1-20 of 29
Design of experiments
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Case study in machine learning for predicting moderate pressure plasma behavior

Available to Purchase
Shadhin Hussain, David J. Lary, Kentaro Hara, Kallol Bera, Shahid Rauf, Matthew Goeckner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 043001 (2024)
https://doi.org/10.1116/6.0003434
Published: May 2024
View articletitled, Case study in machine learning for predicting moderate pressure plasma behavior
Open the PDF for Case study in machine learning for predicting moderate pressure plasma behavior in another window
Journal Articles

Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition

Available to Purchase
J. Montalvo-Urquizo, D. A. Mazón-Montijo, A. A. Ortíz-Atondo, A. L. Martínez-García, M. I. Mendivil-Palma, O. Y. Ramírez-Esquivel, Z. Montiel-González
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062410 (2023)
https://doi.org/10.1116/6.0002829
Published: November 2023
View articletitled, Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition
Open the PDF for Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition in another window
Journal Articles

Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment

Available to Purchase
Minglei Yang, Guangyu He, Jiao Chen, Zhaolu Zhang, Guanjun Yang, Zezhou Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013408 (2022)
https://doi.org/10.1116/6.0001346
Published: December 2021
View articletitled, Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment
Open the PDF for Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment in another window
Journal Articles

Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature

Available to Purchase
T. Motomura, T. Tabaru, Y. Fujio, T. Okuyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013001 (2021)
https://doi.org/10.1116/6.0000677
Published: December 2020
View articletitled, Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature
Open the PDF for Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature in another window
Journal Articles

Design of experiments approach to luminescent CaMoO4 by atomic layer deposition

Available to Purchase
Julie Nitsche Kvalvik, Per-Anders Hansen, Ola Nilsen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052408 (2020)
https://doi.org/10.1116/6.0000327
Published: August 2020
View articletitled, Design of experiments approach to luminescent CaMoO4 by atomic layer deposition
Open the PDF for Design of experiments approach to luminescent CaMoO4 by atomic layer deposition in another window
Includes: Supplementary data
Journal Articles

Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses

Available to Purchase
Bernd Vierneusel, Stephan Tremmel, Sandro Wartzack
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061501 (2015)
https://doi.org/10.1116/1.4926383
Published: July 2015
View articletitled, Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses
Open the PDF for Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses in another window
Journal Articles

Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology

Available to Purchase
Micheal Burke, Alan Blake, Ian M. Povey, Michael Schmidt, Nikolay Petkov, Patrick Carolan, Aidan J. Quinn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 031506 (2014)
https://doi.org/10.1116/1.4868215
Published: March 2014
View articletitled, Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
Open the PDF for Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology in another window
Includes: Supplementary data
Journal Articles

Characterization and comparison of silicon nitride films deposited using two novel processes

Available to Purchase
Vivek Sharma, Adam Bailey, Bill Dauksher, Clarence Tracy, Stuart Bowden, Barry O’Brien
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 021201 (2012)
https://doi.org/10.1116/1.3687423
Published: February 2012
View articletitled, Characterization and comparison of silicon nitride films deposited using two novel processes
Open the PDF for Characterization and comparison of silicon nitride films deposited using two novel processes in another window
Journal Articles

Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers

Available to Purchase
Z. R. Tadisina, A. Natarajarathinam, S. Gupta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 973–978 (2010)
https://doi.org/10.1116/1.3430549
Published: June 2010
View articletitled, Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers
Open the PDF for Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers in another window
Journal Articles

Thin films by metal-organic precursor plasma spray

Available to Purchase
Douglas L. Schulz, Robert A. Sailer, Scott Payne, James Leach, Ronald J. Molz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 962–969 (2009)
https://doi.org/10.1116/1.3148826
Published: June 2009
View articletitled, Thin films by metal-organic precursor plasma spray
Open the PDF for Thin films by metal-organic precursor plasma spray in another window
Journal Articles

