1-20 of 181
Ultraviolet light
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

MOCVD grown ultraviolet microlight-emitting diodes with an InGaN/GaN/AlGaN active region design

Guangying Wang, Yuting Li, Cheng Liu, Qinchen Lin, Surjava Sanyal, Chirag Gupta, Shubhra S. Pasayat
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062706 (2023)
https://doi.org/10.1116/6.0002996
Published: November 2023
View article titled, MOCVD grown ultraviolet microlight-emitting diodes with an InGaN/GaN/AlGaN active region design
Open the PDF for MOCVD grown ultraviolet microlight-emitting diodes with an InGaN/GaN/AlGaN active region design in another window
Journal Articles

Measurements and model of UV-induced oxidation of aluminum

Robert F. Berg, Charles Tarrio, Thomas B. Lucatorto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033204 (2023)
https://doi.org/10.1116/6.0002432
Published: March 2023
View article titled, Measurements and model of UV-induced oxidation of aluminum
Open the PDF for Measurements and model of UV-induced oxidation of aluminum in another window
Journal Articles

Deep UV AlGaN LED reliability for long duration space missions

Benjamin C. Letson, Simon Barke, Peter Wass, Guido Mueller, Fan Ren, Stephen J. Pearton, John W. Conklin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013202 (2023)
https://doi.org/10.1116/6.0002199
Published: December 2022
View article titled, Deep UV AlGaN LED reliability for long duration space missions
Open the PDF for Deep UV AlGaN LED reliability for long duration space missions in another window
Journal Articles

Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants

Muhammad Farooq, Siddiqa Ismail, N. U. Rehman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 013001 (2023)
https://doi.org/10.1116/6.0002064
Published: December 2022
View article titled, Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants
Open the PDF for Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants in another window
Journal Articles

Characterization of vacuum ultraviolet-irradiated surface modification of CoO(111) crystal by low-energy atom scattering spectroscopy

G. Tan, H. Fukuta, K. K. H. De Silva, A. Matsuda, M. Yoshimura, M. Yoshimoto, K. Umezawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063202 (2022)
https://doi.org/10.1116/6.0001971
Published: September 2022
View article titled, Characterization of vacuum ultraviolet-irradiated surface modification of CoO(111) crystal by low-energy atom scattering spectroscopy
Open the PDF for Characterization of vacuum ultraviolet-irradiated surface modification of CoO(111) crystal by low-energy atom scattering spectroscopy in another window
Journal Articles

Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al2O3

Konner E. K. Holden, Shane M. Witsell, Paul C. Lemaire, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 040401 (2022)
https://doi.org/10.1116/6.0001865
Published: May 2022
View article titled, Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al<sub>2</sub>O<sub>3</sub>
Open the PDF for Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al<sub>2</sub>O<sub>3</sub> in another window
Includes: Supplementary data
Journal Articles

Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes

Gerd Schönhense, Hans-Joachim Elmers
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 020802 (2022)
https://doi.org/10.1116/6.0001500
Published: January 2022
View article titled, Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes
Open the PDF for Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes in another window
Journal Articles

Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching

Clarence Y. Chan, Shunya Namiki, Jennifer K. Hite, Michael A. Mastro, Syed B. Qadri, Xiuling Li
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 053212 (2021)
https://doi.org/10.1116/6.0001231
Published: August 2021
View article titled, Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching
Open the PDF for Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching in another window
Includes: Supplementary data
Journal Articles

Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity

Adam Pranda, Chen Li, Youngsik Seo, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043001 (2021)
https://doi.org/10.1116/6.0001015
Published: May 2021
View article titled, Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity
Open the PDF for Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity in another window
Journal Articles

Effect of anti-reflection coating on the performance of silicon solar cells with nanocrystalline quantum dots downshifting film

Ala H. Sabeeh, Alyssa N. Brigman, Jerzy Ruzyllo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 032802 (2021)
https://doi.org/10.1116/6.0000833
Published: May 2021
View article titled, Effect of anti-reflection coating on the performance of silicon solar cells with nanocrystalline quantum dots downshifting film
Open the PDF for Effect of anti-reflection coating on the performance of silicon solar cells with nanocrystalline quantum dots downshifting film in another window
Journal Articles

