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Journal Articles

Design of a custom vapor transport co-deposition system for scalable production of perovskite solar cells

Ella Wassweiler, Anurag Panda, Tamar Kadosh, Thienan Nguyen, Wan-Ju Hsu, Emma Pettit, Russell J. Holmes, Harry Tuller, Vladimir Bulovic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 052801 (2023)
https://doi.org/10.1116/6.0002668
Published: July 2023
View article titled, Design of a custom vapor transport co-deposition system for scalable production of perovskite solar cells
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Includes: Supplementary data
Journal Articles

Comparative study of two atomic layer etching processes for GaN

Cédric Mannequin, Christophe Vallée, Katsuhiro Akimoto, Thierry Chevolleau, Christophe Durand, Christian Dussarrat, Takashi Teramoto, Etienne Gheeraert, Henri Mariette
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 032602 (2020)
https://doi.org/10.1116/1.5134130
Published: March 2020
View article titled, Comparative study of two atomic layer etching processes for GaN
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Includes: Supplementary data
Journal Articles

Investigating recent developments and applications of optical plasma spectroscopy: A review

Angela R. Hanna, Ellen R. Fisher
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 020806 (2020)
https://doi.org/10.1116/1.5141844
Published: February 2020
View article titled, Investigating recent developments and applications of optical plasma spectroscopy: A review
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Includes: Supplementary data
Journal Articles

Hydrophobic surface modification of polymethyl methacrylate by two-dimensional plasma jet array at atmospheric pressure

Feng Liu, Meiling Cai, Bo Zhang, Zhi Fang, Chunqi Jiang, Kostya (Ken) Ostrikov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 061302 (2018)
https://doi.org/10.1116/1.5030718
Published: October 2018
View article titled, Hydrophobic surface modification of polymethyl methacrylate by two-dimensional plasma jet array at atmospheric pressure
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Journal Articles

New leak element based on graphene oxide membranes

Donghui Meng, Rongxin Yan, Guohua Ren, Lichen Sun, Lina Wang, Chongwu Guo, Li Wang, Rongping Shao, Yong Wang, Wei Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 041603 (2018)
https://doi.org/10.1116/1.5035347
Published: June 2018
View article titled, New leak element based on graphene oxide membranes
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Journal Articles

Impact of plasma jet geometry on residence times of radical species

James Lalor, Laurence Scally, Patrick J. Cullen, Vladimir Milosavljević
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 03E108 (2018)
https://doi.org/10.1116/1.5022294
Published: May 2018
View article titled, Impact of plasma jet geometry on residence times of radical species
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Journal Articles

Modeling and experimental demonstration of high-throughput flow-through spatial atomic layer deposition of Al2O3 coatings on textiles at atmospheric pressure

Moataz Bellah M. Mousa, Jennifer S. Ovental, Alexandra H. Brozena, Christopher J. Oldham, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031517 (2018)
https://doi.org/10.1116/1.5022077
Published: May 2018
View article titled, Modeling and experimental demonstration of high-throughput flow-through spatial atomic layer deposition of Al<sub>2</sub>O<sub>3</sub> coatings on textiles at atmospheric pressure
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Journal Articles

Review Article: Recommended practice for calibrating vacuum gauges of the ionization type

James A. Fedchak, Patrick J. Abbott, Jay H. Hendricks, Paul C. Arnold, Neil T. Peacock
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 030802 (2018)
https://doi.org/10.1116/1.5025060
Published: April 2018
View article titled, Review Article: Recommended practice for calibrating vacuum gauges of the ionization type
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Journal Articles

Comparisons of NF3 plasma-cleaned Y2O3, YOF, and YF3 chamber coatings during silicon etching in Cl2 plasmas

Tianyu Ma, Tyler List, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031305 (2018)
https://doi.org/10.1116/1.5026777
Published: April 2018
View article titled, Comparisons of NF<sub>3</sub> plasma-cleaned Y<sub>2</sub>O<sub>3</sub>, YOF, and YF<sub>3</sub> chamber coatings during silicon etching in Cl<sub>2</sub> plasmas
Open the PDF for Comparisons of NF<sub>3</sub> plasma-cleaned Y<sub>2</sub>O<sub>3</sub>, YOF, and YF<sub>3</sub> chamber coatings during silicon etching in Cl<sub>2</sub> plasmas in another window
Journal Articles

