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Journal Articles

Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

Wil Gardner, David A. Winkler, David L. J. Alexander, Davide Ballabio, Benjamin W. Muir, Paul J. Pigram
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063204 (2023)
https://doi.org/10.1116/6.0002788
Published: September 2023
View article titled, Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models
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Includes: Supplementary data
Journal Articles

Self-joule heating assisted field emission following the Child–Langmuir law

Yoichiro Neo, Rikuto Oda, Jonghyun Moon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063104 (2023)
https://doi.org/10.1116/5.0159964
Published: September 2023
View article titled, Self-joule heating assisted field emission following the Child–Langmuir law
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Journal Articles

Application of machine learning to spectrum and image data

Satoka Aoyagi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063202 (2023)
https://doi.org/10.1116/6.0002858
Published: September 2023
View article titled, Application of machine learning to spectrum and image data
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Includes: Supplementary data
Journal Articles

Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films

Jake Soares, Wesley Jen, John D. Hues, Drew Lysne, Jesse Wensel, Steven M. Hues, Elton Graugnard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052404 (2023)
https://doi.org/10.1116/6.0002811
Published: August 2023
View article titled, Intrinsic and atomic layer etching enhanced area-selective atomic layer deposition of molybdenum disulfide thin films
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Includes: Supplementary data
Journal Articles

Low-resistivity molybdenum obtained by atomic layer deposition

Kees van der Zouw, Bernhard Y. van der Wel, Antonius A. I. Aarnink, Rob A. M. Wolters, Dirk J. Gravesteijn, Alexey Y. Kovalgin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052402 (2023)
https://doi.org/10.1116/6.0002804
Published: August 2023
View article titled, Low-resistivity molybdenum obtained by atomic layer deposition
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Includes: Supplementary data
Journal Articles

Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study

Jeong Won Kim, Ansoon Kim, Hui Ung Hwang, Jun Hyung Kim, Seungwook Choi, Norbert Koch, Dongguen Shin, Zhijuan Zhao, Fen Liu, Minki Choi, Kyu Myung Lee, Yongsup Park
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053211 (2023)
https://doi.org/10.1116/6.0002852
Published: August 2023
View article titled, Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study
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Journal Articles

Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas

Changyong Oh, Hyeong Wook Kim, Myeong Woo Ju, Jun Ho Song, Bo Sung Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053007 (2023)
https://doi.org/10.1116/6.0002798
Published: August 2023
View article titled, Study on effective dry etching of InGaZnO thin films under capacitively coupled plasma-reactive ion etching with a nonfluorine-based etching gas
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Journal Articles

VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS

Francesca Bennet, Robert Opitz, Narges Ghoreishi, Kristina Plate, Jean-Paul Barnes, Allen Bellew, Anna Belu, Giacomo Ceccone, Eric de Vito, Arnaud Delcorte, Alexis Franquet, Francesco Fumagalli, Douglas Gilliland, Harald Jungnickel, Tae Geol Lee, Claude Poleunis, Derk Rading, Hyun Kyong Shon, Valentina Spampinato, Jin Gyeong Son, Fuyi Wang, Yung-Chen Andrew Wang, Yao Zhao, Alexander Roloff, Jutta Tentschert, Jörg Radnik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053210 (2023)
https://doi.org/10.1116/6.0002814
Published: August 2023
View article titled, VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO<sub>2</sub> nanoparticles using ToF-SIMS
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Includes: Supplementary data
Journal Articles

ToF-SIMS in battery research: Advantages, limitations, and best practices

Teo Lombardo, Felix Walther, Christine Kern, Yannik Moryson, Timo Weintraut, Anja Henss, Marcus Rohnke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053207 (2023)
https://doi.org/10.1116/6.0002850
Published: August 2023
View article titled, ToF-SIMS in battery research: Advantages, limitations, and best practices
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Includes: Supplementary data
Journal Articles

Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application

N. Sano, A. Bellew, P. Blenkinsopp
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053204 (2023)
https://doi.org/10.1116/6.0002864
Published: July 2023
View article titled, Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application
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Journal Articles

Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2

Gregor Dornberg, Erik Rohkamm, Peter Birtel, Frank Scholze, Frank Frost
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053104 (2023)
https://doi.org/10.1116/6.0002766
Published: July 2023
View article titled, Characterization of a broad beam Kaufman-type ion source operated with CHF<sub>3</sub> and O<sub>2</sub>
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Includes: Supplementary data
Journal Articles

Erratum: “Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?” [J. Vac. Sci. Technol. B 41, 030803 (2023)]

Charles W. Magee, Temel H. Buyuklimanli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043413 (2023)
https://doi.org/10.1116/6.0002844
Published: June 2023
View article titled, Erratum: “Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?” [J. Vac. Sci. Technol. B 41, 030803 (2023)]
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Journal Articles

Comparison of triethylgallium and diethylgallium ethoxide for β-Ga2O3 growth by metalorganic vapor phase epitaxy

Ken Goto, Taro Nishimura, Masato Ishikawa, Takahito Okuyama, Haruka Tozato, Shogo Sasaki, Kazutada Ikenaga, Yoshihiko Takinami, Hideaki Machida,