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Journal Articles

Topology of conductive clusters in sputtered high-quality VO2 thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions

Editor’s Pick
Cyril Koughia, Ozan Gunes, Chunzi Zhang, Shi-Jie Wen, Rick Wong, Qiaoqin Yang, Safa O. Kasap
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 063401 (2020)
https://doi.org/10.1116/6.0000443
Published: September 2020
View article titled, Topology of conductive clusters in sputtered high-quality VO<sub>2</sub> thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions
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Journal Articles

Maximizing stoichiometry control in reactive sputter deposition of TiO2

Brian D. Hoskins, Dmitri B. Strukov
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 020606 (2017)
https://doi.org/10.1116/1.4974140
Published: January 2017
View article titled, Maximizing stoichiometry control in reactive sputter deposition of TiO<sub>2</sub>
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Includes: Supplementary data
Journal Articles

Permeability and corrosion in ZrO2/Al2O3 nanolaminate and Al2O3 thin films grown by atomic layer deposition on polymers

Peter F. Carcia, Robert S. McLean, Zhigang G. Li, Michael H. Reilly, Will J. Marshall
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 041515 (2012)
https://doi.org/10.1116/1.4729447
Published: June 2012
View article titled, Permeability and corrosion in ZrO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> nanolaminate and Al<sub>2</sub>O<sub>3</sub> thin films grown by atomic layer deposition on polymers
Open the PDF for Permeability and corrosion in ZrO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> nanolaminate and Al<sub>2</sub>O<sub>3</sub> thin films grown by atomic layer deposition on polymers in another window
Journal Articles

Temperature dependence of resistivity of Si–Ta film deposited by magnetron sputtering

T. M. Berlicki, E. L. Prociów, J. Brzeziński, S. J. Osadnik
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 23, 503–505 (2005)
https://doi.org/10.1116/1.1894685
Published: April 2005
View article titled, Temperature dependence of resistivity of Si–Ta film deposited by magnetron sputtering
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Journal Articles

Percolative aspects of nonequilibrium adlayer structure

J. W. Evans, D. E. Sanders
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 6, 726–729 (1988)
https://doi.org/10.1116/1.575163
Published: May 1988
View article titled, Percolative aspects of nonequilibrium adlayer structure
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