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Journal Articles

Luminescence properties of GaN/GaInN nanorod light-emitting diodes fabricated by a top-down approach

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Hyerim Heo, Hyeongtaek Lim, Sooyoung Kim, Kyoung-Kook Kim, Dong Yeong Kim, Jaehee Cho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 050401 (2025)
https://doi.org/10.1116/6.0004663
Published: July 2025
View articletitled, Luminescence properties of GaN/GaInN nanorod light-emitting diodes fabricated by a top-down approach
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Journal Articles

On the way to more sustainability: Development of five Al0.25Ga0.75N atomic layer etching modes for shorter cycle times

Open Access
Christian Miersch, Sarah Seidel, Friedrich Roth, Johannes Heitmann, Franziska C. Beyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042603 (2025)
https://doi.org/10.1116/6.0004593
Published: June 2025
View articletitled, On the way to more sustainability: Development of five Al0.25Ga0.75N atomic layer etching modes for shorter cycle times
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Journal Articles

Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning

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Jianming Guo, Zhiping Mou, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043005 (2025)
https://doi.org/10.1116/6.0004669
Published: June 2025
View articletitled, Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
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Journal Articles

Surface nanoparticle monitoring for plasma etching chamber components using single particle inductively coupled plasma mass spectrometry (SP ICP-MS)

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Lisa Mey-Ami, Fuhe Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043206 (2025)
https://doi.org/10.1116/6.0004481
Published: June 2025
View articletitled, Surface nanoparticle monitoring for plasma etching chamber components using single particle inductively coupled plasma mass spectrometry (SP ICP-MS)
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Journal Articles

Growth and properties of Sn-doped sol-gel Ga2O3 thin films

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Kate M. Wislang, Rodrigo Martinez-Gazoni, Roger J. Reeves, Martin W. Allen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043410 (2025)
https://doi.org/10.1116/6.0004540
Published: June 2025
View articletitled, Growth and properties of Sn-doped sol-gel Ga2O3 thin films
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Journal Articles

Control of iron doping during the growth of bulk gallium oxide crystals by the Czochralski method

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D. A. Bauman, D. I. Panov, V. A. Spiridonov, A. Yu. Ivanov, P. A. Bogdanov, W. V. Lundin, E. Yu. Lundina, A. F. Tsatsulnikov, M. V. Tokarev, B. Y. Ber, S. S. Rachkov, D. Yu. Kazantsev, P. N. Brunkov, A. E. Romanov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 042804 (2025)
https://doi.org/10.1116/6.0004535
Published: May 2025
View articletitled, Control of iron doping during the growth of bulk gallium oxide crystals by the Czochralski method
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Journal Articles

Layer-dependent optical properties of PtSe2 determined from a single film

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Owen Peterson, Hatim Saeed, Jackson Niedel, Ke Wang, Qihua Zhang, Stephanie Law, Maria Hilse, Frank Peiris
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032201 (2025)
https://doi.org/10.1116/6.0004406
Published: April 2025
View articletitled, Layer-dependent optical properties of PtSe2 determined from a single film
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Journal Articles

Sputter yield and stoichiometry study of InGaZnO film in ion beam etching

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Jie Li, Shreya Kundu, Laurent Souriau, Frederic Lazzarino, Katia Devriendt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033204 (2025)
https://doi.org/10.1116/6.0004243
Published: March 2025
View articletitled, Sputter yield and stoichiometry study of InGaZnO film in ion beam etching
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Journal Articles

Structural, electrical, and thermal characterization of homoepitaxial close-injection showerhead metalorganic chemical vapor deposition β-Ga2O3 enhancement-mode recessed-gate MOSFETs

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Hannah N. Masten, Gustavo Armando Alvarez, Corey Halverson, Joyce Christiansen-Salameh, Eugene Y. Kwon, Michael Liao, James Spencer Lundh, Audrey Rose Gutierrez, Fikadu Alema, Andrei Osinsky, Alan G. Jacobs, Mark S. Goorsky, Marc H. Weber, Zhiting Tian, Karl D. Hobart, Marko J. Tadjer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022703 (2025)
https://doi.org/10.1116/6.0004176
Published: February 2025
View articletitled, Structural, electrical, and thermal characterization of homoepitaxial close-injection showerhead metalorganic chemical vapor deposition β-Ga2O3 enhancement-mode recessed-gate MOSFETs
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Journal Articles

