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Journal Articles

Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

Editor’s Pick
Ajay Ravi, Long Viet Than, Jacqueline Lewis, Jingwei Shi, Andreas Werbrouck, Jingyi Han, Miika Mattinen, Stacey F. Bent
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 062407 (2024)
https://doi.org/10.1116/6.0003975
Published: November 2024
View article titled, Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography
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Journal Articles

Optical emission spectroscopy as a method for evaluating the change in Si etching structures profile in ICP SF6/C4F8 plasma: Microstructures

Artem A. Osipov, Alina E. Fumina, Anastasia B. Speshilova, Ekaterina V. Endiiarova, Armenak A. Osipov, Sergey E. Alexandrov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063001 (2024)
https://doi.org/10.1116/6.0003809
Published: September 2024
View article titled, Optical emission spectroscopy as a method for evaluating the change in Si etching structures profile in ICP SF<sub>6</sub>/C<sub>4</sub>F<sub>8</sub> plasma: Microstructures
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Journal Articles

Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials

Faegheh S. Sajjadian, Laura Galleni, Kevin M. Dorney, Dhirendra P. Singh, Fabian Holzmeier, Michiel J. van Setten, Stefan De Gendt, Thierry Conard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053206 (2023)
https://doi.org/10.1116/6.0002808
Published: August 2023
View article titled, Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials
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Journal Articles

Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors

Roberta Hawkins, Chadwin D. Young
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053202 (2022)
https://doi.org/10.1116/6.0001818
Published: July 2022
View article titled, Effect of fabrication processes before atomic layer deposition on β-Ga<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub>/Cr/Au metal–oxide–semiconductor capacitors
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Journal Articles

Optimization of three-dimensional metamaterials for terahertz energy harvesting

Shendu Yang, Zachary Thacker, Evan Allison, Patrick Pinhero
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062801 (2021)
https://doi.org/10.1116/6.0001106
Published: September 2021
View article titled, Optimization of three-dimensional metamaterials for terahertz energy harvesting
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Journal Articles

Preface for the Special Topic Collection Commemorating the Career of John Coburn

Eric Kay, David B. Graves, Eray S. Aydil
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 061602 (2020)
https://doi.org/10.1116/6.0000643
Published: October 2020
View article titled, Preface for the Special Topic Collection Commemorating the Career of John Coburn
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Journal Articles

Chemical passivation of the perovskite layer and its real-time effect on the device performance in back-contact perovskite solar cells

Askhat N. Jumabekov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 060401 (2020)
https://doi.org/10.1116/6.0000481
Published: September 2020
View article titled, Chemical passivation of the perovskite layer and its real-time effect on the device performance in back-contact perovskite solar cells
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Journal Articles

Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist

Editor’s Pick
Adam Pranda, Kang-Yi Lin, Sebastian Engelmann, Robert L. Bruce, Eric A. Joseph, Dominik Metzler, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052601 (2020)
https://doi.org/10.1116/6.0000289
Published: July 2020
View article titled, Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
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Journal Articles

Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

Luxherta Buzi, Hiroyuki Miyazoe, Matthew. P. Sagianis, Nathan Marchack, John M. Papalia, Sebastian. U. Engelmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033006 (2020)
https://doi.org/10.1116/1.5143032
Published: March 2020
View article titled, Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
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Journal Articles

Treatment of SU-8 surfaces using atmospheric pressure dielectric barrier discharge plasma

Juliana de Novais Schianti, Fellype do Nascimento, Jhonattan Cordoba Ramirez, Munemasa Machida, Lucas Heitzmann Gabrielli, Hugo Enrique Hernandez-Figueroa, Stanislav Moshkalev
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021403 (2018)
https://doi.org/10.1116/1.4999045
Published: February 2018
View article titled, Treatment of SU-8 surfaces using atmospheric pressure dielectric barrier discharge plasma
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Includes: Supplementary data
Journal Articles

