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Journal Articles

Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se3

Margaret M. Brown, Ricardo Ruvalcaba, Katherine M. Burzynski, Derek Winner, Krishnamurthy Mahalingam, Venkata S. Puli, Ryan P. Laing, Tobin C. Muratore, Jeff L. Brown, Kurt G. Eyink, Said Elhamri, Aldo H. Romero, Jonathan Guerrero-Sanchez, Joseph P. Corbett, Amber Reed
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 043406 (2023)
https://doi.org/10.1116/6.0002655
Published: June 2023
View article titled, Nucleation and quantum confinement of nano-platelet Bi<sub>2</sub>–Bi<sub>2</sub>Se<sub>3</sub>
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Includes: Supplementary data
Journal Articles

Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption

Thabiso Kunene, Alex B. F. Martinson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 41, 042402 (2023)
https://doi.org/10.1116/6.0002664
Published: June 2023
View article titled, Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO<sub>2</sub> absorption
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Includes: Supplementary data
Journal Articles

Type II band alignment of NiO/α-Ga2O3 for annealing temperatures up to 600 °C

Xinyi Xia, Jian-Sian Li, Chao-Ching Chiang, Timothy Jinsoo Yoo, Eitan Hershkovitz, Fan Ren, Honggyu Kim, Jihyun Kim, Dae-Woo Jeon, Ji-Hyeon Park, S. J. Pearton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063408 (2022)
https://doi.org/10.1116/6.0002257
Published: November 2022
View article titled, Type II band alignment of NiO/α-Ga<sub>2</sub>O<sub>3</sub> for annealing temperatures up to 600 °C
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Journal Articles

Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]

Abdulrahman H. Basher, Marjan Krstić, Karin Fink, Tomoko Ito, Kazuhiro Karahashi, Wolfgang Wenzel, Satoshi Hamaguchi
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 39, 057001 (2021)
https://doi.org/10.1116/6.0001319
Published: August 2021
View article titled, Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)<sub>2</sub> on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]
Open the PDF for Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)<sub>2</sub> on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)] in another window
Journal Articles

Structural and optical properties of (Zn,Mn)O thin films prepared by atomic layer deposition

Amirhossein Ghods, Chuanle Zhou, Ian T. Ferguson
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 042408 (2020)
https://doi.org/10.1116/6.0000141
Published: June 2020
View article titled, Structural and optical properties of (Zn,Mn)O thin films prepared by atomic layer deposition
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Journal Articles

Bixbyite-Ta2N2O film prepared by HiPIMS and postdeposition annealing: Structure and properties

J. Čapek, Š. Batková, M. Matas, Š. Kos, T. Kozák, S. Haviar, J. Houška, J. Schusser, J. Minár, F. Dvořák, P. Zeman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 38, 033409 (2020)
https://doi.org/10.1116/6.0000066
Published: April 2020
View article titled, Bixbyite-Ta<sub>2</sub>N<sub>2</sub>O film prepared by HiPIMS and postdeposition annealing: Structure and properties
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Journal Articles

Formation of defects and impurities in MoSx and their effect on electronic properties

Yifan Nie, Ravi Agarwal, Sumeet C. Pandey, Gurtej S. Sandhu
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 030905 (2019)
https://doi.org/10.1116/1.5090237
Published: April 2019
View article titled, Formation of defects and impurities in MoS<sub>x</sub> and their effect on electronic properties
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Journal Articles

Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Seok Hwan Kim, Wooseok Song, In Su Jeon, Sun Sook Lee, Taek-Mo Chung, Ki-Seok An
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 02D402 (2018)
https://doi.org/10.1116/1.5015946
Published: February 2018
View article titled, Initial reactions of ultrathin HfO<sub>2</sub> films by <em>in situ</em> atomic layer deposition: An <em>in situ</em> synchrotron photoemission spectroscopy study
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Journal Articles

Role of film thickness on the structural and optical properties of GaN on Si (100) grown by hollow-cathode plasma-assisted atomic layer deposition

Nese Gungor, Mustafa Alevli
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021514 (2018)
https://doi.org/10.1116/1.5003154
Published: February 2018
View article titled, Role of film thickness on the structural and optical properties of GaN on Si (100) grown by hollow-cathode plasma-assisted atomic layer deposition
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Journal Articles

In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition

Ganna Chistiakova, Mathias Mews, Regan G. Wilks, Marcus Bär, Lars Korte
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 02D401 (2018)
https://doi.org/10.1116/1.5015967
Published: January 2018
View article titled, In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition
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Includes: Supplementary data
Journal Articles

Atomic layer deposition of molybdenum disulfide films using MoF6 and H2S

Anil U. Mane, Steven Letourneau, David J. Mandia, Jian Liu, Joseph A. Libera, Yu Lei, Qing Peng, Elton Graugnard, Jeffrey W. Elam
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A125 (2018)
https://doi.org/10.1116/1.5003423
Published: December 2017
View article titled, Atomic layer deposition of molybdenum disulfide films using MoF<sub>6</sub> and H<sub>2</sub>S
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Journal Articles

Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al2O3/p-Ge MOS structures

Martha A. Botzakaki, George Skoulatakis, Nikolaos Xanthopoulos, Violetta Gianneta, Anastasios Travlos, Stella Kennou, Spyridon Ladas, Christos Tsamis, Eleni Makarona, Stavroula N. Georga, Christoforos A. Krontiras
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A120 (2018)
https://doi.org/10.1116/1.5003375
Published: December 2017
View article titled, Influence of the atomic layer deposition temperature on the structural and electrical properties of Al/Al<sub>2</sub>O<sub>3</sub>/p-Ge MOS structures
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Journal Articles

Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature

Julian Pilz, Alberto Perrotta, Paul Christian, Martin Tazreiter, Roland Resel, Günther Leising, Thomas Griesser, Anna Maria Coclite
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 01A109 (2018)
https://doi.org/10.1116/1.5003334
Published: December 2017
View article titled, Tuning of material properties of ZnO thin films grown by plasma-enhanced atomic layer deposition at room temperature
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Includes: Supplementary data
Journal Articles

XeF2 etching of epitaxial Nb2N for lift-off or micromachining of III-N materials and devices

Brian P. Downey, D. Scott Katzer, Neeraj Nepal, Matthew T. Hardy, David J. Meyer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C312 (2017)
https://doi.org/10.1116/1.4994400
Published: July 2017
View article titled, XeF<sub>2</sub> etching of epitaxial Nb<sub>2</sub>N for lift-off or micromachining of III-N materials and devices
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Journal Articles

Atomic layer deposition of two dimensional MoS2 on 150 mm substrates

Arturo Valdivia, Douglas J. Tweet, John F. Conley, Jr.
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021515 (2016)
https://doi.org/10.1116/1.4941245
Published: February 2016
View article titled, Atomic layer deposition of two dimensional MoS<sub>2</sub> on 150 mm substrates
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Journal Articles

Anodic formation of highly ordered TiO2 nanotube arrays on conducting glass substrate: Effect of titanium film thickness

Motahareh Einollahzadeh-Samadi, Reza S. Dariani
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061402 (2015)
https://doi.org/10.1116/1.4926752
Published: July 2015
View article titled, Anodic formation of highly ordered TiO<sub>2</sub> nanotube arrays on conducting glass substrate: Effect of titanium film thickness
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Journal Articles

a-SixC1−x:H thin films with subnanometer surface roughness for biological applications

José Herrera-Celis, Claudia Reyes-Betanzo, Adrián Itzmoyotl-Toxqui, Abdu Orduña-Díaz, Ana Pérez-Coyotl
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 05E108 (2015)
https://doi.org/10.1116/1.4922409
Published: June 2015
View article titled, <em>a</em>-Si<sub>x</sub>C<sub>1−x</sub>:H thin films with subnanometer surface roughness for biological applications
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Journal Articles

Photoluminescence from nanocrystalline silicon nc-Si, nc-Si/SiO2 nanocomposites, and nc-Si oxidized in O2 and treated in H2O

Stan Veprek, Maritza G. J. Veprek-Heijman
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 043001 (2015)
https://doi.org/10.1116/1.4921555
Published: May 2015
View article titled, Photoluminescence from nanocrystalline silicon nc-Si, nc-Si/SiO<sub>2</sub> nanocomposites, and nc-Si oxidized in O<sub>2</sub> and treated in H<sub>2</sub>O
Open the PDF for Photoluminescence from nanocrystalline silicon nc-Si, nc-Si/SiO<sub>2</sub> nanocomposites, and nc-Si oxidized in O<sub>2</sub> and treated in H<sub>2</sub>O in another window
Journal Articles

Sintered Cr/Pt and Ni/Au ohmic contacts to B12P2

Clint D. Frye, Sergei O. Kucheyev, James H. Edgar, Lars F. Voss, Adam M. Conway, Qinghui Shao, Rebecca J. Nikolić
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 031101 (2015)
https://doi.org/10.1116/1.4917010
Published: April 2015
View article titled, Sintered Cr/Pt and Ni/Au ohmic contacts to B<sub>12</sub>P<sub>2</sub>
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Journal Articles

Optical characteristics of nanocrystalline AlxGa1−xN thin films deposited by hollow cathode plasma-assisted atomic layer deposition

Eda Goldenberg, Cagla Ozgit-Akgun, Necmi Biyikli, Ali Kemal Okyay
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 32, 031508 (2014)
https://doi.org/10.1116/1.4870381
Published: April 2014
View article titled, Optical characteristics of nanocrystalline Al<sub>x</sub>Ga<sub>1−x</sub>N thin films deposited by hollow cathode plasma-assisted atomic layer deposition
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