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Journal Articles

Significance of plasma-surface interactions in the etch behavior of low-k materials

Adam Pranda, Steven Grzeskowiak, Yu- Hao Tsai, Yusuke Yoshida, Eric Liu, Yun Han, Peter Biolsi, Ken Kobayashi, Nobuyuki Ikezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063009 (2023)
https://doi.org/10.1116/6.0003014
Published: November 2023
View article titled, Significance of plasma-surface interactions in the etch behavior of low-k materials
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Journal Articles

Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition

Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062404 (2023)
https://doi.org/10.1116/6.0002901
Published: October 2023
View article titled, Stabilization of the tetragonal phase in ZrO<sub>2</sub> thin films according to ozone concentration using atomic layer deposition
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Journal Articles

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

Partha Sarathi Padhi, R. S. Ajimsha, S. K. Rai, Sushmita Bhartiya, Aniruddha Bose, Bidyadhar Das, Manoj Kumar Tiwari, Pankaj Misra
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063201 (2023)
https://doi.org/10.1116/6.0002849
Published: September 2023
View article titled, Correlation of interfacial and dielectric characteristics in atomic layer deposited Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> nanolaminates grown with different precursor purge times
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Includes: Supplementary data
Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Challenges in porosity characterization of thin films: Cross-evaluation of different techniques

Mikhail R. Baklanov, Konstantin P. Mogilnikov, Alexey S. Vishnevskiy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050802 (2023)
https://doi.org/10.1116/6.0002793
Published: July 2023
View article titled, Challenges in porosity characterization of thin films: Cross-evaluation of different techniques
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Journal Articles

Investigating wet chemical oxidation methods to form SiO2 interlayers for self-aligned Pt-HfO2-Si gate stacks

Amy C. Brummer, Siddharth Kurup, Daniel Aziz, Michael A. Filler, Eric M. Vogel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053201 (2023)
https://doi.org/10.1116/6.0002762
Published: July 2023
View article titled, Investigating wet chemical oxidation methods to form SiO<sub>2</sub> interlayers for self-aligned Pt-HfO<sub>2</sub>-Si gate stacks
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Journal Articles

Electron-enhanced SiO2 atomic layer deposition at 35 °C using disilane and ozone or water as reactants

Jonas C. Gertsch, Zachary C. Sobell, Andrew S. Cavanagh, Harsono Simka, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042404 (2023)
https://doi.org/10.1116/6.0002726
Published: June 2023
View article titled, Electron-enhanced SiO<sub>2</sub> atomic layer deposition at 35 °C using disilane and ozone or water as reactants
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Journal Articles

The ST component in the Si 2p photoemission spectrum from H-terminated and oxidized Si (001) surfaces

A. Herrera-Gomez, M. O. Vazquez-Lepe, P. G. Mani-Gonzalez, P. Pianetta, F. S. Aguirre-Tostado, O. Ceballos-Sanchez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043206 (2023)
https://doi.org/10.1116/6.0002690
Published: May 2023
View article titled, The <em>S<sub>T</sub></em> component in the Si 2<em>p</em> photoemission spectrum from H-terminated and oxidized Si (001) surfaces
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Journal Articles

Neutral transport during etching of high aspect ratio features

Theodoros Panagopoulos, Thorsten Lill
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033006 (2023)
https://doi.org/10.1116/6.0002468
Published: April 2023
View article titled, Neutral transport during etching of high aspect ratio features
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Journal Articles

Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition

Rong Chen, Zilian Qi, Yingfei Xiong, Yicheng Li, Xiaodong Zhang, Kun Cao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032702 (2023)
https://doi.org/10.1116/6.0002386
Published: March 2023
View article titled, Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition
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Includes: Supplementary data
Journal Articles

Effects of processing parameters on the morphologies of complex sesquioxide thin films

