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Journal Articles

Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks

Editor’s Pick
Kartik Sondhi, Stephen Ross, Joyeeta Nag, X. C. Guo, Dexin Zhao, Adarsh Rajashekhar, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 050403 (2024)
https://doi.org/10.1116/6.0003790
Published: August 2024
View article titled, Inherent area selective deposition of silicon dioxide in multilayer 3D SiO<em><sub>x</sub></em>–SiN<em><sub>x</sub></em> stacks
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Journal Articles

Bias voltage influence on the a-SiCx:H interlayer deposition using tetramethylsilane: Decorative applications of a-C:H thin films on steel

Michael C. Goldbeck, Vanessa Piroli, Jennifer S. Weber, Carla D. Boeira, Bruna L. Perotti, Newton K. Fukumasu, Fernando Alvarez, Carlos A. Figueroa, Alexandre F. Michels
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023007 (2024)
https://doi.org/10.1116/6.0003328
Published: February 2024
View article titled, Bias voltage influence on the a-SiCx:H interlayer deposition using tetramethylsilane: Decorative applications of a-C:H thin films on steel
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Includes: Supplementary data
Journal Articles

Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates

Editor’s Pick
Rachel A. Nye, Nicholas M. Carroll, Sarah E. Morgan, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013205 (2024)
https://doi.org/10.1116/6.0003183
Published: January 2024
View article titled, Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates
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Includes: Supplementary data
Journal Articles

Significance of plasma-surface interactions in the etch behavior of low-k materials

Adam Pranda, Steven Grzeskowiak, Yu- Hao Tsai, Yusuke Yoshida, Eric Liu, Yun Han, Peter Biolsi, Ken Kobayashi, Nobuyuki Ikezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063009 (2023)
https://doi.org/10.1116/6.0003014
Published: November 2023
View article titled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Journal Articles

Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time

Jennifer Stefani Weber, Vanessa Piroli, Michael Cristian Goldbeck, Bruna Louise Perotti, Carla Daniela Boeira, Newton Kiyoshi Fukumasu, Alexandre Fassini Michels, Carlos Alejandro Figueroa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063403 (2023)
https://doi.org/10.1116/6.0002911
Published: September 2023
View article titled, Si-containing interlayer using tetramethylsilene for diamondlike carbon film adhesion on low-alloy steel: The role of the interlayer deposition time
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Includes: Supplementary data
Journal Articles

Graphite oxide synthetized by pulsed laser ablation technique used as an antifouling coating to inhibit CaCO3 scale on stainless steel surfaces

Juan P. Cuenca-Vargas, Juan D. Lopez-Vargas, Andre A. Drummond, Marcelo M. Werneck, Dante F. Franceschini, Sergio S. Camargo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053111 (2023)
https://doi.org/10.1116/6.0002833
Published: August 2023
View article titled, Graphite oxide synthetized by pulsed laser ablation technique used as an antifouling coating to inhibit CaCO<sub>3</sub> scale on stainless steel surfaces
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Includes: Supplementary data
Journal Articles

Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications

Marco Lisker, Mamathamba Kalishettyhalli Mahadevaiah, Keerthi Dorai Swamy Reddy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042406 (2023)
https://doi.org/10.1116/6.0002424
Published: July 2023
View article titled, Plasma-enhanced atomic layer deposition of silicon nitride for front-end-of-line applications
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Journal Articles

Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption

Thabiso Kunene, Alex B. F. Martinson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042402 (2023)
https://doi.org/10.1116/6.0002664
Published: June 2023
View article titled, Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO<sub>2</sub> absorption
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Includes: Supplementary data
Journal Articles

Nitrogen centers in single crystal diamond grown by chemical vapor deposition

D. S. Misra
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042703 (2023)
https://doi.org/10.1116/6.0002622
Published: May 2023
View article titled, Nitrogen centers in single crystal diamond grown by chemical vapor deposition
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Journal Articles

Atomic layer deposition of MoOx thin films using Mo(iPrCp)2H2 and O3

Ethan Hendrix, Ben M. Garland, Vamseedhara Vemuri, Nicholas C. Strandwitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032409 (2023)
https://doi.org/10.1116/6.0002436
Published: April 2023
View article titled, Atomic layer deposition of MoO<sub>x</sub> thin films using Mo(<sup>i</sup>PrCp)<sub>2</sub>H<sub>2</sub> and O<sub>3</sub>
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Journal Articles

