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Journal Articles

Selective mask deposition using SiCl4 plasma for highly selective etching process

Miyako Matsui, Makoto Miura, Kenichi Kuwahara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063002 (2023)
https://doi.org/10.1116/6.0002773
Published: September 2023
View article titled, Selective mask deposition using SiCl<sub>4</sub> plasma for highly selective etching process
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Journal Articles

Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes

Daisuke Ogawa, Keiji Nakamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063001 (2023)
https://doi.org/10.1116/6.0002835
Published: September 2023
View article titled, Plasma functionalization mechanism to modify isocyanate groups on multiwalled carbon nanotubes
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Journal Articles

Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying

Farzin Ghadami, Mohammad Amin Davoudabadi, Soheil Ghadami
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063102 (2023)
https://doi.org/10.1116/6.0002951
Published: September 2023
View article titled, Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying
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Journal Articles

Quasiatomic layer etching of silicon nitride enhanced by low temperature

Daniel N. Shanks, Rania K. Ahmed, John D. Femi-Oyetoro, Matthew R. Dickie, Andrew D. Beyer, Frank Greer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052601 (2023)
https://doi.org/10.1116/6.0002846
Published: August 2023
View article titled, Quasiatomic layer etching of silicon nitride enhanced by low temperature
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Journal Articles

Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography

Bo Cao, Rui Li, Zhiyuan Cao, Haomin Li, Liqiong Sun, Yingsan Geng, Jianhua Wang, Zhenxing Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053006 (2023)
https://doi.org/10.1116/6.0002876
Published: August 2023
View article titled, Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography
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Journal Articles

Tailoring of Mg and MgLi thin-film corrosion rates with dielectric barrier discharge plasma treatment

Lisa Hanke, Torge Hartig, Felix Weisheit, Tim Tjardts, Tim Pogoda, Franz Faupel, Eckhard Quandt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053109 (2023)
https://doi.org/10.1116/6.0002783
Published: August 2023
View article titled, Tailoring of Mg and MgLi thin-film corrosion rates with dielectric barrier discharge plasma treatment
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Includes: Supplementary data
Journal Articles

Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching

Benjamin Fontaine, Christelle Boixaderas, Jérôme Dubois, Pascal Gouraud, Arnaud Rival, Nicolas Posseme
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053005 (2023)
https://doi.org/10.1116/6.0002751
Published: August 2023
View article titled, Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching
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Journal Articles

Process optimization for shallow trench isolation etch using computational models

Shuo Huang, Prem Panneerchelvam, Chad M. Huard, Shyam Sridhar, Peter L. G. Ventzek, Mark D. Smith
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053004 (2023)
https://doi.org/10.1116/6.0002838
Published: August 2023
View article titled, Process optimization for shallow trench isolation etch using computational models
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Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053002 (2023)
https://doi.org/10.1116/6.0002585
Published: July 2023
View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
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Journal Articles

Evaluating hydrophobic recovery of N2 and H2O(g) plasma modified silk fibroin films aged at ambient and elevated temperatures

Ashley N. Keobounnam, Chase Lenert-Mondou, Alexzandria Kubik, Morgan J. Hawker
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050401 (2023)
https://doi.org/10.1116/6.0002803
Published: July 2023
View article titled, Evaluating hydrophobic recovery of N<sub>2</sub> and H<sub>2</sub>O(g) plasma modified silk fibroin films aged at ambient and elevated temperatures
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Includes: Supplementary data
Journal Articles

Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31

Yinghe Ma, Jinhui Mei, Junxin Ouyang, Peng Wu, Sai Wang, Jianguo Yang, Yanming He, Wenjian Zheng, Huaxin Li, Chuanyang Lu, Sendong Ren, Jianping Xu, Paul K. Chu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053101 (2023)
https://doi.org/10.1116/6.0002687
Published: July 2023
View article titled, Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31
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Journal Articles

Exploring the self-limiting atomic layer etching of AlGaN: A study of O2-BCl3 and chlorinate-argon systems

Lulu Guan, Xingyu Li, Chunxiang Guo, Xinying Shi, Kaidong Xu, Shiwei Zhuang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042603 (2023)
https://doi.org/10.1116/6.0002647
Published: June 2023
View article titled, Exploring the self-limiting atomic layer etching of AlGaN: A study of O<sub>2</sub>-BCl<sub>3</sub> and chlorinate-argon systems
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Includes: Supplementary data
Journal Articles

Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma

Vikas Rathore, Sudhir Kumar Nema
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043001 (2023)
https://doi.org/10.1116/6.0002460
Published: May 2023
View article titled, Selective generation of reactive oxygen species in plasma-activated water using CO<sub>2</sub> plasma
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Journal Articles

Tribological behavior of WC/WCN/CNx coatings deposited by high power impulse magnetron sputtering

L. Flores-Cova, E. Broitman, O. Jimenez, M. Flores-Martínez
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033105 (2023)
https://doi.org/10.1116/6.0002421
Published: April 2023
View article titled, Tribological behavior of WC/WC