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Journal Articles

Deposition and characterization of α-Fe2O3/Pd thin films for neutron reflectometry studies

Hanyu Wang, Ethan C. Self, Sadhvikas J. Addamane, Christopher M. Rouleau, Ryan R. Wixom, Katie L. Browning, Gabriel M. Veith, Liyuan Liang, James F. Browning
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053202 (2023)
https://doi.org/10.1116/6.0002717
Published: July 2023
View article titled, Deposition and characterization of α-Fe<sub>2</sub>O<sub>3</sub>/Pd thin films for neutron reflectometry studies
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Includes: Supplementary data
Journal Articles

Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage

Hardik Jain, Mariadriana Creatore, Paul Poodt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 012401 (2023)
https://doi.org/10.1116/6.0002249
Published: December 2022
View article titled, Molecular layer deposition of alucone in high aspect ratio trenches: The effect of TMA outgassing on step-coverage
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Journal Articles

Sticking probabilities of H2O and Al(CH3)3 during atomic layer deposition of Al2O3 extracted from their impact on film conformality

Karsten Arts, Vincent Vandalon, Riikka L. Puurunen, Mikko Utriainen, Feng Gao, Wilhelmus M. M. (Erwin) Kessels, Harm C. M. Knoops
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 030908 (2019)
https://doi.org/10.1116/1.5093620
Published: April 2019
View article titled, Sticking probabilities of H<sub>2</sub>O and Al(CH<sub>3</sub>)<sub>3</sub> during atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> extracted from their impact on film conformality
Open the PDF for Sticking probabilities of H<sub>2</sub>O and Al(CH<sub>3</sub>)<sub>3</sub> during atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> extracted from their impact on film conformality in another window
Journal Articles

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Oili M. E. Ylivaara, Lauri Kilpi, Xuwen Liu, Sakari Sintonen, Saima Ali, Mikko Laitinen, Jaakko Julin, Eero Haimi, Timo Sajavaara, Harri Lipsanen, Simo-Pekka Hannula, Helena Ronkainen, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01B105 (2017)
https://doi.org/10.1116/1.4966198
Published: November 2016
View article titled, Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties
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Journal Articles

Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis

Feng Gao, Sanna Arpiainen, Riikka L. Puurunen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 010601 (2015)
https://doi.org/10.1116/1.4903941
Published: December 2014
View article titled, Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis
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Journal Articles

Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness

Alexander S. Yersak, Yung C. Lee, Joseph A. Spencer, Markus D. Groner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 01A130 (2014)
https://doi.org/10.1116/1.4850176
Published: December 2013
View article titled, Atmospheric pressure spatial atomic layer deposition web coating with <em>in situ</em> monitoring of film thickness
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of TiN for the fabrication of nanomechanical resonators

Nathan Nelson-Fitzpatrick, Csaba Guthy, Somayyeh Poshtiban, Eric Finley, Kenneth D. Harris, Brian J. Worfolk, Stephane Evoy
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 021503 (2013)
https://doi.org/10.1116/1.4790132
Published: February 2013
View article titled, Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
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Journal Articles

Cross characterization of ultrathin interlayers in HfO2 high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry

Matus Banyay, Larissa Juschkin, Eric Bersch, Daniel Franca, Michael Liehr, Alain Diebold
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 041506 (2012)
https://doi.org/10.1116/1.4718433
Published: May 2012
View article titled, Cross characterization of ultrathin interlayers in HfO<sub>2</sub> high-k stacks by angle resolved x-ray photoelectron spectroscopy, medium energy ion scattering, and grazing incidence extreme ultraviolet reflectometry
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Journal Articles

Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation

H. Sinha, D. B. Straight, J. L. Lauer, N. C. Fuller, S. U. Engelmann, Y. Zhang, G. A. Antonelli, M. Severson, Y. Nishi, J. L. Shohet
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 1316–1318 (2010)
https://doi.org/10.1116/1.3488594
Published: September 2010
View article titled, Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation
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Journal Articles

