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Journal Articles

Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition

Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062404 (2023)
https://doi.org/10.1116/6.0002901
Published: October 2023
View article titled, Stabilization of the tetragonal phase in ZrO<sub>2</sub> thin films according to ozone concentration using atomic layer deposition
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Journal Articles

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

Partha Sarathi Padhi, R. S. Ajimsha, S. K. Rai, Sushmita Bhartiya, Aniruddha Bose, Bidyadhar Das, Manoj Kumar Tiwari, Pankaj Misra
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063201 (2023)
https://doi.org/10.1116/6.0002849
Published: September 2023
View article titled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times
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Includes: Supplementary data
Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Investigating wet chemical oxidation methods to form SiO2 interlayers for self-aligned Pt-HfO2-Si gate stacks

Amy C. Brummer, Siddharth Kurup, Daniel Aziz, Michael A. Filler, Eric M. Vogel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053201 (2023)
https://doi.org/10.1116/6.0002762
Published: July 2023
View article titled, Investigating wet chemical oxidation methods to form SiO<sub>2</sub> interlayers for self-aligned Pt-HfO<sub>2</sub>-Si gate stacks
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Journal Articles

Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition

Rong Chen, Zilian Qi, Yingfei Xiong, Yicheng Li, Xiaodong Zhang, Kun Cao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032702 (2023)
https://doi.org/10.1116/6.0002386
Published: March 2023
View article titled, Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition
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Includes: Supplementary data
Journal Articles

Effects of processing parameters on the morphologies of complex sesquioxide thin films

Sofia K. Pinzon, James A. Valdez, Vancho Kocevski, J. K. Baldwin, Blas P. Uberuaga, Cortney R. Kreller, Benjamin K. Derby
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033404 (2023)
https://doi.org/10.1116/6.0002398
Published: March 2023
View article titled, Effects of processing parameters on the morphologies of complex sesquioxide thin films
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Includes: Supplementary data
Journal Articles

Type-II band alignment for atomic layer deposited HfSiO4 on α-Ga2O3

Xinyi Xia, Jian-Sian Li, Zhuoqun Wen, Kamruzzaman Khan, Md Irfan Khan, Elaheh Ahmadi, Yuichi Oshima, David C. Hays, Fan Ren, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023205 (2023)
https://doi.org/10.1116/6.0002453
Published: March 2023
View article titled, Type-II band alignment for atomic layer deposited HfSiO<sub>4</sub> on α-Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

Dielectric spectroscopy and magnetoelectric coupling in dilute Fe substituted quasi-one-dimensional spin chain calcium cobalt manganite films

Nisha Thankachen, Bhargav Y. Pathak, Rutvi J. Pandya, U. V. Chhaya, A. K. Debnath, U. S. Joshi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013403 (2023)
https://doi.org/10.1116/5.0118975
Published: December 2022
View article titled, Dielectric spectroscopy and magnetoelectric coupling in dilute Fe substituted quasi-one-dimensional spin chain calcium cobalt manganite films
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Journal Articles

Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al2O3

Konner E. K. Holden, Shane M. Witsell, Paul C. Lemaire, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 040401 (2022)
https://doi.org/10.1116/6.0001865
Published: May 2022
View article titled, Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al<sub>2</sub>O<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Optical dielectric properties of HfO2-based films

Hongyi Dou, Nives Strkalj, Yizhi Zhang, Judith L. MacManus-Driscoll, Quanxi Jia, Haiyan Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 033412 (2022)
https://doi.org/10.1116/6.0001651
Published: April 2022
View article titled, Optical dielectric properties of HfO<sub>2</sub>-based films
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Journal Articles

Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device applications

Won-Bum Lee, Hyun-Jun Jeong, Hye-Mi Kim, Jin-Seong Park
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 032402 (2022)
https://doi.org/10.1116/6.0001643
Published: April 2022
View article titled, Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device applications
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Includes: Supplementary data
Journal Articles

Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition

Beibei Ge, Daisuke Ohori, Yi-Ho Chen, Takuya Ozaki, Kazuhiko Endo, Yiming Li, Jenn-Hwan Tarng, Seiji Samukawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022405 (2022)
https://doi.org/10.1116/6.0001607
Published: February 2022
View article titled, Room-temperature and high-quality HfO<sub>2</sub>/SiO<sub>2</sub> gate stacked film grown by neutral beam enhanced atomic layer deposition
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Journal Articles

Atomic layer deposition of GdF3 thin films

Elisa Atosuo, Kenichiro Mizohata, Miika Mattinen, Miia Mäntymäki, Marko Vehkamäki, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022402 (2022)
https://doi.org/10.1116/6.0001629
Published: January 2022
View article titled, Atomic layer deposition of GdF<sub>3</sub> thin films
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Journal Articles

Electronic structure and anion engineering for perovskite oxysulfide BaTi(O,S)3

Jingjing Liu, Sa Zhang, Ming Jiang, Haiyan Xiao, Shan Feng, Liang Qiao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012801 (2022)
https://doi.org/10.1116/6.0001471
Published: December 2021
View article titled, Electronic structure and anion engineering for perovskite oxysulfide BaTi(O,S)<sub>3</sub>
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Journal Articles

Epitaxial growth by atomic layer deposition and properties of high-k barium strontium titanate on Zintl-templated Ge (001) substrates

Thanh Tung Le, Chon Hei Lam, Agham B. Posadas, Alexander A. Demkov, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 012401 (2022)
https://doi.org/10.1116/6.0001445
Published: November 2021
View article titled, Epitaxial growth by atomic layer deposition and properties of high-<em>k</em> barium strontium titanate on Zintl-templated Ge (001) substrates
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Includes: Supplementary data
Journal Articles

Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching

Jonas C. Gertsch, Emanuele Sortino, Victor M. Bright, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 062602 (2021)
https://doi.org/10.1116/6.0001340
Published: November 2021
View article titled, Deposit and etchback approach for ultrathin Al<sub>2</sub>O<sub>3</sub> films with low pinhole density using atomic layer deposition and atomic layer etching
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Journal Articles

Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide

Hanno Kröncke, Florian Maudet, Sourish Banerjee, Jürgen Albert, Sven Wiesner, Veeresh Deshpande, Catherine Dubourdieu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 052408 (2021)
https://doi.org/10.1116/6.0001207
Published: September 2021
View article titled, Effect of O<sub>2</sub> plasma exposure time during atomic layer deposition of amorphous gallium oxide
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Journal Articles

Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition

Chanwon Jung, Seokhwi Song, Hyunwoo Park, Youngjoon Kim, Eun Jong Lee, Sung Gwon Lee, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042404 (2021)
https://doi.org/10.1116/6.0000887
Published: June 2021
View article titled, Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition
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Journal Articles

Surface plasmon resonance is possible in an optical fiber tapered to a point

Doryne Sunda-Meya, Hans D. Hallen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043206 (2021)
https://doi.org/10.1116/6.0000965
Published: June 2021
View article titled, Surface plasmon resonance is possible in an optical fiber tapered to a point
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Journal Articles

{100}-textured piezoelectric Pb(Zr,Ti)O3 films: Influence of Pb content in the PbxTiO3 seed layer on the electrical properties of chemical solution deposited Pb(Zr,Ti)O3

Sushma Kotru, Vaishali Batra, Jian Zhong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043405 (2021)
https://doi.org/10.1116/6.0000955
Published: May 2021
View article titled, {100}-textured piezoelectric Pb(Zr,Ti)O<sub>3</sub> films: Influence of Pb content in the Pb<sub>x</sub>TiO<sub>3</sub> seed layer on the electrical properties of chemical solution deposited Pb(Zr,Ti)O<sub>3</sub>
Open the PDF for {100}-textured piezoelectric Pb(Zr,Ti)O<sub>3</sub> films: Influence of Pb content in the Pb<sub>x</sub>TiO<sub>3</sub> seed layer on the electrical properties of chemical solution deposited Pb(Zr,Ti)O<sub>3</sub> in another window