1-20 of 30
Artificial neural networks
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning

Editor’s PickAvailable to Purchase
Jianming Guo, Zhiping Mou, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043005 (2025)
https://doi.org/10.1116/6.0004669
Published: June 2025
View articletitled, Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
Open the PDF for Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning in another window
Journal Articles

Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy

Editor’s PickOpen Access
Tiffany C. Kaspar, Sarah Akers, Henry W. Sprueill, Arman H. Ter-Petrosyan, Jenna A. Bilbrey, Derek Hopkins, Ajay Harilal, Jijo Christudasjustus, Patrick Gemperline, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032702 (2025)
https://doi.org/10.1116/6.0004493
Published: March 2025
View articletitled, Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
Open the PDF for Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy in another window
Journal Articles

Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes

Available to Purchase
Kirill Trunov, Viktor Kraiushkin, Andrei Zenkevich, Anton Khanas
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033002 (2025)
https://doi.org/10.1116/6.0004433
Published: March 2025
View articletitled, Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes
Open the PDF for Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes in another window
Journal Articles

Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning

Editor’s PickAvailable to Purchase
Patrick T. Gemperline, Rajendra Paudel, Rama K. Vasudevan, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032701 (2025)
https://doi.org/10.1116/6.0004400
Published: March 2025
View articletitled, Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning
Open the PDF for Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning in another window
Journal Articles

Applications of machine learning in ion beam analysis of materials

Available to Purchase
Tiago Fiorini da Silva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 020803 (2025)
https://doi.org/10.1116/6.0004277
Published: February 2025
View articletitled, Applications of machine learning in ion beam analysis of materials
Open the PDF for Applications of machine learning in ion beam analysis of materials in another window
Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

Available to Purchase
Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View articletitled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
Open the PDF for Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization in another window
Journal Articles

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

Editor’s PickFree
Andreas Kounis-Melas, Joseph R. Vella, Athanassios Z. Panagiotopoulos, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012603 (2025)
https://doi.org/10.1116/6.0004027
Published: January 2025
View articletitled, Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions
Open the PDF for Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions in another window
Journal Articles

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Editor’s PickAvailable to Purchase
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053405 (2024)
https://doi.org/10.1116/6.0003817
Published: August 2024
View articletitled, Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates
Open the PDF for Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates in another window
Journal Articles

Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra

Editor’s PickAvailable to Purchase
Fatima Jenina Arellano, Minoru Kusaba, Stephen Wu, Ryo Yoshida, Zoltán Donkó, Peter Hartmann, Tsanko V. Tsankov, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053001 (2024)
https://doi.org/10.1116/6.0003731
Published: July 2024
View articletitled, Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra
Open the PDF for Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra in another window
Journal Articles

Case study in machine learning for predicting moderate pressure plasma behavior

Available to Purchase
Shadhin Hussain, David J. Lary, Kentaro Hara, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043001 (2024)
https://doi.org/10.1116/6.0003434
Published: May 2024
View articletitled, Case study in machine learning for predicting moderate pressure plasma behavior
Open the PDF for Case study in machine learning for predicting moderate pressure plasma behavior in another window
Journal Articles

Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon

FeaturedAvailable to Purchase
F. K. Urban, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043401 (2024)
https://doi.org/10.1116/6.0003548
Published: May 2024
View articletitled, Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon
Open the PDF for Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon in another window
Journal Articles

Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control

FeaturedAvailable to Purchase
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023404 (2024)
https://doi.org/10.1116/6.0003196
Published: January 2024
View articletitled, Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control
Open the PDF for Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control in another window
Journal Articles

Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning

Available to Purchase
Dehen Cao, Shimin Yu, Zili Chen, Yu Wang, Hongyu Wang, Zhipeng Chen, Wei Jiang, Ya Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013001 (2024)
https://doi.org/10.1116/5.0173921
Published: December 2023
View articletitled, Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning
Open the PDF for Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning in another window
Journal Articles

Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models

Open Access
Wil Gardner, David A. Winkler, David L. J. Alexander, Davide Ballabio, Benjamin W. Muir, Paul J. Pigram
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063204 (2023)
https://doi.org/10.1116/6.0002788
Published: September 2023
View articletitled, Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models
Open the PDF for Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models in another window
Includes: Supplementary data
Journal Articles

Application of machine learning to spectrum and image data

Editor’s PickOpen Access
Satoka Aoyagi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063202 (2023)
https://doi.org/10.1116/6.0002858
Published: September 2023
View articletitled, Application of machine learning to spectrum and image data
Open the PDF for Application of machine learning to spectrum and image data in another window
Includes: Supplementary data
Journal Articles

Machine learning and atomic layer deposition: Predicting saturation times from reactor growth profiles using artificial neural networks

Editor’s PickFree
Angel Yanguas-Gil, Jeffrey W. Elam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 062408 (2022)
https://doi.org/10.1116/6.0001973
Published: November 2022
View articletitled, Machine learning and atomic layer deposition: Predicting saturation times from reactor growth profiles using artificial neural networks
Open the PDF for Machine learning and atomic layer deposition: Predicting saturation times from reactor growth profiles using artificial neural networks in another window
Journal Articles

Review Article: Tools and trends for probing brain neurochemistry

FeaturedScilightOpen Access
Abraham G. Beyene, Sarah J. Yang, Markita P. Landry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 040802 (2019)
https://doi.org/10.1116/1.5051047
Published: June 2019
View articletitled, Review Article: Tools and trends for probing brain neurochemistry
Open the PDF for Review Article: Tools and trends for probing brain neurochemistry in another window
Journal Articles

Feedback control of HfO 2 etch processing in inductively coupled Cl 2 / N 2 / Ar plasmas

Available to Purchase
Chaung Lin, Keh-Chyang Leou, Ting-Chieh Li, Lurng-Shehng Lee, Pei-Jer Tzeng
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 1282–1286 (2008)
https://doi.org/10.1116/1.2966438
Published: August 2008
View articletitled, Feedback control of HfO 2 etch processing in inductively coupled Cl 2 / N 2 / Ar plasmas
Open the PDF for Feedback control of HfO 2 etch processing in inductively coupled Cl 2 / N 2 / Ar plasmas in another window
Journal Articles

Plasma control using neural network and optical emission spectroscopy

Available to Purchase
Byungwhan Kim, Jung Ki Bae, Wan-Shick Hong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 355–358 (2005)
https://doi.org/10.1116/1.1851542
Published: March 2005
View articletitled, Plasma control using neural network and optical emission spectroscopy
Open the PDF for Plasma control using neural network and optical emission spectroscopy in another window
Journal Articles

Prediction of SiC etching in a N F 3 ∕ C H 4 plasma using neural network

Available to Purchase
Byungwhan Kim, Byung Teak Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 2517–2522 (2004)
https://doi.org/10.1116/1.1810169
Published: November 2004
View articletitled, Prediction of SiC etching in a N F 3 ∕ C H 4 plasma using neural network
Open the PDF for Prediction of SiC etching in a N F 3 ∕ C H 4 plasma using neural network in another window