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Journal Articles

Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering

G. V. Taylor, L. B. Bayu Aji, S. J. Shin, J. H. Bae, A. M. Engwall, S. O. Kucheyev

J. Vac. Sci. Technol. A 42, 040401 (2024)

https://doi.org/10.1116/6.0003571

Published: May 2024

View article titled, Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering

Journal Articles

Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets

Yasunori Ohtsu, Takeshi Uchida, Ryohei Kuno, Julian Schulze

J. Vac. Sci. Technol. A 42, 033011 (2024)

https://doi.org/10.1116/6.0003448

Published: April 2024

View article titled, Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets

Journal Articles

Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor

Yeong-Min Lim, Young-Hun Hong, Gil-Ho Kang, Chin-Wook Chung

J. Vac. Sci. Technol. A 41, 013005 (2023)

https://doi.org/10.1116/6.0002180

Published: December 2022

View article titled, Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor

Journal Articles

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Yasunori Ohtsu, Koya Yasuda, Julian Schulze

J. Vac. Sci. Technol. A 40, 053006 (2022)

https://doi.org/10.1116/6.0001994

Published: August 2022

View article titled, Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Journal Articles

Magnetron sputtered NiAl/TiB_x multilayer thin films

Tomasz Wojcik, Vincent Ott, Sedat Özbilen, Harald Leiste, Sven Ulrich, Paul Heinz Mayrhofer, Helmut Riedl, Michael Stueber

J. Vac. Sci. Technol. A 40, 033410 (2022)

https://doi.org/10.1116/6.0001734

Published: April 2022

View article titled, Magnetron sputtered NiAl/TiBx multilayer thin films

Journal Articles

Optimization of three-dimensional metamaterials for terahertz energy harvesting

Shendu Yang, Zachary Thacker, Evan Allison, Patrick Pinhero

J. Vac. Sci. Technol. A 39, 062801 (2021)

https://doi.org/10.1116/6.0001106

Published: September 2021

View article titled, Optimization of three-dimensional metamaterials for terahertz energy harvesting

Journal Articles

Impact of Cr₂O₃ additives on the gas-sensitive properties of β-Ga₂O₃ thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors

Aleksei V. Almaev, Evgeny V. Chernikov, Vadim V. Novikov, Bogdan O. Kushnarev, Nikita N. Yakovlev, Ekaterina V. Chuprakova, Vladimir L. Oleinik, Anastasiya D. Lozinskaya, Daniela S. Gogova

J. Vac. Sci. Technol. A 39, 023405 (2021)

https://doi.org/10.1116/6.0000723

Published: January 2021

View article titled, Impact of Cr2O3 additives on the gas-sensitive properties of β-Ga2O3 thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors

Journal Articles

Magnetron sputtering

Stephen M. Rossnagel

J. Vac. Sci. Technol. A 38, 060805 (2020)

https://doi.org/10.1116/6.0000594

Published: November 2020

View article titled, Magnetron sputtering

Journal Articles

Investigation of TiN film on an RF ceramic window by atomic layer deposition

Zhen Peng, Gen Chen, Yan-Ping Zhao, Xin Zhang, Yun-Tao Song, Grigori Shirkov, Galina Karamysheva, Oleg Karamyshev, Luciano Calabretta, Antonio Caruso

J. Vac. Sci. Technol. A 38, 052401 (2020)

https://doi.org/10.1116/6.0000159

Published: July 2020

View article titled, Investigation of TiN film on an RF ceramic window by atomic layer deposition

Includes: Supplementary data

Journal Articles

Role of high aspect-ratio thin-film metal deposition in Cu back-end-of-line technology

Andrew Simon, Oscar van der Straten, Nicholas A. Lanzillo, Chih-Chao Yang, Takeshi Nogami, Daniel C. Edelstein

J. Vac. Sci. Technol. A 38, 053402 (2020)

https://doi.org/10.1116/6.0000170

Published: July 2020

View article titled, Role of high aspect-ratio thin-film metal deposition in Cu back-end-of-line technology

Journal Articles

Atmospheric pressure microwave plasma for aluminum surface cleaning

Lucia Bónová, Weikun Zhu, Dhruval K. Patel, Daniel V. Krogstad, David N. Ruzic

J. Vac. Sci. Technol. A 38, 023002 (2020)

https://doi.org/10.1116/1.5132912

Published: January 2020

View article titled, Atmospheric pressure microwave plasma for aluminum surface cleaning

Journal Articles

Study on CF₄/O₂ plasma resistance of O-ring elastomer materials

Tetsuya Goto, Shogo Obara, Tomoya Shimizu, Tsuyoshi Inagaki, Yasuyuki Shirai, Shigetoshi Sugawa

