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Journal Articles

Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations

Luxherta Buzi, Hiroyuki Miyazoe, Matthew. P. Sagianis, Nathan Marchack, John M. Papalia, Sebastian. U. Engelmann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033006 (2020)
https://doi.org/10.1116/1.5143032
Published: March 2020
View article titled, Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
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Journal Articles

Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy

Shyam Sridhar, Lei Liu, Emilia W. Hirsch, Vincent M. Donnelly, Demetre J. Economou
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061303 (2016)
https://doi.org/10.1116/1.4964641
Published: October 2016
View article titled, Insights into the mechanism of in-plasma photo-assisted etching using optical emission spectroscopy
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Journal Articles

Vapor deposition of molybdenum oxide using bis(ethylbenzene) molybdenum and water

Tasha L. Drake, Peter C. Stair
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051403 (2016)
https://doi.org/10.1116/1.4959532
Published: August 2016
View article titled, Vapor deposition of molybdenum oxide using bis(ethylbenzene) molybdenum and water
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Journal Articles

F-atom kinetics in SF6/Ar inductively coupled plasmas

Wei Yang, Shu-Xia Zhao, De-Qi Wen, Wei Liu, Yong-Xin Liu, Xue-Chun Li, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031305 (2016)
https://doi.org/10.1116/1.4945003
Published: March 2016
View article titled, F-atom kinetics in SF<sub>6</sub>/Ar inductively coupled plasmas
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Journal Articles

Surface chemistry of InP ridge structures etched in Cl2-based plasma analyzed with angular XPS

Sophie Bouchoule, Romain Chanson, Arnaud Pageau, Edmond Cambril, Stephane Guilet, Ahmed Rhallabi, Christophe Cardinaud
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 05E124 (2015)
https://doi.org/10.1116/1.4927541
Published: August 2015
View article titled, Surface chemistry of InP ridge structures etched in Cl<sub>2</sub>-based plasma analyzed with angular XPS
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Journal Articles

Chamber wall interactions with HBr/Cl2/O2 plasmas

Ashutosh K. Srivastava, Tomohiro Ohashi, Vincent M. Donnelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041301 (2015)
https://doi.org/10.1116/1.4920933
Published: May 2015
View article titled, Chamber wall interactions with HBr/Cl<sub>2</sub>/O<sub>2</sub> plasmas
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Journal Articles

Low damage etching method of low-k material with a neutral beam for interlayer dielectric of semiconductor device

Seung Hyun Kang, Jong Kyu Kim, Sung Ho Lee, Jin Woo Kim, Geun Young Yeom
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021309 (2015)
https://doi.org/10.1116/1.4905736
Published: January 2015
View article titled, Low damage etching method of low-k material with a neutral beam for interlayer dielectric of semiconductor device
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Journal Articles

Effect of conductive TiN buffer layer on the growth of stoichiometric VO2 films and the out-of-plane insulator–metal transition properties

Md. Suruz Mian, Kunio Okimura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 041502 (2014)
https://doi.org/10.1116/1.4874844
Published: May 2014
View article titled, Effect of conductive TiN buffer layer on the growth of stoichiometric VO<sub>2</sub> films and the out-of-plane insulator–metal transition properties
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Journal Articles

Portable total reflection x-ray fluorescence analysis in the identification of unknown laboratory hazards

Ying Liu, Susumu Imashuku, Nobuharu Sasaki, Long Ze, Jun Kawai, Shotaro Takano, Yoshiki Sohrin, Hiroko Seki, Hiroya Miyauchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 031401 (2014)
https://doi.org/10.1116/1.4867462
Published: March 2014
View article titled, Portable total reflection x-ray fluorescence analysis in the identification of unknown laboratory hazards
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Journal Articles

Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma

Tatsunori Koda, Hiroshi Toyota
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 02B104 (2014)
https://doi.org/10.1116/1.4832226
Published: November 2013
View article titled, Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma
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Journal Articles

Inductively coupled plasma–reactive ion etching of c- and a-plane AlGaN over the entire Al composition range: Effect of BCl3 pretreatment in Cl2/Ar plasma chemistry

