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Journal Articles

Self-joule heating assisted field emission following the Child–Langmuir law

Yoichiro Neo, Rikuto Oda, Jonghyun Moon
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 063104 (2023)
https://doi.org/10.1116/5.0159964
Published: September 2023
View article titled, Self-joule heating assisted field emission following the Child–Langmuir law
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Journal Articles

Transient photocapacitance spectroscopy of deep-levels in (001) β-Ga2O3

Fenfen Fenda Florena, Aboulaye Traoré, Takeaki Sakurai
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 033205 (2023)
https://doi.org/10.1116/6.0002378
Published: March 2023
View article titled, Transient photocapacitance spectroscopy of deep-levels in (001) <em>β</em>-Ga<sub>2</sub>O<sub>3</sub>
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Journal Articles

On the possible nature of deep centers in Ga2O3

A. Y. Polyakov, A. I. Kochkova, Amanda Langørgen, Lasse Vines, A. Vasilev, I. V. Shchemerov, A. A. Romanov, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 023401 (2023)
https://doi.org/10.1116/6.0002307
Published: January 2023
View article titled, On the possible nature of deep centers in Ga<sub>2</sub>O<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Effects of metal redeposition in plasma sputtering

Kei Kiyokawa, Reiko Saito, Masato Morita, Tetsuo Sakamoto
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063009 (2022)
https://doi.org/10.1116/6.0002204
Published: November 2022
View article titled, Effects of metal redeposition in plasma sputtering
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Includes: Supplementary data
Journal Articles

Evaluation of nickel self-sputtering yields by molecular-dynamics simulation

Nicolas A. Mauchamp, Michiro Isobe, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043005 (2021)
https://doi.org/10.1116/6.0000979
Published: June 2021
View article titled, Evaluation of nickel self-sputtering yields by molecular-dynamics simulation
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Journal Articles

A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions

Joelle Zgheib, Pierre Yves Jouan, Ahmed Rhallabi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 043004 (2021)
https://doi.org/10.1116/6.0000865
Published: June 2021
View article titled, A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions
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Journal Articles

Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO

Violeta Prodanovic´, Hong Wah Chan, Anil U. Mane, Jeffrey W. Elam, Matthias M. Minjauw, Christophe Detavernier, Harry van der Graaf, Pasqualina M. Sarro
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 06A102 (2018)
https://doi.org/10.1116/1.5040813
Published: October 2018
View article titled, Effect of thermal annealing and chemical treatments on secondary electron emission properties of atomic layer deposited MgO
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Journal Articles

Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target

Muhammad Arif, Markus Sauer, Annette Foelske-Schmitz, Christoph Eisenmenger-Sittner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061507 (2017)
https://doi.org/10.1116/1.4993082
Published: September 2017
View article titled, Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target
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Includes: Supplementary data
Journal Articles

Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements

Stefan Raggl, Johannes Postler, Jörg Winkler, Georg Strauss, Christian Feist, Arno Plankensteiner, Michael Eidenberger-Schober, Paul Scheier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061308 (2017)
https://doi.org/10.1116/1.4996074
Published: September 2017
View article titled, Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements
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Journal Articles

Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017

J. E. Greene
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C204 (2017)
https://doi.org/10.1116/1.4998940
Published: September 2017
View article titled, Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017
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Journal Articles

Influence of surface roughness on secondary electron emission from graphite

Thomas S. Burton, Tyson C. Back, Steven B. Fairchild, Gregory B. Thompson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 041404 (2017)
https://doi.org/10.1116/1.4986629
Published: June 2017
View article titled, Influence of surface roughness on secondary electron emission from graphite
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Journal Articles

High performance flexible copper indium gallium selenide core–shell nanorod array photodetectors

Emad Badradeen, Matthew Brozak, Filiz Keles, Khalidah Al-Mayalee, Tansel Karabacak
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 03E112 (2017)
https://doi.org/10.1116/1.4982681
Published: April 2017
View article titled, High performance flexible copper indium gallium selenide core–shell nanorod array photodetectors
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Journal Articles

Electric potential screening on metal targets submitted to reactive sputtering

Carles Corbella, Adrian Marcak, Achim von Keudell, Teresa de los Arcos
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021307 (2017)
https://doi.org/10.1116/1.4972566
Published: December 2016
View article titled, Electric potential screening on metal targets submitted to reactive sputtering
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Journal Articles

Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher

Kye Hyun Baek, Eunwoo Lee, Michael Klick, Ralf Rothe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021304 (2017)
https://doi.org/10.1116/1.4968206
Published: December 2016
View article titled, Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher
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Journal Articles

Impact of extreme electrical fields on charge density distributions in Al3Sc alloy

Claudia Loyola, Joaquin Peralta, Scott R. Broderick, Krishna Rajan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061404 (2016)
https://doi.org/10.1116/1.4964833
Published: October 2016
View article titled, Impact of extreme electrical fields on charge density distributions in Al<sub>3</sub>Sc alloy
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Journal Articles

Analysis of compositional uniformity in AlxGa1−xN thin films using atom probe tomography and electron microscopy

Fang Liu, Li Huang, Lisa M. Porter, Robert F. Davis, Daniel K. Schreiber
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 041510 (2016)
https://doi.org/10.1116/1.4953410
Published: June 2016
View article titled, Analysis of compositional uniformity in Al<sub>x</sub>Ga<sub>1−x</sub>N thin films using atom probe tomography and electron microscopy
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Journal Articles

Results and problems in the construction phase of the SuperKEKB vacuum system

Yusuke Suetsugu, Ken-ichi Kanazawa, Kyo Shibata, Takuya Ishibashi, Hiromi Hisamatsu, Mitsuru Shirai, Shinji Terui
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021605 (2016)
https://doi.org/10.1116/1.4942455
Published: February 2016
View article titled, Results and problems in the construction phase of the SuperKEKB vacuum system
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Journal Articles

Fluid simulation of the bias effect in inductive/capacitive discharges

Yu-Ru Zhang, Fei Gao, Xue-Chun Li, Annemie Bogaerts, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061303 (2015)
https://doi.org/10.1116/1.4928033
Published: August 2015
View article titled, Fluid simulation of the bias effect in inductive/capacitive discharges
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Journal Articles

Evaluation of electropolished stainless steel electrodes for use in DC high voltage photoelectron guns

Mahzad BastaniNejad, Abdelmageed A. Elmustafa, Eric Forman, Steven Covert, John Hansknecht, Carlos Hernandez-Garcia, Matthew Poelker, Lopa Das, Michael Kelley, Phillip Williams
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 041401 (2015)
https://doi.org/10.1116/1.4920984
Published: May 2015
View article titled, Evaluation of electropolished stainless steel electrodes for use in DC high voltage photoelectron guns
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Journal Articles

Recovery of x-ray absorption spectral profile in etched TiO2 thin films

Keiji Sano, Masahito Niibe, Retsuo Kawakami, Yoshitaka Nakano
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 031403 (2015)
https://doi.org/10.1116/1.4917012
Published: April 2015
View article titled, Recovery of x-ray absorption spectral profile in etched TiO<sub>2</sub> thin films
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