1-20 of 225
Electrical resistivity
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Microstructural and kinetics analysis of FeB–Fe2B layer grown by pulsed-DC powder-pack boriding on AISI 316 L steel

I. Campos-Silva, J. Cedeño-Velázquez, A. D. Contla-Pacheco, I. Arzate-Vázquez, L. E. Castillo-Vela, M. Olivares-Luna, J. L. Rosales-Lopez, F. P. Espino-Cortes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053101 (2024)
https://doi.org/10.1116/6.0003774
Published: July 2024
View article titled, Microstructural and kinetics analysis of FeB–Fe<sub>2</sub>B layer grown by pulsed-DC powder-pack boriding on AISI 316 L steel
Open the PDF for Microstructural and kinetics analysis of FeB–Fe<sub>2</sub>B layer grown by pulsed-DC powder-pack boriding on AISI 316 L steel in another window
Journal Articles

Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction

Min-Ji Ha, Na-Gyeong Kang, Woo-Hee Kim, Tae Joo Park, Tae-Eon Park, Ji-Hoon Ahn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042401 (2024)
https://doi.org/10.1116/6.0003664
Published: June 2024
View article titled, Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction
Open the PDF for Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction in another window
Journal Articles

Studies of electrical resistivity and magnetic properties of CuFe and CuNiFe films prepared by magnetron sputtering

Muhammad Saqib Shahzad, Xiao Wang, Yinglin Hu, Xiaona Li, Qiao Jiang, Min Li, ZhuMin Li, Renwei Liu, Rui Zheng, Chuang Dong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043408 (2024)
https://doi.org/10.1116/6.0003684
Published: June 2024
View article titled, Studies of electrical resistivity and magnetic properties of CuFe and CuNiFe films prepared by magnetron sputtering
Open the PDF for Studies of electrical resistivity and magnetic properties of CuFe and CuNiFe films prepared by magnetron sputtering in another window
Includes: Supplementary data
Journal Articles

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor

So Young Kim, Chunghee Jo, Hyerin Shin, Dongmin Yoon, Donghyuk Shin, Min-ho Cheon, Kyu-beom Lee, Dong-won Seo, Jae-wook Choi, Heungsoo Park, Dae-Hong Ko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032405 (2024)
https://doi.org/10.1116/6.0003361
Published: March 2024
View article titled, Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO<sub>2</sub>Cl<sub>2</sub> as precursor
Open the PDF for Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO<sub>2</sub>Cl<sub>2</sub> as precursor in another window
Journal Articles

Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

Editor’s Pick
Ha Young Lee, Jeong Hwan Han, Byung Joon Choi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022405 (2024)
https://doi.org/10.1116/6.0003319
Published: February 2024
View article titled, Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition
Open the PDF for Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties

Hwan-Seok Seo, Taeyoon Lee, Hyungjun Kim, Ivan Petrov, J. E. Greene
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063406 (2023)
https://doi.org/10.1116/6.0003072
Published: October 2023
View article titled, Phase composition of polycrystalline HfN<sub>x</sub> (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties
Open the PDF for Phase composition of polycrystalline HfN<sub>x</sub> (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties in another window
Journal Articles

Low-resistivity molybdenum obtained by atomic layer deposition

Kees van der Zouw, Bernhard Y. van der Wel, Antonius A. I. Aarnink, Rob A. M. Wolters, Dirk J. Gravesteijn, Alexey Y. Kovalgin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052402 (2023)
https://doi.org/10.1116/6.0002804
Published: August 2023
View article titled, Low-resistivity molybdenum obtained by atomic layer deposition
Open the PDF for Low-resistivity molybdenum obtained by atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Structural evolution and thermoelectric properties of Mg3SbxBi2−x thin films deposited by magnetron sputtering

Grzegorz Sadowski, Rui Shu, Arnaud le Febvrier, Zhijia Han, Denis Music, Weishu Liu, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043409 (2023)
https://doi.org/10.1116/6.0002635
Published: June 2023
View article titled, Structural evolution and thermoelectric properties of Mg<sub>3</sub>Sb<sub>x</sub>Bi<sub>2</sub><em><sub>−</sub></em><sub>x</sub> thin films deposited by magnetron sputtering
Open the PDF for Structural evolution and thermoelectric properties of Mg<sub>3</sub>Sb<sub>x</sub>Bi<sub>2</sub><em><sub>−</sub></em><sub>x</sub> thin films deposited by magnetron sputtering in another window
Journal Articles

The growth of self-intercalated Nb1+xSe2 by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity

Peter M. Litwin, Samantha T. Jaszewski, Wendy L. Sarney, Asher C. Leff, Sergiy Krylyuk, Albert V. Davydov, Jon F. Ihlefeld, Stephen J. McDonnell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042707 (2023)
https://doi.org/10.1116/6.0002593
Published: June 2023
View article titled, The growth of self-intercalated Nb<sub>1+<em>x</em></sub>Se<sub>2</sub> by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity
Open the PDF for The growth of self-intercalated Nb<sub>1+<em>x</em></sub>Se<sub>2</sub> by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity in another window
Includes: Supplementary data
Journal Articles

Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading

S. Altaf Husain, P. Kreiml, P.-O. Renault, C. Mitterer, M. J. Cordill, D. Faurie
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033403 (2023)
https://doi.org/10.1116/6.0002348
Published: March 2023
View article titled, Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading
Open the PDF for Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading in another window
Journal Articles

Describing mechanical damage evolution through in situ electrical resistance measurements

David D. Gebhart, Anna Krapf, Benoit Merle, Christoph Gammer, Megan J. Cordill
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023408 (2023)
https://doi.org/10.1116/6.0002362
Published: February 2023
View article titled, Describing mechanical damage evolution through <em>in situ</em> electrical resistance measurements
Open the PDF for Describing mechanical damage evolution through <em>in situ</em> electrical resistance measurements in another window
Journal Articles

Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications

A. Ferreira, M. A. Correa, S. Lanceros-Mendez, F. Vaz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063101 (2022)
https://doi.org/10.1116/6.0002060
Published: October 2022
View article titled, Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications
Open the PDF for Flexible multifunctional hard coatings based on chromium oxynitride for pressure-sensing applications in another window
Includes: Supplementary data
Journal Articles

High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation

Jeyanthinath Mayandi, Matthias Schrade, Ponniah Vajeeston, Marit Stange, Anna M. Lind, Martin F. Sunding, Jonas Deuermeier, Elvira Fortunato, Ole M. Løvvik, Alexander G. Ulyashin, Spyros Diplas, Patricia A. Carvalho, Terje G. Finstad
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 023402 (2022)
https://doi.org/10.1116/6.0001394
Published: January 2022
View article titled, High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation
Open the PDF for High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation in another window
Includes: Supplementary data
Journal Articles

Effects of sputtering process on the thermochromic function of vanadium dioxide thin films

Chuan Li, Jang Hsing Hsieh, Chuan Ming Su, Nai-Yun Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013403 (2022)
https://doi.org/10.1116/6.0001404
Published: November 2021
View article titled, Effects of sputtering process on the thermochromic function of vanadium dioxide thin films
Open the PDF for Effects of sputtering process on the thermochromic function of vanadium dioxide thin films in another window
Journal Articles

Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure

Md. Istiaque Chowdhury, Mark Sowa, Kylie E. Van Meter, Tomas F. Babuska, Tomas Grejtak, Alexander C. Kozen, Brandon A. Krick, Nicholas C. Strandwitz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053408 (2021)
https://doi.org/10.1116/6.0001175
Published: August 2021
View article titled, Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure
Open the PDF for Plasma-enhanced atomic layer deposition of titanium molybdenum nitride: Influence of RF bias and substrate structure in another window
Includes: Supplementary data
Journal Articles

Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition

Carsten Bundesmann, Jens Bauer, Annemarie Finzel, Jürgen W. Gerlach, Wolfgang Knolle, Anke Hellmich, Ron Synowicki
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033406 (2021)
https://doi.org/10.1116/6.0000917
Published: March 2021
View article titled, Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition
Open the PDF for Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition in another window
Journal Articles

Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant

Nikolaos Pliatsikas, Andreas Jamnig, Martin Konpan, Andreas Delimitis, Gregory Abadias, Kostas Sarakinos
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043406 (2020)
https://doi.org/10.1116/6.0000244
Published: June 2020
View article titled, Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant
Open the PDF for Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant in another window
Journal Articles

Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition

Kham M. Niang, Guandong Bai, John Robertson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042401 (2020)
https://doi.org/10.1116/6.0000152
Published: May 2020
View article titled, Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition
Open the PDF for Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu

Seung-Min Han, Dip K. Nandi, Yong-Hwan Joo, Toshiyuki Shigetomi, Kazuharu Suzuki, Shunichi Nabeya, Ryosuke Harada, Soo-Hyun Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 032404 (2020)
https://doi.org/10.1116/1.5134696
Published: March 2020
View article titled, Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu
Open the PDF for Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu in another window
Journal Articles

Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition

Igor Krylov, Yuanshen Qi, Valentina Korchnoy, Kamira Weinfeld, Moshe Eizenberg, Eilam Yalon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 032403 (2020)
https://doi.org/10.1116/6.0000028
Published: March 2020
View article titled, Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition
Open the PDF for Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition in another window