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Journal Articles

Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector

In-Kyu Jang, Hyung-Joo Lee, Dae-Kwang Kim, Lee-Ku Kwac, Sung Woon Cho

J. Vac. Sci. Technol. A 41, 063415 (2023)

https://doi.org/10.1116/6.0002975

Published: November 2023

View article titled, Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector

Journal Articles

Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Ziyi Hu, Hua Shao, Junjie Li, Panpan Lai, Wenrui Wang, Chen Li, Qi Yan, Xiaobin He, Junfeng Li, Tao Yang, Rui Chen, Yayi Wei

J. Vac. Sci. Technol. A 41, 063113 (2023)

https://doi.org/10.1116/6.0003032

Published: November 2023

View article titled, Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Journal Articles

Effects of C₄F₈ plasma polymerization film on etching profiles in the Bosch process

Tomoyuki Nonaka, Kazuo Takahashi, Akimi Uchida, Stefan Lundgaard, Osamu Tsuji

J. Vac. Sci. Technol. A 41, 063004 (2023)

https://doi.org/10.1116/5.0158954

Published: October 2023

View article titled, Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process

Journal Articles

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Azmain A. Hossain, Haozhe Wang, David S. Catherall, Martin Leung, Harm C. M. Knoops, James R. Renzas, Austin J. Minnich

J. Vac. Sci. Technol. A 41, 062601 (2023)

https://doi.org/10.1116/6.0002965

Published: September 2023

View article titled, Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma

Journal Articles

Thermal transport and structural improvements due to annealing of wafer bonded β-Ga₂O₃|4H-SiC

Michael E. Liao, Kenny Huynh, Zhe Cheng, Jingjing Shi, Samuel Graham, Mark S. Goorsky

J. Vac. Sci. Technol. A 41, 063203 (2023)

https://doi.org/10.1116/6.0002693

Published: September 2023

View article titled, Thermal transport and structural improvements due to annealing of wafer bonded β-Ga2O3|4H-SiC

Journal Articles

Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Nickolas Ashburn, Xiuyao Lang, Sumeet Pandey, Steven Wolf, Steve Kramer, John Smythe, Gurtej Sandhu, Charles Winter, Andrew C. Kummel, Kyeongjae Cho

J. Vac. Sci. Technol. A 41, 052403 (2023)

https://doi.org/10.1116/6.0002840

Published: August 2023

View article titled, Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces

Includes: Supplementary data

Journal Articles

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Fang-Fang Ma, Quan-Zhi Zhang, Dao-Man Han, Zi-Lan Xiong, Ming Gao, You-Nian Wang

J. Vac. Sci. Technol. A 41, 053002 (2023)

https://doi.org/10.1116/6.0002585

Published: July 2023

View article titled, Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Journal Articles

Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

Nicholas A. Strnad, Daniel M. Potrepka, Brendan M. Hanrahan, Glen R. Fox, Ronald G. Polcawich, Jeffrey S. Pulskamp, Ryan R. Knight, Ryan Q. Rudy

J. Vac. Sci. Technol. A 41, 050801 (2023)

https://doi.org/10.1116/6.0002431

Published: July 2023

View article titled, Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

Journal Articles

Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga₂O₃ devices

William A. Callahan, Edwin Supple, David Ginley, Michael Sanders, Brian P. Gorman, Ryan O’Hayre, Andriy Zakutayev

J. Vac. Sci. Technol. A 41, 043211 (2023)

https://doi.org/10.1116/6.0002645

Published: June 2023

View article titled, Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga2O3 devices

Includes: Supplementary data

Journal Articles

Determination of stress in thin films using micro-machined buckled membranes

C. Malhaire, M. Granata, D. Hofman, A. Amato, V. Martinez, G. Cagnoli, A. Lemaitre, N. Shcheblanov

J. Vac. Sci. Technol. A 41, 043401 (2023)

https://doi.org/10.1116/6.0002590

Published: May 2023

View article titled, Determination of stress in thin films using micro-machined buckled membranes

Journal Articles

Using metal precursors to passivate oxides for area selective deposition

Kinsey L. Canova, Laurent Souqui, Gregory S. Girolami, John R. Abelson

J. Vac. Sci. Technol. A 41, 033407 (2023)

https://doi.org/10.1116/6.0002413

Published: April 2023

View article titled, Using metal precursors to passivate oxides for area selective deposition

Includes: Supplementary data

Journal Articles

In situ diagnostics of the Si etching structures profile in ICP SF₆/C₄F₈ plasma: Macrostructures

Artem Osipov, Alina Gagaeva, Anastasia Speshilova, Armenak Osipov, Yakov Enns, Alexey Kazakin, Ekaterina Endiiarova, Roman Kornilov, Sergey Alexandrov

