1-20 of 98
Electron density
Close
Save search
Follow your search
Access your saved searches in your account
Close Modal
Sort by
Journal Articles

Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor

Radha Krishna Murthy Bulusu, Shurik Yatom, Christopher W. Patterson, Robert J. Wandell, Bruce R. Locke
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 40, 063001 (2022)
https://doi.org/10.1116/6.0001992
Published: September 2022
View article titled, Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor
Open the PDF for Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor in another window
Includes: Supplementary data
Journal Articles

Reference-free grazing incidence x-ray fluorescence and reflectometry as a methodology for independent validation of x-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization

Philipp Hönicke, Blanka Detlefs, Emmanuel Nolot, Yves Kayser, Uwe Mühle, Beatrix Pollakowski, Burkhard Beckhoff
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 37, 041502 (2019)
https://doi.org/10.1116/1.5094891
Published: May 2019
View article titled, Reference-free grazing incidence x-ray fluorescence and reflectometry as a methodology for independent validation of x-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization
Open the PDF for Reference-free grazing incidence x-ray fluorescence and reflectometry as a methodology for independent validation of x-ray reflectometry on ultrathin layer stacks and a depth-dependent characterization in another window
Journal Articles

Precise control of ion and radical production using electron beam generated plasmas

David R. Boris, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 060601 (2018)
https://doi.org/10.1116/1.5053615
Published: October 2018
View article titled, Precise control of ion and radical production using electron beam generated plasmas
Open the PDF for Precise control of ion and radical production using electron beam generated plasmas in another window
Journal Articles

Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF3/O2 mixtures

Shuo Huang, Vladimir Volynets, James R. Hamilton, Sang Ki Nam, In-Cheol Song, Siqing Lu, Jonathan Tennyson, Mark J. Kushner
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 36, 021305 (2018)
https://doi.org/10.1116/1.5019673
Published: February 2018
View article titled, Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF<sub>3</sub>/O<sub>2</sub> mixtures
Open the PDF for Downstream etching of silicon nitride using continuous-wave and pulsed remote plasma sources sustained in Ar/NF<sub>3</sub>/O<sub>2</sub> mixtures in another window
Journal Articles

Heating mechanisms of magnetized capacitively coupled argon plasmas excited by tailored voltage waveforms

Shali Yang, Maria Elena Innocenti, Ya Zhang, Lin Yi, Wei Jiang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061311 (2017)
https://doi.org/10.1116/1.4990137
Published: October 2017
View article titled, Heating mechanisms of magnetized capacitively coupled argon plasmas excited by tailored voltage waveforms
Open the PDF for Heating mechanisms of magnetized capacitively coupled argon plasmas excited by tailored voltage waveforms in another window
Journal Articles

Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements

Stefan Raggl, Johannes Postler, Jörg Winkler, Georg Strauss, Christian Feist, Arno Plankensteiner, Michael Eidenberger-Schober, Paul Scheier
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 061308 (2017)
https://doi.org/10.1116/1.4996074
Published: September 2017
View article titled, Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements
Open the PDF for Correlation of target properties and plasma parameters in DC magnetron sputtering with Langmuir probe measurements in another window
Journal Articles

Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges

Emi Kawamura, De-Qi Wen, Michael A. Lieberman, Allan J. Lichtenberg
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 05C311 (2017)
https://doi.org/10.1116/1.4993595
Published: July 2017
View article titled, Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges
Open the PDF for Effect of a dielectric layer on plasma uniformity in high frequency electronegative capacitive discharges in another window
Journal Articles

Multiscale approach for simulation of silicon etching using SF6/C4F8 Bosch process

Guillaume Le Dain, Ahmed Rhallabi, Marie Claude Fernandez, Mohamed Boufnichel, Fabrice Roqueta
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 03E113 (2017)
https://doi.org/10.1116/1.4982687
Published: May 2017
View article titled, Multiscale approach for simulation of silicon etching using SF<sub>6</sub>/C<sub>4</sub>F<sub>8</sub> Bosch process
Open the PDF for Multiscale approach for simulation of silicon etching using SF<sub>6</sub>/C<sub>4</sub>F<sub>8</sub> Bosch process in another window
Journal Articles

Ab initio determination of electron affinity of polar nitride surfaces, clean and under Cs coverage

Pawel Strak, Pawel Kempisty, Konrad Sakowski, Stanislaw Krukowski
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021406 (2017)
https://doi.org/10.1116/1.4975332
Published: February 2017
View article titled, <em>Ab initio</em> determination of electron affinity of polar nitride surfaces, clean and under Cs coverage
Open the PDF for <em>Ab initio</em> determination of electron affinity of polar nitride surfaces, clean and under Cs coverage in another window
Journal Articles

Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision

David R. Boris, Tzvetelina B. Petrova, George M. Petrov, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 01A104 (2017)
https://doi.org/10.1116/1.4971416
Published: December 2016
View article titled, Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision
Open the PDF for Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision in another window
Journal Articles

Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher

Kye Hyun Baek, Eunwoo Lee, Michael Klick, Ralf Rothe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021304 (2017)
https://doi.org/10.1116/1.4968206
Published: December 2016
View article titled, Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher
Open the PDF for Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher in another window
Journal Articles

Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O2/Ar plasmas

Chan Xue, De-Qi Wen, Wei Liu, Yu-Ru Zhang, Fei Gao, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 35, 021301 (2017)
https://doi.org/10.1116/1.4967913
Published: November 2016
View article titled, Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O<sub>2</sub>/Ar plasmas
Open the PDF for Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O<sub>2</sub>/Ar plasmas in another window
Journal Articles

Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge

Nishant Sirse, Anurag Mishra, Geun Y. Yeom, Albert R. Ellingboe
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051302 (2016)
https://doi.org/10.1116/1.4959844
Published: July 2016
View article titled, Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge
Open the PDF for Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge in another window
Journal Articles

Measurement of atmospheric pressure microplasma jet with Langmuir probes

Kunning G. Xu, Steven J. Doyle
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 051301 (2016)
https://doi.org/10.1116/1.4959565
Published: July 2016
View article titled, Measurement of atmospheric pressure microplasma jet with Langmuir probes
Open the PDF for Measurement of atmospheric pressure microplasma jet with Langmuir probes in another window
Journal Articles

F-atom kinetics in SF6/Ar inductively coupled plasmas

Wei Yang, Shu-Xia Zhao, De-Qi Wen, Wei Liu, Yong-Xin Liu, Xue-Chun Li, You-Nian Wang
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 031305 (2016)
https://doi.org/10.1116/1.4945003
Published: March 2016
View article titled, F-atom kinetics in SF<sub>6</sub>/Ar inductively coupled plasmas
Open the PDF for F-atom kinetics in SF<sub>6</sub>/Ar inductively coupled plasmas in another window
Journal Articles

One-dimensional Ar-SF6 hydromodel at low-pressure in e-beam generated plasmas

George M. Petrov, David R. Boris, Tzvetelina B. Petrova, Scott G. Walton
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021302 (2016)
https://doi.org/10.1116/1.4940885
Published: February 2016
View article titled, One-dimensional Ar-SF<sub>6</sub> hydromodel at low-pressure in e-beam generated plasmas
Open the PDF for One-dimensional Ar-SF<sub>6</sub> hydromodel at low-pressure in e-beam generated plasmas in another window
Journal Articles

Modification of a metal nanoparticle beam by a hollow electrode discharge

Amir Mohammad Ahadi, Alexander Hinz, Oleksandr Polonskyi, Thomas Trottenberg, Thomas Strunskus, Holger Kersten, Franz Faupel
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 34, 021301 (2016)
https://doi.org/10.1116/1.4936188
Published: November 2015
View article titled, Modification of a metal nanoparticle beam by a hollow electrode discharge
Open the PDF for Modification of a metal nanoparticle beam by a hollow electrode discharge in another window
Includes: Supplementary data
Journal Articles

Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films

L. Maaloul, R. K. Gangwar, S. Morel, L. Stafford
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 061310 (2015)
https://doi.org/10.1116/1.4934762
Published: October 2015
View article titled, Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films
Open the PDF for Spatially resolved electron density and electron energy distribution function in Ar magnetron plasmas used for sputter-deposition of ZnO-based thin films in another window
Journal Articles

Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures

John B. Boffard, Chun C. Lin, Shicong Wang, Amy E. Wendt, Cody Culver, Svetlana Radovanov, Harold Persing
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 021306 (2015)
https://doi.org/10.1116/1.4904036
Published: December 2014
View article titled, Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures
Open the PDF for Comparison of surface vacuum ultraviolet emissions with resonance level number densities. II. Rare-gas plasmas and Ar-molecular gas mixtures in another window
Journal Articles

Thin film analysis by low-energy ion scattering by use of TRBS simulations

Philipp Brüner, Thomas Grehl, Hidde Brongersma, Blanka Detlefs, Emmanuel Nolot, Helen Grampeix, Erich Steinbauer, Peter Bauer
Journal: Journal of Vacuum Science & Technology A
J. Vac. Sci. Technol. A 33, 01A122 (2015)
https://doi.org/10.1116/1.4901451
Published: November 2014
View article titled, Thin film analysis by low-energy ion scattering by use of TRBS simulations
Open the PDF for Thin film analysis by low-energy ion scattering by use of TRBS simulations in another window