnikov, Alexandr Isaev, Andrey Miakonkikh

J. Vac. Sci. Technol. A 42, 052602 (2024)

https://doi.org/10.1116/6.0003717

Published: July 2024

View article titled, Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool

Journal Articles

Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction

Min-Ji Ha, Na-Gyeong Kang, Woo-Hee Kim, Tae Joo Park, Tae-Eon Park, Ji-Hoon Ahn

J. Vac. Sci. Technol. A 42, 042401 (2024)

https://doi.org/10.1116/6.0003664

Published: June 2024

View article titled, Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction

Journal Articles

Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers

Elise des Ligneris, Diane Samélor, Abderrahime Sekkat, Claudie Josse, Teresa Hungria, Alessandro Pugliara, Constantin Vahlas, Brigitte Caussat

J. Vac. Sci. Technol. A 42, 032408 (2024)

https://doi.org/10.1116/6.0003422

Published: April 2024

View article titled, Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers

Includes: Supplementary data

Journal Articles

Remote inductively coupled plasmas in Ar/N₂ mixtures and implications for plasma enhanced ALD

David R. Boris, Michael J. Johnson, Jeffrey M. Woodward, Virginia D. Wheeler, Scott G. Walton

J. Vac. Sci. Technol. A 42, 033008 (2024)

https://doi.org/10.1116/6.0003538

Published: April 2024

View article titled, Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD

Journal Articles

Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films

Corbin Feit, Udit Kumar, Md. Rafiqul Islam, Luis Tomar, S. Novia Berriel, John T. Gaskins, Patrick E. Hopkins, Sudipta Seal, Parag Banerjee

J. Vac. Sci. Technol. A 42, 032407 (2024)

https://doi.org/10.1116/6.0003440

Published: April 2024

View article titled, Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films

Includes: Supplementary data

Journal Articles

Comparison of three titanium-precursors for atomic-layer-deposited TiO₂ for passivating contacts on silicon

Daniel Hiller, Frans Munnik, Julian López-Vidrier, Dmytro Solonenko, Johanna Reif, Martin Knaut, Oliver Thimm, Nicholas E. Grant

J. Vac. Sci. Technol. A 42, 032406 (2024)

https://doi.org/10.1116/6.0003309

Published: March 2024

View article titled, Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon

Includes: Supplementary data

Journal Articles

Fine tuning of Nb-incorporated TiO₂ thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Thomas Vincent, Damien Coutancier, Pia Dally, Mirella Al Katrib, Mathieu Frégnaux, Stefania Cacovich, Frédérique Donsanti, Armelle Yaïche, Karim Medjoubi, Thomas Guillemot, Marion Provost, Jean Rousset, Muriel Bouttemy, Nathanaelle Schneider

J. Vac. Sci. Technol. A 42, 032802 (2024)

https://doi.org/10.1116/6.0003351

Published: March 2024

View article titled, Fine tuning of Nb-incorporated TiO2 thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Includes: Supplementary data

Journal Articles

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO₂Cl₂ as precursor

So Young Kim, Chunghee Jo, Hyerin Shin, Dongmin Yoon, Donghyuk Shin, Min-ho Cheon, Kyu-beom Lee, Dong-won Seo, Jae-wook Choi, Heungsoo Park, Dae-Hong Ko

J. Vac. Sci. Technol. A 42, 032405 (2024)

https://doi.org/10.1116/6.0003361

Published: March 2024

View article titled, Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor

Journal Articles

High-performance of ZnO/TiO₂ heterostructured thin-film photocatalyst fabricated via atomic layer deposition

Ji Young Park, Jeong Hwan Han, Byung Joon Choi

J. Vac. Sci. Technol. A 42, 032404 (2024)

https://doi.org/10.1116/6.0003348

Published: March 2024

View article titled, High-performance of ZnO/TiO2 heterostructured thin-film photocatalyst fabricated via atomic layer deposition

Journal Articles

Inhibition of atomic layer deposition of TiO₂ by functionalizing silicon surface with 4-fluorophenylboronic acid

Dhamelyz Silva-Quinones, John R. Mason, Robert Norden, Andrew V. Teplyakov

J. Vac. Sci. Technol. A 42, 032402 (2024)

https://doi.org/10.1116/6.0003316

Published: March 2024

View article titled, Inhibition of atomic layer deposition of TiO2 by functionalizing silicon surface with 4-fluorophenylboronic acid

Includes: Supplementary data

Journal Articles

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Partha Mukhopadhyay, Ivan Fletcher, Zuriel Caribe Couvertier, Brent Schwab, John Gumpher, Winston V. Schoenfeld, Jon Kretzschmar, Anton deVilliers, Jim Fulford

J. Vac. Sci. Technol. A 42, 032401 (2024)

https://doi.org/10.1116/6.0003405

Published: March 2024

View article titled, Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Journal Articles

Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology

Lewen Qian, Xin Sun, Tao Liu, Ziqiang Huang, Xinlong Guo, Maolin Pan, Dawei Wang, Saisheng Xu, Min Xu, Chen Wang, Chunlei Wu, David Wei Zhang

J. Vac. Sci. Technol. A 42, 023423 (2024)

https://doi.org/10.1116/6.0003357

Published: February 2024

View article titled, Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology

Journal Articles

Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

Ha Young Lee, Jeong Hwan Han, Byung Joon Choi

J. Vac. Sci. Technol. A 42, 022405 (2024)

https://doi.org/10.1116/6.0003319

Published: February 2024

View article titled, Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

Includes: Supplementary data

NARROW

Topics

Effect of NH₃ flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition

Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings

In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry

MOS structure with as-deposited ALD Al₂O₃/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region

Ultrathin ZrO₂ thickness control on TiO₂/ZrO₂ core/shell nanoparticles using ZrO₂ atomic layer deposition and etching

Inherent area selective deposition of silicon dioxide in multilayer 3D SiO_x–SiN_x stacks

First principles reaction processes of Co(CO)₃NO as an atomic layer deposition precursor on SiO₂ and Co surfaces

Revealing the controlling mechanisms of atomic layer etching for high-k dielectrics in conventional inductively coupled plasma etching tool

Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction

Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers

Remote inductively coupled plasmas in Ar/N₂ mixtures and implications for plasma enhanced ALD

Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films

Comparison of three titanium-precursors for atomic-layer-deposited TiO₂ for passivating contacts on silicon

Fine tuning of Nb-incorporated TiO₂ thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO₂Cl₂ as precursor

High-performance of ZnO/TiO₂ heterostructured thin-film photocatalyst fabricated via atomic layer deposition

Inhibition of atomic layer deposition of TiO₂ by functionalizing silicon surface with 4-fluorophenylboronic acid

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology

Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

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