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Journal Articles

Formation of thin films via cold-rolled/annealed nickel sputtering targets

Sixie Li, Ming Wen, Chuanjun Wang, Yiqing Wang, Yue Shen
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063405 (2023)
https://doi.org/10.1116/6.0003033
Published: October 2023
View article titled, Formation of thin films via cold-rolled/annealed nickel sputtering targets
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Journal Articles

Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks

Kartik Sondhi, Rahul Sharangpani, Roshan Tirukkonda, Joyeeta Nag, Xing-Cai Guo, Michael A. Gribelyuk, Raghuveer S. Makala, Senaka Kanakamedala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 050402 (2023)
https://doi.org/10.1116/6.0002860
Published: August 2023
View article titled, Extending area selective deposition of ruthenium onto 3D SiO<sub>2</sub>-Si multilayer stacks
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Includes: Supplementary data
Journal Articles

Process optimization for shallow trench isolation etch using computational models

Shuo Huang, Prem Panneerchelvam, Chad M. Huard, Shyam Sridhar, Peter L. G. Ventzek, Mark D. Smith
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053004 (2023)
https://doi.org/10.1116/6.0002838
Published: August 2023
View article titled, Process optimization for shallow trench isolation etch using computational models
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Journal Articles

Simulation studies of floating field plate in β-Ga2O3 power devices and modules

Zhao Han, Guangwei Xu, Xueqiang Xiang, Weibing Hao, Yuanbiao Li, Xuanze Zhou, Xiaobing Yan, Shibing Long
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 053102 (2023)
https://doi.org/10.1116/6.0002650
Published: July 2023
View article titled, Simulation studies of floating field plate in <em>β</em>-Ga<sub>2</sub>O<sub>3</sub> power devices and modules
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Journal Articles

Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

Antony Premkumar Peter, Takayama Tomomi, Ebisudani Taishi, Shiba Eiichiro, Alfonso Sepulveda, Timothee Blanquart, Yosuke Kimura, Sujith Subramanian, Sylvain Baudot, Briggs Basoene, Anshul Gupta, Anabela Veloso, Elena Capogreco, Hans Mertens, Johan Meersschaut, Thierry Conard, Praveen Dara, Jef Geypen, Gerardo Martinez, Dmitry Batuk, Steven Demuynck, Pierre Morin
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 042401 (2021)
https://doi.org/10.1116/6.0000821
Published: May 2021
View article titled, Engineering high quality and conformal ultrathin SiN<sub>x</sub> films by PEALD for downscaled and advanced CMOS nodes
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Journal Articles

Atomic layer deposition of germanium-selenium-tellurium compounds for low-leakage, tunable ovonic threshold switches

Valerio Adinolfi, Mario Laudato, Ryan Clarke, Vijay K. Narasimhan, Lanxia Cheng, Karl Littau
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 052404 (2020)
https://doi.org/10.1116/6.0000285
Published: July 2020
View article titled, Atomic layer deposition of germanium-selenium-tellurium compounds for low-leakage, tunable ovonic threshold switches
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Includes: Supplementary data
Journal Articles

Atomic layer etching of metals with anisotropy, specificity, and selectivity

Xia Sang, Yantao Xia, Philippe Sautet, Jane P. Chang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 043005 (2020)
https://doi.org/10.1116/6.0000225
Published: June 2020
View article titled, Atomic layer etching of metals with anisotropy, specificity, and selectivity
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Includes: Supplementary data
Journal Articles

Thin film deposition research and its impact on microelectronics scaling

Cyril Cabral, Jr., Christian Lavoie, Conal Murray, Adam Pyzyna, Ken Rodbell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 040803 (2020)
https://doi.org/10.1116/6.0000230
Published: June 2020
View article titled, Thin film deposition research and its impact on microelectronics scaling
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Journal Articles

Tutorial on forming through-silicon vias

Susan L. Burkett, Matthew B. Jordan, Rebecca P. Schmitt, Lyle A. Menk, Andrew E. Hollowell
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 031202 (2020)
https://doi.org/10.1116/6.0000026
Published: April 2020
View article titled, Tutorial on forming through-silicon vias
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Journal Articles