J. Vac. Sci. Technol. A 38, 013002 (2020)

https://doi.org/10.1116/1.5124533

Published: December 2019

View article titled, Study on CF4/O2 plasma resistance of O-ring elastomer materials

Journal Articles

Space-resolved plasma diagnostics in a hybrid (Cr,Al)N process

Kirsten Bobzin, Tobias Brögelmann, Nathan C. Kruppe, Martin Engels

J. Vac. Sci. Technol. A 36, 031515 (2018)

https://doi.org/10.1116/1.5020151

Published: May 2018

View article titled, Space-resolved plasma diagnostics in a hybrid (Cr,Al)N process

Journal Articles

Review Article: Recommended practice for calibrating vacuum gauges of the ionization type

James A. Fedchak, Patrick J. Abbott, Jay H. Hendricks, Paul C. Arnold, Neil T. Peacock

J. Vac. Sci. Technol. A 36, 030802 (2018)

https://doi.org/10.1116/1.5025060

Published: April 2018

View article titled, Review Article: Recommended practice for calibrating vacuum gauges of the ionization type

Journal Articles

Effect of synchronized bias in the deposition of TiB₂ thin films using high power impulse magnetron sputtering

Nils Nedfors, Oleksiy Vozniy, Johanna Rosen

J. Vac. Sci. Technol. A 36, 031510 (2018)

https://doi.org/10.1116/1.5003194

Published: April 2018

View article titled, Effect of synchronized bias in the deposition of TiB2 thin films using high power impulse magnetron sputtering

Journal Articles

Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf₇B₂₃Si₁₇C₄N₄₅ film

Minghui Zhang, Jiechao Jiang, Petr Zeman, Šárka Zuzjaková, Jaroslav Vlček, Efstathios I. Meletis

J. Vac. Sci. Technol. A 36, 021505 (2018)

https://doi.org/10.1116/1.5004145

Published: December 2017

View article titled, Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf7B23Si17C4N45 film

Journal Articles

Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li₂Si₂O₅ to lithium-rich Li₈SiO₆

Jaclyn Coyle, Christopher Apblett, Michael Brumbach, James Ohlhausen, Conrad Stoldt

J. Vac. Sci. Technol. A 35, 061509 (2017)

https://doi.org/10.1116/1.4998726

Published: October 2017

View article titled, Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li2Si2O5 to lithium-rich Li8SiO6

Includes: Supplementary data

Journal Articles

Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements

Stefan Raggl, Johannes Postler, Jörg Winkler, Georg Strauss, Christian Feist, Arno Plankensteiner, Michael Eidenberger-Schober, Paul Scheier

J. Vac. Sci. Technol. A 35, 061308 (2017)

https://doi.org/10.1116/1.4996074

Published: September 2017

View article titled, Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements

Journal Articles

Plasma and floating potentials in magnetron discharges

Jindřich Musil, Martin Jaroš

J. Vac. Sci. Technol. A 35, 060605 (2017)

https://doi.org/10.1116/1.4992054

Published: September 2017

View article titled, Plasma and floating potentials in magnetron discharges

Journal Articles

Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

Jiří Kohout, Jincheng Qian, Thomas Schmitt, Richard Vernhes, Oleg Zabeida, Jolanta Klemberg-Sapieha, Ludvik Martinu

J. Vac. Sci. Technol. A 35, 061505 (2017)

https://doi.org/10.1116/1.4999460

Published: August 2017

View article titled, Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

NARROW

Topics

Boron carbide films with reduced nodular defect density deposited by full-face erosion radio-frequency magnetron sputtering

Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets

Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor

Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma

Magnetron sputtered NiAl/TiB_x multilayer thin films

Optimization of three-dimensional metamaterials for terahertz energy harvesting

Impact of Cr₂O₃ additives on the gas-sensitive properties of β-Ga₂O₃ thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors

Magnetron sputtering

Investigation of TiN film on an RF ceramic window by atomic layer deposition

Role of high aspect-ratio thin-film metal deposition in Cu back-end-of-line technology

Atmospheric pressure microwave plasma for aluminum surface cleaning

Study on CF₄/O₂ plasma resistance of O-ring elastomer materials

Space-resolved plasma diagnostics in a hybrid (Cr,Al)N process

Review Article: Recommended practice for calibrating vacuum gauges of the ionization type

Effect of synchronized bias in the deposition of TiB₂ thin films using high power impulse magnetron sputtering

Study of the high-temperature oxidation resistance mechanism of magnetron sputtered Hf₇B₂₃Si₁₇C₄N₄₅ film

Structural and compositional characterization of RF magnetron cosputtered lithium silicate films: From Li₂Si₂O₅ to lithium-rich Li₈SiO₆

Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements

Plasma and floating potentials in magnetron discharges

Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

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