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Journal Articles

AI-guided frame prediction techniques to model single crystal diamond growth

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Rohan Reddy Mekala, Arjun Srinivasan, Matthias Muehle, Elias Garratt, Adam Porter, Mikael Lindvall
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032708 (2025)
https://doi.org/10.1116/6.0004290
Published: May 2025
View articletitled, AI-guided frame prediction techniques to model single crystal diamond growth
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Journal Articles

Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

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Jiří Kohout, Jincheng Qian, Thomas Schmitt, Richard Vernhes, Oleg Zabeida, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061505 (2017)
https://doi.org/10.1116/1.4999460
Published: August 2017
View articletitled, Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques
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Journal Articles

Tailored ion energy distributions on plasma electrodes

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Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 050823 (2013)
https://doi.org/10.1116/1.4819315
Published: August 2013
View articletitled, Tailored ion energy distributions on plasma electrodes
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Journal Articles

Modified high power impulse magnetron sputtering process for increased deposition rate of titanium

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Clara M. Barker, Erik Lewin, Jörg Patscheider
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 060604 (2013)
https://doi.org/10.1116/1.4819296
Published: August 2013
View articletitled, Modified high power impulse magnetron sputtering process for increased deposition rate of titanium
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Journal Articles

Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge

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Fridrik Magnus, Tryggvi K. Tryggvason, Sveinn Olafsson, Jon T. Gudmundsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 050601 (2012)
https://doi.org/10.1116/1.4732735
Published: June 2012
View articletitled, Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge
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Journal Articles

Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study

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Axel Hemberg, Jean-Pierre Dauchot, Rony Snyders, Stephanos Konstantinidis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 040604 (2012)
https://doi.org/10.1116/1.4722728
Published: June 2012
View articletitled, Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study
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Journal Articles

Influence of ionization degree on film properties when using high power impulse magnetron sputtering

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Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Björefors, Bengt Wälivaara, Henrik Ljungcrantz, U. Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 031507 (2012)
https://doi.org/10.1116/1.3700227
Published: April 2012
View articletitled, Influence of ionization degree on film properties when using high power impulse magnetron sputtering
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Journal Articles

High power impulse magnetron sputtering discharge

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J. T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 030801 (2012)
https://doi.org/10.1116/1.3691832
Published: March 2012
View articletitled, High power impulse magnetron sputtering discharge
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Journal Articles

Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films

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Jianliang Lin, John J. Moore, William D. Sproul, S. L. Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 061301 (2011)
https://doi.org/10.1116/1.3645612
Published: October 2011
View articletitled, Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films
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Journal Articles

Effect of ion bombarding energies on photocatalytic TiO 2 films growing in a pulsed dual magnetron discharge

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Ondřej Novák, Jaroslav Vlček
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 031301 (2011)
https://doi.org/10.1116/1.3563612
Published: March 2011
View articletitled, Effect of ion bombarding energies on photocatalytic TiO 2 films growing in a pulsed dual magnetron discharge
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Journal Articles

Enhanced retained dose uniformity in NiTi spinal correction rod treated by three-dimensional mesh-assisted nitrogen plasma immersion ion implantation

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Q. Y. Lu, T. Hu, Dixon T. K. Kwok, Paul K. Chu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 407–410 (2010)
https://doi.org/10.1116/1.3368497
Published: March 2010
View articletitled, Enhanced retained dose uniformity in NiTi spinal correction rod treated by three-dimensional mesh-assisted nitrogen plasma immersion ion implantation
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Journal Articles

Effect of pulse frequency on the ion fluxes during pulsed dc magnetron sputtering

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M. Rahamathunnisa, D. C. Cameron
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 282–286 (2009)
https://doi.org/10.1116/1.3072513
Published: February 2009
View articletitled, Effect of pulse frequency on the ion fluxes during pulsed dc magnetron sputtering
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Journal Articles

Role of energy in low-temperature high-rate formation of hydrophilic Ti O 2 thin films using pulsed magnetron sputtering

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J. Musil, J. Šícha, D. Heřman, R. Čerstvý
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 666–674 (2007)
https://doi.org/10.1116/1.2736680
Published: May 2007
View articletitled, Role of energy in low-temperature high-rate formation of hydrophilic Ti O 2 thin films using pulsed magnetron sputtering
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Journal Articles

High-power pulsed sputtering using a magnetron with enhanced plasma confinement

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Jaroslav Vlček, Pavel Kudláček, Kristýna Burcalová, Jindřich Musil
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 42–47 (2007)
https://doi.org/10.1116/1.2388954
Published: December 2006
View articletitled, High-power pulsed sputtering using a magnetron with enhanced plasma confinement
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Journal Articles

Ultrawideband radar imaging system for biomedical applications

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H. M. Jafari, W. Liu, S. Hranilovic, M. J. Deen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 752–757 (2006)
https://doi.org/10.1116/1.2194028
Published: May 2006
View articletitled, Ultrawideband radar imaging system for biomedical applications
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Journal Articles

John Ambrose Fleming and the beginning of electronics

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H. F. Dylla, Steven T. Corneliussen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 1244–1251 (2005)
https://doi.org/10.1116/1.1881652
Published: June 2005
View articletitled, John Ambrose Fleming and the beginning of electronics
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Journal Articles

Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. I. Ar pulsed plasmas

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Pramod Subramonium, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 20, 313–324 (2002)
https://doi.org/10.1116/1.1434964
Published: March 2002
View articletitled, Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. I. Ar pulsed plasmas
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Journal Articles

Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl 2 pulsed plasmas

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Pramod Subramonium, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 20, 325–334 (2002)
https://doi.org/10.1116/1.1434965
Published: March 2002
View articletitled, Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl 2 pulsed plasmas
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Journal Articles

Pulsed dc magnetron discharge for high-rate sputtering of thin films

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Jindřich Musil, Jan Leština, Jaroslav Vlček, Tomáš Tölg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 420–424 (2001)
https://doi.org/10.1116/1.1339018
Published: March 2001
View articletitled, Pulsed dc magnetron discharge for high-rate sputtering of thin films
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Journal Articles

Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

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Karol Macák, Vladimir Kouznetsov, Jochen Schneider, Ulf Helmersson, Ivan Petrov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1533–1537 (2000)
https://doi.org/10.1116/1.582380
Published: July 2000
View articletitled, Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
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