Skip Nav Destination
Available to Purchase
Update search
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
Filter
All
- All
- Title
- Author
- Author Affiliations
- Full Text
- Abstract
- Keyword
- DOI
- ISBN
- EISBN
- ISSN
- EISSN
- Issue
- Volume
- References
NARROW
Format
Collections
Topics
Subjects
Journal
Article Type
Issue Section
Date
Availability
Journal Articles
Attention-enhanced conditional variational autoencoder integrating 3D plasma etching simulation for etching process optimization
Available to Purchase
J. Vac. Sci. Technol. A 43, 023003 (2025)
Published: February 2025
Journal Articles
Optical emission spectroscopy as a method for evaluating the change in Si etching structures profile in ICP SF6/C4F8 plasma: Microstructures
Available to PurchaseArtem A. Osipov, Alina E. Fumina, Anastasia B. Speshilova, Ekaterina V. Endiiarova, Armenak A. Osipov, Sergey E. Alexandrov
J. Vac. Sci. Technol. A 42, 063001 (2024)
Published: September 2024
Journal Articles
J. Vac. Sci. Technol. A 42, 022602 (2024)
Published: January 2024
Journal Articles
Atomic layer etching of indium tin oxide
Available to Purchase
J. Vac. Sci. Technol. A 42, 022601 (2024)
Published: January 2024
Includes: Supplementary data
Journal Articles
Formation of thin films via cold-rolled/annealed nickel sputtering targets
Available to Purchase
J. Vac. Sci. Technol. A 41, 063405 (2023)
Published: October 2023
Journal Articles
Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks
Kartik Sondhi, Rahul Sharangpani, Roshan Tirukkonda, Joyeeta Nag, Xing-Cai Guo, Michael A. Gribelyuk, Raghuveer S. Makala, Senaka Kanakamedala
J. Vac. Sci. Technol. A 41, 050402 (2023)
Published: August 2023
Includes: Supplementary data
Journal Articles
Process optimization for shallow trench isolation etch using computational models
Available to Purchase
J. Vac. Sci. Technol. A 41, 053004 (2023)
Published: August 2023
Journal Articles
Simulation studies of floating field plate in β-Ga2O3 power devices and modules
Available to PurchaseZhao Han, Guangwei Xu, Xueqiang Xiang, Weibing Hao, Yuanbiao Li, Xuanze Zhou, Xiaobing Yan, Shibing Long
J. Vac. Sci. Technol. A 41, 053102 (2023)
Published: July 2023
Journal Articles
Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes
Available to PurchaseAntony Premkumar Peter, Takayama Tomomi, Ebisudani Taishi, Shiba Eiichiro, Alfonso Sepulveda, Timothee Blanquart, Yosuke Kimura, Sujith Subramanian, Sylvain Baudot, Briggs Basoene, Anshul Gupta, Anabela Veloso, Elena Capogreco, Hans Mertens, Johan Meersschaut, Thierry Conard, Praveen Dara, Jef Geypen, Gerardo Martinez, Dmitry Batuk, Steven Demuynck, Pierre Morin
J. Vac. Sci. Technol. A 39, 042401 (2021)
Published: May 2021
Journal Articles
Atomic layer deposition of germanium-selenium-tellurium compounds for low-leakage, tunable ovonic threshold switches
Available to Purchase
J. Vac. Sci. Technol. A 38, 052404 (2020)
Published: July 2020
Includes: Supplementary data
Journal Articles
Atomic layer etching of metals with anisotropy, specificity, and selectivity
Available to Purchase
J. Vac. Sci. Technol. A 38, 043005 (2020)
Published: June 2020
Includes: Supplementary data
Journal Articles
Thin film deposition research and its impact on microelectronics scaling
Available to Purchase
J. Vac. Sci. Technol. A 38, 040803 (2020)
Published: June 2020
Journal Articles
Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3)
Available to Purchase
J. Vac. Sci. Technol. A 38, 022606 (2020)
Published: February 2020
Journal Articles
Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve
Available to PurchaseMargaret Wolf, Veronica Hayes, Cynthia R. Gerber, Philip G. Quardokus, Jose J. Ortiz-Garcia, Casey Plummer, Rebecca C. Quardokus
J. Vac. Sci. Technol. A 38, 022413 (2020)
Published: February 2020
Journal Articles
J. Vac. Sci. Technol. A 37, 063201 (2019)
Published: October 2019
Journal Articles
Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption
Available to Purchase
J. Vac. Sci. Technol. A 36, 021301 (2018)
Published: November 2017
Journal Articles
Patterned films by atomic layer deposition using Parafilm as a mask
Available to Purchase
J. Vac. Sci. Technol. A 36, 01B102 (2018)
Published: August 2017
Journal Articles
Temperature and wall coating dependence of alkali vapor transport speed in micron-scale capillaries
FreeMatthieu Giraud-Carrier, Trevor Decker, Joshua McClellan, Linsey Bennett, Aaron Hawkins, Jennifer Black, Soren Almquist, Holger Schmidt
J. Vac. Sci. Technol. A 35, 031602 (2017)
Published: March 2017
Journal Articles
Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology
Available to Purchase
J. Vac. Sci. Technol. A 35, 021306 (2017)
Published: December 2016
Journal Articles
Resistive memory properties of an electrochemical SiO2-based device without an active electrode
Available to Purchase
J. Vac. Sci. Technol. A 34, 02D102 (2016)
Published: October 2015
1