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Journal Articles

Significance of plasma-surface interactions in the etch behavior of low-k materials

Adam Pranda, Steven Grzeskowiak, Yu- Hao Tsai, Yusuke Yoshida, Eric Liu, Yun Han, Peter Biolsi, Ken Kobayashi, Nobuyuki Ikezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063009 (2023)
https://doi.org/10.1116/6.0003014
Published: November 2023
View article titled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Journal Articles

Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy

Joseph R. Vella, Qinzhen Hao, Vincent M. Donnelly, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062602 (2023)
https://doi.org/10.1116/6.0003011
Published: November 2023
View article titled, Dynamics of plasma atomic layer etching: Molecular dynamics simulations and optical emission spectroscopy
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Includes: Supplementary data
Journal Articles

Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbCx films from a compound target

M. Farahani, T. Kozák, A. D. Pajdarová, A. Bahr, H. Riedl, P. Zeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063008 (2023)
https://doi.org/10.1116/6.0002944
Published: October 2023
View article titled, Understanding ion and atom fluxes during high-power impulse magnetron sputtering deposition of NbC<sub>x</sub> films from a compound target
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Journal Articles

Oxygen plasma treatment of TeO2—B2O3 (boro-tellurite) thin films

Uğur Demirkol, Çağrı Durmuş, Tamer Akan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063006 (2023)
https://doi.org/10.1116/6.0002879
Published: October 2023
View article titled, Oxygen plasma treatment of TeO<sub>2</sub>—B<sub>2</sub>O<sub>3</sub> (boro-tellurite) thin films
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Journal Articles

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Daisuke Ogawa, Keiji Nakamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063001 (2023)
https://doi.org/10.1116/6.0002835
Published: September 2023
View article titled, Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes
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Journal Articles

Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography

Bo Cao, Rui Li, Zhiyuan Cao, Haomin Li, Liqiong Sun, Yingsan Geng, Jianhua Wang, Zhenxing Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053006 (2023)
https://doi.org/10.1116/6.0002876
Published: August 2023
View article titled, Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography
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Journal Articles

Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042401 (2023)
https://doi.org/10.1116/6.0002484
Published: May 2023
View article titled, Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma
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Includes: Supplementary data
Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
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Journal Articles

Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy

Qinzhen Hao, Pilbum Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032605 (2023)
https://doi.org/10.1116/6.0002482
Published: April 2023
View article titled, Real-time monitoring of atomic layer etching in Cl<sub>2</sub>/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy
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Journal Articles

In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures

Artem Osipov, Alina Gagaeva, Anastasia Speshilova, Armenak Osipov, Yakov Enns, Alexey Kazakin, Ekaterina Endiiarova, Roman Kornilov, Sergey Alexandrov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033007 (2023)
https://doi.org/10.1116/6.0002427
Published: April 2023
View article titled, <em>In situ</em> diagnostics of the Si etching structures profile in ICP SF<sub>6</sub>/C<sub>4</sub>F<sub>8</sub> plasma: Macrostructures
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Journal Articles

Enhancement of discharge and mechanical properties of ta-C films by pulse-enhanced cathodic arc deposition

Benfu Wang, Xiubo Tian, Jian Hu, Chunzhi Gong, Xiangli Liu, Jin Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033003 (2023)
https://doi.org/10.1116/6.0002352
Published: March 2023
View article titled, Enhancement of discharge and mechanical properties of ta-C films by pulse-enhanced cathodic arc deposition
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Journal Articles

Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si

François Boulard, Valentin Bacquié, Aurélien Tavernier, Nicolas Possémé
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033002 (2023)
https://doi.org/10.1116/6.0002434
Published: March 2023
View article titled, Role of SiCl<sub>4</sub> addition in CH<sub>3</sub>F/O<sub>2</sub> based chemistry for Si<sub>3</sub>N<sub>4</sub> etching selectively to SiO<sub>2</sub>, SiCO, and Si
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Journal Articles

Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments

Clémence Badie, Héloïse Tissot, Beniamino Sciacca, Maïssa K. Barr, Julien Bachmann, Christophe Vallée, Gaël Gautier, Thomas Defforge, Vincent Astie, Jean-Manuel Decams, Mikhael Bechelany, Lionel Santinacci
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032401 (2023)
https://doi.org/10.1116/6.0002288
Published: March 2023
View article titled, Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments
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Includes: Supplementary data
Journal Articles

Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation

Artem Shelemin, Oleg Zabeida, Jincheng Qian, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023409 (2023)
https://doi.org/10.1116/6.0002371
Published: February 2023
View article titled, Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation
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Includes: Supplementary data
Journal Articles

Photoluminescence spectroscopy of Cr3+ in β-Ga2O3 and (Al0.1Ga0.9)2O3

Cassandra Remple, Lauren M. Barmore, Jani Jesenovec, John S. McCloy, Matthew D. McCluskey
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022702 (2023)
https://doi.org/10.1116/6.0002340
Published: January 2023
View article titled, Photoluminescence spectroscopy of Cr<sup>3+</sup> in β-Ga<sub>2</sub>O<sub>3</sub> and (Al<sub>0.1</sub>Ga<sub>0.9</sub>)<sub>2</sub>O<sub>3</sub>
Open the PDF for Photoluminescence spectroscopy of Cr<sup>3+</sup> in β-Ga<sub>2</sub>O<sub>3</sub> and (Al<sub>0.1</sub>Ga<sub>0.9</sub>)<sub>2</sub>O<sub>3</sub> in another window
Includes: Supplementary data
Journal Articles

Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation

Siegfried Hofmann, Feng-Min Zhong, Hao Yang, Jiang-Yong Wang, Cong-Kang Xu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013408 (2023)
https://doi.org/10.1116/6.0002233
Published: January 2023
View article titled, Dynamic character of compositional sputter depth profiling by SIMS: A comparison of different models for quantitative profile evaluation
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Journal Articles

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Muhammad Farooq, Siddiqa Ismail, N. U. Rehman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013001 (2023)
https://doi.org/10.1116/6.0002064
Published: December 2022
View article titled, Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants
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Journal Articles

Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al2O3 using infrared and optical emission spectroscopy

M. A. Mione, V. Vandalon, W. M. M. Kessels, F. Roozeboom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062407 (2022)
https://doi.org/10.1116/6.0002158
Published: November 2022
View article titled, Temperature study of atmospheric-pressure plasma-enhanced spatial ALD of Al<sub>2</sub>O<sub>3</sub> using infrared and optical emission spectroscopy
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Includes: Supplementary data
Journal Articles

Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor

Radha Krishna Murthy Bulusu, Shurik Yatom, Christopher W. Patterson, Robert J. Wandell, Bruce R. Locke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063001 (2022)
https://doi.org/10.1116/6.0001992
Published: September 2022
View article titled, Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor
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Includes: Supplementary data
Journal Articles

Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy

Nils Martensson, Alexander Föhlisch, Svante Svensson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043207 (2022)
https://doi.org/10.1116/6.0001879
Published: June 2022
View article titled, Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy
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