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Journal Articles

Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron

Editor’s Pick
Laurent Souqui, Hans Högberg, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063412 (2023)
https://doi.org/10.1116/6.0003001
Published: November 2023
View article titled, Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboron
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Includes: Supplementary data
Journal Articles

(AlCrNiTiZr)Nx high-entropy nitride coatings with enhanced hardness via tailoring N2 flow rates for anti-wear applications

Editor’s Pick
Jia Zheng, Cunxiu Zhang, Jingchuan Li, Junyi Chen, Yifan Dong, Sam Zhang, Jian Zhang, Deen Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053404 (2023)
https://doi.org/10.1116/6.0002837
Published: July 2023
View article titled, (AlCrNiTiZr)N<sub>x</sub> high-entropy nitride coatings with enhanced hardness via tailoring N<sub>2</sub> flow rates for anti-wear applications
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Journal Articles

Neutral transport during etching of high aspect ratio features

Theodoros Panagopoulos, Thorsten Lill
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033006 (2023)
https://doi.org/10.1116/6.0002468
Published: April 2023
View article titled, Neutral transport during etching of high aspect ratio features
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Journal Articles

Effect of plasma nitriding substrate current density on the adhesion strength of in situ PVD TiN coatings

Xin Zhang, Xiu-bo Tian, Chun-zhi Gong, Xiang-li Liu, Jin Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033405 (2023)
https://doi.org/10.1116/6.0002353
Published: April 2023
View article titled, Effect of plasma nitriding substrate current density on the adhesion strength of <em>in situ</em> PVD TiN coatings
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Journal Articles

Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment

Minglei Yang, Guangyu He, Jiao Chen, Zhaolu Zhang, Guanjun Yang, Zezhou Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013408 (2022)
https://doi.org/10.1116/6.0001346
Published: December 2021
View article titled, Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment
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Journal Articles

Sticking coefficients of selenium and tellurium

Derrick S. H. Liu, Maria Hilse, Roman Engel-Herbert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 023413 (2021)
https://doi.org/10.1116/6.0000736
Published: February 2021
View article titled, Sticking coefficients of selenium and tellurium
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Includes: Supplementary data
Journal Articles

Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition

Editor’s Pick
Brian C. Welch, Olivia M. McIntee, Anand B. Ode, Bonnie B. McKenzie, Alan R. Greenberg, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052409 (2020)
https://doi.org/10.1116/6.0000271
Published: August 2020
View article titled, Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition
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Journal Articles

Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures

Thomas E. Seidel, Michael I. Current
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022602 (2020)
https://doi.org/10.1116/1.5133953
Published: January 2020
View article titled, Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures
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Journal Articles

Influence of Si precursor type on the surface roughening of SiGe epitaxial layers deposited by ultrahigh vacuum chemical vapor deposition method

Youngmo Kim, Sungyeol Yoon, Daehong Ko, Hyunchul Sohn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041403 (2017)
https://doi.org/10.1116/1.4986490
Published: June 2017
View article titled, Influence of Si precursor type on the surface roughening of SiGe epitaxial layers deposited by ultrahigh vacuum chemical vapor deposition method
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Journal Articles

Review Article: Reactions of fluorine atoms with silicon, revisited, again

Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C202 (2017)
https://doi.org/10.1116/1.4983922
Published: May 2017
View article titled, Review Article: Reactions of fluorine atoms with silicon, revisited, again
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Journal Articles

Hydrogen interactions with oxidized austenitic stainless steel

Vincenc Nemanič, Marko Žumer, Mitja Lakner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021605 (2017)
https://doi.org/10.1116/1.4975142
Published: January 2017
View article titled, Hydrogen interactions with oxidized austenitic stainless steel
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Journal Articles

SiO2 etching in an Ar/c-C4F8/O2 dual frequency capacitively coupled plasma

Shahid Rauf, Ajit Balakrishna
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021308 (2017)
https://doi.org/10.1116/1.4973299
Published: December 2016
View article titled, SiO<sub>2</sub> etching in an Ar/c-C<sub>4</sub>F<sub>8</sub>/O<sub>2</sub> dual frequency capacitively coupled plasma
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Journal Articles

Reactant utilization in CVD and ALD chambers

Edward J. McInerney
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B138 (2017)
https://doi.org/10.1116/1.4972773
Published: December 2016
View article titled, Reactant utilization in CVD and ALD chambers
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Journal Articles

Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures

Matthias C. Schwille, Timo Schössler, Jonas Barth, Martin Knaut, Florian Schön, Arnim Höchst, Martin Oettel, Johann W. Bartha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B118 (2017)
https://doi.org/10.1116/1.4971196
Published: December 2016
View article titled, Experimental and simulation approach for process optimization of atomic layer deposited thin films in high aspect ratio 3D structures
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Journal Articles

Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition

Matthias C. Schwille, Timo Schössler, Florian Schön, Martin Oettel, Johann W. Bartha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B119 (2017)
https://doi.org/10.1116/1.4971197
Published: December 2016
View article titled, Temperature dependence of the sticking coefficients of bis-diethyl aminosilane and trimethylaluminum in atomic layer deposition
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Journal Articles

Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures

Véronique Cremers, Filip Geenen, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B115 (2017)
https://doi.org/10.1116/1.4968201
Published: November 2016
View article titled, Monte Carlo simulations of atomic layer deposition on 3D large surface area structures: Required precursor exposure for pillar- versus hole-type structures
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Journal Articles

Water transport control on a patterned superhydrophobic surface via laser direct writing

Tianchi Chen, Hongtao Liu, Shuhua Teng, Wei Yan, Haifeng Yang, Jiande Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061103 (2016)
https://doi.org/10.1116/1.4966617
Published: October 2016
View article titled, Water transport control on a patterned superhydrophobic surface via laser direct writing
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Includes: Supplementary data
Journal Articles

Application of cyclic fluorocarbon/argon discharges to device patterning

Dominik Metzler, Kishore Uppireddi, Robert L. Bruce, Hiroyuki Miyazoe, Yu Zhu, William Price, Ed S. Sikorski, Chen Li, Sebastian U. Engelmann, Eric A. Joseph, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01B102 (2016)
https://doi.org/10.1116/1.4935460
Published: November 2015
View article titled, Application of cyclic fluorocarbon/argon discharges to device patterning
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Journal Articles

Iron–cobalt alloy thin films with high saturation magnetizations grown by conformal metalorganic CVD

Pengyi Zhang, Shaista Babar, John R. Abelson, Sarbeswar Sahoo, Meng Zhu, Michael Kautzky, Luke M. Davis, Gregory S. Girolami
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061521 (2015)
https://doi.org/10.1116/1.4935449
Published: November 2015
View article titled, Iron–cobalt alloy thin films with high saturation magnetizations grown by conformal metalorganic CVD
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Includes: Supplementary data
Journal Articles

Temporal evolution of ion energy distribution functions and ion charge states of Cr and Cr-Al pulsed arc plasmas

Koichi Tanaka, André Anders
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061301 (2015)
https://doi.org/10.1116/1.4926750
Published: July 2015
View article titled, Temporal evolution of ion energy distribution functions and ion charge states of Cr and Cr-Al pulsed arc plasmas
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