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Journal Articles

Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride

Hankyu Kim, Miso Kim, Bumsang Kim, Bonggeun Shong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063409 (2023)
https://doi.org/10.1116/6.0002966
Published: October 2023
View article titled, Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride
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Includes: Supplementary data
Journal Articles

Solid-source metal-organic MBE for elemental Ir and Ru films

Sreejith Nair, Kyle Noordhoek, Dooyong Lee, Christopher J. Bartel, Bharat Jalan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062701 (2023)
https://doi.org/10.1116/6.0002955
Published: September 2023
View article titled, Solid-source metal-organic MBE for elemental Ir and Ru films
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Includes: Supplementary data
Journal Articles

Structure evolution and mechanical properties of Al-alloyed tantalum diboride films prepared by magnetron sputtering co-deposition

Viktor Šroba, Tomáš Fiantok, Martin Truchlý, Tomáš Roch, Branislav Grančič, Katarína Viskupová, Leonid Satrapinskyy, Peter Švec, Jr., Štefan Nagy, Vitalii Izai, Peter Kúš, Marián Mikula
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023410 (2023)
https://doi.org/10.1116/6.0002390
Published: March 2023
View article titled, Structure evolution and mechanical properties of Al-alloyed tantalum diboride films prepared by magnetron sputtering co-deposition
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Journal Articles

Effects of metal redeposition in plasma sputtering

Kei Kiyokawa, Reiko Saito, Masato Morita, Tetsuo Sakamoto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063009 (2022)
https://doi.org/10.1116/6.0002204
Published: November 2022
View article titled, Effects of metal redeposition in plasma sputtering
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Includes: Supplementary data
Journal Articles

General method for predicting ZnO–metal interface termination: Extension of the method for Al2O3–metal systems

Michiko Yoshitake
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 063217 (2021)
https://doi.org/10.1116/6.0001312
Published: October 2021
View article titled, General method for predicting ZnO–metal interface termination: Extension of the method for Al<sub>2</sub>O<sub>3</sub>–metal systems
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Journal Articles

Investigations on Ba diffusion and SiO evaporation during BaSi2 film formation on Si substrates by thermal evaporation

Daisuke Yazawa, Kosuke O. Hara, Junji Yamanaka, Keisuke Arimoto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043410 (2021)
https://doi.org/10.1116/6.0001081
Published: May 2021
View article titled, Investigations on Ba diffusion and SiO evaporation during BaSi<sub>2</sub> film formation on Si substrates by thermal evaporation
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Includes: Supplementary data
Journal Articles

Review on recent progress in patterning phase change materials

Meihua Shen, Thorsten Lill, Nick Altieri, John Hoang, Steven Chiou, Jim Sims, Andrew McKerrow, Rafal Dylewicz, Ernest Chen, Hamid Razavi, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 060802 (2020)
https://doi.org/10.1116/6.0000336
Published: September 2020
View article titled, Review on recent progress in patterning phase change materials
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Journal Articles

Estimating the thermochemical properties of trimethylaluminum for thin-film processing applications

Raymond A. Adomaitis
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 050602 (2018)
https://doi.org/10.1116/1.5045342
Published: August 2018
View article titled, Estimating the thermochemical properties of trimethylaluminum for thin-film processing applications
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Journal Articles

Review Article: Plasma–surface interactions at the atomic scale for patterning metals

Nicholas D. Altieri, Jack Kun-Chieh Chen, Luke Minardi, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C203 (2017)
https://doi.org/10.1116/1.4993602
Published: July 2017
View article titled, Review Article: Plasma–surface interactions at the atomic scale for patterning metals
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Journal Articles

Reactive ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles

Thomas Lautenschläger, Carsten Bundesmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041001 (2017)
https://doi.org/10.1116/1.4985050
Published: June 2017
View article titled, Reactive ion beam sputtering of Ti: Influence of process parameters on angular and energy distribution of sputtered and backscattered particles
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Journal Articles

