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Journal Articles

Internal cylindrical cathodic-arc deposited Cr coatings on slender tubes: Uniformity, toughness, and oxidation resistance

Benfu Wang, Huiyuan Geng, Xiubo Tian, Chunzhi Gong, Tianshi Hu, Jin Zhang, Yong Lian
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033105 (2025)
https://doi.org/10.1116/6.0004494
Published: April 2025
View articletitled, Internal cylindrical cathodic-arc deposited Cr coatings on slender tubes: Uniformity, toughness, and oxidation resistance
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Journal Articles

Atomic layer deposition of AlxTi1−xN via co-evaporation of metal precursors

Pamburayi Mpofu, Pentti Niiranen, Oscar Alm, Jonas Lauridsen, Tommy Larsson, Henrik Pedersen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 032405 (2025)
https://doi.org/10.1116/6.0004420
Published: March 2025
View articletitled, Atomic layer deposition of AlxTi1−xN via co-evaporation of metal precursors
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Journal Articles

Recent trends in thermal atomic layer deposition chemistry

Featured
Georgi Popov, Miika Mattinen, Anton Vihervaara, Markku Leskelä
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 030801 (2025)
https://doi.org/10.1116/6.0004320
Published: March 2025
View articletitled, Recent trends in thermal atomic layer deposition chemistry
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Journal Articles

Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching

Evan Litch, Hyunjae Lee, Sang Ki Nam, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 033001 (2025)
https://doi.org/10.1116/6.0004250
Published: March 2025
View articletitled, Consequences of low bias frequencies in inductively coupled plasmas on ion angular distributions for high aspect ratio plasma etching
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Journal Articles

Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model

Featured
Yudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Michael Hinshelwood, Klaus Edinger, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023005 (2025)
https://doi.org/10.1116/6.0004219
Published: February 2025
View articletitled, Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model
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Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View articletitled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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Journal Articles

Remote plasma assisted processing and semiconductor interface electronic structure

Featured
Leonard J. Brillson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 020801 (2025)
https://doi.org/10.1116/6.0004200
Published: January 2025
View articletitled, Remote plasma assisted processing and semiconductor interface electronic structure
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Journal Articles

Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum

Yudong Li, Hubertus Marbach, Christian Preischl, Michael Budach, Daniel Rhinow, Klaus Edinger, Gottlieb S. Oehrlein
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013004 (2025)
https://doi.org/10.1116/6.0003978
Published: January 2025
View articletitled, Selective etching of ruthenium using electron beam-irradiation and Ar/O2/CF4 remote plasma-based surface functionalization: Comparisons to tantalum
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Journal Articles

Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization

Sujin Kwon, Bonggeun Shong
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 012401 (2025)
https://doi.org/10.1116/6.0004143
Published: December 2024
View articletitled, Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization
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Journal Articles

Characterization of the ion angle distribution function in low-pressure plasmas using a micro-electromechanical system

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M. Melzer, K. Meinel, C. Stoeckel, T. Hemke, T. Mussenbrock, S. Zimmermann
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 013002 (2025)
https://doi.org/10.1116/6.0004034
Published: December 2024
View articletitled, Characterization of the ion angle distribution function in low-pressure plasmas using a micro-electromechanical system
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Journal Articles

Report on laser-induced fluorescence transitions relevant for the microelectronics industry and sustainability applications

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V. S. Santosh K. Kondeti, Shurik Yatom, Ivan Romadanov, Yevgeny Raitses, Leonid Dorf, Andrei Khomenko
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063005 (2024)
https://doi.org/10.1116/6.0004070
Published: November 2024
View articletitled, Report on laser-induced fluorescence transitions relevant for the microelectronics industry and sustainability applications
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Journal Articles

Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography

Editor’s Pick
Ajay Ravi, Long Viet Than, Jacqueline Lewis, Jingwei Shi, Andreas Werbrouck, Jingyi Han, Miika Mattinen, Stacey F. Bent
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 062407 (2024)
https://doi.org/10.1116/6.0003975
Published: November 2024
View articletitled, Comparison of Al- and Hf-based hybrid photoresists grown by molecular layer deposition for extreme ultraviolet lithography
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Journal Articles

Adhesion layers between piezoelectric and magnetostrictive layers in a MEMS magneto-sensor stack: Influence on the phase transformation of deposited Co/Fe multilayers to magnetostrictive CoxFe1−x phase

Featured
H. Honig, H. Töpfer, P. Schaaf
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063405 (2024)
https://doi.org/10.1116/6.0004071
Published: October 2024
View articletitled, Adhesion layers between piezoelectric and magnetostrictive layers in a MEMS magneto-sensor stack: Influence on the phase transformation of deposited Co/Fe multilayers to magnetostrictive CoxFe1−x phase
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Journal Articles

Development of high on/off current ratio in p-type copper oxide thin-film transistors with a back-end-of-line compatible process

Chi-Yuan Kuo, Wei-Chen Lin, Tsung-Tien Lo, Ching-Hsuan Shen, Ming-Yu Shen, Chia-Chan Lee, Chi-Ping Lin, Yuang-Ming Lin, Haw-Tyng Huang, Po-Chun Yeh, Hsin-Chu Chen, Chih-I Wu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 053412 (2024)
https://doi.org/10.1116/5.0226672
Published: August 2024
View articletitled, Development of high on/off current ratio in p-type copper oxide thin-film transistors with a back-end-of-line compatible process
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Journal Articles

Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study

Jomar U. Tercero, Michiro Isobe, Kazuhiro Karahashi, Magdaleno R. Vasquez, Jr., Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 052603 (2024)
https://doi.org/10.1116/6.0003750
Published: August 2024
View articletitled, Etch-stop mechanisms in plasma-enhanced atomic layer etching of silicon nitride: A molecular dynamics study
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Journal Articles

Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching

Shikhar Arvind, Esben W. Larsen, Philippe Bezard, John Petersen, Stefan De Gendt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 033009 (2024)
https://doi.org/10.1116/6.0003541
Published: April 2024
View articletitled, Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
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Includes: Supplementary data
Journal Articles

Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)

Editor’s Pick
Rosemary Jones, Giulio D’Acunto, Payam Shayesteh, Indiana Pinsard, François Rochet, Fabrice Bournel, Jean-Jacques Gallet, Ashley Head, Joachim Schnadt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022404 (2024)
https://doi.org/10.1116/6.0003349
Published: February 2024
View articletitled, Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
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Includes: Supplementary data
Journal Articles

Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates

Editor’s Pick
Rachel A. Nye, Nicholas M. Carroll, Sarah E. Morgan, Gregory N. Parsons
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 013205 (2024)
https://doi.org/10.1116/6.0003183
Published: January 2024
View articletitled, Vapor-phase zeolitic imidazolate framework-8 growth on fibrous polymer substrates
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Includes: Supplementary data
Journal Articles

Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector

In-Kyu Jang, Hyung-Joo Lee, Dae-Kwang Kim, Lee-Ku Kwac, Sung Woon Cho
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063415 (2023)
https://doi.org/10.1116/6.0002975
Published: November 2023
View articletitled, Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector
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Journal Articles

Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process

Ziyi Hu, Hua Shao, Junjie Li, Panpan Lai, Wenrui Wang, Chen Li, Qi Yan, Xiaobin He, Junfeng Li, Tao Yang, Rui Chen, Yayi Wei
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063113 (2023)
https://doi.org/10.1116/6.0003032
Published: November 2023
View articletitled, Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process
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