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Journal Articles

Analysis of pulsed direct current reactive magnetron sputtering on a silicon target

E. Teran-Hinojosa, R. Sanginés, N. Abundiz-Cisneros, J. Aguila-Muñoz, R. Machorro-Mejia
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063401 (2024)
https://doi.org/10.1116/5.0222096
Published: September 2024
View article titled, Analysis of pulsed direct current reactive magnetron sputtering on a silicon target
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Journal Articles

Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode

Nina Baule, Lars Haubold, Thomas Schuelke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053103 (2024)
https://doi.org/10.1116/6.0003786
Published: July 2024
View article titled, Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode
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Journal Articles

Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films

Weilong Gao, Ruizhi Zhang, Jin Wang, Zihao Huang, Zhiguo Li, Yajun Fu, Guoqiang Luo, Rong Tu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063414 (2023)
https://doi.org/10.1116/6.0003066
Published: November 2023
View article titled, Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films
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Journal Articles

Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol

Yufan Li, Yong Zheng, Yuze Du, Xi Zhang, Wangwang Wang, Jin Lv
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063411 (2023)
https://doi.org/10.1116/6.0003082
Published: November 2023
View article titled, Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol
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Journal Articles

Electrochromic properties of NiO films prepared by atomic layer deposition

Xi Su, Zexin Tu, Liwei Ji, Hao Wu, Hongxing Xu, Chang Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062407 (2023)
https://doi.org/10.1116/6.0003040
Published: October 2023
View article titled, Electrochromic properties of NiO films prepared by atomic layer deposition
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Journal Articles

Oxygen plasma treatment of TeO2—B2O3 (boro-tellurite) thin films

Uğur Demirkol, Çağrı Durmuş, Tamer Akan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063006 (2023)
https://doi.org/10.1116/6.0002879
Published: October 2023
View article titled, Oxygen plasma treatment of TeO<sub>2</sub>—B<sub>2</sub>O<sub>3</sub> (boro-tellurite) thin films
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Journal Articles

Reversible alteration of 3D printed polymer properties via infiltration of alumina by atomic layer deposition

Atilla C. Varga, Seán T. Barry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 022403 (2023)
https://doi.org/10.1116/6.0002397
Published: February 2023
View article titled, Reversible alteration of 3D printed polymer properties via infiltration of alumina by atomic layer deposition
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Includes: Supplementary data
Journal Articles

Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films

Eiji Kusano
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053405 (2022)
https://doi.org/10.1116/6.0001989
Published: September 2022
View article titled, Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films
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Journal Articles

Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene

Atilla C. Varga, Seán T. Barry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 022407 (2022)
https://doi.org/10.1116/6.0001595
Published: February 2022
View article titled, Modified 3D-printed architectures: Effects of coating by alumina on acrylonitrile butadiene styrene
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Includes: Supplementary data
Journal Articles

Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment

Minglei Yang, Guangyu He, Jiao Chen, Zhaolu Zhang, Guanjun Yang, Zezhou Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013408 (2022)
https://doi.org/10.1116/6.0001346
Published: December 2021
View article titled, Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment
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Journal Articles

Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings

Wjatscheslaw Sakiew, Philippe Schwerdtner, Marco Jupé, Andreas Pflug, Detlev Ristau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063402 (2021)
https://doi.org/10.1116/6.0001224
Published: September 2021
View article titled, Impact of ion species on ion beam sputtered Ta<sub>2</sub>O<sub>5</sub> layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings
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Journal Articles

Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching

Clint D. Frye, Scott B. Donald, Catherine Reinhardt, Lars F. Voss, Sara E. Harrison
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053002 (2021)
https://doi.org/10.1116/6.0001123
Published: August 2021
View article titled, Impact of carrier wafer on etch rate, selectivity, morphology, and passivation during GaN plasma etching
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Journal Articles

Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature

T. Motomura, T. Tabaru, Y. Fujio, T. Okuyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013001 (2021)
https://doi.org/10.1116/6.0000677
Published: December 2020
View article titled, Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature
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Journal Articles

Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition

Gilbert B. Rayner, Jr., Noel O’Toole, Jeffrey Shallenberger, Blaine Johs
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 062408 (2020)
https://doi.org/10.1116/6.0000454
Published: November 2020
View article titled, Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
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Journal Articles

Ultrasonic atomization of titanium isopropoxide at room temperature for TiO2 atomic layer deposition

Editor’s Pick
Moon-Hyung Jang, Yu Lei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 062405 (2020)
https://doi.org/10.1116/6.0000464
Published: October 2020
View article titled, Ultrasonic atomization of titanium isopropoxide at room temperature for TiO<sub>2</sub> atomic layer deposition
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Includes: Supplementary data
Journal Articles

Simultaneous realization of infrared-light switching and high visible-light transmittance in extremely thin VO2 films grown on ZnO-nanorods buffered glasses

Tatsuro Fukuzumi, Fei Chen, Kunio Okimura, Iwao Yamaguchi, Tetsuo Tsuchiya
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033407 (2020)
https://doi.org/10.1116/1.5142212
Published: April 2020
View article titled, Simultaneous realization of infrared-light switching and high visible-light transmittance in extremely thin VO<sub>2</sub> films grown on ZnO-nanorods buffered glasses
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Journal Articles

Homologous substrate-temperature dependence of structure and properties of TiO2, ZrO2, and HfO2 thin films deposited by reactive sputtering

Eiji Kusano
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051508 (2019)
https://doi.org/10.1116/1.5100307
Published: August 2019
View article titled, Homologous substrate-temperature dependence of structure and properties of TiO<sub>2</sub>, ZrO<sub>2</sub>, and HfO<sub>2</sub> thin films deposited by reactive sputtering
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Journal Articles

Homeotropic alignment behavior of liquid crystal molecules on self-assembled monolayers with fluorinated alkyl chain

Seok-Gon Hwang, Hong-Gyu Park, Mu-Hun Park, Sang-Geon Park
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 041401 (2018)
https://doi.org/10.1116/1.5028327
Published: June 2018
View article titled, Homeotropic alignment behavior of liquid crystal molecules on self-assembled monolayers with fluorinated alkyl chain
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Journal Articles

Modeling physical vapor deposition of energetic materials

Koroush Shirvan, Eric C. Forrest
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 03E103 (2018)
https://doi.org/10.1116/1.5022805
Published: March 2018
View article titled, Modeling physical vapor deposition of energetic materials
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Journal Articles

Influence of incident angle of sputtered atom on the size and shape of granule in granular films using CoFeAlSi alloy

Yuji Fujiwara, Ryosuke Ishii, Toshifumi Shimizu, Mutsuko Jimbo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 02C104 (2018)
https://doi.org/10.1116/1.5002608
Published: January 2018
View article titled, Influence of incident angle of sputtered atom on the size and shape of granule in granular films using CoFeAlSi alloy
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