Plasma atomic layer etching of tantalum nitride with surface fluorination and Ar ion sputtering

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Hojin Kang, Sangbae Lee, Minsung Jeon, Heeyeop Chae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 022601 (2025)
https://doi.org/10.1116/6.0004259
Published: February 2025
View articletitled, Plasma atomic layer etching of tantalum nitride with surface fluorination and Ar ion sputtering
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Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

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Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View articletitled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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Journal Articles

Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum

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Yudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Klaus Edinger, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013004 (2025)
https://doi.org/10.1116/6.0003978
Published: January 2025
View articletitled, Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum
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Journal Articles

Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties

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Wen-Hsi Lee, Edward Kuo, Chia-Nung Hung, Tai-Chen Kuo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012602 (2025)
https://doi.org/10.1116/6.0004040
Published: December 2024
View articletitled, Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties
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Journal Articles

Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride

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Thorsten Lill, Mingmei Wang, Dongjun Wu, Youn-Jin Oh, Tae Won Kim, Mark Wilcoxson, Harmeet Singh, Vahid Ghodsi, Steven M. George, Yuri Barsukov, Igor Kaganovich
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063006 (2024)
https://doi.org/10.1116/6.0004019
Published: November 2024
View articletitled, Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
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Journal Articles

Synthesis and electrical transport properties of superconducting platinum silicide thin films and devices

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Tharanga R. Nanayakkara, Anthony T. Bollinger, Ruoshui Li, Chenyu Zhou, Abdul K. Rumaiz, Xiao Tong, Lihua Zhang, Kim Kisslinger, Charles T. Black, Mingzhao Liu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063407 (2024)
https://doi.org/10.1116/6.0004008
Published: October 2024
View articletitled, Synthesis and electrical transport properties of superconducting platinum silicide thin films and devices
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Journal Articles

Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes

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Aleksei Almaev, Bogdan Kushnarev, Petr Korusenko, Pavel Butenko, Viktor Kopyev, Aleksandra Koroleva, Andrei Chikiryaka, Evgeniy Zhizhin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063406 (2024)
https://doi.org/10.1116/6.0003956
Published: October 2024
View articletitled, Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes
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Journal Articles

Effect of post-deposition annealing on crystal structure of RF magnetron sputtered germanium dioxide thin films

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Ahmad Matar Abed, Rebecca L. Peterson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063403 (2024)
https://doi.org/10.1116/6.0003960
Published: October 2024
View articletitled, Effect of post-deposition annealing on crystal structure of RF magnetron sputtered germanium dioxide thin films
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Journal Articles

Fabrication of thick Cr masks for reactive ion substrate etching by electron beam lithography and lift-off techniques

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Deyong Wang, Peter Kjær Kristensen, Manohar Chirumamilla, Kjeld Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063105 (2024)
https://doi.org/10.1116/6.0003965
Published: October 2024
View articletitled, Fabrication of thick Cr masks for reactive ion substrate etching by electron beam lithography and lift-off techniques
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Journal Articles

Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings

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Lanxin Guo, Yixian Wang, Zifan Pang, Xin Han, Yafeng Wang, Lipei Peng, Xin Gao, Chunlei Pei, Tuo Wang, Jinlong Gong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 062401 (2024)
https://doi.org/10.1116/6.0003777
Published: September 2024
View articletitled, Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings
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Journal Articles

Development of high on/off current ratio in p-type copper oxide thin-film transistors with a back-end-of-line compatible process

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Chi-Yuan Kuo, Wei-Chen Lin, Tsung-Tien Lo, Ching-Hsuan Shen, Ming-Yu Shen, Chia-Chan Lee, Chi-Ping Lin, Yuang-Ming Lin, Haw-Tyng Huang, Po-Chun Yeh, Hsin-Chu Chen, Chih-I Wu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053412 (2024)
https://doi.org/10.1116/5.0226672
Published: August 2024
View articletitled, Development of high on/off current ratio in p-type copper oxide thin-film transistors with a back-end-of-line compatible process
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