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Journal Articles

Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning

Editor’s PickAvailable to Purchase
Jianming Guo, Zhiping Mou, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043005 (2025)
https://doi.org/10.1116/6.0004669
Published: June 2025
View articletitled, Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning
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Journal Articles

Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package

Editor’s PickAvailable to Purchase
Alaina Humiston, Miu Lun Lau, Tim Stack, Evan Restuccia, Alberto Herrera-Gomez, Min Long, Daniel T. Olive, Jeff Terry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 043411 (2025)
https://doi.org/10.1116/6.0004326
Published: June 2025
View articletitled, Analysis of x-ray emission spectroscopy (XES) data using artificial intelligence techniques included in the XES Neo package
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Journal Articles

AI-guided frame prediction techniques to model single crystal diamond growth

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Rohan Reddy Mekala, Arjun Srinivasan, Matthias Muehle, Elias Garratt, Adam Porter, Mikael Lindvall
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032708 (2025)
https://doi.org/10.1116/6.0004290
Published: May 2025
View articletitled, AI-guided frame prediction techniques to model single crystal diamond growth
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Journal Articles

Benchmarking large language models for materials synthesis: The case of atomic layer deposition

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Angel Yanguas-Gil, Matthew T. Dearing, Jeffrey W. Elam, Jessica C. Jones, Sungjoon Kim, Adnan Mohammad, Chi Thang Nguyen, Bratin Sengupta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032406 (2025)
https://doi.org/10.1116/6.0004319
Published: April 2025
View articletitled, Benchmarking large language models for materials synthesis: The case of atomic layer deposition
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Journal Articles

Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy

Editor’s PickOpen Access
Tiffany C. Kaspar, Sarah Akers, Henry W. Sprueill, Arman H. Ter-Petrosyan, Jenna A. Bilbrey, Derek Hopkins, Ajay Harilal, Jijo Christudasjustus, Patrick Gemperline, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032702 (2025)
https://doi.org/10.1116/6.0004493
Published: March 2025
View articletitled, Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
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Journal Articles

On simulating thin-film processes at the atomic scale using machine-learned force fields

Editor’s PickAvailable to Purchase
S. Kondati Natarajan, J. Schneider, N. Pandey, J. Wellendorff, S. Smidstrup
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033404 (2025)
https://doi.org/10.1116/6.0004288
Published: March 2025
View articletitled, On simulating thin-film processes at the atomic scale using machine-learned force fields
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Journal Articles

Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes

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Kirill Trunov, Viktor Kraiushkin, Andrei Zenkevich, Anton Khanas
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033002 (2025)
https://doi.org/10.1116/6.0004433
Published: March 2025
View articletitled, Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes
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Journal Articles

Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning

Editor’s PickAvailable to Purchase
Patrick T. Gemperline, Rajendra Paudel, Rama K. Vasudevan, Ryan B. Comes
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032701 (2025)
https://doi.org/10.1116/6.0004400
Published: March 2025
View articletitled, Improvement of data analytics techniques in reflection high-energy electron diffraction to enable machine learning
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Journal Articles

Applications of machine learning in ion beam analysis of materials

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Tiago Fiorini da Silva
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 020803 (2025)
https://doi.org/10.1116/6.0004277
Published: February 2025
View articletitled, Applications of machine learning in ion beam analysis of materials
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Journal Articles

Novel secondary ion mass spectrometry identification system for organic materials using random forest

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Tetsuya Masuda, Miya Fujita, Tomikazu Ueno, Daisuke Hayashi, Satoka Aoyagi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023204 (2025)
https://doi.org/10.1116/6.0004260
Published: February 2025
View articletitled, Novel secondary ion mass spectrometry identification system for organic materials using random forest
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Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

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Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View articletitled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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Journal Articles

Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions

Editor’s PickFree
Andreas Kounis-Melas, Joseph R. Vella, Athanassios Z. Panagiotopoulos, David B. Graves
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012603 (2025)
https://doi.org/10.1116/6.0004027
Published: January 2025
View articletitled, Deep potential molecular dynamics simulations of low-temperature plasma-surface interactions
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Journal Articles

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Editor’s PickAvailable to Purchase
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053405 (2024)
https://doi.org/10.1116/6.0003817
Published: August 2024
View articletitled, Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates
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Journal Articles

Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra

Editor’s PickAvailable to Purchase
Fatima Jenina Arellano, Minoru Kusaba, Stephen Wu, Ryo Yoshida, Zoltán Donkó, Peter Hartmann, Tsanko V. Tsankov, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053001 (2024)
https://doi.org/10.1116/6.0003731
Published: July 2024
View articletitled, Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra
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Journal Articles

Case study in machine learning for predicting moderate pressure plasma behavior

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Shadhin Hussain, David J. Lary, Kentaro Hara, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043001 (2024)
https://doi.org/10.1116/6.0003434
Published: May 2024
View articletitled, Case study in machine learning for predicting moderate pressure plasma behavior
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Journal Articles

Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon

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F. K. Urban, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043401 (2024)
https://doi.org/10.1116/6.0003548
Published: May 2024
View articletitled, Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon
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Journal Articles

Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control

FeaturedAvailable to Purchase
F. K. Urban, III, D. Barton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 023404 (2024)
https://doi.org/10.1116/6.0003196
Published: January 2024
View articletitled, Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control
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Journal Articles

Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature

FeaturedOpen Access
F. Bock, F. Tasnádi, I. A. Abrikosov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013412 (2024)
https://doi.org/10.1116/6.0003260
Published: January 2024
View articletitled, Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature
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Journal Articles

Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning

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Dehen Cao, Shimin Yu, Zili Chen, Yu Wang, Hongyu Wang, Zhipeng Chen, Wei Jiang, Ya Zhang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013001 (2024)
https://doi.org/10.1116/5.0173921
Published: December 2023
View articletitled, Optimizing impedance matching parameters for single-frequency capacitively coupled plasma via machine learning
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Journal Articles

Materials characterization: Can artificial intelligence be used to address reproducibility challenges?

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Miu Lun Lau, Abraham Burleigh, Jeff Terry, Min Long
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 060801 (2023)
https://doi.org/10.1116/6.0002809
Published: November 2023
View articletitled, Materials characterization: Can artificial intelligence be used to address reproducibility challenges?
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