Stable yttrium oxyfluoride used in plasma process chamber

Yoshinobu Shiba, Akinobu Teramoto, Tetsuya Goto, Yukio Kishi, Yasuyuki Shirai, Shigetoshi Sugawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021405 (2017)
https://doi.org/10.1116/1.4975143
Published: January 2017
View article titled, Stable yttrium oxyfluoride used in plasma process chamber
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Journal Articles

Interplay of composition, structure, and electron density of states in W-Os cathode materials and relationship with thermionic emission

Qunfei Zhou, Thomas John Balk, Matthew J. Beck
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021601 (2017)
https://doi.org/10.1116/1.4972857
Published: January 2017
View article titled, Interplay of composition, structure, and electron density of states in W-Os cathode materials and relationship with thermionic emission
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Journal Articles

Investigating routes toward atomic layer deposition of silicon carbide: Ab initio screening of potential silicon and carbon precursors

Ekaterina A. Filatova, Dennis Hausmann, Simon D. Elliott
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B103 (2017)
https://doi.org/10.1116/1.4964890
Published: October 2016
View article titled, Investigating routes toward atomic layer deposition of silicon carbide: <em>Ab initio</em> screening of potential silicon and carbon precursors
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Includes: Supplementary data
Journal Articles

Shape anisotropy and instability of holes formed during dewetting of single-crystal palladium and nickel films

Jongpil Ye
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 060601 (2015)
https://doi.org/10.1116/1.4926373
Published: July 2015
View article titled, Shape anisotropy and instability of holes formed during dewetting of single-crystal palladium and nickel films
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Journal Articles

Viable chemical approach for patterning nanoscale magnetoresistive random access memory

Taeseung Kim, Younghee Kim, Jack Kun-Chieh Chen, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021308 (2015)
https://doi.org/10.1116/1.4904215
Published: January 2015
View article titled, Viable chemical approach for patterning nanoscale magnetoresistive random access memory
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Includes: Supplementary data
Journal Articles

Thermodynamic assessment and experimental verification of reactive ion etching of magnetic metal elements

Taeseung Kim, Jack Kun-Chieh Chen, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 041305 (2014)
https://doi.org/10.1116/1.4885061
Published: June 2014
View article titled, Thermodynamic assessment and experimental verification of reactive ion etching of magnetic metal elements
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Journal Articles

Effect of WN content on toughness enhancement in V1−xWxN/MgO(001) thin films

H. Kindlund, D. G. Sangiovanni, J. Lu, J. Jensen, V. Chirita, I. Petrov, J. E. Greene, L. Hultman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 030603 (2014)
https://doi.org/10.1116/1.4867610
Published: March 2014
View article titled, Effect of WN content on toughness enhancement in V<sub>1−x</sub>W<sub>x</sub>N/MgO(001) thin films
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Journal Articles

Control of the interfacial abruptness of Au-catalyzed Si-Si1−xGex heterostructured nanowires grown by vapor–liquid–solid

Priyanka Periwal, Thierry Baron, Laurence Latu-Romain, Bassem Salem, Franck Bassani, Gilles Patriarche, Pascal Gentile
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 031101 (2014)
https://doi.org/10.1116/1.4867264
Published: March 2014
View article titled, Control of the interfacial abruptness of Au-catalyzed Si-Si<sub>1−x</sub>Ge<sub>x</sub> heterostructured nanowires grown by vapor–liquid–solid
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Journal Articles

Mechanical and tribological properties of Sn-Cu-O films prepared by reactive magnetron sputtering

Jindřich Musil, Martin Hromádka, Radomír Čerstvý, Zbyněk Soukup
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021504 (2014)
https://doi.org/10.1116/1.4859275
Published: January 2014
View article titled, Mechanical and tribological properties of Sn-Cu-O films prepared by reactive magnetron sputtering
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Journal Articles

Novel method for the prediction of an interface bonding species at alumina/metal interfaces

Michiko Yoshitake, Shinjiro Yagyu, Toyohiro Chikyow
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 021102 (2014)
https://doi.org/10.1116/1.4849375
Published: December 2013
View article titled, Novel method for the prediction of an interface bonding species at alumina/metal interfaces
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