Vacuum ultraviolet enhanced atomic layer etching of ruthenium films

Brennan M. Coffey, Himamshu C. Nallan, John G. Ekerdt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 012601 (2021)
https://doi.org/10.1116/6.0000742
Published: December 2020
View article titled, Vacuum ultraviolet enhanced atomic layer etching of ruthenium films
Open the PDF for Vacuum ultraviolet enhanced atomic layer etching of ruthenium films in another window
Includes: Supplementary data
Journal Articles

Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction

Yashuang Zheng, Lijun Wang, Peter Bruggeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063005 (2020)
https://doi.org/10.1116/6.0000575
Published: October 2020
View article titled, Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction
Open the PDF for Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction in another window
Journal Articles

Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor

Robert Soriano, Gilles Cunge, Nader Sadeghi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043002 (2020)
https://doi.org/10.1116/6.0000134
Published: June 2020
View article titled, Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor
Open the PDF for Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor in another window
Journal Articles

Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

Luxherta Buzi, Hiroyuki Miyazoe, Matthew. P. Sagianis, Nathan Marchack, John M. Papalia, Sebastian. U. Engelmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033006 (2020)
https://doi.org/10.1116/1.5143032
Published: March 2020
View article titled, Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
Open the PDF for Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations in another window
Journal Articles

Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics

Askar A. Rezvanov, Andrey V. Miakonkikh, Dmitry S. Seregin, Alexey S. Vishnevskiy, Konstantin A. Vorotilov, Konstantin V. Rudenko, Mikhail R. Baklanov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033005 (2020)
https://doi.org/10.1116/1.5143417
Published: March 2020
View article titled, Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics
Open the PDF for Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics in another window
Includes: Supplementary data
Journal Articles

Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma

Emilia W. Hirsch, Linfeng Du, Demetre J. Economou, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 023009 (2020)
https://doi.org/10.1116/1.5138189
Published: January 2020
View article titled, Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma
Open the PDF for Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma in another window
Journal Articles

High responsivity tin gallium oxide Schottky ultraviolet photodetectors

Partha Mukhopadhyay, Winston V. Schoenfeld
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 013403 (2020)
https://doi.org/10.1116/1.5128911
Published: December 2019
View article titled, High responsivity tin gallium oxide Schottky ultraviolet photodetectors
Open the PDF for High responsivity tin gallium oxide Schottky ultraviolet photodetectors in another window
Journal Articles

Atomic layer defect-free etching for germanium using HBr neutral beam

Takuya Fujii, Daisuke Ohori, Shuichi Noda, Yosuke Tanimoto, Daisuke Sato, Hideyuki Kurihara, Wataru Mizubayashi, Kazuhiko Endo, Yiming Li, Yao-Jen Lee, Takuya Ozaki, Seiji Samukawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 051001 (2019)
https://doi.org/10.1116/1.5100547
Published: July 2019
View article titled, Atomic layer defect-free etching for germanium using HBr neutral beam
Open the PDF for Atomic layer defect-free etching for germanium using HBr neutral beam in another window
Journal Articles

Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets

Jonathan Holburg, Matthias Müller, Klaus Mann, Stephan Wieneke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 031303 (2019)
https://doi.org/10.1116/1.5089201
Published: April 2019
View article titled, Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets
Open the PDF for Brilliance improvement of laser-produced extreme ultraviolet and soft x-ray plasmas based on pulsed gas jets in another window
Journal Articles

Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam

Daisuke Ohori, Takuya Fujii, Shuichi Noda, Wataru Mizubayashi, Kazuhiko Endo, En-Tzu Lee, Yiming Li, Yao-Jen Lee, Takuya Ozaki, Seiji Samukawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 021003 (2019)
https://doi.org/10.1116/1.5079692
Published: January 2019
View article titled, Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam
Open the PDF for Atomic layer germanium etching for 3D Fin-FET using chlorine neutral beam in another window