Inside the mysterious world of plasma: A process engineer’s perspective

Keren J. Kanarik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 031004 (2020)
https://doi.org/10.1116/1.5141863
Published: March 2020
View article titled, Inside the mysterious world of plasma: A process engineer’s perspective
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Journal Articles

Plasma atomic layer etching of SiO2 and Si3N4 with heptafluoropropyl methyl ether (C3F7OCH3)

Yongjae Kim, Sangin Lee, Yegeun Cho, Seoeun Kim, Heeyeop Chae
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022606 (2020)
https://doi.org/10.1116/1.5134710
Published: February 2020
View article titled, Plasma atomic layer etching of SiO<sub>2</sub> and Si<sub>3</sub>N<sub>4</sub> with heptafluoropropyl methyl ether (C<sub>3</sub>F<sub>7</sub>OCH<sub>3</sub>)
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Journal Articles

Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve

Margaret Wolf, Veronica Hayes, Cynthia R. Gerber, Philip G. Quardokus, Jose J. Ortiz-Garcia, Casey Plummer, Rebecca C. Quardokus
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 022413 (2020)
https://doi.org/10.1116/1.5139672
Published: February 2020
View article titled, Microcontroller design for solution-phase molecular deposition in vacuum via a pulsed-solenoid valve
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Journal Articles

Universal software for the real-time control of sequential processing techniques

Julian Pilz, Martin Tazreiter, Anna Maria Coclite
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 063201 (2019)
https://doi.org/10.1116/1.5125052
Published: October 2019
View article titled, Universal software for the real-time control of sequential processing techniques
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Journal Articles

Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors

Andrea Illiberi, Ilias Katsouras, Sasa Gazibegovic, Brian Cobb, Elida Nekovic, Willem van Boekel, Corne Frijters, Joris Maas, Fred Roozeboom, Yves Creyghton, Paul Poodt, Gerwin Gelinck
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 04F401 (2018)
https://doi.org/10.1116/1.5008464
Published: February 2018
View article titled, Atmospheric plasma-enhanced spatial-ALD of InZnO for high mobility thin film transistors
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Journal Articles

Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption

Jason A. Peck, David N. Ruzic
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021301 (2018)
https://doi.org/10.1116/1.4991586
Published: November 2017
View article titled, Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption
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Journal Articles

Patterned films by atomic layer deposition using Parafilm as a mask

Chao Zhang, Jesse Kalliomäki, Markku Leskelä, Mikko Ritala
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01B102 (2018)
https://doi.org/10.1116/1.5001033
Published: August 2017
View article titled, Patterned films by atomic layer deposition using Parafilm as a mask
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Journal Articles

Temperature and wall coating dependence of alkali vapor transport speed in micron-scale capillaries

Matthieu Giraud-Carrier, Trevor Decker, Joshua McClellan, Linsey Bennett, Aaron Hawkins, Jennifer Black, Soren Almquist, Holger Schmidt
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 031602 (2017)
https://doi.org/10.1116/1.4978888
Published: March 2017
View article titled, Temperature and wall coating dependence of alkali vapor transport speed in micron-scale capillaries
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Journal Articles

Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology

Onintza Ros, Erwine Pargon, Marc Fouchier, Pascal Gouraud, Sebastien Barnola
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021306 (2017)
https://doi.org/10.1116/1.4972228
Published: December 2016
View article titled, Gate patterning strategies to reduce the gate shifting phenomenon for 14 nm fully depleted silicon-on-insulator technology
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Journal Articles

Resistive memory properties of an electrochemical SiO2-based device without an active electrode

Chih-Yi Liu, Kun-Chi Chiang, Chun-Hung Lai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 02D102 (2016)
https://doi.org/10.1116/1.4933077
Published: October 2015
View article titled, Resistive memory properties of an electrochemical SiO<sub>2</sub>-based device without an active electrode
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Journal Articles

Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model

Nobuyuki Kuboi, Tetsuya Tatsumi, Takashi Kinoshita, Takushi Shigetoshi, Masanaga Fukasawa, Jun Komachi, Hisahiro Ansai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061308 (2015)
https://doi.org/10.1116/1.4931782
Published: September 2015
View article titled, Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model
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