Vapor-phase grafting of functional silanes on atomic layer deposited Al2O3

Editor’s Pick
Vepa Rozyyev, Rahul Shevate, Rajesh Pathak, Julia G. Murphy, Anil U. Mane, S. J. Sibener, Jeffrey W. Elam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032408 (2023)
https://doi.org/10.1116/6.0002364
Published: April 2023
View article titled, Vapor-phase grafting of functional silanes on atomic layer deposited Al<sub>2</sub>O<sub>3</sub>
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Includes: Supplementary data
Journal Articles

In situ analysis of nucleation reactions during TiCl4/H2O atomic layer deposition on SiO2 and H-terminated Si surfaces treated with a silane small molecule inhibitor

Jan-Willem J. Clerix, Golnaz Dianat, Annelies Delabie, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032406 (2023)
https://doi.org/10.1116/6.0002493
Published: March 2023
View article titled, <em>In situ</em> analysis of nucleation reactions during TiCl<sub>4</sub>/H<sub>2</sub>O atomic layer deposition on SiO<sub>2</sub> and H-terminated Si surfaces treated with a silane small molecule inhibitor
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Journal Articles

Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation

Artem Shelemin, Oleg Zabeida, Jincheng Qian, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023409 (2023)
https://doi.org/10.1116/6.0002371
Published: February 2023
View article titled, Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of Cu2O using copper acetylacetonate

Gabriel Bartholazzi, M. M. Shehata, Daniel H. Macdonald, Lachlan E. Black
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022402 (2023)
https://doi.org/10.1116/6.0002238
Published: February 2023
View article titled, Atomic layer deposition of Cu<sub>2</sub>O using copper acetylacetonate
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Journal Articles

Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Editor’s Pick
Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012603 (2023)
https://doi.org/10.1116/6.0002149
Published: January 2023
View article titled, Thermal atomic layer etching of VO<sub>2</sub> using sequential BCl<sub>3</sub> and SF<sub>4</sub> exposures: Observation of conversion, ligand-exchange, and oxidation state changes
Open the PDF for Thermal atomic layer etching of VO<sub>2</sub> using sequential BCl<sub>3</sub> and SF<sub>4</sub> exposures: Observation of conversion, ligand-exchange, and oxidation state changes in another window
Includes: Supplementary data
Journal Articles

Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

Editor’s Pick
Jung-Sik Kim, Hwan Oh, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063401 (2022)
https://doi.org/10.1116/6.0002036
Published: September 2022
View article titled, Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition
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Journal Articles

Adsorption and surface reaction of isopropyl alcohol on SiO2 surfaces

Takezo Mawaki, Akinobu Teramoto, Katsutoshi Ishii, Yoshinobu Shiba, Rihito Kuroda, Tomoyuki Suwa, Shuji Azumo, Akira Shimizu, Kota Umezawa, Yasuyuki Shirai, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053201 (2022)
https://doi.org/10.1116/6.0002002
Published: July 2022
View article titled, Adsorption and surface reaction of isopropyl alcohol on SiO<sub>2</sub> surfaces
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Journal Articles

Chemical vapor deposition of sp2-boron nitride films on Al2O3 (0001), ( 11 2 ¯ ) , ( 1 1 ¯ 02 ) , and ( 10 1 ¯ ) substrates

Editor’s Pick
Sachin Sharma, Laurent Souqui, Henrik Pedersen, Hans Högberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 033404 (2022)
https://doi.org/10.1116/6.0001672
Published: April 2022
View article titled, Chemical vapor deposition of sp<sup>2</sup>-boron nitride films on Al<sub>2</sub>O<sub>3</sub> (0001), ( 11 2 ¯ ) , ( 1 1 ¯ 02 ) , and ( 10 1 ¯ ) substrates
Open the PDF for Chemical vapor deposition of sp<sup>2</sup>-boron nitride films on Al<sub>2</sub>O<sub>3</sub> (0001), ( 11 2 ¯ ) , ( 1 1 ¯ 02 ) , and ( 10 1 ¯ ) substrates in another window
Journal Articles

Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory

Editor’s Pick
Austin M. Cano, Suresh Kondati Natarajan, Jonathan L. Partridge, Simon D. Elliott, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022601 (2022)
https://doi.org/10.1116/6.0001542
Published: January 2022
View article titled, Spontaneous etching of B<sub>2</sub>O<sub>3</sub> by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory
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Journal Articles

Machine learning approach to thickness prediction from in situ spectroscopic ellipsometry data for atomic layer deposition processes

Ayush Arunachalam, S. Novia Berriel, Corbin Feit, Udit Kumar, Sudipta Seal, Kanad Basu, Parag Banerjee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012405 (2022)
https://doi.org/10.1116/6.0001482
Published: December 2021
View article titled, Machine learning approach to thickness prediction from <em>in situ</em> spectroscopic ellipsometry data for atomic layer deposition processes
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