Quantitative measurements of various gases in high and ultrahigh vacuum

Hajime Yoshida, Kenta Arai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 031604 (2018)
https://doi.org/10.1116/1.5018210
Published: March 2018
View article titled, Quantitative measurements of various gases in high and ultrahigh vacuum
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Journal Articles

Interferometry of plasma bursts in helium atmospheric-pressure plasma jets

Vladimir Samara, Sylwia Ptasinska
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 04F402 (2018)
https://doi.org/10.1116/1.5023113
Published: March 2018
View article titled, Interferometry of plasma bursts in helium atmospheric-pressure plasma jets
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Includes: Supplementary data
Journal Articles

Amorphous gallium oxide grown by low-temperature PECVD

Eiji Kobayashi, Mathieu Boccard, Quentin Jeangros, Nathan Rodkey, Daniel Vresilovic, Aïcha Hessler-Wyser, Max Döbeli, Daniel Franta, Stefaan De Wolf, Monica Morales-Masis, Christophe Ballif
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021518 (2018)
https://doi.org/10.1116/1.5018800
Published: March 2018
View article titled, Amorphous gallium oxide grown by low-temperature PECVD
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Includes: Supplementary data
Journal Articles

Numerical study on the fluid dynamical aspects of atomic layer deposition process

Petteri Peltonen, Ville Vuorinen, Giovanni Marin, Antti J. Karttunen, Maarit Karppinen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021516 (2018)
https://doi.org/10.1116/1.5018475
Published: February 2018
View article titled, Numerical study on the fluid dynamical aspects of atomic layer deposition process
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Journal Articles

Characterization of particle generated during plasma-enhanced chemical vapor deposition on amorphous carbon layer using particle beam mass spectrometer

Dongbin Kim, TaeWan Kim, Sang Hyun Park, Sung Kyu Lim, Hyo-Chang Lee, Taesung Kim, Sang-Woo Kang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021506 (2018)
https://doi.org/10.1116/1.5000087
Published: December 2017
View article titled, Characterization of particle generated during plasma-enhanced chemical vapor deposition on amorphous carbon layer using particle beam mass spectrometer
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Journal Articles

Low temperature plasma enhanced deposition of GaP films on Si substrate

Alexander S. Gudovskikh, Ivan A. Morozov, Alexander V. Uvarov, Dmitriy A. Kudryashov, Ekaterina V. Nikitina, Anton S. Bukatin, Vladimir N. Nevedomskiy, Jean-Paul Kleider
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021302 (2018)
https://doi.org/10.1116/1.4999409
Published: December 2017
View article titled, Low temperature plasma enhanced deposition of GaP films on Si substrate
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Journal Articles

Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis

Jiun-Ruey Chen, Wenyu Zhang, Rambert K. Nahm, Michael A. DiFeo, James R. Engstrom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061604 (2017)
https://doi.org/10.1116/1.4996553
Published: November 2017
View article titled, Design and characterization of a microreactor for spatially confined atomic layer deposition and <em>in situ</em> UHV surface analysis
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Journal Articles

Fourier transform infrared spectroscopy of trifluoroiodomethane plasma

Cassius J. F. Fagioli, David Urrabazo, Matthew J. Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061305 (2017)
https://doi.org/10.1116/1.4986503
Published: August 2017
View article titled, Fourier transform infrared spectroscopy of trifluoroiodomethane plasma
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Journal Articles

Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques

Jiří Kohout, Jincheng Qian, Thomas Schmitt, Richard Vernhes, Oleg Zabeida, Jolanta Klemberg-Sapieha, Ludvik Martinu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061505 (2017)
https://doi.org/10.1116/1.4999460
Published: August 2017
View article titled, Hard AlN films prepared by low duty cycle magnetron sputtering and by other deposition techniques
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Journal Articles

Interaction of ammonia and hydrogen with tungsten at elevated temperature studied by gas flow through a capillary

Sabina Markelj, Anže Založnik, Iztok Čadež
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061602 (2017)
https://doi.org/10.1116/1.4995373
Published: August 2017
View article titled, Interaction of ammonia and hydrogen with tungsten at elevated temperature studied by gas flow through a capillary
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Journal Articles

Cyclic Cl2/H2 quasi-atomic layer etching approach for TiN and TaN patterning using organic masks

Nathan Marchack, John M. Papalia, Sebastian Engelmann, Eric A. Joseph
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C314 (2017)
https://doi.org/10.1116/1.4995413
Published: July 2017
View article titled, Cyclic Cl<sub>2</sub>/H<sub>2</sub> quasi-atomic layer etching approach for TiN and TaN patterning using organic masks
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