1-20 of 83
Environmental pollution
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Quantifying the resonant photoemission of radiation damaged Pu

J. G. Tobin, S.-W. Yu, B. W. Chung
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053201 (2024)
https://doi.org/10.1116/6.0003764
Published: July 2024
View article titled, Quantifying the resonant photoemission of radiation damaged Pu
Open the PDF for Quantifying the resonant photoemission of radiation damaged Pu in another window
Journal Articles

Plasma atomic layer etching of SiO2 with a low global warming potential fluorocarbon precursor (C6F6)

Inho Seong, Yebin You, Youngseok Lee, Minsu Choi, Dain Sung, Geunyoung Yeom, ShinJae You
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 032601 (2024)
https://doi.org/10.1116/6.0003345
Published: April 2024
View article titled, Plasma atomic layer etching of SiO<sub>2</sub> with a low global warming potential fluorocarbon precursor (C<sub>6</sub>F<sub>6</sub>)
Open the PDF for Plasma atomic layer etching of SiO<sub>2</sub> with a low global warming potential fluorocarbon precursor (C<sub>6</sub>F<sub>6</sub>) in another window
Journal Articles

Vapor-phase grafting of functional silanes on atomic layer deposited Al2O3

Editor’s Pick
Vepa Rozyyev, Rahul Shevate, Rajesh Pathak, Julia G. Murphy, Anil U. Mane, S. J. Sibener, Jeffrey W. Elam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 032408 (2023)
https://doi.org/10.1116/6.0002364
Published: April 2023
View article titled, Vapor-phase grafting of functional silanes on atomic layer deposited Al<sub>2</sub>O<sub>3</sub>
Open the PDF for Vapor-phase grafting of functional silanes on atomic layer deposited Al<sub>2</sub>O<sub>3</sub> in another window
Includes: Supplementary data
Journal Articles

Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles

Ryota Kazama, Taichi Watanabe, Shungo Zen, Nozomi Takeuchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063008 (2022)
https://doi.org/10.1116/6.0001861
Published: November 2022
View article titled, Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles
Open the PDF for Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles in another window
Journal Articles

Degradation of methylene blue by pulsed nanosecond discharge in Ar, O2, and N2 gaseous bubbles in water: Evaluation of direct and postprocessing modes

Naomi Bourbeau, Laure Soussan, Ahmad Hamdan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 053003 (2022)
https://doi.org/10.1116/6.0001968
Published: August 2022
View article titled, Degradation of methylene blue by pulsed nanosecond discharge in Ar, O<sub>2</sub>, and N<sub>2</sub> gaseous bubbles in water: Evaluation of direct and postprocessing modes
Open the PDF for Degradation of methylene blue by pulsed nanosecond discharge in Ar, O<sub>2</sub>, and N<sub>2</sub> gaseous bubbles in water: Evaluation of direct and postprocessing modes in another window
Journal Articles

Plasma-jet sterilization enhanced by ion wind

Scilight
Hongcheng Zhu, Linxiu Jiang, Shouru Xie, Yongrong Jiang, Hua Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 033001 (2021)
https://doi.org/10.1116/6.0000703
Published: March 2021
View article titled, Plasma-jet sterilization enhanced by ion wind
Open the PDF for Plasma-jet sterilization enhanced by ion wind in another window
Journal Articles

Sputter deposition and thermal evaporation of Li2O, Li2S, and Li2Se films

Editor’s Pick
Simon Lorger, Dieter Fischer, Robert Usiskin, Joachim Maier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 061515 (2019)
https://doi.org/10.1116/1.5123439
Published: November 2019
View article titled, Sputter deposition and thermal evaporation of Li<sub>2</sub>O, Li<sub>2</sub>S, and Li<sub>2</sub>Se films
Open the PDF for Sputter deposition and thermal evaporation of Li<sub>2</sub>O, Li<sub>2</sub>S, and Li<sub>2</sub>Se films in another window
Includes: Supplementary data
Journal Articles

