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Journal Articles

Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings

Jun-Hyeok Jeon, Sun Gil Kim, Hyun-Mi Kim, Hye-Young Kim, Chang-sub Park, Yong Soo Lee, Seul-Gi Kim, Hyeongkeun Kim, Jae-Boong Choi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032408 (2025)
https://doi.org/10.1116/6.0004256
Published: April 2025
View articletitled, Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings
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Journal Articles

In situ control of GaN growth rate in nitrogen-limited regime

M. Canciani, S. Vichi, O. Koplak, S. Bietti, S. Sanguinetti
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032704 (2025)
https://doi.org/10.1116/6.0004437
Published: April 2025
View articletitled, In situ control of GaN growth rate in nitrogen-limited regime
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Journal Articles

Enhanced tribocorrosive properties of precipitation-hardened martensitic stainless steel by arc plasma nitriding

Lin Zhang, Jin Gu, Kaiqiang Qi, Jie Jin, Xingguang Liu, Jun Zheng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033104 (2025)
https://doi.org/10.1116/6.0004453
Published: April 2025
View articletitled, Enhanced tribocorrosive properties of precipitation-hardened martensitic stainless steel by arc plasma nitriding
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Journal Articles

Errata: “Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching” [J. Vac. Sci. Technol. A 43, 023007 (2025)]

Shikhar Arvind, Roberto Fallica, Philippe Bezard, John Petersen, Stefan De Gendt, Esben W. Larsen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 037001 (2025)
https://doi.org/10.1116/6.0004555
Published: March 2025
View articletitled, Errata: “Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching” [J. Vac. Sci. Technol. A 43, 023007 (2025)]
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Journal Articles

Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching

Leyi Zhang, Zhihong Gao, Yongzhi Fang, Dongyu Cen, Maoxiang Liu, Yan Zhang, Chunxia Ma, Enhao Zhao, Wencan Zhu, Wenli Wu, Xudong Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033003 (2025)
https://doi.org/10.1116/6.0004402
Published: March 2025
View articletitled, Research on the difference in etching rates of SiO2 at the top and bottom of high-aspect-ratio trench in C4F8/Ar/O2 plasma etching
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Journal Articles

Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching

Evan Litch, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033001 (2025)
https://doi.org/10.1116/6.0004250
Published: March 2025
View articletitled, Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching
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Journal Articles

Plasma-free hydrogenation of oxygen-terminated polycrystalline diamond as determined by circular transmission line measurements (CTLM)

Dylan M. Evans, Clint D. Frye
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033201 (2025)
https://doi.org/10.1116/6.0004337
Published: March 2025
View articletitled, Plasma-free hydrogenation of oxygen-terminated polycrystalline diamond as determined by circular transmission line measurements (CTLM)
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Journal Articles

Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching

Shikhar Arvind, Roberto Fallica, Philippe Bezard, John Petersen, Stefan De Gendt, Esben W. Larsen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023007 (2025)
https://doi.org/10.1116/6.0004265
Published: February 2025
View articletitled, Impact of vacuum ultraviolet photons on ultrathin negative tone resists for extreme ultraviolet lithography during plasma etching
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Journal Articles

Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor

Editor’s Pick
Ruben Blomme, Aditya Chalishazar, Lowie Henderick, Frans Munnik, Johan Meersschaut, Matthias M. Minjauw, Christophe Detavernier, Jolien Dendooven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022409 (2025)
https://doi.org/10.1116/6.0004267
Published: February 2025
View articletitled, Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor
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Journal Articles

Area selective PECVD on metal oxide resist

Rosanna A. Robert, Katie Lutker-Lee, Christophe Vallée
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023407 (2025)
https://doi.org/10.1116/6.0004072
Published: February 2025
View articletitled, Area selective PECVD on metal oxide resist
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Journal Articles

Enhanced properties of microarc oxide coating by secondary treatment of laser surface remelting

Jie Zan, ZiHan Liu, Xingyue Dai, Hanhua Zhu, Guangshen Xu, Hailin Lu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023102 (2025)
https://doi.org/10.1116/6.0004300
Published: February 2025
View articletitled, Enhanced properties of microarc oxide coating by secondary treatment of laser surface remelting
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Journal Articles

Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model

Featured
Yudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Michael Hinshelwood, Klaus Edinger, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023005 (2025)
https://doi.org/10.1116/6.0004219
Published: February 2025
View articletitled, Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model
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Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View articletitled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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Journal Articles

Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature

FeaturedScilight
Hak-Chol Choe, Song-Ha Ri, Jong-Pom Kim, In-Su Ri, Se Chol Pak, Yong-Jun Kim
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023001 (2025)
https://doi.org/10.1116/6.0004084
Published: January 2025
View articletitled, Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature
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Journal Articles

Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success

Editor’s Pick
Brian C. Welch, Jeanne Casetta, Rajesh Pathak, Jeffrey W. Elam, Céline Pochat-Bohatier, Philippe Miele, Tamar Segal-Peretz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022402 (2025)
https://doi.org/10.1116/6.0004187
Published: January 2025
View articletitled, Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success
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Journal Articles

Remote plasma assisted processing and semiconductor interface electronic structure

Featured
Leonard J. Brillson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 020801 (2025)
https://doi.org/10.1116/6.0004200
Published: January 2025
View articletitled, Remote plasma assisted processing and semiconductor interface electronic structure
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Journal Articles

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

Editor’s Pick
Andreas Kounis-Melas, Joseph R. Vella, Athanassios Z. Panagiotopoulos, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012603 (2025)
https://doi.org/10.1116/6.0004027
Published: January 2025
View articletitled, Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions
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Journal Articles

Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum

Yudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Klaus Edinger, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013004 (2025)
https://doi.org/10.1116/6.0003978
Published: January 2025
View articletitled, Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum
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Journal Articles

Etching and fluorination of yttrium oxide (Y2O3) irradiated with fluorine ions or radicals

Hojun Kang, Tomoko Ito, Junghwan Um, Hikaru Kokura, Sungil Cho, Hyunjung Park, Kazuhiro Karahashi, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013003 (2025)
https://doi.org/10.1116/6.0004137
Published: January 2025
View articletitled, Etching and fluorination of yttrium oxide (Y2O3) irradiated with fluorine ions or radicals
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Journal Articles

Comparisons of atomic layer etching of silicon in Cl2 and HBr-containing plasmas

Mahmoud A. I. Elgarhy, Qinzhen Hao, Heejung Kim, Sang Ki Nam, Song-Yun Kang, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012601 (2025)
https://doi.org/10.1116/6.0004092
Published: December 2024
View articletitled, Comparisons of atomic layer etching of silicon in Cl2 and HBr-containing plasmas
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