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Journal Articles

Introduction to reproducible laboratory hard x-ray photoelectron spectroscopy

Featured
Kateryna Artyushkova, Stuart R. Leadley, Alexander G. Shard
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052801 (2024)
https://doi.org/10.1116/6.0003740
Published: July 2024
View article titled, Introduction to reproducible laboratory hard x-ray photoelectron spectroscopy
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Journal Articles

Nanometer-scale depth-resolved hard x-ray absorption spectroscopy based on the detection of energy-loss Auger electrons with low energies

Noritake Isomura, Keiichiro Oh-ishi, Naoko Takahashi, Satoru Kosaka
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063204 (2022)
https://doi.org/10.1116/6.0002131
Published: October 2022
View article titled, Nanometer-scale depth-resolved hard x-ray absorption spectroscopy based on the detection of energy-loss Auger electrons with low energies
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Includes: Supplementary data
Journal Articles

Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes

Featured
Gerd Schönhense, Hans-Joachim Elmers
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 020802 (2022)
https://doi.org/10.1116/6.0001500
Published: January 2022
View article titled, Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes
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Journal Articles

Hard x-ray photoelectron spectroscopy of tunable oxide interfaces

Martina Müller, Patrick Lömker, Paul Rosenberger, Mai Hussein Hamed, David N. Mueller, Ronja A. Heinen, Thomas Szyjka, Lutz Baumgarten
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013215 (2022)
https://doi.org/10.1116/6.0001491
Published: December 2021
View article titled, Hard x-ray photoelectron spectroscopy of tunable oxide interfaces
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Journal Articles

Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se2 interface

Dirk Hauschild, Ralph Steininger, Dimitrios Hariskos, Wolfram Witte, Sven Tougaard, Clemens Heske, Lothar Weinhardt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063216 (2021)
https://doi.org/10.1116/6.0001336
Published: October 2021
View article titled, Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se<sub>2</sub> interface
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Includes: Supplementary data
Journal Articles

High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy

Julien E. Rault, Cheng-Tai Kuo, Henrique P. Martins, Giuseppina Conti, Slavomír Nemšák
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 060802 (2021)
https://doi.org/10.1116/6.0001289
Published: October 2021
View article titled, High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy
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Journal Articles

Exploration of the nonideal behavior observed in engineered, multilayer MgO/Ag/MgO photocathodes

ZhengRong Lee, Linda Spentzouris, Manfred Mascheck, Jeff Terry
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063202 (2021)
https://doi.org/10.1116/6.0001136
Published: September 2021
View article titled, Exploration of the nonideal behavior observed in engineered, multilayer MgO/Ag/MgO photocathodes
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Journal Articles

Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets

Editor’s Pick
Jonathan Holburg, Matthias Müller, Klaus Mann, Stephan Wieneke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031303 (2019)
https://doi.org/10.1116/1.5089201
Published: April 2019
View article titled, Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets
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Journal Articles

Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001)

Editor’s Pick
Jesús Redondo, Mykola Telychko, Pavel Procházka, Martin Konečný, Jan Berger, Martin Vondráček, Jan Čechal, Pavel Jelínek, Martin Švec
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031401 (2018)
https://doi.org/10.1116/1.5008977
Published: April 2018
View article titled, Simple device for the growth of micrometer-sized monocrystalline single-layer graphene on SiC(0001)
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Includes: Supplementary data
Journal Articles

Nonevaporable getter coating chambers for extreme high vacuum

Marcy L. Stutzman, Philip A. Adderley, Md Abdullah A. Mamun, Matt Poelker
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031603 (2018)
https://doi.org/10.1116/1.5010154
Published: March 2018
View article titled, Nonevaporable getter coating chambers for extreme high vacuum
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Journal Articles

In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells

Tian Zhang, Chang-Yeh Lee, Bin Gong, Sean Lim, Stuart Wenham, Bram Hoex
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031601 (2018)
https://doi.org/10.1116/1.5020339
Published: March 2018
View article titled, <em>In situ</em> x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WO<sub>x</sub> as hole-selective contacts for Si solar cells
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Includes: Supplementary data
Journal Articles

