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Journal Articles

Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam

Ye Eun Kim, Doo San Kim, Yun Jong Jang, Hong Seong Gil, Ho Seop Jeon, Jong Woo Hong, In Ho Kim, Cheol Kim, Jeong-Heon Park, Geun Young Yeom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033005 (2023)
https://doi.org/10.1116/6.0002465
Published: April 2023
View article titled, Study on etch characteristics of magnetic tunnel junction materials using rf-biased H<sub>2</sub>/NH<sub>3</sub> reactive ion beam
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Journal Articles

Electron beam-induced etching of SiO2, Si3N4, and poly-Si assisted by CF4/O2 remote plasma

Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Hubertus Marbach, Klaus Edinger, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013004 (2023)
https://doi.org/10.1116/6.0002234
Published: December 2022
View article titled, Electron beam-induced etching of SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, and poly-Si assisted by CF<sub>4</sub>/O<sub>2</sub> remote plasma
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Journal Articles

SiO2 etching and surface evolution using combined exposure to CF4/O2 remote plasma and electron beam

Editor’s Pick
Kang-Yi Lin, Christian Preischl, Christian Felix Hermanns, Daniel Rhinow, Hans-Michael Solowan, Michael Budach, Klaus Edinger, G. S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063004 (2022)
https://doi.org/10.1116/6.0002038
Published: October 2022
View article titled, SiO<sub>2</sub> etching and surface evolution using combined exposure to CF<sub>4</sub>/O<sub>2</sub> remote plasma and electron beam
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Journal Articles

Method to compensate radiation-induced errors in a hot-cathode-ionization gauge with correcting electrode

Hiroshi Saeki, Tamotsu Magome
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 061601 (2011)
https://doi.org/10.1116/1.3645599
Published: October 2011
View article titled, Method to compensate radiation-induced errors in a hot-cathode-ionization gauge with correcting electrode
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Journal Articles

Conventional triode ionization gauge with carbon nanotube cold electron emitter

Lin Xiao, Li Qian, Yang Wei, Liang Liu, Shoushan Fan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1–4 (2008)
https://doi.org/10.1116/1.2803713
Published: December 2007
View article titled, Conventional triode ionization gauge with carbon nanotube cold electron emitter
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Journal Articles

Vacuum measurement by carbon nanotube field emission

In-Mook Choi, Sam-Yong Woo, Seung-Soo Hong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1556–1559 (2006)
https://doi.org/10.1116/1.2167984
Published: June 2006
View article titled, Vacuum measurement by carbon nanotube field emission
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Journal Articles

Performance of a hot-cathode-ionization-gauge head with correcting electrode and shield tube, operated with an automated-pressure-compensating circuit in a synchrotron radiation environment

Hiroshi Saeki, Tamotsu Magome, Yoshihiko Shoji
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1148–1150 (2006)
https://doi.org/10.1116/1.2208992
Published: June 2006
View article titled, Performance of a hot-cathode-ionization-gauge head with correcting electrode and shield tube, operated with an automated-pressure-compensating circuit in a synchrotron radiation environment
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Journal Articles

Pressure-measurement errors in a cold-cathode-ionization gauge caused by an external-electron source

Hiroshi Saeki, Tamotsu Magome, Yoshihiko Shoji, Takashi Momose
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 2212–2215 (2004)
https://doi.org/10.1116/1.1781184
Published: September 2004
View article titled, Pressure-measurement errors in a cold-cathode-ionization gauge caused by an external-electron source
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Journal Articles

Generation of low-energy neutral beam for Si etching

S. J. Kim, S. J. Wang, J. K. Lee, D. H. Lee, G. Y. Yeom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 1948–1955 (2004)
https://doi.org/10.1116/1.1774198
Published: September 2004
View article titled, Generation of low-energy neutral beam for Si etching
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Journal Articles

Characteristics of a large diameter reactive ion beam generated by an electron cyclotron resonance microwave plasma source

St. Geisler, A. Brockhaus, J. Engemann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 19, 539–546 (2001)
https://doi.org/10.1116/1.1347051
Published: March 2001
View article titled, Characteristics of a large diameter reactive ion beam generated by an electron cyclotron resonance microwave plasma source
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Journal Articles

Energy and mass‐resolved detection of neutral and ion species using modulated‐pole‐bias quadrupole mass spectroscopy

A. M. Myers, D. N. Ruzic, R. C. Powell, N. Maley, D. W. Pratt, J. E. Greene, J. R. Abelson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 8, 1668–1672 (1990)
https://doi.org/10.1116/1.576827
Published: May 1990
View article titled, Energy and mass‐resolved detection of neutral and ion species using modulated‐pole‐bias quadrupole mass spectroscopy
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