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Journal Articles

Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

Jiří Kohout, Jincheng Qian, Thomas Schmitt, Richard Vernhes, Oleg Zabeida, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061505 (2017)
https://doi.org/10.1116/1.4999460
Published: August 2017
View article titled, Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques
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Journal Articles

Tailored ion energy distributions on plasma electrodes

Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 050823 (2013)
https://doi.org/10.1116/1.4819315
Published: August 2013
View article titled, Tailored ion energy distributions on plasma electrodes
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Journal Articles

Current–voltage–time characteristics of the reactive Ar/O2 high power impulse magnetron sputtering discharge

Fridrik Magnus, Tryggvi K. Tryggvason, Sveinn Olafsson, Jon T. Gudmundsson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 050601 (2012)
https://doi.org/10.1116/1.4732735
Published: June 2012
View article titled, Current–voltage–time characteristics of the reactive Ar/O<sub>2</sub> high power impulse magnetron sputtering discharge
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Journal Articles

Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study

Axel Hemberg, Jean-Pierre Dauchot, Rony Snyders, Stephanos Konstantinidis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 040604 (2012)
https://doi.org/10.1116/1.4722728
Published: June 2012
View article titled, Evaporation-assisted high-power impulse magnetron sputtering: The deposition of tungsten oxide as a case study
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Journal Articles

Influence of ionization degree on film properties when using high power impulse magnetron sputtering

Mattias Samuelsson, Daniel Lundin, Kostas Sarakinos, Fredrik Björefors, Bengt Wälivaara, Henrik Ljungcrantz, U. Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 031507 (2012)
https://doi.org/10.1116/1.3700227
Published: April 2012
View article titled, Influence of ionization degree on film properties when using high power impulse magnetron sputtering
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Journal Articles

High power impulse magnetron sputtering discharge

J. T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 030801 (2012)
https://doi.org/10.1116/1.3691832
Published: March 2012
View article titled, High power impulse magnetron sputtering discharge
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Journal Articles

Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films

Jianliang Lin, John J. Moore, William D. Sproul, S. L. Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 061301 (2011)
https://doi.org/10.1116/1.3645612
Published: October 2011
View article titled, Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films
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Journal Articles

Effect of ion bombarding energies on photocatalytic TiO 2 films growing in a pulsed dual magnetron discharge

Ondřej Novák, Jaroslav Vlček
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 031301 (2011)
https://doi.org/10.1116/1.3563612
Published: March 2011
View article titled, Effect of ion bombarding energies on photocatalytic TiO 2 films growing in a pulsed dual magnetron discharge
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Journal Articles

Enhanced retained dose uniformity in NiTi spinal correction rod treated by three-dimensional mesh-assisted nitrogen plasma immersion ion implantation

Q. Y. Lu, T. Hu, Dixon T. K. Kwok, Paul K. Chu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 407–410 (2010)
https://doi.org/10.1116/1.3368497
Published: March 2010
View article titled, Enhanced retained dose uniformity in NiTi spinal correction rod treated by three-dimensional mesh-assisted nitrogen plasma immersion ion implantation
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Journal Articles

Effect of pulse frequency on the ion fluxes during pulsed dc magnetron sputtering

M. Rahamathunnisa, D. C. Cameron
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 282–286 (2009)
https://doi.org/10.1116/1.3072513
Published: February 2009
View article titled, Effect of pulse frequency on the ion fluxes during pulsed dc magnetron sputtering
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Journal Articles

Role of energy in low-temperature high-rate formation of hydrophilic Ti O 2 thin films using pulsed magnetron sputtering

J. Musil, J. Šícha, D. Heřman, R. Čerstvý
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 666–674 (2007)
https://doi.org/10.1116/1.2736680
Published: May 2007
View article titled, Role of energy in low-temperature high-rate formation of hydrophilic Ti O 2 thin films using pulsed magnetron sputtering
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Journal Articles

High-power pulsed sputtering using a magnetron with enhanced plasma confinement

Jaroslav Vlček, Pavel Kudláček, Kristýna Burcalová, Jindřich Musil
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 42–47 (2007)
https://doi.org/10.1116/1.2388954
Published: December 2006
View article titled, High-power pulsed sputtering using a magnetron with enhanced plasma confinement
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Journal Articles

Ultrawideband radar imaging system for biomedical applications

H. M. Jafari, W. Liu, S. Hranilovic, M. J. Deen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 752–757 (2006)
https://doi.org/10.1116/1.2194028
Published: May 2006
View article titled, Ultrawideband radar imaging system for biomedical applications
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Journal Articles

John Ambrose Fleming and the beginning of electronics

H. F. Dylla, Steven T. Corneliussen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 1244–1251 (2005)
https://doi.org/10.1116/1.1881652
Published: June 2005
View article titled, John Ambrose Fleming and the beginning of electronics
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Journal Articles

Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. I. Ar pulsed plasmas

Pramod Subramonium, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 20, 313–324 (2002)
https://doi.org/10.1116/1.1434964
Published: March 2002
View article titled, Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. I. Ar pulsed plasmas
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Journal Articles

Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl 2 pulsed plasmas

Pramod Subramonium, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 20, 325–334 (2002)
https://doi.org/10.1116/1.1434965
Published: March 2002
View article titled, Two-dimensional modeling of long-term transients in inductively coupled plasmas using moderate computational parallelism. II. Ar/Cl 2 pulsed plasmas
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Journal Articles

Pulsed dc magnetron discharge for high-rate sputtering of thin films

Jindřich Musil, Jan Leština, Jaroslav Vlček, Tomáš Tölg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 420–424 (2001)
https://doi.org/10.1116/1.1339018
Published: March 2001
View article titled, Pulsed dc magnetron discharge for high-rate sputtering of thin films
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Journal Articles

Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

Karol Macák, Vladimir Kouznetsov, Jochen Schneider, Ulf Helmersson, Ivan Petrov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1533–1537 (2000)
https://doi.org/10.1116/1.582380
Published: July 2000
View article titled, Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
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Journal Articles

Dynamic simulations of pulsed reactive sputtering processes

L. B. Jonsson, T. Nyberg, S. Berg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 503–508 (2000)
https://doi.org/10.1116/1.582216
Published: March 2000
View article titled, Dynamic simulations of pulsed reactive sputtering processes
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Journal Articles

Very uniform and high aspect ratio anisotropy SiO 2 etching process in magnetic neutral loop discharge plasma

W. Chen, Y. Morikawa, M. Itoh, T. Hayashi, K. Sugita, H. Shindo, T. Uchida
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 2546–2550 (1999)
https://doi.org/10.1116/1.581995
Published: September 1999
View article titled, Very uniform and high aspect ratio anisotropy SiO 2 etching process in magnetic neutral loop discharge plasma
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