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Journal Articles

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

F. K. Urban, III, D. Barton

J. Vac. Sci. Technol. A 42, 053405 (2024)

https://doi.org/10.1116/6.0003817

Published: August 2024

View article titled, Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Journal Articles

Co-deposition of bismuth-nitrogen films on MgO (001) by molecular beam epitaxy

Ashok Shrestha, Ali Abbas, David C. Ingram, Arthur R. Smith

J. Vac. Sci. Technol. A 42, 023407 (2024)

https://doi.org/10.1116/6.0003118

Published: January 2024

View article titled, Co-deposition of bismuth-nitrogen films on MgO (001) by molecular beam epitaxy

Journal Articles

Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control

F. K. Urban, III, D. Barton

J. Vac. Sci. Technol. A 42, 023404 (2024)

https://doi.org/10.1116/6.0003196

Published: January 2024

View article titled, Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control

Journal Articles

In situ spectroscopic ellipsometry and rigorous coupled wave analysis for real time profile evolution of atomic layer deposited films inside SiO₂ nanotrenches

S. Novia Berriel, Corbin Feit, Nick Keller, Nicholas G. Rudawski, Parag Banerjee

J. Vac. Sci. Technol. A 40, 062403 (2022)

https://doi.org/10.1116/6.0001937

Published: September 2022

View article titled, In situ spectroscopic ellipsometry and rigorous coupled wave analysis for real time profile evolution of atomic layer deposited films inside SiO2 nanotrenches

Includes: Supplementary data

Journal Articles

Machine learning approach to thickness prediction from in situ spectroscopic ellipsometry data for atomic layer deposition processes

Ayush Arunachalam, S. Novia Berriel, Corbin Feit, Udit Kumar, Sudipta Seal, Kanad Basu, Parag Banerjee

J. Vac. Sci. Technol. A 40, 012405 (2022)

https://doi.org/10.1116/6.0001482

Published: December 2021

View article titled, Machine learning approach to thickness prediction from in situ spectroscopic ellipsometry data for atomic layer deposition processes

Journal Articles

Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

Saidjafarzoda Ilhom, Deepa Shukla, Adnan Mohammad, John Grasso, Brian Willis, Necmi Biyikli

J. Vac. Sci. Technol. A 38, 022405 (2020)

https://doi.org/10.1116/1.5128663

Published: January 2020

View article titled, Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

Includes: Supplementary data

Journal Articles

Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

Kazuki Yoshida, Kentaro Tokoro, Kensaku Kanomata, Masanori Miura, Kentaro Saito, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose

J. Vac. Sci. Technol. A 37, 060901 (2019)

https://doi.org/10.1116/1.5116844

Published: September 2019

View article titled, Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

Journal Articles

Initial reactions of ultrathin HfO₂ films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Seok Hwan Kim, Wooseok Song, In Su Jeon, Sun Sook Lee, Taek-Mo Chung, Ki-Seok An

J. Vac. Sci. Technol. A 36, 02D402 (2018)

https://doi.org/10.1116/1.5015946

Published: February 2018

View article titled, Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Journal Articles

In situ absolute magnetometry in an UHV scanning probe microscope using conducting polymer-thin film

Kapildeb Ambal, Clayton C. Williams, Christoph Boehme

J. Vac. Sci. Technol. A 35, 021602 (2017)

https://doi.org/10.1116/1.4973920

Published: January 2017

View article titled, In situ absolute magnetometry in an UHV scanning probe microscope using conducting polymer-thin film

Journal Articles

Mechanistic modeling study of atomic layer deposition process optimization in a fluidized bed reactor

Chen-Long Duan, Peng-Hui Zhu, Zhang Deng, Yun Li, Bin Shan, Hai-Sheng Fang, Guang Feng, Rong Chen

J. Vac. Sci. Technol. A 35, 01B102 (2017)

https://doi.org/10.1116/1.4964848

Published: October 2016

View article titled, Mechanistic modeling study of atomic layer deposition process optimization in a fluidized bed reactor

Journal Articles

In situ process monitoring during multistage coevaporation of Cu₂ZnSnS₄ thin films

Takahiro Mise, Shin Tajima, Tatsuo Fukano, Kazuo Higuchi, Hironori Katagiri

J. Vac. Sci. Technol. A 33, 021206 (2015)

https://doi.org/10.1116/1.4906787

Published: February 2015

View article titled, In situ process monitoring during multistage coevaporation of Cu2ZnSnS4 thin films

Journal Articles

Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO₂ using tetrakis(dimethylamido)titanium and water

Brent A. Sperling, John Hoang, William A. Kimes, James E. Maslar, Kristen L. Steffens, Nhan V. Nguyen

J. Vac. Sci. Technol. A 32, 031513 (2014)

https://doi.org/10.1116/1.4872166

Published: April 2014

View article titled, Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO2 using tetrakis(dimethylamido)titanium and water

