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Journal Articles
Case study in machine learning for predicting moderate pressure plasma behavior
Available to Purchase
J. Vac. Sci. Technol. A 42, 043001 (2024)
Published: May 2024
Journal Articles
Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition
Available to PurchaseJ. Montalvo-Urquizo, D. A. Mazón-Montijo, A. A. Ortíz-Atondo, A. L. Martínez-García, M. I. Mendivil-Palma, O. Y. Ramírez-Esquivel, Z. Montiel-González
J. Vac. Sci. Technol. A 41, 062410 (2023)
Published: November 2023
Journal Articles
Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment
Available to Purchase
J. Vac. Sci. Technol. A 40, 013408 (2022)
Published: December 2021
Journal Articles
Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature
Available to Purchase
J. Vac. Sci. Technol. A 39, 013001 (2021)
Published: December 2020
Journal Articles
Design of experiments approach to luminescent CaMoO4 by atomic layer deposition
Available to Purchase
J. Vac. Sci. Technol. A 38, 052408 (2020)
Published: August 2020
Includes: Supplementary data
Journal Articles
Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses
Available to Purchase
J. Vac. Sci. Technol. A 33, 061501 (2015)
Published: July 2015
Journal Articles
Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
Available to PurchaseMicheal Burke, Alan Blake, Ian M. Povey, Michael Schmidt, Nikolay Petkov, Patrick Carolan, Aidan J. Quinn
J. Vac. Sci. Technol. A 32, 031506 (2014)
Published: March 2014
Includes: Supplementary data
Journal Articles
Characterization and comparison of silicon nitride films deposited using two novel processes
Available to Purchase
J. Vac. Sci. Technol. A 30, 021201 (2012)
Published: February 2012
Journal Articles
Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers
Available to Purchase
J. Vac. Sci. Technol. A 28, 973–978 (2010)
Published: June 2010
Journal Articles
Thin films by metal-organic precursor plasma spray
Available to Purchase
J. Vac. Sci. Technol. A 27, 962–969 (2009)
Published: June 2009
Journal Articles
Sidewall damage in plasma etching of Si/SiGe heterostructures
Available to Purchase
J. Vac. Sci. Technol. A 27, 836–843 (2009)
Published: June 2009
Journal Articles
Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows
Available to Purchase
J. Vac. Sci. Technol. A 25, 474–479 (2007)
Published: April 2007
Journal Articles
Effects of processing parameters on electroluminescence of rf magnetron sputter deposited Zn S : Er F 3
Available to Purchase
J. Vac. Sci. Technol. A 25, 225–231 (2007)
Published: January 2007
Journal Articles
Computational fluid dynamic model of a tapered Holweck vacuum pump operating in the viscous and transition regimes. I. Vacuum performance
Available to Purchase
J. Vac. Sci. Technol. A 24, 1584–1591 (2006)
Published: June 2006
Journal Articles
Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films
Available to Purchase
J. Vac. Sci. Technol. A 24, 946–952 (2006)
Published: May 2006
Journal Articles
Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor
Available to Purchase
J. Vac. Sci. Technol. A 18, 2122–2129 (2000)
Published: September 2000
Journal Articles
Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool
Available to Purchase
J. Vac. Sci. Technol. A 18, 1297–1302 (2000)
Published: July 2000
Journal Articles
Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technology
Available to Purchase
J. Vac. Sci. Technol. A 18, 1313–1320 (2000)
Published: July 2000
Journal Articles
J. Vac. Sci. Technol. A 17, 2850–2858 (1999)
Published: September 1999
Journal Articles
Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry
Available to Purchase
J. Vac. Sci. Technol. A 16, 1577–1581 (1998)
Published: May 1998
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