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Journal Articles

Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning

Editor’s PickAvailable to Purchase
Jianming Guo, Zhiping Mou, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043005 (2025)
https://doi.org/10.1116/6.0004669
Published: June 2025
View article titled, Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
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Journal Articles

Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package

Editor’s PickFree
Alaina Humiston, Miu Lun Lau, Tim Stack, Evan Restuccia, Alberto Herrera-Gomez, Min Long, Daniel T. Olive, Jeff Terry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043411 (2025)
https://doi.org/10.1116/6.0004326
Published: June 2025
View article titled, Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package
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Journal Articles

AI-guided frame prediction techniques to model single crystal diamond growth

Free
Rohan Reddy Mekala, Arjun Srinivasan, Matthias Muehle, Elias Garratt, Adam Porter, Mikael Lindvall
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032708 (2025)
https://doi.org/10.1116/6.0004290
Published: May 2025
View article titled, AI-guided frame prediction techniques to model single crystal diamond growth
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Journal Articles

Benchmarking large language models for materials synthesis: The case of atomic layer deposition

FeaturedScilightFree
Angel Yanguas-Gil, Matthew T. Dearing, Jeffrey W. Elam, Jessica C. Jones, Sungjoon Kim, Adnan Mohammad, Chi Thang Nguyen, Bratin Sengupta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032406 (2025)
https://doi.org/10.1116/6.0004319
Published: April 2025
View article titled, Benchmarking large language models for materials synthesis: The case of atomic layer deposition
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Journal Articles

Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy

Editor’s PickOpen Access
Tiffany C. Kaspar, Sarah Akers, Henry W. Sprueill, Arman H. Ter-Petrosyan, Jenna A. Bilbrey, Derek Hopkins, Ajay Harilal, Jijo Christudasjustus, Patrick Gemperline, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032702 (2025)
https://doi.org/10.1116/6.0004493
Published: March 2025
View article titled, Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
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Journal Articles

On simulating thin-film processes at the atomic scale using machine-learned force fields

Editor’s PickFree
S. Kondati Natarajan, J. Schneider, N. Pandey, J. Wellendorff, S. Smidstrup
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033404 (2025)
https://doi.org/10.1116/6.0004288
Published: March 2025
View article titled, On simulating thin-film processes at the atomic scale using machine-learned force fields
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Journal Articles

Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning

Editor’s PickFree
Patrick T. Gemperline, Rajendra Paudel, Rama K. Vasudevan, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032701 (2025)
https://doi.org/10.1116/6.0004400
Published: March 2025
View article titled, Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning
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Journal Articles

Applications of machine learning in ion beam analysis of materials

Free
Tiago Fiorini da Silva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 020803 (2025)
https://doi.org/10.1116/6.0004277
Published: February 2025
View article titled, Applications of machine learning in ion beam analysis of materials
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Journal Articles

Novel secondary ion mass spectrometry identification system for organic materials using random forest

Free
Tetsuya Masuda, Miya Fujita, Tomikazu Ueno, Daisuke Hayashi, Satoka Aoyagi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023204 (2025)
https://doi.org/10.1116/6.0004260
Published: February 2025
View article titled, Novel secondary ion mass spectrometry identification system for organic materials using random forest
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Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

Available to Purchase
Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View article titled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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Journal Articles

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

Editor’s PickFree
Andreas Kounis-Melas, Joseph R. Vella, Athanassios Z. Panagiotopoulos, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012603 (2025)
https://doi.org/10.1116/6.0004027
Published: January 2025
View article titled, Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions
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Journal Articles

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Editor’s PickFree
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053405 (2024)
https://doi.org/10.1116/6.0003817
Published: August 2024
View article titled, Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates
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Journal Articles

Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra

Editor’s PickFree
Fatima Jenina Arellano, Minoru Kusaba, Stephen Wu, Ryo Yoshida, Zoltán Donkó, Peter Hartmann, Tsanko V. Tsankov, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053001 (2024)
https://doi.org/10.1116/6.0003731
Published: July 2024
View article titled, Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra
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Journal Articles

Case study in machine learning for predicting moderate pressure plasma behavior

Available to Purchase
Shadhin Hussain, David J. Lary, Kentaro Hara, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043001 (2024)
https://doi.org/10.1116/6.0003434
Published: May 2024
View article titled, Case study in machine learning for predicting moderate pressure plasma behavior
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Journal Articles

Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon

FeaturedAvailable to Purchase
F. K. Urban, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043401 (2024)
https://doi.org/10.1116/6.0003548
Published: May 2024
View article titled, Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon
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Journal Articles

Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature

FeaturedOpen Access
F. Bock, F. Tasnádi, I. A. Abrikosov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013412 (2024)
https://doi.org/10.1116/6.0003260
Published: January 2024
View article titled, Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature
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Journal Articles

Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning

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Dehen Cao, Shimin Yu, Zili Chen, Yu Wang, Hongyu Wang, Zhipeng Chen, Wei Jiang, Ya Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013001 (2024)
https://doi.org/10.1116/5.0173921
Published: December 2023
View article titled, Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning
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Journal Articles

Materials characterization: Can artificial intelligence be used to address reproducibility challenges?

Available to Purchase
Miu Lun Lau, Abraham Burleigh, Jeff Terry, Min Long
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 060801 (2023)
https://doi.org/10.1116/6.0002809
Published: November 2023
View article titled, Materials characterization: Can artificial intelligence be used to address reproducibility challenges?
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Journal Articles

Real-time artificial intelligence enhanced defect engineering in CeO2 nanostructures

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Udit Kumar, Ayush Arunachalam, Corbin Feit, S. Novia Berriel, Kanad Basu, Parag Banerjee, Sudipta Seal
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062409 (2023)
https://doi.org/10.1116/6.0002912
Published: November 2023
View article titled, Real-time artificial intelligence enhanced defect engineering in CeO2 nanostructures
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Includes: Supplementary data
Journal Articles

Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

Open Access
Wil Gardner, David A. Winkler, David L. J. Alexander, Davide Ballabio, Benjamin W. Muir, Paul J. Pigram
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063204 (2023)
https://doi.org/10.1116/6.0002788
Published: September 2023
View article titled, Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models
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Includes: Supplementary data