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Journal Articles

Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation

Editor’s Pick
Lindsey N. Penland, H. H. Hirushan, N. Dissanayake, Rachael G. Farber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063205 (2024)
https://doi.org/10.1116/6.0003926
Published: September 2024
View article titled, Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation
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Journal Articles

Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb3Sn film growth for superconducting radiofrequency applications

Sarah A. Willson, Rachael G. Farber, S. J. Sibener
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063204 (2024)
https://doi.org/10.1116/6.0003892
Published: September 2024
View article titled, Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb<sub>3</sub>Sn film growth for superconducting radiofrequency applications
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Journal Articles

Quantifying the resonant photoemission of radiation damaged Pu

J. G. Tobin, S.-W. Yu, B. W. Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053201 (2024)
https://doi.org/10.1116/6.0003764
Published: July 2024
View article titled, Quantifying the resonant photoemission of radiation damaged Pu
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Journal Articles

Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source

Editor’s Pick
Naga Prathibha Jasti, Shay Tirosh, Ansuman Halder, Eti Teblum, David Cahen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043406 (2024)
https://doi.org/10.1116/6.0003607
Published: May 2024
View article titled, <em>Continuous wave</em> laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source
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Includes: Supplementary data
Journal Articles

Area-selective atomic layer deposition of palladium

Editor’s Pick
Himamshu C. Nallan, Xin Yang, Brennan M. Coffey, Andrei Dolocan, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022401 (2024)
https://doi.org/10.1116/6.0003261
Published: January 2024
View article titled, Area-selective atomic layer deposition of palladium
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Includes: Supplementary data
Journal Articles

Standing wave patterns in graphene systems studied using scanning tunneling spectroscopy

Editor’s Pick
Won-Jun Jang, Min Hui Chang, Min Jeong Kang, Young Jae Song, Se-Jong Kahng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062203 (2023)
https://doi.org/10.1116/6.0003075
Published: October 2023
View article titled, Standing wave patterns in graphene systems studied using scanning tunneling spectroscopy
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Includes: Supplementary data
Journal Articles

Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization

Raquel Garza, Nathan Bartlett, Jameson Crouse, Andrew Herschberg, R. Mohan Sankaran, Md. Amzad Hossain, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063209 (2023)
https://doi.org/10.1116/6.0002980
Published: October 2023
View article titled, Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization
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Journal Articles

Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory

T. Stach, A. Seif, A. Ambrosetti, P. L. Silvestrelli, U. Burghaus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062201 (2023)
https://doi.org/10.1116/6.0002948
Published: September 2023
View article titled, Enhancing the reactivity of clean, defect-free epitaxial graphene by the substrate—Experiment and theory
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Includes: Supplementary data
Journal Articles

In situ plasmonic tip preparation and validation techniques for scanning tunneling microscopy

Editor’s Pick
Benjamen N. Taber, Matthew L. Neill, Trevor N. Thom, Octavia D. Clapp, Vartkess Ara Apkarian, Joonhee Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053205 (2023)
https://doi.org/10.1116/6.0002807
Published: July 2023
View article titled, <em>In situ</em> plasmonic tip preparation and validation techniques for scanning tunneling microscopy
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Journal Articles

Effect of local pressure difference caused by argon flow on properties of DLC films on rubber

Haoran Zeng, Jiaqi Liu, Tao Yang, Qiaoyuan Deng, Feng Wen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053410 (2023)
https://doi.org/10.1116/6.0002806
Published: July 2023
View article titled, Effect of local pressure difference caused by argon flow on properties of DLC films on rubber
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Includes: Supplementary data
Journal Articles

Study of the surface and interface properties of ultrathin nickel film on cerium layer by in situ magnetic sputtering