High magnetization Fe Co ∕ Pd multilayers

M. J. Walock, H. Ambaye, M. Chshiev, F. R. Klose, W. H. Butler, G. J. Mankey
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 731–734 (2008)
https://doi.org/10.1116/1.2830631
Published: June 2008
View article titled, High magnetization Fe Co ∕ Pd multilayers
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Journal Articles

Experimental study of Cr ∕ Sc multilayer mirrors for the nitrogen K α -emission line

Aurélie Hardouin, Franck Delmotte, Marie Françoise Ravet, Françoise Bridou, Arnaud Jerome, Françoise Varniere, Claude Montcalm, Sébastien Hedacq, Eric Gullikson, Pascal Aubert
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 26, 333–337 (2008)
https://doi.org/10.1116/1.2891248
Published: March 2008
View article titled, Experimental study of Cr ∕ Sc multilayer mirrors for the nitrogen K α -emission line
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Journal Articles

Thermal stability of Ti Al N ∕ Ti Al O N ∕ Si 3 N 4 tandem absorbers prepared by reactive direct current magnetron sputtering

Harish C. Barshilia, N. Selvakumar, K. S. Rajam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 383–390 (2007)
https://doi.org/10.1116/1.2699425
Published: February 2007
View article titled, Thermal stability of Ti Al N ∕ Ti Al O N ∕ Si 3 N 4 tandem absorbers prepared by reactive direct current magnetron sputtering
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Journal Articles

Characterization of fluorine-modified organosilicate glass

Chi-Wen Liu, Ying-Lang Wang, Yungder Juang, Shiuh-Ko JangJean, Wen-His Lee
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 2076–2081 (2006)
https://doi.org/10.1116/1.2348644
Published: October 2006
View article titled, Characterization of fluorine-modified organosilicate glass
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Journal Articles

Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics

F. Salmassi, P. P. Naulleau, E. M. Gullikson, D. L. Olynick, J. A. Liddle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1136–1140 (2006)
https://doi.org/10.1116/1.2212435
Published: June 2006
View article titled, Extreme ultraviolet binary phase gratings: Fabrication and application to diffractive optics
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Journal Articles

Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy

M. P. Seah
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 1564–1571 (2004)
https://doi.org/10.1116/1.1705594
Published: July 2004
View article titled, Intercomparison of silicon dioxide thickness measurements made by multiple techniques: The route to accuracy
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Journal Articles

Deep in situ dry-etch monitoring of III-V multilayer structures using laser reflectometry and reflectivity modeling

H. Moussa, R. Daneau, C. Mériadec, L. Manin, I. Sagnes, R. Raj
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 20, 748–753 (2002)
https://doi.org/10.1116/1.1468652
Published: May 2002
View article titled, Deep <em>in situ</em> dry-etch monitoring of III-V multilayer structures using laser reflectometry and reflectivity modeling
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Journal Articles

Kinetic investigation of copper film oxidation by spectroscopic ellipsometry and reflectometry

Yao Zhi Hu, Rahul Sharangpani, Sing-Pin Tay
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 2527–2532 (2000)
https://doi.org/10.1116/1.1287156
Published: September 2000
View article titled, Kinetic investigation of copper film oxidation by spectroscopic ellipsometry and reflectometry
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Journal Articles

Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber window

Milad F. Tabet, Umesh Kelkar, William A. McGahan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1704–1708 (2000)
https://doi.org/10.1116/1.582411
Published: July 2000
View article titled, Integrated measurement of Ti and TiN thickness and optical constants using reflectance data through a vacuum chamber window
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Journal Articles

Operating high-density plasma sources in a low-density range: Applications to metal etch processes

P. Czuprynski, O. Joubert, L. Vallier, N. Sadeghi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 2572–2580 (1999)
https://doi.org/10.1116/1.581998
Published: September 1999
View article titled, Operating high-density plasma sources in a low-density range: Applications to metal etch processes
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Journal Articles

Thickness and index measurement of transparent thin films using neural network processed reflectance data

Milad F. Tabet, William A. McGahan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 1836–1839 (1999)
https://doi.org/10.1116/1.581900
Published: July 1999
View article titled, Thickness and index measurement of transparent thin films using neural network processed reflectance data
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