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Journal Articles

Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization

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Jianming Guo, Kun Ren, Dong Ni, Dawei Gao
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 43, 023003 (2025)
https://doi.org/10.1116/6.0004166
Published: February 2025
View articletitled, Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
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Journal Articles

Optical emission spectroscopy as a method for evaluating the change in Si etching structures profile in ICP SF6/C4F8 plasma: Microstructures

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Artem A. Osipov, Alina E. Fumina, Anastasia B. Speshilova, Ekaterina V. Endiiarova, Armenak A. Osipov, Sergey E. Alexandrov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 063001 (2024)
https://doi.org/10.1116/6.0003809
Published: September 2024
View articletitled, Optical emission spectroscopy as a method for evaluating the change in Si etching structures profile in ICP SF6/C4F8 plasma: Microstructures
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Journal Articles

Plasma nitridation for atomic layer etching of Ni

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Taylor G. Smith, Ali M. Ali, Jean-François de Marneffe, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022602 (2024)
https://doi.org/10.1116/6.0003263
Published: January 2024
View articletitled, Plasma nitridation for atomic layer etching of Ni
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Journal Articles

Atomic layer etching of indium tin oxide

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Christoffer Kauppinen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 42, 022601 (2024)
https://doi.org/10.1116/6.0003170
Published: January 2024
View articletitled, Atomic layer etching of indium tin oxide
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Includes: Supplementary data
Journal Articles

Formation of thin films via cold-rolled/annealed nickel sputtering targets

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Sixie Li, Ming Wen, Chuanjun Wang, Yiqing Wang, Yue Shen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063405 (2023)
https://doi.org/10.1116/6.0003033
Published: October 2023
View articletitled, Formation of thin films via cold-rolled/annealed nickel sputtering targets
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Journal Articles

Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks

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Kartik Sondhi, Rahul Sharangpani, Roshan Tirukkonda, Joyeeta Nag, Xing-Cai Guo, Michael A. Gribelyuk, Raghuveer S. Makala, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050402 (2023)
https://doi.org/10.1116/6.0002860
Published: August 2023
View articletitled, Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks
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Includes: Supplementary data
Journal Articles

Process optimization for shallow trench isolation etch using computational models

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Shuo Huang, Prem Panneerchelvam, Chad M. Huard, Shyam Sridhar, Peter L. G. Ventzek, Mark D. Smith
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053004 (2023)
https://doi.org/10.1116/6.0002838
Published: August 2023
View articletitled, Process optimization for shallow trench isolation etch using computational models
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Journal Articles

Simulation studies of floating field plate in β-Ga2O3 power devices and modules

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Zhao Han, Guangwei Xu, Xueqiang Xiang, Weibing Hao, Yuanbiao Li, Xuanze Zhou, Xiaobing Yan, Shibing Long
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053102 (2023)
https://doi.org/10.1116/6.0002650
Published: July 2023
View articletitled, Simulation studies of floating field plate in β-Ga2O3 power devices and modules
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Journal Articles

Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

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Antony Premkumar Peter, Takayama Tomomi, Ebisudani Taishi, Shiba Eiichiro, Alfonso Sepulveda, Timothee Blanquart, Yosuke Kimura, Sujith Subramanian, Sylvain Baudot, Briggs Basoene, Anshul Gupta, Anabela Veloso, Elena Capogreco, Hans Mertens, Johan Meersschaut, Thierry Conard, Praveen Dara, Jef Geypen, Gerardo Martinez, Dmitry Batuk, Steven Demuynck, Pierre Morin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042401 (2021)
https://doi.org/10.1116/6.0000821
Published: May 2021
View articletitled, Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
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Journal Articles

Atomic layer deposition of germanium-selenium-tellurium compounds for low-leakage, tunable ovonic threshold switches

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Valerio Adinolfi, Mario Laudato, Ryan Clarke, Vijay K. Narasimhan, Lanxia Cheng, Karl Littau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052404 (2020)
https://doi.org/10.1116/6.0000285
Published: July 2020
View articletitled, Atomic layer deposition of germanium-selenium-tellurium compounds for low-leakage, tunable ovonic threshold switches
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Includes: Supplementary data
Journal Articles

Atomic layer etching of metals with anisotropy, specificity, and selectivity

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Xia Sang, Yantao Xia, Philippe Sautet, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043005 (2020)
https://doi.org/10.1116/6.0000225
Published: June 2020
View articletitled, Atomic layer etching of metals with anisotropy, specificity, and selectivity
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Includes: Supplementary data
Journal Articles

Thin film deposition research and its impact on microelectronics scaling

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Cyril Cabral, Jr., Christian Lavoie, Conal Murray, Adam Pyzyna, Ken Rodbell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 040803 (2020)
https://doi.org/10.1116/6.0000230
Published: June 2020
View articletitled, Thin film deposition research and its impact on microelectronics scaling
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Journal Articles

Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3)

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Yongjae Kim, Sangin Lee, Yegeun Cho, Seoeun Kim, Heeyeop Chae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022606 (2020)
https://doi.org/10.1116/1.5134710
Published: February 2020
View articletitled, Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3)
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Journal Articles

Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve

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Margaret Wolf, Veronica Hayes, Cynthia R. Gerber, Philip G. Quardokus, Jose J. Ortiz-Garcia, Casey Plummer, Rebecca C. Quardokus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022413 (2020)
https://doi.org/10.1116/1.5139672
Published: February 2020
View articletitled, Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve
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Journal Articles

Universal software for the real-time control of sequential processing techniques

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Julian Pilz, Martin Tazreiter, Anna Maria Coclite
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 063201 (2019)
https://doi.org/10.1116/1.5125052
Published: October 2019
View articletitled, Universal software for the real-time control of sequential processing techniques
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Journal Articles

Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption

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Jason A. Peck, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021301 (2018)
https://doi.org/10.1116/1.4991586
Published: November 2017
View articletitled, Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption
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Journal Articles

Patterned films by atomic layer deposition using Parafilm as a mask

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Chao Zhang, Jesse Kalliomäki, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B102 (2018)
https://doi.org/10.1116/1.5001033
Published: August 2017
View articletitled, Patterned films by atomic layer deposition using Parafilm as a mask
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Journal Articles

Temperature and wall coating dependence of alkali vapor transport speed in micron-scale capillaries

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Matthieu Giraud-Carrier, Trevor Decker, Joshua McClellan, Linsey Bennett, Aaron Hawkins, Jennifer Black, Soren Almquist, Holger Schmidt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031602 (2017)
https://doi.org/10.1116/1.4978888
Published: March 2017
View articletitled, Temperature and wall coating dependence of alkali vapor transport speed in micron-scale capillaries
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Journal Articles

Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology

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Onintza Ros, Erwine Pargon, Marc Fouchier, Pascal Gouraud, Sebastien Barnola
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021306 (2017)
https://doi.org/10.1116/1.4972228
Published: December 2016
View articletitled, Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology
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Journal Articles

Resistive memory properties of an electrochemical SiO2-based device without an active electrode

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Chih-Yi Liu, Kun-Chi Chiang, Chun-Hung Lai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 02D102 (2016)
https://doi.org/10.1116/1.4933077
Published: October 2015
View articletitled, Resistive memory properties of an electrochemical SiO2-based device without an active electrode
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