Sidewall damage in plasma etching of Si/SiGe heterostructures

Available to Purchase
R. Ding, L. J. Klein, Mark G. Friesen, M. A. Eriksson, A. E. Wendt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 836–843 (2009)
https://doi.org/10.1116/1.3097858
Published: June 2009
View articletitled, Sidewall damage in plasma etching of Si/SiGe heterostructures
Open the PDF for Sidewall damage in plasma etching of Si/SiGe heterostructures in another window
Journal Articles

Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows

Available to Purchase
R. Dorsman, C. R. Kleijn, J. F. M. Velthuis, J. P. Zijp, A. M. B. van Mol
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 474–479 (2007)
https://doi.org/10.1116/1.2717191
Published: April 2007
View articletitled, Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows
Open the PDF for Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows in another window
Journal Articles

Effects of processing parameters on electroluminescence of rf magnetron sputter deposited Zn S : Er F 3

Available to Purchase
David M. DeVito, Avni A. Argun, Evan Law, Mark R. Davidson, M. Puga-Lambers, Paul H. Holloway
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 225–231 (2007)
https://doi.org/10.1116/1.2429679
Published: January 2007
View articletitled, Effects of processing parameters on electroluminescence of rf magnetron sputter deposited Zn S : Er F 3
Open the PDF for Effects of processing parameters on electroluminescence of rf magnetron sputter deposited Zn S : Er F 3 in another window
Journal Articles

Computational fluid dynamic model of a tapered Holweck vacuum pump operating in the viscous and transition regimes. I. Vacuum performance

Available to Purchase
S. Giors, E. Colombo, F. Inzoli, F. Subba, R. Zanino
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1584–1591 (2006)
https://doi.org/10.1116/1.2178362
Published: June 2006
View articletitled, Computational fluid dynamic model of a tapered Holweck vacuum pump operating in the viscous and transition regimes. I. Vacuum performance
Open the PDF for Computational fluid dynamic model of a tapered Holweck vacuum pump operating in the viscous and transition regimes. I. Vacuum performance in another window
Journal Articles

Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films

Available to Purchase
F. Martin, P. Muralt, M.-A. Dubois
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 946–952 (2006)
https://doi.org/10.1116/1.2201042
Published: May 2006
View articletitled, Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films
Open the PDF for Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films in another window
Journal Articles

Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor

Available to Purchase
M. J. Sowa, M. E. Littau, V. Pohray, J. L. Cecchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 2122–2129 (2000)
https://doi.org/10.1116/1.1286396
Published: September 2000
View articletitled, Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor
Open the PDF for Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor in another window
Journal Articles

Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool

Available to Purchase
Craig Garvin, J. W. Grizzle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1297–1302 (2000)
https://doi.org/10.1116/1.582343
Published: July 2000
View articletitled, Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool
Open the PDF for Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool in another window
Journal Articles

Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technology

Available to Purchase
André Schiltz, Laëtitia Palatini, Maryse Paoli, Maurice Rivoire, Alain Prola
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1313–1320 (2000)
https://doi.org/10.1116/1.582346
Published: July 2000
View articletitled, Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technology
Open the PDF for Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technology in another window
Journal Articles

Establishing the relationship between process, structure, and properties of TiN films deposited by electron cyclotron resonance assisted reactive sputtering. I. Variations in hardness and roughness as a function of process parameters

Available to Purchase
Carl Carney, Delcie Durham
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 2850–2858 (1999)
https://doi.org/10.1116/1.581952
Published: September 1999
View articletitled, Establishing the relationship between process, structure, and properties of TiN films deposited by electron cyclotron resonance assisted reactive sputtering. I. Variations in hardness and roughness as a function of process parameters
Open the PDF for Establishing the relationship between process, structure, and properties of TiN films deposited by electron cyclotron resonance assisted reactive sputtering. I. Variations in hardness and roughness as a function of process parameters in another window
Journal Articles

Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry

Available to Purchase
L. C. Pruette, S. M. Karecki, R. Reif, J. G. Langan, S. A. Rogers, R. J. Ciotti, B. S. Felker
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 16, 1577–1581 (1998)
https://doi.org/10.1116/1.581190
Published: May 1998
View articletitled, Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry
Open the PDF for Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry in another window