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Journal Articles

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H2/N2/Ar plasma

Wangu Kang, Ji Sang Ahn, Jeong Hwan Han
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062401 (2023)
https://doi.org/10.1116/6.0002970
Published: September 2023
View article titled, Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma
Open the PDF for Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis(isopropylcyclopentadienyl)molybdenum(IV) dihydride and an H<sub>2</sub>/N<sub>2</sub>/Ar plasma in another window
Includes: Supplementary data
Journal Articles

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

Partha Sarathi Padhi, R. S. Ajimsha, S. K. Rai, Sushmita Bhartiya, Aniruddha Bose, Bidyadhar Das, Manoj Kumar Tiwari, Pankaj Misra
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063201 (2023)
https://doi.org/10.1116/6.0002849
Published: September 2023
View article titled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times
Open the PDF for Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times in another window
Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Sanjie Liu, Yangfeng Li, Qing Liu, Jiayou Tao, Xinhe Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052405 (2023)
https://doi.org/10.1116/6.0002639
Published: August 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces
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Journal Articles

Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

Jake Soares, Wesley Jen, John D. Hues, Drew Lysne, Jesse Wensel, Steven M. Hues, Elton Graugnard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052404 (2023)
https://doi.org/10.1116/6.0002811
Published: August 2023
View article titled, Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films
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Includes: Supplementary data
Journal Articles

Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Nickolas Ashburn, Xiuyao Lang, Sumeet Pandey, Steven Wolf, Steve Kramer, John Smythe, Gurtej Sandhu, Charles Winter, Andrew C. Kummel, Kyeongjae Cho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052403 (2023)
https://doi.org/10.1116/6.0002840
Published: August 2023
View article titled, Density functional theory study on reaction mechanisms of Co(<sup>tbu2</sup>DAD)<sub>2</sub> for area selective-atomic layer deposition of Co films on metal surfaces
Open the PDF for Density functional theory study on reaction mechanisms of Co(<sup>tbu2</sup>DAD)<sub>2</sub> for area selective-atomic layer deposition of Co films on metal surfaces in another window
Includes: Supplementary data
Journal Articles

Low-resistivity molybdenum obtained by atomic layer deposition

Kees van der Zouw, Bernhard Y. van der Wel, Antonius A. I. Aarnink, Rob A. M. Wolters, Dirk J. Gravesteijn, Alexey Y. Kovalgin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052402 (2023)
https://doi.org/10.1116/6.0002804
Published: August 2023
View article titled, Low-resistivity molybdenum obtained by atomic layer deposition
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Includes: Supplementary data
Journal Articles

Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks

Kartik Sondhi, Rahul Sharangpani, Roshan Tirukkonda, Joyeeta Nag, Xing-Cai Guo, Michael A. Gribelyuk, Raghuveer S. Makala, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050402 (2023)
https://doi.org/10.1116/6.0002860
Published: August 2023
View article titled, Extending area selective deposition of ruthenium onto 3D SiO<sub>2</sub>-Si multilayer stacks
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of Al2O3 interlayer for improving AlN growth on silicon substrates

Rony Saha, Jonathan Anderson, Mark W. Holtz, Edwin L. Piner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053208 (2023)
https://doi.org/10.1116/6.0002760
Published: August 2023
View article titled, Atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> interlayer for improving AlN growth on silicon substrates
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Journal Articles

Plasmonic black coatings with broadband absorption for space applications

Hanjörg Wagner, Valentin Ripka, Andrea Dellith, Jan Dellith, Florian Wittkämper, Uwe Hübner, Mario Ziegler
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053209 (2023)
https://doi.org/10.1116/6.0002821
Published: August 2023
View article titled, Plasmonic black coatings with broadband absorption for space applications
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Includes: Supplementary data
Journal Articles

Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements

J. Patouillard, R. Gassilloud, F. Mercier, A. Mantoux, R. Boichot, A. Crisci, M. Bernard, N. Gauthier, S. Cadot, C. Raynaud, F. Gianesello, E. Blanquet
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052201 (2023)
https://doi.org/10.1116/6.0002678
Published: July 2023
View article titled, Chemical conversion of MoS<sub>2</sub> thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by <em>in situ</em> reflectance measurements
Open the PDF for Chemical conversion of MoS<sub>2</sub> thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by <em>in situ</em> reflectance measurements in another window
Includes: Supplementary data
Journal Articles

