1-20 of 22
Electron density
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Disilane addition versus silane-hydrogen flow rate effect on the PECVD of silicon thin films

Panagiotis Dimitrakellis, Eleftherios Amanatides, Dimitrios Mataras, Angelos G. Kalampounias, Nikolaos Spiliopoulos, Vanina Lahootun, François Coeuret, Alain Madec
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 061307 (2016)
https://doi.org/10.1116/1.4966957
Published: November 2016
View article titled, Disilane addition versus silane-hydrogen flow rate effect on the PECVD of silicon thin films
Open the PDF for Disilane addition versus silane-hydrogen flow rate effect on the PECVD of silicon thin films in another window
Journal Articles

Measurement of spatial and temporal evolution of electromagnetic fields in a 100 MHz plasma source using B dot and double dipole probes

Barton Lane, Colin Campbell, Ikuo Sawada, Peter L. G. Ventzek
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031302 (2016)
https://doi.org/10.1116/1.4943586
Published: March 2016
View article titled, Measurement of spatial and temporal evolution of electromagnetic fields in a 100 MHz plasma source using B dot and double dipole probes
Open the PDF for Measurement of spatial and temporal evolution of electromagnetic fields in a 100 MHz plasma source using B dot and double dipole probes in another window
Journal Articles

Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges

Jia Liu, De-Qi Wen, Yong-Xin Liu, Fei Gao, Wen-Qi Lu, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 061308 (2013)
https://doi.org/10.1116/1.4822059
Published: September 2013
View article titled, Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges
Open the PDF for Experimental and numerical investigations of electron density in low-pressure dual-frequency capacitively coupled oxygen discharges in another window
Journal Articles

Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy

Shicong Wang, Amy E. Wendt, John B. Boffard, Chun C. Lin, Svetlana Radovanov, Harold Persing
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 021303 (2013)
https://doi.org/10.1116/1.4792671
Published: February 2013
View article titled, Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy
Open the PDF for Noninvasive, real-time measurements of plasma parameters via optical emission spectroscopy in another window
Journal Articles

Modeling of inductively coupled plasma Ar/Cl2/N2 plasma discharge: Effect of N2 on the plasma properties

Romain Chanson, Ahmed Rhallabi, Marie Claude Fernandez, Christophe Cardinaud, Jean Pierre Landesman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 31, 011301 (2013)
https://doi.org/10.1116/1.4766681
Published: November 2012
View article titled, Modeling of inductively coupled plasma Ar/Cl<sub>2</sub>/N<sub>2</sub> plasma discharge: Effect of N<sub>2</sub> on the plasma properties
Open the PDF for Modeling of inductively coupled plasma Ar/Cl<sub>2</sub>/N<sub>2</sub> plasma discharge: Effect of N<sub>2</sub> on the plasma properties in another window
Journal Articles

Control of electromagnetic edge effects in electrically-small rectangular plasma reactors

Christopher P. Trampel, Daniel S. Stieler
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 051305 (2012)
https://doi.org/10.1116/1.4739497
Published: July 2012
View article titled, Control of electromagnetic edge effects in electrically-small rectangular plasma reactors
Open the PDF for Control of electromagnetic edge effects in electrically-small rectangular plasma reactors in another window
Journal Articles

Origin of electrical signals for plasma etching end point detection: Comparison of end point signals and electron density

Mark A. Sobolewski, David L. Lahr
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 30, 051303 (2012)
https://doi.org/10.1116/1.4737615
Published: July 2012
View article titled, Origin of electrical signals for plasma etching end point detection: Comparison of end point signals and electron density
Open the PDF for Origin of electrical signals for plasma etching end point detection: Comparison of end point signals and electron density in another window
Journal Articles

Spatially resolved measurements of ion density and electron temperature in a dual-frequency capacitively coupled plasma by complete floating double probe technique

Xiang-Zhan Jiang, Yong-Xin Liu, Shuo Yang, Wen-Qi Lu, Zhen-Hua Bi, Xiao-Song Li, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 29, 011006 (2011)
https://doi.org/10.1116/1.3520644
Published: January 2011
View article titled, Spatially resolved measurements of ion density and electron temperature in a dual-frequency capacitively coupled plasma by complete floating double probe technique
Open the PDF for Spatially resolved measurements of ion density and electron temperature in a dual-frequency capacitively coupled plasma by complete floating double probe technique in another window
Journal Articles

Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements

G. A. Curley, L. Gatilova, S. Guilet, S. Bouchoule, G. S. Gogna, N. Sirse, S. Karkari, J. P. Booth
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 360–372 (2010)
https://doi.org/10.1116/1.3330766
Published: March 2010
View article titled, Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements
Open the PDF for Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements in another window
Journal Articles