Tianzuo Fu, Yiqiang Zhong, Lihua Zhou, Shuwen Meng, Zhengang Tian, Yiwu Chen, Tianfu Li, Xiaoyu Zou, Zhengcao Li, Tinggui Yang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043212 (2023)
https://doi.org/10.1116/6.0002455
Published: July 2023
View article titled, Study of the surface and interface properties of ultrathin nickel film on cerium layer by <em>in situ</em> magnetic sputtering
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Journal Articles

Need for complementary techniques for reliable characterization of MoS2-like layers

Editor’s Pick
Aditya Deshpande, Koki Hojo, Koichi Tanaka, Pedro Arias, Hicham Zaid, Michael Liao, Mark Goorsky, Suneel Kodambaka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042203 (2023)
https://doi.org/10.1116/6.0002701
Published: June 2023
View article titled, Need for complementary techniques for reliable characterization of MoS<sub>2</sub>-like layers
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Journal Articles

Controlling the size and density of InN quantum dots formed on sapphire substrate by droplet epitaxy

Malak Refaei, Andrian Kuchuk, Rohith Allaparthi, Mirsaeid Sarollahia, Md Helal Uddin Maruf, Morgan E. Ware
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042711 (2023)
https://doi.org/10.1116/6.0002679
Published: June 2023
View article titled, Controlling the size and density of InN quantum dots formed on sapphire substrate by droplet epitaxy
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Journal Articles

Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride

Editor’s Pick
Holger Saare, Wenyi Xie, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042602 (2023)
https://doi.org/10.1116/6.0002708
Published: June 2023
View article titled, Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride
Open the PDF for Comparison of BCl<sub>3</sub>, TiCl<sub>4</sub>, and SOCl<sub>2</sub> chlorinating agents for atomic layer etching of TiO<sub>2</sub> and ZrO<sub>2</sub> using tungsten hexafluoride in another window
Includes: Supplementary data
Journal Articles

Resolving buried interfaces with low energy ion scattering

Adele Valpreda, Jacobus M. Sturm, Andrey E. Yakshin, Marcelo Ackermann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043203 (2023)
https://doi.org/10.1116/6.0002567
Published: May 2023
View article titled, Resolving buried interfaces with low energy ion scattering
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Journal Articles

Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature

George H. Major, B. Maxwell Clark, Kevin Cayabyab, Nathan Engel, Christopher D. Easton, Jan Čechal, Donald R. Baer, Jeff Terry, Matthew R. Linford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043201 (2023)
https://doi.org/10.1116/6.0002714
Published: May 2023
View article titled, Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature
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Journal Articles

XPS characterization of a PuGa-7 at. % alloy

P. Roussel, S. C. Hernandez, J. J. Joyce, K. S. Graham, T. Venhaus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023204 (2023)
https://doi.org/10.1116/6.0002365
Published: February 2023
View article titled, XPS characterization of a PuGa-7 at. % alloy
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Includes: Supplementary data
Journal Articles

Deposition-last lithographically defined epitaxial complex oxide devices on Si(100)

Featured
M. Chrysler, J. C. Jiang, G. Lorkowski, E. I. Meletis, J. H. Ngai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 052701 (2022)
https://doi.org/10.1116/6.0001939
Published: July 2022
View article titled, Deposition-last lithographically defined epitaxial complex oxide devices on Si(100)
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Journal Articles

In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride

Johanna Reif, Martin Knaut, Sebastian Killge, Matthias Albert, Thomas Mikolajick, Johann W. Bartha
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 032602 (2022)
https://doi.org/10.1116/6.0001630
Published: April 2022
View article titled, <em>In situ</em> studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
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Journal Articles

Lamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystals

Featured
Abdulhakim Bake, Weiyao Zhao, David Mitchell, Xiaolin Wang, Mitchell Nancarrow, David Cortie
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 033203 (2022)
https://doi.org/10.1116/6.0001771
Published: April 2022
View article titled, Lamellae preparation for atomic-resolution STEM imaging from ion-beam-sensitive topological insulator crystals
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