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Journal Articles
Luminescence properties of GaN/GaInN nanorod light-emitting diodes fabricated by a top-down approach
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J. Vac. Sci. Technol. A 43, 050401 (2025)
Published: July 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 042603 (2025)
Published: June 2025
Journal Articles
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
J. Vac. Sci. Technol. A 43, 043005 (2025)
Published: June 2025
Journal Articles
Surface nanoparticle monitoring for plasma etching chamber components using single particle inductively coupled plasma mass spectrometry (SP ICP-MS)
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J. Vac. Sci. Technol. A 43, 043206 (2025)
Published: June 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 043410 (2025)
Published: June 2025
Journal Articles
Control of iron doping during the growth of bulk gallium oxide crystals by the Czochralski method
Available to PurchaseD. A. Bauman, D. I. Panov, V. A. Spiridonov, A. Yu. Ivanov, P. A. Bogdanov, W. V. Lundin, E. Yu. Lundina, A. F. Tsatsulnikov, M. V. Tokarev, B. Y. Ber, S. S. Rachkov, D. Yu. Kazantsev, P. N. Brunkov, A. E. Romanov
J. Vac. Sci. Technol. A 43, 042804 (2025)
Published: May 2025
Journal Articles
Layer-dependent optical properties of PtSe2 determined from a single film
Available to PurchaseOwen Peterson, Hatim Saeed, Jackson Niedel, Ke Wang, Qihua Zhang, Stephanie Law, Maria Hilse, Frank Peiris
J. Vac. Sci. Technol. A 43, 032201 (2025)
Published: April 2025
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Sputter yield and stoichiometry study of InGaZnO film in ion beam etching
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J. Vac. Sci. Technol. A 43, 033204 (2025)
Published: March 2025
Journal Articles
Structural, electrical, and thermal characterization of homoepitaxial close-injection showerhead metalorganic chemical vapor deposition β-Ga2O3 enhancement-mode recessed-gate MOSFETs
Available to PurchaseHannah N. Masten, Gustavo Armando Alvarez, Corey Halverson, Joyce Christiansen-Salameh, Eugene Y. Kwon, Michael Liao, James Spencer Lundh, Audrey Rose Gutierrez, Fikadu Alema, Andrei Osinsky, Alan G. Jacobs, Mark S. Goorsky, Marc H. Weber, Zhiting Tian, Karl D. Hobart, Marko J. Tadjer
J. Vac. Sci. Technol. A 43, 022703 (2025)
Published: February 2025
Journal Articles
Plasma atomic layer etching of tantalum nitride with surface fluorination and Ar ion sputtering
J. Vac. Sci. Technol. A 43, 022601 (2025)
Published: February 2025
Journal Articles
Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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J. Vac. Sci. Technol. A 43, 023003 (2025)
Published: February 2025
Journal Articles
Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum
Available to PurchaseYudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Klaus Edinger, Gottlieb S. Oehrlein
J. Vac. Sci. Technol. A 43, 013004 (2025)
Published: January 2025
Journal Articles
J. Vac. Sci. Technol. A 43, 012602 (2025)
Published: December 2024
Journal Articles
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
Thorsten Lill, Mingmei Wang, Dongjun Wu, Youn-Jin Oh, Tae Won Kim, Mark Wilcoxson, Harmeet Singh, Vahid Ghodsi, Steven M. George, Yuri Barsukov, Igor Kaganovich
J. Vac. Sci. Technol. A 42, 063006 (2024)
Published: November 2024
Journal Articles
Synthesis and electrical transport properties of superconducting platinum silicide thin films and devices
Available to PurchaseTharanga R. Nanayakkara, Anthony T. Bollinger, Ruoshui Li, Chenyu Zhou, Abdul K. Rumaiz, Xiao Tong, Lihua Zhang, Kim Kisslinger, Charles T. Black, Mingzhao Liu
J. Vac. Sci. Technol. A 42, 063407 (2024)
Published: October 2024
Journal Articles
Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes
Available to PurchaseAleksei Almaev, Bogdan Kushnarev, Petr Korusenko, Pavel Butenko, Viktor Kopyev, Aleksandra Koroleva, Andrei Chikiryaka, Evgeniy Zhizhin
J. Vac. Sci. Technol. A 42, 063406 (2024)
Published: October 2024
Journal Articles
Effect of post-deposition annealing on crystal structure of RF magnetron sputtered germanium dioxide thin films
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J. Vac. Sci. Technol. A 42, 063403 (2024)
Published: October 2024
Journal Articles
Fabrication of thick Cr masks for reactive ion substrate etching by electron beam lithography and lift-off techniques
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J. Vac. Sci. Technol. A 42, 063105 (2024)
Published: October 2024
Journal Articles
Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings
Available to PurchaseLanxin Guo, Yixian Wang, Zifan Pang, Xin Han, Yafeng Wang, Lipei Peng, Xin Gao, Chunlei Pei, Tuo Wang, Jinlong Gong
J. Vac. Sci. Technol. A 42, 062401 (2024)
Published: September 2024
Journal Articles
Development of high on/off current ratio in p-type copper oxide thin-film transistors with a back-end-of-line compatible process
Available to PurchaseChi-Yuan Kuo, Wei-Chen Lin, Tsung-Tien Lo, Ching-Hsuan Shen, Ming-Yu Shen, Chia-Chan Lee, Chi-Ping Lin, Yuang-Ming Lin, Haw-Tyng Huang, Po-Chun Yeh, Hsin-Chu Chen, Chih-I Wu
J. Vac. Sci. Technol. A 42, 053412 (2024)
Published: August 2024
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