Remote doping of graphene on SiO2 with 5 keV x-rays in air

Björn Salzmann, Carlo Bernard, Adrian Hemmi, Thomas Greber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 020603 (2018)
https://doi.org/10.1116/1.5013003
Published: February 2018
View article titled, Remote doping of graphene on SiO<sub>2</sub> with 5 keV x-rays in air
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Journal Articles

Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing

Nicolaie Moldovan, Ralu Divan, Hongjun Zeng, Leonidas E. Ocola, Vincent De Andrade, Michael Wojcik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A124 (2018)
https://doi.org/10.1116/1.5003412
Published: December 2017
View article titled, Atomic layer deposition frequency-multiplied Fresnel zone plates for hard x-rays focusing
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Includes: Supplementary data
Journal Articles

Residual stress measurements in electron beam evaporated yttria doped zirconia films deposited on Si (111) substrates

Kamalan Kirubaharan Amirtharaj Moses, Kuppusami Parasuraman, Sujay Chakravarty, Arul Maximus Rabel, Anandh Jesuraj Selvaraj, Akash Singh
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021504 (2018)
https://doi.org/10.1116/1.5004229
Published: December 2017
View article titled, Residual stress measurements in electron beam evaporated yttria doped zirconia films deposited on Si (111) substrates
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Journal Articles

Solution processed ZnO homogeneous quasisuperlattice materials

Editor’s Pick
Darragh Buckley, David McNulty, Vitaly Zubialevich, Peter Parbrook, Colm O'Dwyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061517 (2017)
https://doi.org/10.1116/1.5001758
Published: November 2017
View article titled, Solution processed ZnO homogeneous quasisuperlattice materials
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Includes: Supplementary data
Journal Articles

Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides

Editor’s Pick
Petro Deminskyi, Ali Haider, Evgeniya Kovalska, Necmi Biyikli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A107 (2018)
https://doi.org/10.1116/1.5003421
Published: November 2017
View article titled, Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides
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Journal Articles

Revisiting the growth mechanism of atomic layer deposition of Al2O3: A vibrational sum-frequency generation study

Editor’s Pick
Vincent Vandalon, W. M. M. (Erwin) Kessels
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C313 (2017)
https://doi.org/10.1116/1.4993597
Published: July 2017
View article titled, Revisiting the growth mechanism of atomic layer deposition of Al<sub>2</sub>O<sub>3</sub>: A vibrational sum-frequency generation study
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Includes: Supplementary data
Journal Articles

Hard x-ray photoemission study of oxidation states of Ti underlayer in Fe/Ti film system

Akito Takashima, Eiji Ikenaga, Takayuki Muro, Akio Kawabata, Tomo Murakami, Mizuhisa Nihei, Naoki Yokoyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021507 (2017)
https://doi.org/10.1116/1.4973964
Published: January 2017
View article titled, Hard x-ray photoemission study of oxidation states of Ti underlayer in Fe/Ti film system
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Journal Articles

Patterning optically clear films: Coplanar transparent and color-contrasted thin films from interdiffused electrodeposited and solution-processed metal oxides

Colm Glynn, Hugh Geaney, David McNulty, John O'Connell, Justin Holmes, Colm O'Dwyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 020602 (2017)
https://doi.org/10.1116/1.4968549
Published: November 2016
View article titled, Patterning optically clear films: Coplanar transparent and color-contrasted thin films from interdiffused electrodeposited and solution-processed metal oxides
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Includes: Supplementary data
Journal Articles

Plasma-free atomic layer deposition of Ru thin films using H2 molecules as a nonoxidizing reactant

Seung-Joon Lee, Soo-Hyun Kim, Masayuki Saito, Kazuharu Suzuki, Shunichi Nabeya, Jeongyeop Lee, Sangdeok Kim, Seungjin Yeom, Do-Joong Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031509 (2016)
https://doi.org/10.1116/1.4946755
Published: April 2016
View article titled, Plasma-free atomic layer deposition of Ru thin films using H<sub>2</sub> molecules as a nonoxidizing reactant
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