Sofia K. Pinzon, James A. Valdez, Vancho Kocevski, J. K. Baldwin, Blas P. Uberuaga, Cortney R. Kreller, Benjamin K. Derby
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033404 (2023)
https://doi.org/10.1116/6.0002398
Published: March 2023
View article titled, Effects of processing parameters on the morphologies of complex sesquioxide thin films
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Includes: Supplementary data
Journal Articles

Type-II band alignment for atomic layer deposited HfSiO4 on α-Ga2O3

Xinyi Xia, Jian-Sian Li, Zhuoqun Wen, Kamruzzaman Khan, Md Irfan Khan, Elaheh Ahmadi, Yuichi Oshima, David C. Hays, Fan Ren, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023205 (2023)
https://doi.org/10.1116/6.0002453
Published: March 2023
View article titled, Type-II band alignment for atomic layer deposited HfSiO<sub>4</sub> on α-Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation

Artem Shelemin, Oleg Zabeida, Jincheng Qian, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023409 (2023)
https://doi.org/10.1116/6.0002371
Published: February 2023
View article titled, Hybrid octa-silane polyhedral oligomeric silsesquioxane (OS-POSS) optical films prepared by ion beam assisted evaporation
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Includes: Supplementary data
Journal Articles

Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning

Ying Rui, Meng-Hsien Chen, Sumeet Pandey, Lan Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022601 (2023)
https://doi.org/10.1116/6.0002139
Published: February 2023
View article titled, Applications and mechanisms of anisotropic two-step Si<sub>3</sub>N<sub>4</sub> etching with hydrogen plasma conditioning
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Journal Articles

Dielectric spectroscopy and magnetoelectric coupling in dilute Fe substituted quasi-one-dimensional spin chain calcium cobalt manganite films

Nisha Thankachen, Bhargav Y. Pathak, Rutvi J. Pandya, U. V. Chhaya, A. K. Debnath, U. S. Joshi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013403 (2023)
https://doi.org/10.1116/5.0118975
Published: December 2022
View article titled, Dielectric spectroscopy and magnetoelectric coupling in dilute Fe substituted quasi-one-dimensional spin chain calcium cobalt manganite films
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Journal Articles

Area selective deposition of ruthenium on 3D structures

Kartik Sondhi, Rahul Sharangpani, Ramy Nashed Bassely Said, Joyeeta Nag, Michael Gribelyuk, Senaka Kanakamedala, Raghuveer S. Makala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062412 (2022)
https://doi.org/10.1116/6.0002148
Published: November 2022
View article titled, Area selective deposition of ruthenium on 3D structures
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Includes: Supplementary data
Journal Articles

Growth of (SmxGa1−x)2O3 by molecular beam epitaxy

Anthony D. Stewart, Brent P. Gila, Cammy R. Abernathy, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062701 (2022)
https://doi.org/10.1116/6.0002135
Published: October 2022
View article titled, Growth of (Sm<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> by molecular beam epitaxy
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Includes: Supplementary data
Journal Articles

Statistical analysis of pulsed spark discharges in water: Effects of gap distance, electrode material, and voltage polarity on discharge characteristics

Audren Dorval, Korentin Geraud, Flavien Valensi, Ahmad Hamdan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 043006 (2022)
https://doi.org/10.1116/6.0001923
Published: June 2022
View article titled, Statistical analysis of pulsed spark discharges in water: Effects of gap distance, electrode material, and voltage polarity on discharge characteristics
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Includes: Supplementary data
Journal Articles

Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al2O3

Konner E. K. Holden, Shane M. Witsell, Paul C. Lemaire, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 040401 (2022)
https://doi.org/10.1116/6.0001865
Published: May 2022
View article titled, Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al<sub>2</sub>O<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Optical dielectric properties of HfO2-based films

Hongyi Dou, Nives Strkalj, Yizhi Zhang, Judith L. MacManus-Driscoll, Quanxi Jia, Haiyan Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 033412 (2022)
https://doi.org/10.1116/6.0001651
Published: April 2022
View article titled, Optical dielectric properties of HfO<sub>2</sub>-based films
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