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Journal Articles

Surface passivation approaches for silicon, germanium, and III–V semiconductors

Editor’s Pick
Roel J. Theeuwes, Wilhelmus M. M. Kessels, Bart Macco
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 060801 (2024)
https://doi.org/10.1116/6.0004030
Published: November 2024
View article titled, Surface passivation approaches for silicon, germanium, and III–V semiconductors
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Journal Articles

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride

Editor’s Pick
Thorsten Lill, Mingmei Wang, Dongjun Wu, Youn-Jin Oh, Tae Won Kim, Mark Wilcoxson, Harmeet Singh, Vahid Ghodsi, Steven M. George, Yuri Barsukov, Igor Kaganovich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063006 (2024)
https://doi.org/10.1116/6.0004019
Published: November 2024
View article titled, Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
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Journal Articles

Nanometer-thick TiO2 channel thin film transistors as radical monitors for plasma enhanced atomic layer deposition

Kohei Yamano, Hibiki Takeda, Ryo Miyazawa, Masanori Miura, Bashir Ahmmad, Fumihiko Hirose
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 062410 (2024)
https://doi.org/10.1116/6.0003981
Published: November 2024
View article titled, Nanometer-thick TiO<sub>2</sub> channel thin film transistors as radical monitors for plasma enhanced atomic layer deposition
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Journal Articles

Study on the fabrication of high-quality hafnium oxide thin films using spatial rotated atomic layer deposition and supercritical fluids treatment

Wen-Hsi Lee, Chien-Ching Feng, Guan-Fu Chen, Tai-Chen Kuo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 062409 (2024)
https://doi.org/10.1116/6.0004041
Published: November 2024
View article titled, Study on the fabrication of high-quality hafnium oxide thin films using spatial rotated atomic layer deposition and supercritical fluids treatment
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Journal Articles

Process stability of SiO2 atomic layer etching in C4F6/Ar chemistry

Editor’s Pick
Antoine Ronco, F. Boulard, B. Pelissier, N. Posseme
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 062601 (2024)
https://doi.org/10.1116/6.0003822
Published: September 2024
View article titled, Process stability of SiO<sub>2</sub> atomic layer etching in C<sub>4</sub>F<sub>6</sub>/Ar chemistry
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Journal Articles

MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region

Yu-Xuan Zeng, Xi-Rui Wang, Ruo-Yun Yang, Wei Huang, Lei Yang, Hong-Ping Ma, Qing-Chun Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053207 (2024)
https://doi.org/10.1116/5.0202640
Published: August 2024
View article titled, MOS structure with as-deposited ALD Al<sub>2</sub>O<sub>3</sub>/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region
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Journal Articles

Inherent area selective deposition of silicon dioxide in multilayer 3D SiOx–SiNx stacks

Editor’s Pick
Kartik Sondhi, Stephen Ross, Joyeeta Nag, X. C. Guo, Dexin Zhao, Adarsh Rajashekhar, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 050403 (2024)
https://doi.org/10.1116/6.0003790
Published: August 2024
View article titled, Inherent area selective deposition of silicon dioxide in multilayer 3D SiO<em><sub>x</sub></em>–SiN<em><sub>x</sub></em> stacks
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Journal Articles

Precise and practical 3D topography simulation of high aspect ratio contact hole etch by using model optimization algorithm

Tetsuya Nishizuka, Ryo Igosawa, Takahiro Yokoyama, Kaoru Sako, Hironori Moki, Masanobu Honda
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043003 (2024)
https://doi.org/10.1116/6.0003515
Published: June 2024
View article titled, Precise and practical 3D topography simulation of high aspect ratio contact hole etch by using model optimization algorithm
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Journal Articles

Atomic layer etching of SiCO films with surface modification by O2 and CF4/NH3/Ar plasmas and desorption by IR annealing

Editor’s Pick
Nicholas McDowell, Ritchie Scott-McCabe, Phuc N. Phan, Hiroyuki Kobayashi, Nobuya Miyoshi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042602 (2024)
https://doi.org/10.1116/6.0003596
Published: June 2024
View article titled, Atomic layer etching of SiCO films with surface modification by O<sub>2</sub> and CF<sub>4</sub>/NH<sub>3</sub>/Ar plasmas and desorption by IR annealing
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Journal Articles

XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice

Featured
B. Vincent Crist
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032803 (2024)
https://doi.org/10.1116/6.0003439
Published: April 2024
View article titled, XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice
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Journal Articles

Experimental study of Ni/TiO2/β-Ga2O3 metal–dielectric–semiconductor diodes using p-NiO junction termination extension

Editor’s Pick
Jeremiah Williams, Weisong Wang, Nolan S. Hendricks, Aaron Adams, Joshua Piel, Daniel M. Dryden, Kyle Liddy, Nicholas Sepelak, Bradley Morell, Ahmad Islam, Andrew Green
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033405 (2024)
https://doi.org/10.1116/6.0003467
Published: March 2024
View article titled, Experimental study of Ni/TiO<sub>2</sub>/β-Ga<sub>2</sub>O<sub>3</sub> metal–dielectric–semiconductor diodes using p-NiO junction termination extension
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Journal Articles

Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology

Lewen Qian, Xin Sun, Tao Liu, Ziqiang Huang, Xinlong Guo, Maolin Pan, Dawei Wang, Saisheng Xu, Min Xu, Chen Wang, Chunlei Wu, David Wei Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023423 (2024)
https://doi.org/10.1116/6.0003357
Published: February 2024
View article titled, Fabrication of the low-k films with tunable k value as spacers in advanced CMOS technology
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Journal Articles

2-mercaptobenzimidazole inhibits corrosion and prolongs the lifetime of an epoxy resin coating on a copper-62 alloy surface in a simulated marine environment at 40 °C

Jingkang Chen, Xu Li, Xujie Xiao, Chengfei Zhu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023110 (2024)
https://doi.org/10.1116/6.0003203
Published: February 2024
View article titled, 2-mercaptobenzimidazole inhibits corrosion and prolongs the lifetime of an epoxy resin coating on a copper-62 alloy surface in a simulated marine environment at 40 °C
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Journal Articles

Bottom angle control mechanism and optimization of slanted gratings for optical applications

Jiuru Gao, Chanjuan Liu, Zhiwei He, Shuo Dong, Kaidong Xu, Shiwei Zhuang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023403 (2024)
https://doi.org/10.1116/6.0003221
Published: January 2024
View article titled, Bottom angle control mechanism and optimization of slanted gratings for optical applications
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Journal Articles

Annealing modulated microstructural and electrical properties of plasma-enhanced atomic layer deposition-derived HfO2/SiO2 nanolaminates on AlGaN/GaN

Editor’s Pick
Boxun Wang, Yao Li, Minran Chen, Duo Cao, Feng Liu, Zhongjian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 012401 (2024)
https://doi.org/10.1116/6.0003000
Published: December 2023
View article titled, Annealing modulated microstructural and electrical properties of plasma-enhanced atomic layer deposition-derived HfO<sub>2</sub>/SiO<sub>2</sub> nanolaminates on AlGaN/GaN
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Journal Articles

Significance of plasma-surface interactions in the etch behavior of low-k materials

Adam Pranda, Steven Grzeskowiak, Yu- Hao Tsai, Yusuke Yoshida, Eric Liu, Yun Han, Peter Biolsi, Ken Kobayashi, Nobuyuki Ikezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063009 (2023)
https://doi.org/10.1116/6.0003014
Published: November 2023
View article titled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Journal Articles

Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition

Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062404 (2023)
https://doi.org/10.1116/6.0002901
Published: October 2023
View article titled, Stabilization of the tetragonal phase in ZrO<sub>2</sub> thin films according to ozone concentration using atomic layer deposition
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Journal Articles

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

Partha Sarathi Padhi, R. S. Ajimsha, S. K. Rai, Sushmita Bhartiya, Aniruddha Bose, Bidyadhar Das, Manoj Kumar Tiwari, Pankaj Misra
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063201 (2023)
https://doi.org/10.1116/6.0002849
Published: September 2023
View article titled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times
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Includes: Supplementary data
Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Challenges in porosity characterization of thin films: Cross-evaluation of different techniques

Mikhail R. Baklanov, Konstantin P. Mogilnikov, Alexey S. Vishnevskiy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050802 (2023)
https://doi.org/10.1116/6.0002793
Published: July 2023
View article titled, Challenges in porosity characterization of thin films: Cross-evaluation of different techniques
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