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Journal Articles

Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi2-based thin films

Editor’s Pick
Sophie Richter, Ahmed Bahr, Philip Kutrowatz, Tomasz Wojcik, Szilárd Kolozsvári, Peter Polcik, Carmen Jerg, Jürgen Ramm, Helmut Riedl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053407 (2024)
https://doi.org/10.1116/6.0003833
Published: August 2024
View article titled, Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi<sub>2</sub>-based thin films
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Journal Articles

Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source

Editor’s Pick
Naga Prathibha Jasti, Shay Tirosh, Ansuman Halder, Eti Teblum, David Cahen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043406 (2024)
https://doi.org/10.1116/6.0003607
Published: May 2024
View article titled, <em>Continuous wave</em> laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source
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Includes: Supplementary data
Journal Articles

Atomic structure of a NbTiN/AlN/NbTiN Josephson junction grown by molecular-beam epitaxy

Edwin Supple, Christopher J. K. Richardson, Brian P. Gorman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 042701 (2024)
https://doi.org/10.1116/6.0003518
Published: May 2024
View article titled, Atomic structure of a NbTiN/AlN/NbTiN Josephson junction grown by molecular-beam epitaxy
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Includes: Supplementary data
Journal Articles

Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor

So Young Kim, Chunghee Jo, Hyerin Shin, Dongmin Yoon, Donghyuk Shin, Min-ho Cheon, Kyu-beom Lee, Dong-won Seo, Jae-wook Choi, Heungsoo Park, Dae-Hong Ko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032405 (2024)
https://doi.org/10.1116/6.0003361
Published: March 2024
View article titled, Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO<sub>2</sub>Cl<sub>2</sub> as precursor
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Journal Articles

Effect of template on the photoresponsivity of BaSi2 films grown on Ge(111) substrates by molecular beam epitaxy

Sho Aonuki, Kaori Takayanagi, Ai Iwai, Kaoru Toko, Takashi Suemasu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032702 (2024)
https://doi.org/10.1116/6.0003503
Published: March 2024
View article titled, Effect of template on the photoresponsivity of BaSi<sub>2</sub> films grown on Ge(111) substrates by molecular beam epitaxy
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Journal Articles

Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform

Editor’s Pick
Partha Mukhopadhyay, Ivan Fletcher, Zuriel Caribe Couvertier, Brent Schwab, John Gumpher, Winston V. Schoenfeld, Jon Kretzschmar, Anton deVilliers, Jim Fulford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032401 (2024)
https://doi.org/10.1116/6.0003405
Published: March 2024
View article titled, Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform
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Journal Articles

High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD

D. Gogova, D. Q. Tran, V. Stanishev, V. Jokubavicius, L. Vines, M. Schubert, R. Yakimova, P. P. Paskov, V. Darakchieva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022708 (2024)
https://doi.org/10.1116/6.0003424
Published: February 2024
View article titled, High crystalline quality homoepitaxial Si-doped <em>β</em>-Ga<sub>2</sub>O<sub>3</sub>(010) layers with reduced structural anisotropy grown by hot-wall MOCVD
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Journal Articles

Infrared photoelectric detection of polycrystalline Bi2Te3 thin films prepared by pulsed laser deposition

Qijun Kao, Yi Xiao, Yongfeng Jia, Jin Wang, Chuanbin Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023421 (2024)
https://doi.org/10.1116/6.0003343
Published: February 2024
View article titled, Infrared photoelectric detection of polycrystalline Bi<sub>2</sub>Te<sub>3</sub> thin films prepared by pulsed laser deposition
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Journal Articles

Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films

D. Cristea, A. I. Scărlătescu, G. Bulai, D. Martínez-Martínez, C. I. da Silva Oliveira, G. Yan, L. Cunha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023411 (2024)
https://doi.org/10.1116/6.0003267
Published: January 2024
View article titled, Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films
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Journal Articles

Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga2O3

Jacqueline Cooke, Minhan Lou, Michael A. Scarpulla, Berardi Sensale-Rodriguez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022801 (2024)
https://doi.org/10.1116/6.0003216
Published: January 2024
View article titled, Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga<sub>2</sub>O<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates

Editor’s Pick
Rachel A. Nye, Nicholas M. Carroll, Sarah E. Morgan, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013205 (2024)
https://doi.org/10.1116/6.0003183
Published: January 2024
View article titled, Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates
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Includes: Supplementary data
Journal Articles

Effects of the growth parameters on the surface quality of InN films

Peng Su, Junhong Pei, Jinping Luo, Guangyu Zheng, Yukang Sun, Lijun Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013410 (2024)
https://doi.org/10.1116/6.0003205
Published: January 2024
View article titled, Effects of the growth parameters on the surface quality of InN films
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Journal Articles

Electrochromic properties of NiO films prepared by atomic layer deposition

Xi Su, Zexin Tu, Liwei Ji, Hao Wu, Hongxing Xu, Chang Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062407 (2023)
https://doi.org/10.1116/6.0003040
Published: October 2023
View article titled, Electrochromic properties of NiO films prepared by atomic layer deposition
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Journal Articles

Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties

Hwan-Seok Seo, Taeyoon Lee, Hyungjun Kim, Ivan Petrov, J. E. Greene
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063406 (2023)
https://doi.org/10.1116/6.0003072
Published: October 2023
View article titled, Phase composition of polycrystalline HfN<sub>x</sub> (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties
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Journal Articles

Stabilization of the tetragonal phase in ZrO2 thin films according to ozone concentration using atomic layer deposition

Seokhwi Song, Eungju Kim, Kyunghoo Kim, Jangho Bae, Jinho Lee, Chang Hwa Jung, Hanjin Lim, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062404 (2023)
https://doi.org/10.1116/6.0002901
Published: October 2023
View article titled, Stabilization of the tetragonal phase in ZrO<sub>2</sub> thin films according to ozone concentration using atomic layer deposition
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Journal Articles

Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces

Editor’s Pick
Sanjie Liu, Yangfeng Li, Qing Liu, Jiayou Tao, Xinhe Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052405 (2023)
https://doi.org/10.1116/6.0002639
Published: August 2023
View article titled, Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces
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Journal Articles

Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering

Editor’s Pick
Smita G. Rao, Pascal Manuel Illgner, Robert Boyd, Gyula Nagy, Philippe Djemia, Daniel Primetzhofer, Ivan Petrov, Arnaud le Febvrier, Per Eklund
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053415 (2023)
https://doi.org/10.1116/6.0002947
Published: August 2023
View article titled, Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering
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Includes: Supplementary data
Journal Articles

Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study

Jeong Won Kim, Ansoon Kim, Hui Ung Hwang, Jun Hyung Kim, Seungwook Choi, Norbert Koch, Dongguen Shin, Zhijuan Zhao, Fen Liu, Minki Choi, Kyu Myung Lee, Yongsup Park
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053211 (2023)
https://doi.org/10.1116/6.0002852
Published: August 2023
View article titled, Work function measurement by ultraviolet photoelectron spectroscopy: Versailles project on advanced materials and standards interlaboratory study
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Journal Articles

Impacts of specific element-treated three-dimensional GaN layer on characteristics of nonpolar a-plane GaN film

Yifeng Xu, Xiong Zhang, Ruiting Fang, Xuguang Luo, Lin Chen, Shenyu Xu, Zhiyi Lou, Jia Cui, Guohua Hu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052706 (2023)
https://doi.org/10.1116/6.0002834
Published: August 2023
View article titled, Impacts of specific element-treated three-dimensional GaN layer on characteristics of nonpolar <em>a</em>-plane GaN film
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Journal Articles

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon

Editor’s Pick
Heli Seppänen, Igor Prozheev, Christoffer Kauppinen, Sami Suihkonen, Kenichiro Mizohata, Harri Lipsanen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052401 (2023)
https://doi.org/10.1116/6.0002705
Published: July 2023
View article titled, Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon
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