Amit P. Shah, Masihhur R. Laskar, A. Azizur Rahman, Maheshwar R. Gokhale, Arnab Bhattacharya
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061305 (2013)
https://doi.org/10.1116/1.4818871
Published: August 2013
View article titled, Inductively coupled plasma–reactive ion etching of <em>c-</em> and <em>a-</em>plane AlGaN over the entire Al composition range: Effect of BCl<sub>3</sub> pretreatment in Cl<sub>2</sub>/Ar plasma chemistry
Open the PDF for Inductively coupled plasma–reactive ion etching of <em>c-</em> and <em>a-</em>plane AlGaN over the entire Al composition range: Effect of BCl<sub>3</sub> pretreatment in Cl<sub>2</sub>/Ar plasma chemistry in another window
Journal Articles

Effect of O2 gas partial pressure on mechanical properties of Al2O3 films deposited by inductively coupled plasma-assisted radio frequency magnetron sputtering

Hirokazu Fujiyama, Tsunetaka Sumomogi, Masayoshi Nakamura
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 051511 (2012)
https://doi.org/10.1116/1.4746013
Published: August 2012
View article titled, Effect of O<sub>2</sub> gas partial pressure on mechanical properties of Al<sub>2</sub>O<sub>3</sub> films deposited by inductively coupled plasma-assisted radio frequency magnetron sputtering
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Journal Articles

Low-temperature oriented growth of vanadium dioxide films on CoCrTa metal template on Si and vertical metal–insulator transition

Kunio Okimura, Md.Suruz Mian
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 051502 (2012)
https://doi.org/10.1116/1.4733995
Published: July 2012
View article titled, Low-temperature oriented growth of vanadium dioxide films on CoCrTa metal template on Si and vertical metal–insulator transition
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Journal Articles

Effect of Cl2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy

S. Bouchoule, L. Vallier, G. Patriarche, T. Chevolleau, C. Cardinaud
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 031301 (2012)
https://doi.org/10.1116/1.3692751
Published: March 2012
View article titled, Effect of Cl<sub>2</sub>- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using <em>in situ</em> x-ray photoelectron spectroscopy
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Journal Articles

Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline silicon

Sheng-Hui Chen, Shao-Ze Tseng, Wei Chen, Wen-Hao Cho, Chia-Hua Chan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 01A141 (2012)
https://doi.org/10.1116/1.3666040
Published: December 2011
View article titled, Wide-angle antireflection ZnO films on bullet-like nanostructures of multi-crystalline silicon
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Journal Articles

Cryogenic inductively coupled plasma etching for fabrication of tapered through-silicon vias

A. Kamto, R. Divan, A. V. Sumant, S. L. Burkett
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 719–725 (2010)
https://doi.org/10.1116/1.3281005
Published: June 2010
View article titled, Cryogenic inductively coupled plasma etching for fabrication of tapered through-silicon vias
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Journal Articles

Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography

Y. R. Park, J. H. Ahn, J. S. Kim, B. S. Kwon, N.-E. Lee, H. Y. Kang, C. K. Hwangbo, Jinho Ahn, Hwan Seok Seo
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 761–765 (2010)
https://doi.org/10.1116/1.3425639
Published: June 2010
View article titled, Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography
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Journal Articles

Model for aspect ratio dependent etch modulated processing

Peter J. Gilgunn, J. Fernando Alfaro, Gary K. Fedder
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 334–346 (2010)
https://doi.org/10.1116/1.3305716
Published: March 2010
View article titled, Model for aspect ratio dependent etch modulated processing
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Journal Articles

TaN metal gate etch mechanisms in B Cl 3 -based plasmas

Denis Shamiryan, Andrey Danila, Mikhail R. Baklanov, Werner Boullart
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 302–305 (2010)
https://doi.org/10.1116/1.3280170
Published: February 2010
View article titled, TaN metal gate etch mechanisms in B Cl 3 -based plasmas
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Journal Articles

Etching studies of silica glasses in SF 6 / Ar inductively coupled plasmas: Implications for microfluidic devices fabrication

L. Lallement, C. Gosse, C. Cardinaud, M.-C. Peignon-Fernandez, A. Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 277–286 (2010)
https://doi.org/10.1116/1.3298875
Published: February 2010
View article titled, Etching studies of silica glasses in SF 6 / Ar inductively coupled plasmas: Implications for microfluidic devices fabrication
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