J. Vac. Sci. Technol. A 41, 033007 (2023)

https://doi.org/10.1116/6.0002427

Published: April 2023

View article titled, In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures

Journal Articles

Describing mechanical damage evolution through in situ electrical resistance measurements

David D. Gebhart, Anna Krapf, Benoit Merle, Christoph Gammer, Megan J. Cordill

J. Vac. Sci. Technol. A 41, 023408 (2023)

https://doi.org/10.1116/6.0002362

Published: February 2023

View article titled, Describing mechanical damage evolution through in situ electrical resistance measurements

Journal Articles

Molecular dynamics study of SiO₂ nanohole etching by fluorocarbon ions

Charisse Marie D. Cagomoc, Michiro Isobe, Satoshi Hamaguchi

J. Vac. Sci. Technol. A 41, 023001 (2023)

https://doi.org/10.1116/6.0002380

Published: February 2023

View article titled, Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions

Includes: Supplementary data

Journal Articles

Voltage waveform tailoring for high aspect ratio plasma etching of SiO₂ using Ar/CF₄/O₂ mixtures: Consequences of ion and electron distributions on etch profiles

Florian Krüger, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner

J. Vac. Sci. Technol. A 41, 013006 (2023)

https://doi.org/10.1116/6.0002290

Published: December 2022

View article titled, Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles

Journal Articles

Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

Oili M. E. Ylivaara, Andreas Langner, Satu Ek, Jari Malm, Jaakko Julin, Mikko Laitinen, Saima Ali, Sakari Sintonen, Harri Lipsanen, Timo Sajavaara, Riikka L. Puurunen

J. Vac. Sci. Technol. A 40, 062414 (2022)

https://doi.org/10.1116/6.0002095

Published: November 2022

View article titled, Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

Journal Articles

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

Yao Du, Florian Krüger, Sang Ki Nam, Hoki Lee, Suyoung Yoo, Jacob Eapen, Mark J. Kushner, Steven Shannon

J. Vac. Sci. Technol. A 40, 053007 (2022)

https://doi.org/10.1116/6.0002008

Published: September 2022

View article titled, Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

Journal Articles

Preface for the special topic collection honoring Dr. Scott Chambers’ 70th birthday and his leadership in the science and technology of oxide thin films

Tiffany C. Kaspar, Yingge Du, Mark H. Engelhard, Don R. Baer, Bharat Jalan, Joseph H. Ngai

J. Vac. Sci. Technol. A 40, 041602 (2022)

https://doi.org/10.1116/6.0001942

Published: June 2022

View article titled, Preface for the special topic collection honoring Dr. Scott Chambers’ 70th birthday and his leadership in the science and technology of oxide thin films

Journal Articles

Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS

Nicholas A. Strnad, Wendy L. Sarney, Gilbert B. Rayner, Jr., Robert R. Benoit, Glen R. Fox, Ryan Q. Rudy, Thomas J. Larrabee, Jeffrey Shallenberger, Jeffrey S. Pulskamp

J. Vac. Sci. Technol. A 40, 042403 (2022)

https://doi.org/10.1116/6.0001633

Published: May 2022

View article titled, Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS

Includes: Supplementary data

Journal Articles

Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage

L. E. Klebanoff

J. Vac. Sci. Technol. A 40, 033206 (2022)

https://doi.org/10.1116/6.0001816

Published: April 2022

View article titled, Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage

NARROW

Topics

Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector

Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Effects of C₄F₈ plasma polymerization film on etching profiles in the Bosch process

Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF₆/H₂ plasma

Thermal transport and structural improvements due to annealing of wafer bonded β-Ga₂O₃|4H-SiC

Density functional theory study on reaction mechanisms of Co(^tbu2DAD)₂ for area selective-atomic layer deposition of Co films on metal surfaces

Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors

Extending atomic layer deposition for use in next-generation piezoMEMS: Review and perspective

Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga₂O₃ devices

Determination of stress in thin films using micro-machined buckled membranes

Using metal precursors to passivate oxides for area selective deposition

In situ diagnostics of the Si etching structures profile in ICP SF₆/C₄F₈ plasma: Macrostructures

Describing mechanical damage evolution through in situ electrical resistance measurements

Molecular dynamics study of SiO₂ nanohole etching by fluorocarbon ions

Voltage waveform tailoring for high aspect ratio plasma etching of SiO₂ using Ar/CF₄/O₂ mixtures: Consequences of ion and electron distributions on etch profiles

Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

Comparison of glancing-angle scatterings on different materials in a high aspect ratio plasma etching process using molecular dynamics simulation

Preface for the special topic collection honoring Dr. Scott Chambers’ 70th birthday and his leadership in the science and technology of oxide thin films

Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS

Technical and personal remembrances of David A. Shirley in studies of surface magnetism, photoelectron spectroscopy, EUV lithography, and hydrogen storage

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