Journal Articles

Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness

Alexander S. Yersak, Yung C. Lee, Joseph A. Spencer, Markus D. Groner

J. Vac. Sci. Technol. A 32, 01A130 (2014)

https://doi.org/10.1116/1.4850176

Published: December 2013

View article titled, Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness

Includes: Supplementary data

Journal Articles

Optimized MEMS Pirani sensor with increased pressure measurement sensitivity in the fine and high vacuum regime

Friedemann Völklein, Mario Grau, Andreas Meier, Grit Hemer, Lars Breuer, Peter Woias

J. Vac. Sci. Technol. A 31, 061604 (2013)

https://doi.org/10.1116/1.4819783

Published: September 2013

View article titled, Optimized MEMS Pirani sensor with increased pressure measurement sensitivity in the fine and high vacuum regime

Journal Articles

Surface characterization of nanomaterials and nanoparticles: Important needs and challenging opportunities

Donald R. Baer, Mark H. Engelhard, Grant E. Johnson, Julia Laskin, Jinfeng Lai, Karl Mueller, Prabhakaran Munusamy, Suntharampillai Thevuthasan, Hongfei Wang, Nancy Washton, Alison Elder, Brittany L. Baisch, Ajay Karakoti, Satyanarayana V. N. T. Kuchibhatla, DaeWon Moon

J. Vac. Sci. Technol. A 31, 050820 (2013)

https://doi.org/10.1116/1.4818423

Published: August 2013

View article titled, Surface characterization of nanomaterials and nanoparticles: Important needs and challenging opportunities

Journal Articles

Effect of surface contamination on electron tunneling in the high bias range

Hailang Qin, Kuan Eng Johnson Goh, Michel Bosman, Xiang Li, Kin Leong Pey, Cedric Troadec

J. Vac. Sci. Technol. A 30, 041402 (2012)

https://doi.org/10.1116/1.4721640

Published: May 2012

View article titled, Effect of surface contamination on electron tunneling in the high bias range

Journal Articles

Electrical properties and stability of an epitaxial alumina film formed on Cu-9 at. % Al(111)

Michiko Yoshitake, Takahiro Nagata, Weijie Song

J. Vac. Sci. Technol. A 30, 021509 (2012)

https://doi.org/10.1116/1.3688493

Published: February 2012

View article titled, Electrical properties and stability of an epitaxial alumina film formed on Cu-9 at. % Al(111)

Journal Articles

Thickness monitoring of graphene on SiC using low-energy electron diffraction

P. J. Fisher, Luxmi, N. Srivastava, S. Nie, R. M. Feenstra

J. Vac. Sci. Technol. A 28, 958–962 (2010)

https://doi.org/10.1116/1.3301621

Published: June 2010

View article titled, Thickness monitoring of graphene on SiC using low-energy electron diffraction

Journal Articles

In situ monitoring of material processing by a pulsed laser beam coupled via a lensed fiber into a scanning electron microscope

David J. Hwang, Nipun Misra, Costas P. Grigoropoulos, Andrew M. Minor, Samuel S. Mao

J. Vac. Sci. Technol. A 26, 1432–1438 (2008)

https://doi.org/10.1116/1.2987946

Published: October 2008

View article titled, In situ monitoring of material processing by a pulsed laser beam coupled via a lensed fiber into a scanning electron microscope

Journal Articles

Real-time monitoring of successive sparks in high-density plasma chambers

Michio Sato, Hiroto Ohtake, Koichi Suzuki, Seiji Samukawa

J. Vac. Sci. Technol. A 25, 1594–1598 (2007)

https://doi.org/10.1116/1.2796180

Published: October 2007

View article titled, Real-time monitoring of successive sparks in high-density plasma chambers

NARROW

Topics

Numerical ellipsometry: AI for real-time, in situ process control for absorbing films growing on unknown transparent substrates

Co-deposition of bismuth-nitrogen films on MgO (001) by molecular beam epitaxy

Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control

In situ spectroscopic ellipsometry and rigorous coupled wave analysis for real time profile evolution of atomic layer deposited films inside SiO₂ nanotrenches

Machine learning approach to thickness prediction from in situ spectroscopic ellipsometry data for atomic layer deposition processes

Understanding the role of rf-power on AlN film properties in hollow-cathode plasma-assisted atomic layer deposition

Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid

Initial reactions of ultrathin HfO₂ films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

In situ absolute magnetometry in an UHV scanning probe microscope using conducting polymer-thin film

Mechanistic modeling study of atomic layer deposition process optimization in a fluidized bed reactor

In situ process monitoring during multistage coevaporation of Cu₂ZnSnS₄ thin films

Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO₂ using tetrakis(dimethylamido)titanium and water

Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness

Optimized MEMS Pirani sensor with increased pressure measurement sensitivity in the fine and high vacuum regime

Surface characterization of nanomaterials and nanoparticles: Important needs and challenging opportunities

Effect of surface contamination on electron tunneling in the high bias range

Electrical properties and stability of an epitaxial alumina film formed on Cu-9 at. % Al(111)

Thickness monitoring of graphene on SiC using low-energy electron diffraction

In situ monitoring of material processing by a pulsed laser beam coupled via a lensed fiber into a scanning electron microscope

Real-time monitoring of successive sparks in high-density plasma chambers

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