Self-bias voltage diagnostics for the amorphous-to-microcrystalline transition in a-Si:H under a hydrogen-plasma treatment

A. Hadjadj, N. Pham, P. Roca i Cabarrocas, O. Jbara
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 28, 309–313 (2010)
https://doi.org/10.1116/1.3305719
Published: February 2010
View article titled, Self-bias voltage diagnostics for the amorphous-to-microcrystalline transition in a-Si:H under a hydrogen-plasma treatment
Open the PDF for Self-bias voltage diagnostics for the amorphous-to-microcrystalline transition in a-Si:H under a hydrogen-plasma treatment in another window
Journal Articles

Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher

Chaung Lin, Keh-Chyang Leou, Hong-Min Huang, Cheng-Hung Hsieh
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 27, 157–164 (2009)
https://doi.org/10.1116/1.3054135
Published: January 2009
View article titled, Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher
Open the PDF for Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher in another window
Journal Articles

Capacitive discharges driven by combined dc/rf sources

E. Kawamura, M. A. Lieberman, A. J. Lichtenberg, E. A. Hudson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 25, 1456–1474 (2007)
https://doi.org/10.1116/1.2771561
Published: August 2007
View article titled, Capacitive discharges driven by combined dc/rf sources
Open the PDF for Capacitive discharges driven by combined dc/rf sources in another window
Journal Articles

Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition

Vivek Vyas, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 24, 1955–1969 (2006)
https://doi.org/10.1116/1.2335864
Published: September 2006
View article titled, Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition
Open the PDF for Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition in another window
Journal Articles

Control of plasma parameters by using noble gas admixtures

Kurt J. Taylor, Seokmin Yun, George R. Tynan
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 2131–2138 (2004)
https://doi.org/10.1116/1.1772375
Published: September 2004
View article titled, Control of plasma parameters by using noble gas admixtures
Open the PDF for Control of plasma parameters by using noble gas admixtures in another window
Journal Articles

Performance of inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition

Kunio Okimura, Junya Oyanagi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 22, 39–45 (2004)
https://doi.org/10.1116/1.1627770
Published: November 2003
View article titled, Performance of inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition
Open the PDF for Performance of inductively coupled plasma assisted sputtering with internal coil for ferromagnetic CoCrTa film deposition in another window
Journal Articles

Degree of Cl 2 dissociation and etching characteristics in high-density plasmas

Seiji Samukawa
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 17, 774–779 (1999)
https://doi.org/10.1116/1.581648
Published: May 1999
View article titled, Degree of Cl 2 dissociation and etching characteristics in high-density plasmas
Open the PDF for Degree of Cl 2 dissociation and etching characteristics in high-density plasmas in another window
Journal Articles

Influence of electrostatic forces on the investigation of dopant atoms in layered semiconductors by scanning tunneling microscopy/spectroscopy and atomic force microscopy

R. Schlaf, D. Louder, M. W. Nelson, B. A. Parkinson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 15, 1466–1472 (1997)
https://doi.org/10.1116/1.580563
Published: May 1997
View article titled, Influence of electrostatic forces on the investigation of dopant atoms in layered semiconductors by scanning tunneling microscopy/spectroscopy and atomic force microscopy
Open the PDF for Influence of electrostatic forces on the investigation of dopant atoms in layered semiconductors by scanning tunneling microscopy/spectroscopy and atomic force microscopy in another window
Journal Articles

Effect of herringbone reconstruction on interference of two-dimensional electron gas on Au(111) surfaces

D. Fujita, K. Amemiya, T. Yakabe, H. Nejoh, T. Sato, M. Iwatsuki
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 15, 1613–1618 (1997)
https://doi.org/10.1116/1.580641
Published: May 1997
View article titled, Effect of herringbone reconstruction on interference of two-dimensional electron gas on Au(111) surfaces
Open the PDF for Effect of herringbone reconstruction on interference of two-dimensional electron gas on Au(111) surfaces in another window
Journal Articles

Automated Langmuir probe characterization of methane/hydrogen low‐pressure radio frequency discharges in a production reactor

F. A. Cali, P. A. F. Herbert, W. M. Kelly
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 13, 2920–2923 (1995)
https://doi.org/10.1116/1.579614
Published: November 1995
View article titled, Automated Langmuir probe characterization of methane/hydrogen low‐pressure radio frequency discharges in a production reactor
Open the PDF for Automated Langmuir probe characterization of methane/hydrogen low‐pressure radio frequency discharges in a production reactor in another window
Journal Articles

Electron and ion transport in magnetron plasmas

T. E. Sheridan, M. J. Goeckner, J. Goree
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 8, 1623–1626 (1990)
https://doi.org/10.1116/1.576776
Published: May 1990
View article titled, Electron and ion transport in magnetron plasmas
Open the PDF for Electron and ion transport in magnetron plasmas in another window