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Journal Articles

Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition

J. Montalvo-Urquizo, D. A. Mazón-Montijo, A. A. Ortíz-Atondo, A. L. Martínez-García, M. I. Mendivil-Palma, O. Y. Ramírez-Esquivel, Z. Montiel-González
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 062410 (2023)
https://doi.org/10.1116/6.0002829
Published: November 2023
View article titled, Advanced two-objective optimization of thickness and large-area homogeneity of ZnO ultrathin films deposited by atomic layer deposition
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Journal Articles

Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment

Minglei Yang, Guangyu He, Jiao Chen, Zhaolu Zhang, Guanjun Yang, Zezhou Sun
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 013408 (2022)
https://doi.org/10.1116/6.0001346
Published: December 2021
View article titled, Research on the preparation and performance of anti-dust self-cleaning film on Mars dusty environment
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Journal Articles

Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature

T. Motomura, T. Tabaru, Y. Fujio, T. Okuyama
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 013001 (2021)
https://doi.org/10.1116/6.0000677
Published: December 2020
View article titled, Influence of nitrogen gas flow ratio on gallium nitride film growth using high-density convergent plasma sputtering device at room temperature
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Journal Articles

Design of experiments approach to luminescent CaMoO4 by atomic layer deposition

Julie Nitsche Kvalvik, Per-Anders Hansen, Ola Nilsen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052408 (2020)
https://doi.org/10.1116/6.0000327
Published: August 2020
View article titled, Design of experiments approach to luminescent CaMoO<sub>4</sub> by atomic layer deposition
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Includes: Supplementary data
Journal Articles

Monte Carlo simulation of the MoS2 sputtering process and the influence of the normalized momentum on residual stresses

Bernd Vierneusel, Stephan Tremmel, Sandro Wartzack
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061501 (2015)
https://doi.org/10.1116/1.4926383
Published: July 2015
View article titled, Monte Carlo simulation of the MoS<sub>2</sub> sputtering process and the influence of the normalized momentum on residual stresses
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Journal Articles

Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology

Micheal Burke, Alan Blake, Ian M. Povey, Michael Schmidt, Nikolay Petkov, Patrick Carolan, Aidan J. Quinn
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 031506 (2014)
https://doi.org/10.1116/1.4868215
Published: March 2014
View article titled, Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
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Includes: Supplementary data
Journal Articles

Characterization and comparison of silicon nitride films deposited using two novel processes

Vivek Sharma, Adam Bailey, Bill Dauksher, Clarence Tracy, Stuart Bowden, Barry O’Brien
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 021201 (2012)
https://doi.org/10.1116/1.3687423
Published: February 2012
View article titled, Characterization and comparison of silicon nitride films deposited using two novel processes
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Journal Articles

Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers

Z. R. Tadisina, A. Natarajarathinam, S. Gupta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 973–978 (2010)
https://doi.org/10.1116/1.3430549
Published: June 2010
View article titled, Magnetic tunnel junctions with Co-based perpendicular magnetic anisotropy multilayers
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Journal Articles

Thin films by metal-organic precursor plasma spray

Douglas L. Schulz, Robert A. Sailer, Scott Payne, James Leach, Ronald J. Molz
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 962–969 (2009)
https://doi.org/10.1116/1.3148826
Published: June 2009
View article titled, Thin films by metal-organic precursor plasma spray
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Journal Articles

Sidewall damage in plasma etching of Si/SiGe heterostructures

R. Ding, L. J. Klein, Mark G. Friesen, M. A. Eriksson, A. E. Wendt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 836–843 (2009)
https://doi.org/10.1116/1.3097858
Published: June 2009
View article titled, Sidewall damage in plasma etching of Si/SiGe heterostructures
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Journal Articles

Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows

R. Dorsman, C. R. Kleijn, J. F. M. Velthuis, J. P. Zijp, A. M. B. van Mol
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 474–479 (2007)
https://doi.org/10.1116/1.2717191
Published: April 2007
View article titled, Zinc deposition experiments for validation of direct-simulation Monte Carlo calculations of rarefied internal gas flows
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Journal Articles

Effects of processing parameters on electroluminescence of rf magnetron sputter deposited Zn S : Er F 3

David M. DeVito, Avni A. Argun, Evan Law, Mark R. Davidson, M. Puga-Lambers, Paul H. Holloway
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 225–231 (2007)
https://doi.org/10.1116/1.2429679
Published: January 2007
View article titled, Effects of processing parameters on electroluminescence of rf magnetron sputter deposited Zn S : Er F 3
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Journal Articles

Computational fluid dynamic model of a tapered Holweck vacuum pump operating in the viscous and transition regimes. I. Vacuum performance

S. Giors, E. Colombo, F. Inzoli, F. Subba, R. Zanino
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1584–1591 (2006)
https://doi.org/10.1116/1.2178362
Published: June 2006
View article titled, Computational fluid dynamic model of a tapered Holweck vacuum pump operating in the viscous and transition regimes. I. Vacuum performance
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Journal Articles

Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films

F. Martin, P. Muralt, M.-A. Dubois
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 946–952 (2006)
https://doi.org/10.1116/1.2201042
Published: May 2006
View article titled, Process optimization for the sputter deposition of molybdenum thin films as electrode for AlN thin films
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Journal Articles

Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor

M. J. Sowa, M. E. Littau, V. Pohray, J. L. Cecchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 2122–2129 (2000)
https://doi.org/10.1116/1.1286396
Published: September 2000
View article titled, Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor
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Journal Articles

Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technology

André Schiltz, Laëtitia Palatini, Maryse Paoli, Maurice Rivoire, Alain Prola
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1313–1320 (2000)
https://doi.org/10.1116/1.582346
Published: July 2000
View article titled, Plasma etch-back planarization coupled to chemical mechanical polishing for sub 0.18 μm shallow trench isolation technology
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Journal Articles

Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool

Craig Garvin, J. W. Grizzle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 18, 1297–1302 (2000)
https://doi.org/10.1116/1.582343
Published: July 2000
View article titled, Demonstration of broadband radio frequency sensing: Empirical polysilicon etch rate estimation in a Lam 9400 etch tool
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Journal Articles

Establishing the relationship between process, structure, and properties of TiN films deposited by electron cyclotron resonance assisted reactive sputtering. I. Variations in hardness and roughness as a function of process parameters

Carl Carney, Delcie Durham
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 2850–2858 (1999)
https://doi.org/10.1116/1.581952
Published: September 1999
View article titled, Establishing the relationship between process, structure, and properties of TiN films deposited by electron cyclotron resonance assisted reactive sputtering. I. Variations in hardness and roughness as a function of process parameters
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Journal Articles

Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry

L. C. Pruette, S. M. Karecki, R. Reif, J. G. Langan, S. A. Rogers, R. J. Ciotti, B. S. Felker
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 16, 1577–1581 (1998)
https://doi.org/10.1116/1.581190
Published: May 1998
View article titled, Evaluation of trifluoroacetic anhydride as an alternative plasma enhanced chemical vapor deposition chamber clean chemistry
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Journal Articles

Plasma etch modeling using optical emission spectroscopy

Roawen Chen, Herb Huang, C. J. Spanos, Michael Gatto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 14, 1901–1906 (1996)
https://doi.org/10.1116/1.580357
Published: May 1996
View article titled, Plasma etch modeling using optical emission spectroscopy
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