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Journal Articles

Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Premrudee Promdet, Pentti Niiranen, Simon Lagerkvist, Daniel Lundin, Henrik Pedersen

J. Vac. Sci. Technol. A 43, 040402 (2025)

https://doi.org/10.1116/6.0004410

Published: May 2025

View articletitled, Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Journal Articles

Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al₂O₃

Jay V. Swarup, Heng-Ray Chuang, James T. Jensen, Jeffrey Gao, Amy L. You, James R. Engstrom

J. Vac. Sci. Technol. A 43, 022404 (2025)

https://doi.org/10.1116/6.0004171

Published: February 2025

View articletitled, Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O3

Journal Articles

Secondary ion mass spectrometry relative sensitivity factor of ⁶⁹Ga in ZnS

Hayat Soufiani, Mikhail Klimov, Romain Gaume

J. Vac. Sci. Technol. A 43, 023201 (2025)

https://doi.org/10.1116/6.0004165

Published: January 2025

View articletitled, Secondary ion mass spectrometry relative sensitivity factor of 69Ga in ZnS

Journal Articles

Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

E. Kokkonen, H.-E. Nieminen, F. Rehman, V. Miikkulainen, M. Putkonen, M. Ritala, S. Huotari, J. Schnadt, S. Urpelainen

J. Vac. Sci. Technol. A 42, 062406 (2024)

https://doi.org/10.1116/6.0003871

Published: October 2024

View articletitled, Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

Journal Articles

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Yundong Zhou, Alexis Franquet, Valentina Spampinato, Alex Merkulov, Michael R. Keenan, Paul A. W. van der Heide, Gustavo F. Trindade, Wilfried Vandervorst, Ian S. Gilmore

J. Vac. Sci. Technol. A 42, 053208 (2024)

https://doi.org/10.1116/6.0003821

Published: September 2024

View articletitled, OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Journal Articles

Dry and wet etching of single-crystal AlN

Hsiao-Hsuan Wan, Chao-Ching Chiang, Jian-Sian Li, Nahid Sultan Al-Mamun, Aman Haque, Fan Ren, Stephen J. Pearton

J. Vac. Sci. Technol. A 42, 052601 (2024)

https://doi.org/10.1116/6.0003744

Published: July 2024

View articletitled, Dry and wet etching of single-crystal AlN

Journal Articles

Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Martin Fenker, Martin Balzer, Holger Kaßner

J. Vac. Sci. Technol. A 42, 043402 (2024)

https://doi.org/10.1116/6.0003333

Published: May 2024

View articletitled, Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Journal Articles

Fine tuning of Nb-incorporated TiO₂ thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Thomas Vincent, Damien Coutancier, Pia Dally, Mirella Al Katrib, Mathieu Frégnaux, Stefania Cacovich, Frédérique Donsanti, Armelle Yaïche, Karim Medjoubi, Thomas Guillemot, Marion Provost, Jean Rousset, Muriel Bouttemy, Nathanaelle Schneider

J. Vac. Sci. Technol. A 42, 032802 (2024)

https://doi.org/10.1116/6.0003351

Published: March 2024

View articletitled, Fine tuning of Nb-incorporated TiO2 thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Includes: Supplementary data

Journal Articles

Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra

Katsumi Watanabe, Daisuke Watanabe, Kazutoshi Mamiya, Seiji Koizumi, Noriaki Sanada, Mineharu Suzuki

J. Vac. Sci. Technol. A 42, 023210 (2024)

https://doi.org/10.1116/6.0003379

Published: February 2024

View articletitled, Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra

Journal Articles

Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy

Canser Gül, Hülya Durmuş, Sevda Albayrak, Nilay Çömez

J. Vac. Sci. Technol. A 41, 063107 (2023)

https://doi.org/10.1116/6.0002894

Published: October 2023

View articletitled, Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy

Journal Articles

Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Sen Chen, Jiaxuan Ren, Douhao Yang, Lijun Sang, Bowen Liu, Qiang Chen, Zhongwei Liu

J. Vac. Sci. Technol. A 41, 042401 (2023)

https://doi.org/10.1116/6.0002484

Published: May 2023

View articletitled, Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Includes: Supplementary data

Journal Articles

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Jessica A. Murdzek, Ann Lii-Rosales, Steven M. George

