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Journal Articles

Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering

R. J. Hong, X. Jiang, V. Sittinger, B. Szyszka, T. Höing, G. Bräuer, G. Heide, G. H. Frischat
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 20, 900–905 (2002)
https://doi.org/10.1116/1.1472420
Published: May 2002
View article titled, Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering
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Journal Articles

Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometry

W. Bieck, E. Merz, H. Gnaser, H. Oechsner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 108–117 (2001)
https://doi.org/10.1116/1.1329117
Published: January 2001
View article titled, Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometry
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Journal Articles

INA-X: A novel instrument for electron-gas secondary neutral mass spectrometry with optional in situ x-ray photoelectron spectroscopy

Hans Oechsner, Matthias Müller
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 3401–3405 (1999)
https://doi.org/10.1116/1.582073
Published: November 1999
View article titled, INA-X: A novel instrument for electron-gas secondary neutral mass spectrometry with optional <em>in situ</em> x-ray photoelectron spectroscopy
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Journal Articles

Energy spectra of secondary neutrals obtained by means of the electrostatic energy filter of a commercial low-pressure HF-plasma secondary neutral mass spectrometer

Holger Jenett, Vasile-Dan Hodoroaba
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 15, 3158–3162 (1997)
https://doi.org/10.1116/1.580861
Published: November 1997
View article titled, Energy spectra of secondary neutrals obtained by means of the electrostatic energy filter of a commercial low-pressure HF-plasma secondary neutral mass spectrometer
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Journal Articles

Sputtering investigation of boron nitride with secondary ion and secondary neutral mass spectrometry

J. Zhang, S. Bhattacharjee, V. Shutthanandan, P. K. Ray
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 15, 243–247 (1997)
https://doi.org/10.1116/1.580519
Published: March 1997
View article titled, Sputtering investigation of boron nitride with secondary ion and secondary neutral mass spectrometry
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Journal Articles

Simultaneous dual‐element analyses of refractory metals in naturally occurring matrices using resonance ionization of sputtered atoms

W. F. Calaway, R. C. Wiens, D. S. Burnett, M. J. Pellin, D. M. Gruen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 13, 1310–1315 (1995)
https://doi.org/10.1116/1.579556
Published: May 1995
View article titled, Simultaneous dual‐element analyses of refractory metals in naturally occurring matrices using resonance ionization of sputtered atoms
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Journal Articles

Interaction of molecular BF+ and BF+2 ions with gold surfaces at low energies: Neutralization, dissociation, and deposition

Y. G. Shen, L. J. Huang, W. M. Lau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 11, 2099–2103 (1993)
https://doi.org/10.1116/1.578375
Published: July 1993
View article titled, Interaction of molecular BF<sup>+</sup> and BF<sup>+</sup><sub>2</sub> ions with gold surfaces at low energies: Neutralization, dissociation, and deposition
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Journal Articles

Quantitative analysis of ionic solids by secondary neutral mass spectrometry

M. Fichtner, J. Goschnick, U. C. Schmidt, A. Schweiker, H. F. Ache
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 10, 362–367 (1992)
https://doi.org/10.1116/1.578057
Published: March 1992
View article titled, Quantitative analysis of ionic solids by secondary neutral mass spectrometry
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Journal Articles

The Auger electron, Rutherford backscattering, secondary neutral mass, and secondary ion mass spectroscopies characterization of a W/TiNy/TiSiz/Si barrier structure for use in 1.0‐μm very large scale integrated circuit contacts

C. L. Grove, R. B. Gregory, R. L. Hance, S. W. Sun, N. Kelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 7, 1596–1600 (1989)
https://doi.org/10.1116/1.576056
Published: May 1989
View article titled, The Auger electron, Rutherford backscattering, secondary neutral mass, and secondary ion mass spectroscopies characterization of a W/TiN<sub><em>y</em></sub>/TiSi<sub><em>z</em></sub>/Si barrier structure for use in 1.0‐μm very large scale integrated circuit contacts
Open the PDF for The Auger electron, Rutherford backscattering, secondary neutral mass, and secondary ion mass spectroscopies characterization of a W/TiN<sub><em>y</em></sub>/TiSi<sub><em>z</em></sub>/Si barrier structure for use in 1.0‐μm very large scale integrated circuit contacts in another window
Journal Articles

Relative elemental sensitivity factors in secondary neutral mass spectrometry

A. Wucher, F. Novak, W. Reuter
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 6, 2265–2270 (1988)
https://doi.org/10.1116/1.575022
Published: July 1988
View article titled, Relative elemental sensitivity factors in secondary neutral mass spectrometry
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Journal Articles

Calculation of postionization probabilities as a function of plasma parameters in electron gas secondary neutral mass spectrometry

A. Wucher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 6, 2287–2292 (1988)
https://doi.org/10.1116/1.575025
Published: July 1988
View article titled, Calculation of postionization probabilities as a function of plasma parameters in electron gas secondary neutral mass spectrometry
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Journal Articles

Plasma studies on the Leybold–Heraeus INA3 secondary neutral mass spectrometry system

A. Wucher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 6, 2293–2298 (1988)
https://doi.org/10.1116/1.575026
Published: July 1988
View article titled, Plasma studies on the Leybold–Heraeus INA3 secondary neutral mass spectrometry system
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Journal Articles

Secondary ion and sputtered neutral formation from oxygen loaded Si(100)

P. Sander, U. Kaiser, R. Jede, D. Lipinsky, O. Ganschow, A. Benninghoven
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 3, 1946–1954 (1985)
https://doi.org/10.1116/1.572949
Published: September 1985
View article titled, Secondary ion and sputtered neutral formation from oxygen loaded Si(100)
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Journal Articles

High resolution sputter depth profiling of implantation structures in Si by low energy SNMS

H. Oechsner, H. Paulus, P. Beckmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 3, 1403–1407 (1985)
https://doi.org/10.1116/1.572789
Published: May 1985
View article titled, High resolution sputter depth profiling of implantation structures in Si by low energy SNMS
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Journal Articles

Quantitative chemical surface, in‐depth, and bulk analysis by secondary neutrals mass spectrometry (SNMS)

K.‐H. Müller, K. Seifert, M. Wilmers
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 3, 1367–1370 (1985)
https://doi.org/10.1116/1.572780
Published: May 1985
View article titled, Quantitative chemical surface, in‐depth, and bulk analysis by secondary neutrals mass spectrometry (SNMS)
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