Role of the dense amorphous carbon layer in photoresist etching

Editor’s Pick
Adam Pranda, Sandra A. Gutierrez Razo, Zuleykhan Tomova, John T. Fourkas, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021304 (2018)
https://doi.org/10.1116/1.5009640
Published: December 2017
View article titled, Role of the dense amorphous carbon layer in photoresist etching
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Journal Articles

Surface roughening of photoresist after change of the photon/radical and ion treatment sequence

Yan Zhang, Takuya Takeuchi, Kenji Ishikawa, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 060606 (2017)
https://doi.org/10.1116/1.4994218
Published: September 2017
View article titled, Surface roughening of photoresist after change of the photon/radical and ion treatment sequence
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Journal Articles

Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns

Hiroyuki Miyazoe, Sebastian U. Engelmann, Michael A. Guillorn, Dongfei Pei, Weiyi Li, Jason L. Lauer, J. Leon Shohet, Nicholas C. M. Fuller
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C306 (2017)
https://doi.org/10.1116/1.4985541
Published: June 2017
View article titled, Effects of ultraviolet and vacuum ultraviolet synchrotron radiation on organic underlayers to modulate line-edge roughness of fine-pitch poly-silicon patterns
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Journal Articles

Inductively coupled plasma reactive-ion etching of β-Ga2O3: Comprehensive investigation of plasma chemistry and temperature

Amit P. Shah, Arnab Bhattacharya
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041301 (2017)
https://doi.org/10.1116/1.4983078
Published: May 2017
View article titled, Inductively coupled plasma reactive-ion etching of β-Ga<sub>2</sub>O<sub>3</sub>: Comprehensive investigation of plasma chemistry and temperature
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Journal Articles

Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology

Onintza Ros, Erwine Pargon, Marc Fouchier, Pascal Gouraud, Sebastien Barnola
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021306 (2017)
https://doi.org/10.1116/1.4972228
Published: December 2016
View article titled, Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology
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Journal Articles

Trenched 4H-SiC with tapered sidewall formed by Cl2/O2 reactive ion etching

Yuan-Hung Tseng, Bing-Yue Tsui
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061305 (2016)
https://doi.org/10.1116/1.4965421
Published: October 2016
View article titled, Trenched 4H-SiC with tapered sidewall formed by Cl<sub>2</sub>/O<sub>2</sub> reactive ion etching
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Journal Articles

Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system

Shailesh Dhungana, Bradley J. Nordell, Anthony N. Caruso, Michelle M. Paquette, William A. Lanford, Kris Scharfenberger, Danya Jacob, Sean W. King
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061302 (2016)
https://doi.org/10.1116/1.4964648
Published: October 2016
View article titled, Combinatorial survey of fluorinated plasma etching in the silicon-oxygen-carbon-nitrogen-hydrogen system
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Journal Articles

Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness

Maher Tahhan, Joseph Nedy, Silvia H. Chan, Cory Lund, Haoran Li, Geetak Gupta, Stacia Keller, Umesh Mishra
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031303 (2016)
https://doi.org/10.1116/1.4944054
Published: March 2016
View article titled, Optimization of a chlorine-based deep vertical etch of GaN demonstrating low damage and low roughness
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Journal Articles

Atomic layer deposition of two dimensional MoS2 on 150 mm substrates

Arturo Valdivia, Douglas J. Tweet, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021515 (2016)
https://doi.org/10.1116/1.4941245
Published: February 2016
View article titled, Atomic layer deposition of two dimensional MoS<sub>2</sub> on 150 mm substrates
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Journal Articles

Low-temperature atomic layer deposition of TiO2 thin layers for the processing of memristive devices

Samuele Porro, Alladin Jasmin, Katarzyna Bejtka, Daniele Conti, Denis Perrone, Salvatore Guastella, Candido F. Pirri, Alessandro Chiolerio, Carlo Ricciardi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A147 (2016)
https://doi.org/10.1116/1.4938465
Published: December 2015
View article titled, Low-temperature atomic layer deposition of TiO<sub>2</sub> thin layers for the processing of memristive devices
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