J. Vac. Sci. Technol. A 41, 032603 (2023)

https://doi.org/10.1116/6.0002488

Published: April 2023

View articletitled, Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Includes: Supplementary data

Journal Articles

Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Jonas C. Gertsch, Jonathan L. Partridge, Austin M. Cano, Joel W. Clancey, Victor M. Bright, Steven M. George

J. Vac. Sci. Technol. A 41, 012603 (2023)

https://doi.org/10.1116/6.0002149

Published: January 2023

View articletitled, Thermal atomic layer etching of VO2 using sequential BCl3 and SF4 exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Includes: Supplementary data

Journal Articles

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Anna Kapran, Vinicius G. Antunes, Zdeněk Hubička, Charles Ballage, Tiberiu Minea

J. Vac. Sci. Technol. A 41, 013003 (2023)

https://doi.org/10.1116/6.0002309

Published: December 2022

View articletitled, Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Journal Articles

Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

Jung-Sik Kim, Hwan Oh, Gregory N. Parsons

J. Vac. Sci. Technol. A 40, 063401 (2022)

https://doi.org/10.1116/6.0002036

Published: September 2022

View articletitled, Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

Journal Articles

Desorption characteristics of selenium and tellurium thin films

Derrick S. H. Liu, Maria Hilse, Roman Engel-Herbert

J. Vac. Sci. Technol. A 40, 053407 (2022)

https://doi.org/10.1116/6.0002013

Published: September 2022

View articletitled, Desorption characteristics of selenium and tellurium thin films

Journal Articles

Operating modes and target erosion in high power impulse magnetron sputtering

M. Rudolph, N. Brenning, H. Hajihoseini, M. A. Raadu, J. Fischer, J. T. Gudmundsson, D. Lundin

J. Vac. Sci. Technol. A 40, 043005 (2022)

https://doi.org/10.1116/6.0001919

Published: June 2022

View articletitled, Operating modes and target erosion in high power impulse magnetron sputtering

Journal Articles

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Kazuki Yoshida, Issei Nagata, Kentaro Saito, Masanori Miura, Kensaku Kanomata, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose

J. Vac. Sci. Technol. A 40, 022408 (2022)

https://doi.org/10.1116/6.0001622

Published: February 2022

View articletitled, Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Journal Articles

Reaction mechanism studies on atomic layer deposition process of AlF₃

Heta-Elisa Nieminen, Mikko Ritala

J. Vac. Sci. Technol. A 40, 022401 (2022)

https://doi.org/10.1116/6.0001624

Published: January 2022

View articletitled, Reaction mechanism studies on atomic layer deposition process of AlF3

Journal Articles

Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

Angel Yanguas-Gil, Joseph A. Libera, Jeffrey W. Elam

J. Vac. Sci. Technol. A 39, 062404 (2021)

https://doi.org/10.1116/6.0001212

Published: September 2021

View articletitled, Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

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Self-limiting deposition of copper from copper beta-diketonates and plasma electrons

Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al₂O₃

Secondary ion mass spectrometry relative sensitivity factor of ⁶⁹Ga in ZnS

Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum

OrbiSIMS depth profiling of semiconductor materials—Useful yield and depth resolution

Dry and wet etching of single-crystal AlN

Investigating different carbon-based target materials: Can we improve ionization in HiPIMS for the deposition of diamondlike carbon films?

Fine tuning of Nb-incorporated TiO₂ thin films by atomic layer deposition and application as efficient electron transport layer in perovskite solar cells

Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra

Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy

Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma

Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition

Thermal atomic layer etching of VO₂ using sequential BCl₃ and SF₄ exposures: Observation of conversion, ligand-exchange, and oxidation state changes

Investigation of the magnetron balancing effect on the ionized flux fraction and deposition rate of sputtered titanium species for the high-power impulse magnetron sputtering pulses of different lengths

Growth behavior and substrate selective deposition of polypyrrole, polythiophene, and polyaniline by oxidative chemical vapor deposition and molecular layer deposition

Desorption characteristics of selenium and tellurium thin films

Operating modes and target erosion in high power impulse magnetron sputtering

Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon

Reaction mechanism studies on atomic layer deposition process of AlF₃

Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor

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