Effect of ozone concentration on atomic layer deposited tin oxide

Hyunwoo Park, Joohyun Park, Seokyoon Shin, Giyul Ham, Hyeongsu Choi, Seungjin Lee, Namgue Lee, Sejin Kwon, Minwook Bang, Juhyun Lee, Bumsik Kim, Hyeongtag Jeon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 051509 (2018)
https://doi.org/10.1116/1.5027550
Published: August 2018
View article titled, Effect of ozone concentration on atomic layer deposited tin oxide
Open the PDF for Effect of ozone concentration on atomic layer deposited tin oxide in another window
Includes: Supplementary data
Journal Articles

Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors

Editor’s Pick
Nick M. Sbrockey, Gary S. Tompa, Robert Lavelle, Kathleen A. Trumbull, Mark A. Fanton, David W. Snyder, Ronald G. Polcawich, Daniel M. Potrepka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031509 (2018)
https://doi.org/10.1116/1.5014030
Published: April 2018
View article titled, Atomic layer deposition of PbTiO<sub>3</sub> and PbZr<sub>x</sub>Ti<sub>1-x</sub>O<sub>3</sub> films using metal alkyl and alkylamide precursors
Open the PDF for Atomic layer deposition of PbTiO<sub>3</sub> and PbZr<sub>x</sub>Ti<sub>1-x</sub>O<sub>3</sub> films using metal alkyl and alkylamide precursors in another window
Journal Articles

Treatment of SU-8 surfaces using atmospheric pressure dielectric barrier discharge plasma

Juliana de Novais Schianti, Fellype do Nascimento, Jhonattan Cordoba Ramirez, Munemasa Machida, Lucas Heitzmann Gabrielli, Hugo Enrique Hernandez-Figueroa, Stanislav Moshkalev
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021403 (2018)
https://doi.org/10.1116/1.4999045
Published: February 2018
View article titled, Treatment of SU-8 surfaces using atmospheric pressure dielectric barrier discharge plasma
Open the PDF for Treatment of SU-8 surfaces using atmospheric pressure dielectric barrier discharge plasma in another window
Includes: Supplementary data
Journal Articles

Atomic layer deposition of carbon doped silicon oxide by precursor design and process tuning

Meiliang Wang, Haripin Chandra, Xinjian Lei, Anupama Mallikarjunan, Kirk Cuthill, Manchao Xiao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021509 (2018)
https://doi.org/10.1116/1.5003176
Published: January 2018
View article titled, Atomic layer deposition of carbon doped silicon oxide by precursor design and process tuning
Open the PDF for Atomic layer deposition of carbon doped silicon oxide by precursor design and process tuning in another window
Journal Articles

Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes

Alexander S. Yersak, Kashish Sharma, Jasmine M. Wallas, Arrelaine A. Dameron, Xuemin Li, Yongan Yang, Katherine E. Hurst, Chunmei Ban, Robert C. Tenent, Steven M. George
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A123 (2018)
https://doi.org/10.1116/1.5006670
Published: December 2017
View article titled, Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes
Open the PDF for Spatial atomic layer deposition for coating flexible porous Li-ion battery electrodes in another window
Journal Articles

Growth behavior and structural analysis of atomic layer deposited SnxTi1−xOy films

Siliang Chang, Christos G. Takoudis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A121 (2018)
https://doi.org/10.1116/1.5004993
Published: December 2017
View article titled, Growth behavior and structural analysis of atomic layer deposited Sn<sub>x</sub>Ti<sub>1−x</sub>O<sub>y</sub> films
Open the PDF for Growth behavior and structural analysis of atomic layer deposited Sn<sub>x</sub>Ti<sub>1−x</sub>O<sub>y</sub> films in another window
Includes: Supplementary data
Journal Articles

Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnOx as conductive gas diffusion barrier

Lukas Hoffmann, Detlef Theirich, Daniel Schlamm, Tim Hasselmann, Sven Pack, Kai Oliver Brinkmann, Detlef Rogalla, Sven Peters, André Räupke, Hassan Gargouri, Thomas Riedl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A112 (2018)
https://doi.org/10.1116/1.5006781
Published: December 2017
View article titled, Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO<sub>x</sub> as conductive gas diffusion barrier
Open the PDF for Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO<sub>x</sub> as conductive gas diffusion barrier in another window
Includes: Supplementary data
Journal Articles

Plasma enhanced atomic layer deposition of aluminum sulfide thin films

Editor’s Pick
Jakob Kuhs, Zeger Hens, Christophe Detavernier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A113 (2018)
https://doi.org/10.1116/1.5003339
Published: December 2017
View article titled, Plasma enhanced atomic layer deposition of aluminum sulfide thin films
Open the PDF for Plasma enhanced atomic layer deposition of aluminum sulfide thin films in another window
Journal Articles

Unoccupied surface state induced by ozone and ammonia on H-terminated diamond electrodes for photocatalytic ammonia synthesis

Editor’s Pick
Idris Boukahil, Phillip S. Johnson, F. J. Himpsel, Ruimin Qiao, Jason A. Bandy, Robert J. Hamers
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 04D102 (2017)
https://doi.org/10.1116/1.4980041
Published: April 2017
View article titled, Unoccupied surface state induced by ozone and ammonia on H-terminated diamond electrodes for photocatalytic ammonia synthesis
Open the PDF for Unoccupied surface state induced by ozone and ammonia on H-terminated diamond electrodes for photocatalytic ammonia synthesis in another window
Journal Articles

Room temperature TiO2 atomic layer deposition on collagen membrane from a titanium alkylamide precursor

Editor’s Pick
Arghya K. Bishal, Cortino Sukotjo, Christos G. Takoudis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B134 (2017)
https://doi.org/10.1116/1.4972245
Published: December 2016
View article titled, Room temperature TiO<sub>2</sub> atomic layer deposition on collagen membrane from a titanium alkylamide precursor
Open the PDF for Room temperature TiO<sub>2</sub> atomic layer deposition on collagen membrane from a titanium alkylamide precursor in another window
Journal Articles

Atomic layer deposition of Al2O3 for single electron transistors utilizing Pt oxidation and reduction

Michael S. McConnell, Louisa C. Schneider, Golnaz Karbasian, Sergei Rouvimov, Alexei O. Orlov, Gregory L. Snider
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 01A139 (2016)
https://doi.org/10.1116/1.4937992
Published: December 2015
View article titled, Atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> for single electron transistors utilizing Pt oxidation and reduction
Open the PDF for Atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> for single electron transistors utilizing Pt oxidation and reduction in another window
Journal Articles

Low temperature temporal and spatial atomic layer deposition of TiO2 films

Morteza Aghaee, Philipp S. Maydannik, Petri Johansson, Jurkka Kuusipalo, Mariadriana Creatore, Tomáš Homola, David C. Cameron
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041512 (2015)
https://doi.org/10.1116/1.4922588
Published: June 2015
View article titled, Low temperature temporal and spatial atomic layer deposition of TiO<sub>2</sub> films
Open the PDF for Low temperature temporal and spatial atomic layer deposition of TiO<sub>2</sub> films in another window
Journal Articles

Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Bodo Kalkofen, Akinwumi A. Amusan, Muhammad S. K. Bukhari, Bernd Garke, Marco Lisker, Hassan Gargouri, Edmund P. Burte
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 031512 (2015)
https://doi.org/10.1116/1.4917552
Published: April 2015
View article titled, Use of B<sub>2</sub>O<sub>3</sub> films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
Open the PDF for Use of B<sub>2</sub>O<sub>3</sub> films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon in another window