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Heli Seppänen, Igor Prozheev, Christoffer Kauppinen, Sami Suihkonen, Kenichiro Mizohata, Harri Lipsanen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052401 (2023)
https://doi.org/10.1116/6.0002705
Published: July 2023
View article titled, Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
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Journal Articles

Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

Nicholas A. Strnad, Daniel M. Potrepka, Brendan M. Hanrahan, Glen R. Fox, Ronald G. Polcawich, Jeffrey S. Pulskamp, Ryan R. Knight, Ryan Q. Rudy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050801 (2023)
https://doi.org/10.1116/6.0002431
Published: July 2023
View article titled, Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective
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Journal Articles

Investigating wet chemical oxidation methods to form SiO2 interlayers for self-aligned Pt-HfO2-Si gate stacks

Amy C. Brummer, Siddharth Kurup, Daniel Aziz, Michael A. Filler, Eric M. Vogel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053201 (2023)
https://doi.org/10.1116/6.0002762
Published: July 2023
View article titled, Investigating wet chemical oxidation methods to form SiO<sub>2</sub> interlayers for self-aligned Pt-HfO<sub>2</sub>-Si gate stacks
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Journal Articles

Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications

Marco Lisker, Mamathamba Kalishettyhalli Mahadevaiah, Keerthi Dorai Swamy Reddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042406 (2023)
https://doi.org/10.1116/6.0002424
Published: July 2023
View article titled, Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications
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Journal Articles

Atomic layer deposition of calcium fluoride for barrier coating applications

John Hennessy, Robin E. Rodríguez, William C. West, Erik J. Brandon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042405 (2023)
https://doi.org/10.1116/6.0002563
Published: June 2023
View article titled, Atomic layer deposition of calcium fluoride for barrier coating applications
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Includes: Supplementary data
Journal Articles

Electron-enhanced SiO2 atomic layer deposition at 35 °C using disilane and ozone or water as reactants

Jonas C. Gertsch, Zachary C. Sobell, Andrew S. Cavanagh, Harsono Simka, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042404 (2023)
https://doi.org/10.1116/6.0002726
Published: June 2023
View article titled, Electron-enhanced SiO<sub>2</sub> atomic layer deposition at 35 °C using disilane and ozone or water as reactants
Open the PDF for Electron-enhanced SiO<sub>2</sub> atomic layer deposition at 35 °C using disilane and ozone or water as reactants in another window
Journal Articles

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Holger Saare, Wenyi Xie, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042602 (2023)
https://doi.org/10.1116/6.0002708
Published: June 2023
View article titled, Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride
Open the PDF for Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride in another window
Includes: Supplementary data
Journal Articles

Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film

Petros Abi Younes, Ashok-Kumar Yadav, Medet Zhukush, Van-Hoan Le, Hervé Roussel, Marie-Ingrid Richard, Clément Camp, Kai Szeto, Gianluca Ciatto, Nathanaelle Schneider, Elsje Alessandra Quadrelli, Hubert Renevier, Nicolas Gauthier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042403 (2023)
https://doi.org/10.1116/6.0002448
Published: June 2023
View article titled, Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film
Open the PDF for Investigation of the transition of amorphous Ti-thiolate prepared by hybrid atomic layer deposition/molecular layer deposition into titanium disulfide ultrathin film in another window
Includes: Supplementary data
Journal Articles

Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption

Thabiso Kunene, Alex B. F. Martinson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042402 (2023)
https://doi.org/10.1116/6.0002664
Published: June 2023
View article titled, Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO<sub>2</sub> absorption
Open the PDF for Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO<sub>2</sub> absorption in another window
Includes: Supplementary data
Journal Articles

Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042401 (2023)
https://doi.org/10.1116/6.0002484
Published: May 2023
View article titled, Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma
Open the PDF for Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma in another window
Includes: Supplementary data